JP2007532937A5 - - Google Patents
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- JP2007532937A5 JP2007532937A5 JP2007506723A JP2007506723A JP2007532937A5 JP 2007532937 A5 JP2007532937 A5 JP 2007532937A5 JP 2007506723 A JP2007506723 A JP 2007506723A JP 2007506723 A JP2007506723 A JP 2007506723A JP 2007532937 A5 JP2007532937 A5 JP 2007532937A5
- Authority
- JP
- Japan
- Prior art keywords
- projection objective
- image
- mirror
- group
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56026704P | 2004-04-08 | 2004-04-08 | |
| US60/560,267 | 2004-04-08 | ||
| PCT/EP2005/003645 WO2005098505A1 (en) | 2004-04-08 | 2005-04-07 | Catadioptric projection objective with mirror group |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007532937A JP2007532937A (ja) | 2007-11-15 |
| JP2007532937A5 true JP2007532937A5 (https=) | 2008-05-08 |
| JP4801047B2 JP4801047B2 (ja) | 2011-10-26 |
Family
ID=34962386
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007506723A Expired - Fee Related JP4801047B2 (ja) | 2004-04-08 | 2005-04-07 | 鏡群を有するカタジオプトリック投影対物レンズ |
| JP2007506724A Pending JP2007532938A (ja) | 2004-04-08 | 2005-04-07 | カタジオプトリック投影対物レンズ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007506724A Pending JP2007532938A (ja) | 2004-04-08 | 2005-04-07 | カタジオプトリック投影対物レンズ |
Country Status (6)
| Country | Link |
|---|---|
| US (4) | US7712905B2 (https=) |
| EP (2) | EP1733271A1 (https=) |
| JP (2) | JP4801047B2 (https=) |
| KR (1) | KR100991584B1 (https=) |
| CN (1) | CN1965259B (https=) |
| WO (3) | WO2005098504A1 (https=) |
Families Citing this family (109)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG121819A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE10261775A1 (de) | 2002-12-20 | 2004-07-01 | Carl Zeiss Smt Ag | Vorrichtung zur optischen Vermessung eines Abbildungssystems |
| KR101643112B1 (ko) | 2003-02-26 | 2016-07-26 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
| KR101289959B1 (ko) | 2003-04-11 | 2013-07-26 | 가부시키가이샤 니콘 | 액침 리소그래피에 의한 광학기기의 세정방법 |
| SG139733A1 (en) | 2003-04-11 | 2008-02-29 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
| KR20050122269A (ko) | 2003-04-17 | 2005-12-28 | 가부시키가이샤 니콘 | 액침 리소그래피를 이용하기 위한 오토포커스 소자의광학적 배열 |
| US7348575B2 (en) | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| KR101790914B1 (ko) | 2003-05-06 | 2017-10-26 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| WO2004102646A1 (ja) | 2003-05-15 | 2004-11-25 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| TW201515064A (zh) | 2003-05-23 | 2015-04-16 | 尼康股份有限公司 | 曝光方法及曝光裝置以及元件製造方法 |
| TWI474380B (zh) | 2003-05-23 | 2015-02-21 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
| WO2004107417A1 (ja) | 2003-05-28 | 2004-12-09 | Nikon Corporation | 露光方法及び露光装置、並びにデバイス製造方法 |
| US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP3104396B1 (en) | 2003-06-13 | 2018-03-21 | Nikon Corporation | Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
| KR101476087B1 (ko) | 2003-06-19 | 2014-12-23 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
| WO2005006026A2 (en) | 2003-07-01 | 2005-01-20 | Nikon Corporation | Using isotopically specified fluids as optical elements |
| EP2843472B1 (en) | 2003-07-08 | 2016-12-07 | Nikon Corporation | Wafer table for immersion lithography |
| WO2005006418A1 (ja) | 2003-07-09 | 2005-01-20 | Nikon Corporation | 露光装置及びデバイス製造方法 |
| EP2264531B1 (en) | 2003-07-09 | 2013-01-16 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| EP1643543B1 (en) | 2003-07-09 | 2010-11-24 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
| JP4524669B2 (ja) | 2003-07-25 | 2010-08-18 | 株式会社ニコン | 投影光学系の検査方法および検査装置 |
| EP1503244A1 (en) | 2003-07-28 | 2005-02-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
| KR20190002749A (ko) | 2003-07-28 | 2019-01-08 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법 |
| US7779781B2 (en) | 2003-07-31 | 2010-08-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101419192B1 (ko) | 2003-08-29 | 2014-07-15 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| TWI263859B (en) | 2003-08-29 | 2006-10-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| EP1660925B1 (en) | 2003-09-03 | 2015-04-29 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| JP4444920B2 (ja) | 2003-09-19 | 2010-03-31 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| US8208198B2 (en) * | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| KR101498437B1 (ko) | 2003-09-29 | 2015-03-03 | 가부시키가이샤 니콘 | 노광장치, 노광방법 및 디바이스 제조방법 |
| JP2005136364A (ja) | 2003-10-08 | 2005-05-26 | Zao Nikon Co Ltd | 基板搬送装置、露光装置、並びにデバイス製造方法 |
| KR20060126949A (ko) | 2003-10-08 | 2006-12-11 | 가부시키가이샤 니콘 | 기판 반송 장치와 기판 반송 방법, 노광 장치와 노광 방법,및 디바이스 제조 방법 |
| EP1672681B8 (en) | 2003-10-08 | 2011-09-21 | Miyagi Nikon Precision Co., Ltd. | Exposure apparatus, substrate carrying method, exposure method, and method for producing device |
| TW200514138A (en) | 2003-10-09 | 2005-04-16 | Nippon Kogaku Kk | Exposure equipment and exposure method, manufacture method of component |
| US7411653B2 (en) | 2003-10-28 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus |
| EP3370115A1 (en) | 2003-12-03 | 2018-09-05 | Nikon Corporation | Exposure apparatus, exposure method and method for producing a device |
| KR101281397B1 (ko) | 2003-12-15 | 2013-07-02 | 가부시키가이샤 니콘 | 스테이지 장치, 노광 장치, 및 노광 방법 |
| US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
| DE602005008707D1 (de) | 2004-01-14 | 2008-09-18 | Zeiss Carl Smt Ag | Catadioptrisches projektionsobjektiv |
| US7463422B2 (en) | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
| US20080151364A1 (en) * | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| JP4506674B2 (ja) | 2004-02-03 | 2010-07-21 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
| EP1747499A2 (en) | 2004-05-04 | 2007-01-31 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
| KR20160085375A (ko) | 2004-05-17 | 2016-07-15 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN100594430C (zh) | 2004-06-04 | 2010-03-17 | 卡尔蔡司Smt股份公司 | 用于测量光学成像系统的图像质量的系统 |
| KR101421915B1 (ko) | 2004-06-09 | 2014-07-22 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1780772B1 (en) | 2004-07-12 | 2009-09-02 | Nikon Corporation | Exposure equipment and device manufacturing method |
| US8305553B2 (en) | 2004-08-18 | 2012-11-06 | Nikon Corporation | Exposure apparatus and device manufacturing method |
| US7701550B2 (en) | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7397533B2 (en) | 2004-12-07 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
| KR20180125636A (ko) | 2005-01-31 | 2018-11-23 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| US7282701B2 (en) | 2005-02-28 | 2007-10-16 | Asml Netherlands B.V. | Sensor for use in a lithographic apparatus |
| USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| WO2007071569A1 (en) * | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Projection objective of a microlithographic projection exposure apparatus |
| US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7649612B2 (en) * | 2006-01-27 | 2010-01-19 | Chartered Semiconductor Manufacturing Ltd. | Phase shifting photolithography system |
| WO2007086220A1 (ja) * | 2006-01-30 | 2007-08-02 | Nikon Corporation | 反射屈折結像光学系、露光装置、およびデバイスの製造方法 |
| EP1852745A1 (en) | 2006-05-05 | 2007-11-07 | Carl Zeiss SMT AG | High-NA projection objective |
| DE102006028222A1 (de) * | 2006-06-14 | 2007-12-27 | Carl Zeiss Smt Ag | Verfahren zum Betreiben von Projektionsbelichtungsanlagen und Verwendung eines Projektionsobjektivs |
| EP1890191A1 (en) | 2006-08-14 | 2008-02-20 | Carl Zeiss SMT AG | Catadioptric projection objective with pupil mirror |
| EP1906251A1 (en) | 2006-09-26 | 2008-04-02 | Carl Zeiss SMT AG | Projection exposure method and projection exposure system |
| EP1950594A1 (de) * | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
| DE102007033967A1 (de) * | 2007-07-19 | 2009-01-29 | Carl Zeiss Smt Ag | Projektionsobjektiv |
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| WO2009053023A2 (en) | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type |
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| US9176393B2 (en) | 2008-05-28 | 2015-11-03 | Asml Netherlands B.V. | Lithographic apparatus and a method of operating the apparatus |
| US8705170B2 (en) * | 2008-08-29 | 2014-04-22 | Nikon Corporation | High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations |
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| US9205734B1 (en) | 2011-10-06 | 2015-12-08 | XL Hybrids | Motor integration assembly |
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| US9329373B2 (en) * | 2013-02-13 | 2016-05-03 | Canon Kabushiki Kaisha | Catadioptric optical system with multi-reflection element for high numerical aperture imaging |
| DE102013204391B3 (de) | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator |
| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
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| US10365152B1 (en) * | 2013-03-14 | 2019-07-30 | Wavefront Research, Inc. | Compact annular field imager and method for imaging electromagnetic radiation |
| US8670888B1 (en) * | 2013-06-18 | 2014-03-11 | XL Hybrids | Dynamically assisting hybrid vehicles |
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| CN105807410B (zh) * | 2014-12-31 | 2018-11-09 | 上海微电子装备(集团)股份有限公司 | 一种基于高数值孔径的折反射式投影物镜 |
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| DE102015226531A1 (de) * | 2015-04-14 | 2016-10-20 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
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| DE102017207542A1 (de) | 2017-05-04 | 2017-06-29 | Carl Zeiss Smt Gmbh | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik |
| DE102018207277A1 (de) | 2018-05-09 | 2019-11-14 | Carl Zeiss Smt Gmbh | Lithografiemaske, optisches System zur Übertragung von Original Strukturabschnitten der Lithografiemaske sowie Projektionsoptik zur Abbildung eines Objektfeldes, in dem mindestens ein Original-Strukturabschnitt einer Lithografiemaske anordenbar ist |
| TWI831849B (zh) * | 2018-12-07 | 2024-02-11 | 日商索尼股份有限公司 | 圖像顯示裝置及投射光學系統 |
| DE102021202847A1 (de) | 2021-03-24 | 2022-09-29 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie |
| US12192606B2 (en) * | 2021-10-07 | 2025-01-07 | Samsung Electro-Mechanics Co., Ltd. | Imaging lens system and camera module |
| CN116263565A (zh) * | 2021-12-13 | 2023-06-16 | 长鑫存储技术有限公司 | 光刻胶图案的形成方法和投影式曝光装置 |
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| DE102022205272A1 (de) * | 2022-05-25 | 2023-11-30 | Carl Zeiss Smt Gmbh | Katadioptrisches Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren |
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-
2005
- 2005-03-22 US US11/578,098 patent/US7712905B2/en not_active Expired - Fee Related
- 2005-03-22 WO PCT/EP2005/003032 patent/WO2005098504A1/en not_active Ceased
- 2005-04-07 US US11/578,101 patent/US8363315B2/en not_active Expired - Fee Related
- 2005-04-07 KR KR1020067023338A patent/KR100991584B1/ko not_active Expired - Fee Related
- 2005-04-07 CN CN200580018858XA patent/CN1965259B/zh not_active Expired - Fee Related
- 2005-04-07 WO PCT/EP2005/003646 patent/WO2005098506A1/en not_active Ceased
- 2005-04-07 US US11/578,100 patent/US7446952B2/en not_active Expired - Lifetime
- 2005-04-07 JP JP2007506723A patent/JP4801047B2/ja not_active Expired - Fee Related
- 2005-04-07 EP EP05730864A patent/EP1733271A1/en not_active Withdrawn
- 2005-04-07 EP EP05736862A patent/EP1733272A1/en not_active Withdrawn
- 2005-04-07 WO PCT/EP2005/003645 patent/WO2005098505A1/en not_active Ceased
- 2005-04-07 JP JP2007506724A patent/JP2007532938A/ja active Pending
-
2012
- 2012-12-17 US US13/717,439 patent/US20130120728A1/en not_active Abandoned
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