JP2007526523A5 - - Google Patents

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JP2007526523A5
JP2007526523A5 JP2007501931A JP2007501931A JP2007526523A5 JP 2007526523 A5 JP2007526523 A5 JP 2007526523A5 JP 2007501931 A JP2007501931 A JP 2007501931A JP 2007501931 A JP2007501931 A JP 2007501931A JP 2007526523 A5 JP2007526523 A5 JP 2007526523A5
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aqueous solution
water
formulation
mercaptobenzimidazole
hydroxide
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JP2007501931A
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JP2007526523A (ja
JP4758982B2 (ja
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Priority claimed from US10/792,038 external-priority patent/US8338087B2/en
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JP2007501931A 2004-03-03 2005-03-02 基板上に付着したフォトレジスト及び／又は犠牲反射防止材料のエッチング後除去のための組成物並びにプロセス Expired - Lifetime JP4758982B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/792,038 2004-03-03
US10/792,038 US8338087B2 (en) 2004-03-03 2004-03-03 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
PCT/US2005/006713 WO2005085957A1 (en) 2004-03-03 2005-03-02 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate

Publications (3)

Publication Number Publication Date
JP2007526523A JP2007526523A (ja) 2007-09-13
JP2007526523A5 true JP2007526523A5 (https=) 2008-04-17
JP4758982B2 JP4758982B2 (ja) 2011-08-31

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JP2007501931A Expired - Lifetime JP4758982B2 (ja) 2004-03-03 2005-03-02 基板上に付着したフォトレジスト及び／又は犠牲反射防止材料のエッチング後除去のための組成物並びにプロセス

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US (2) US8338087B2 (https=)
EP (1) EP1730600B1 (https=)
JP (1) JP4758982B2 (https=)
KR (1) KR101256230B1 (https=)
CN (1) CN1938647B (https=)
CA (1) CA2599727A1 (https=)
TW (1) TWI408728B (https=)
WO (1) WO2005085957A1 (https=)

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