JP2008016818A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP2008016818A JP2008016818A JP2007097453A JP2007097453A JP2008016818A JP 2008016818 A JP2008016818 A JP 2008016818A JP 2007097453 A JP2007097453 A JP 2007097453A JP 2007097453 A JP2007097453 A JP 2007097453A JP 2008016818 A JP2008016818 A JP 2008016818A
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- semiconductor element
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- metal layer
- electrodes
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Abstract
【解決手段】半導体素子10は、表面11と裏面12とに電極13〜15を有するパワー素子であり、半導体素子10の表面11と裏面12とに金属層21、22を接続することで、表裏両面11、12の電極13〜15を、それぞれの面に位置する金属層21、22と電気的に接続し、当該金属層21、22を介して外部と接続可能とした。
【選択図】図1
Description
図1は、本発明の第1実施形態に係る半導体装置100の全体構成を示す概略断面図である。ここで、図1中の半導体装置100のうち半導体素子10の上面11を表面11、下面12を裏面12とする。
図7は、本発明の第2実施形態に係る半導体装置110の全体構成を示す概略断面図である。
図8は、本発明の第3実施形態に係る半導体装置における要部構成を示す概略平面図であり、上記図1に示される半導体装置における裏面側金属層22側の平面構成に相当するものである。
図10は、本発明の第4実施形態に係る半導体装置130の全体構成を示す概略断面図である。
図11は、本発明の第5実施形態に係る半導体装置140の全体構成を示す概略断面図である。
図12は、本発明の第6実施形態に係る半導体装置150の全体構成を示す概略断面図である。なお、図12ではゲート電極15は省略してある。
図13は、本発明の第7実施形態に係る半導体装置の製造方法の要部を示す概略断面図である。
図14は、本発明の第8実施形態に係る半導体装置の製造方法の要部を示す概略断面図である。
図15は、本発明の第9実施形態に係る半導体装置の製造方法の要部を示す概略断面図である。
図16は、本発明の第10実施形態に係る半導体装置160の全体構成を示す概略断面図である。ここでも、図16中の半導体装置160のうち半導体素子10の上面11を表面11、下面12を裏面12とする。
図18(a)は、本発明の第11実施形態に係る半導体装置170の全体構成を示す概略断面図であり、(b)は(a)中のA−A概略断面図、(c)は(a)中の矢印B方向から見た概略平面図である。
図20は、本発明の第12実施形態に係る半導体装置180の全体構成を示す概略断面図である。また、図21は、本半導体装置180において、半導体素子10の裏面12の電極14、15に、はんだバンプ450を設けた状態を示す概略断面図であり、(a)はエミッタ電極14のはんだバンプ450を分割しない例、(b)は分割した例を示している。
以下に、本発明の他の実施形態として種々の例を示す。半導体装置100の基板400への実装構造としては、上記図5や図6等に示されたものに限定されるものではなく、図22に示されるように、半導体素子10を基板400上に立てた状態となるように、半導体装置100を基板400に搭載してもよい。
13…半導体素子の表面の電極としてのコレクタ電極、
14…半導体素子の裏面の電極としてのエミッタ電極、
15…半導体素子の裏面の電極としてのゲート電極、
21…表面側金属層、22…裏面側金属層、22a…凹部、
30…封止樹脂、40…導電性接合部材としてのはんだ、50…被覆樹脂、
60…導電部材、70…導体部、200…半導体ウェハ、
201…半導体ウェハの表面、202…半導体ウェハの裏面、
301…表面側金属層の素材となる板材、
302…裏面側金属層の素材となる板材、350…フィルム部材。
Claims (25)
- 半導体よりなり表裏両面(11、12)の少なくとも一方の面に電極(13、14、15)を有する半導体素子(10)を備え、
この半導体素子(10)の表面(11)と裏面(12)とには金属層(21、22)が接続されており、
前記電極(13〜15)は、当該電極(13〜15)を有する前記半導体素子(10)の面に接続された前記金属層(21、22)と電気的に接続され、前記金属層(21、22)を介して外部と接続可能となっていることを特徴とする半導体装置。 - 前記半導体素子(10)は、前記表裏両面(11、12)に前記電極(13〜15)を有するものであり、これら表裏両面(11、12)の前記電極(13〜15)は、それぞれの面に位置する前記金属層(21、22)と電気的に接続され、前記金属層(21、22)を介して外部と接続可能となっていることを特徴とする請求項1に記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記金属層(21、22)のうち一方の金属層側から他方の金属層側へ延びる導電部材(60)を備え、この導電部材(60)を介して当該一方の金属層が当該他方の金属層側へ電気的に取り出されていることを特徴とする請求項2に記載の半導体装置。
- 前記半導体素子(10)の一部は、当該半導体素子(10)の厚さ方向に電気的に導通する導体部(70)として構成されており、この導体部(70)を介して、前記半導体素子(10)の表裏両面(11、12)に位置する前記金属層(21、22)のうち一方の金属層が他方の金属層側へ電気的に取り出されていることを特徴とする請求項2に記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)の少なくとも一方の面に設けられた前記電極(14、15)は、複数個のものよりなるものであり、
この複数個の電極(14、15)が設けられている面に接続される前記金属層(22)は、当該複数個の電極(14、15)の配置パターンに対応したパターンとなるように分割された複数個の分割部よりなるものであり、
この分割された前記金属層(22)における個々の分割部の間は、樹脂(30)により封止されていることを特徴とする請求項1ないし4のいずれか1つに記載の半導体装置。 - 前記金属層(21、22)と前記電極(13〜15)との電気的接続は導電性接合部材(40)を介して行われていることを特徴とする請求項1ないし5のいずれか1つに記載の半導体装置。
- 前記電極(13〜15)に電気的に接続される前記金属層(21、22)は、当該電極(13〜15)上に形成されたメッキ膜よりなるものであることを特徴とする請求項1ないし5のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)のそれぞれの厚さは、前記半導体素子(10)と同等以下であることを特徴とする請求項1ないし7のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)は同じ材料よりなり、その厚さは、互いに同じであることを特徴とする請求項1ないし8のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)の端面の間に位置する前記半導体素子(10)の端面が、電気絶縁性の樹脂(50)で被覆されていることを特徴とする請求項1ないし9のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)の少なくとも一方の金属層のうち前記半導体素子(10)の周辺部に位置する端面の全周囲に、樹脂(30)を設け、この樹脂(30)によって、当該少なくとも一方の金属層と前記半導体素子(10)との接続部が補強されていることを特徴とする請求項1ないし10のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)ともに、前記半導体素子(10)の周辺部に位置する端面の全周囲に前記樹脂(30)が設けられ、前記両金属層(21、22)と前記半導体素子(10)との接続部が補強されていることを特徴とする請求項11に記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)の少なくとも一方の前記金属層の外面がフィン形状となっていることを特徴とする請求項1ないし12のいずれか1つに記載の半導体装置。
- 前記半導体素子(10)の表裏両面(11、12)に位置する前記両金属層(21、22)の平面サイズは、前記半導体素子(10)の平面サイズ以下であることを特徴とする請求項1ないし13のいずれか1つに記載の半導体装置。
- 半導体よりなり表裏両面(11、12)の少なくとも一方の面に電極(13、14、15)を有する半導体素子(10)を備え、
前記電極(13〜15)を有する前記半導体素子(10)の面には金属層(21、22)が接続されており、
前記電極(13〜15)は、前記金属層(21、22)と電気的に接続され、前記金属層(21、22)を介して外部と接続可能となっていることを特徴とする半導体装置。 - 前記金属層(21、22)は、前記表裏両面(11、12)に接続されていることを特徴とする請求項15に記載の半導体装置。
- 前記表裏両面(11、12)の一方には、前記電極(13)が設けられており、前記金属層(21)は当該一方の面にのみ接続されていることを特徴とする請求項15に記載の半導体装置。
- 前記金属層(21)が接続されている前記半導体素子(10)の面側から当該面とは反対側の前記半導体素子(10)の面側へ延びる導電部材(60)を備え、この導電部材(60)を介して前記金属層(21)が当該反対側の前記半導体素子(10)の面側へ電気的に取り出されていることを特徴とする請求項17に記載の半導体装置。
- 前記半導体素子(10)の一部は、当該半導体素子(10)の厚さ方向に電気的に導通する導体部(70)として構成されており、この導体部(70)を介して、前記金属層(21)が、前記金属層(21)とは反対側の前記半導体素子(10)の面側へ電気的に取り出されていることを特徴とする請求項17に記載の半導体装置。
- 前記金属層(21)の端面および前記半導体素子(10)の端面が、電気絶縁性の樹脂(50)で被覆されていることを特徴とする請求項17ないし19いずれか1つに記載の半導体装置。
- 前記電極(13〜15)を有する前記半導体素子(10)の面に位置する前記金属層(21、22)の平面サイズは、前記半導体素子(10)の平面サイズ以下であることを特徴とする請求項15ないし20のいずれか1つに記載の半導体装置。
- 半導体よりなり表裏両面(11、12)の少なくとも一方の面に電極(13〜15)を有する半導体素子(10)が複数個設けられた半導体ウェハ(200)を用意し、
この半導体ウェハ(200)の表面(201)および裏面(202)の各面に金属層(21、22)を接続した後、前記金属層(21、22)とともに前記半導体ウェハ(200)を前記半導体素子(10)の単位にカットすることを特徴とする半導体装置の製造方法。 - 前記半導体素子(10)として、表裏両面(11、12)の少なくとも一方の面に設けられた前記電極(14、15)が複数個のものよりなるものを用い、
前記半導体ウェハ(200)のうち前記複数個の電極(14、15)を有する面には、前記金属層(22)として、当該複数個の電極(14、15)の配置パターンに対応したパターンとなるように分割されたものを接続し、
この分割された金属層(22)における個々の分割部の間を、樹脂(30)により封止することを特徴とする請求項22に記載の半導体装置の製造方法。 - 前記分割された金属層(22)を接続する工程は、当該分割される金属層(22)の素材となる板材(302)に対して、その一面から厚さ方向の途中まで凹んだ凹部(22a)を、前記分割された金属層(22)における分割のパターンにて形成し、
前記板材(302)の一面を前記半導体ウェハ(200)に接続した後、前記凹部(22a)の底部側を除去して前記凹部(22a)を前記板材(302)の他面側に開口させることにより行うことを特徴とする請求項23に記載の半導体装置の製造方法。 - 前記分割された金属層(22)を接続する工程は、前記分割された金属層(22)における個々の分割部を、フィルム部材(350)で一体に固定した状態で半導体ウェハ(200)に接続し、しかる後、前記フィルム部材(350)を剥がすことにより行うことを特徴とする請求項23に記載の半導体装置の製造方法。
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DE102007025950A DE102007025950B4 (de) | 2006-06-05 | 2007-06-04 | Halbleitervorrichtung und ihr Herstellungsverfahren |
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