JP2007511892A5 - - Google Patents

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Publication number
JP2007511892A5
JP2007511892A5 JP2006521913A JP2006521913A JP2007511892A5 JP 2007511892 A5 JP2007511892 A5 JP 2007511892A5 JP 2006521913 A JP2006521913 A JP 2006521913A JP 2006521913 A JP2006521913 A JP 2006521913A JP 2007511892 A5 JP2007511892 A5 JP 2007511892A5
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JP
Japan
Prior art keywords
silicon
layer
containing layer
deposited
deposition
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006521913A
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English (en)
Japanese (ja)
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JP2007511892A (ja
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Publication date
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Priority claimed from PCT/US2004/023503 external-priority patent/WO2005013326A2/en
Publication of JP2007511892A publication Critical patent/JP2007511892A/ja
Publication of JP2007511892A5 publication Critical patent/JP2007511892A5/ja
Pending legal-status Critical Current

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JP2006521913A 2003-07-30 2004-07-21 緩和シリコンゲルマニウム層のエピタキシャル成長 Pending JP2007511892A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US49102903P 2003-07-30 2003-07-30
PCT/US2004/023503 WO2005013326A2 (en) 2003-07-30 2004-07-21 Epitaxial growth of relaxed silicon germanium layers

Publications (2)

Publication Number Publication Date
JP2007511892A JP2007511892A (ja) 2007-05-10
JP2007511892A5 true JP2007511892A5 (https=) 2007-08-09

Family

ID=34115457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006521913A Pending JP2007511892A (ja) 2003-07-30 2004-07-21 緩和シリコンゲルマニウム層のエピタキシャル成長

Country Status (6)

Country Link
US (2) US7514372B2 (https=)
EP (1) EP1649495A2 (https=)
JP (1) JP2007511892A (https=)
KR (1) KR20060039915A (https=)
TW (1) TWI382456B (https=)
WO (1) WO2005013326A2 (https=)

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US7598515B2 (en) * 2003-06-26 2009-10-06 Mears Technologies, Inc. Semiconductor device including a strained superlattice and overlying stress layer and related methods
US7531828B2 (en) * 2003-06-26 2009-05-12 Mears Technologies, Inc. Semiconductor device including a strained superlattice between at least one pair of spaced apart stress regions
US7612366B2 (en) * 2003-06-26 2009-11-03 Mears Technologies, Inc. Semiconductor device including a strained superlattice layer above a stress layer
US20070010040A1 (en) * 2003-06-26 2007-01-11 Rj Mears, Llc Method for Making a Semiconductor Device Including a Strained Superlattice Layer Above a Stress Layer
US20070015344A1 (en) * 2003-06-26 2007-01-18 Rj Mears, Llc Method for Making a Semiconductor Device Including a Strained Superlattice Between at Least One Pair of Spaced Apart Stress Regions
US20070020860A1 (en) * 2003-06-26 2007-01-25 Rj Mears, Llc Method for Making Semiconductor Device Including a Strained Superlattice and Overlying Stress Layer and Related Methods
US7901968B2 (en) * 2006-03-23 2011-03-08 Asm America, Inc. Heteroepitaxial deposition over an oxidized surface
US7785995B2 (en) * 2006-05-09 2010-08-31 Asm America, Inc. Semiconductor buffer structures
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US7608526B2 (en) * 2006-07-24 2009-10-27 Asm America, Inc. Strained layers within semiconductor buffer structures
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US8039371B2 (en) * 2009-07-01 2011-10-18 International Business Machines Corporation Reduced defect semiconductor-on-insulator hetero-structures
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US9023721B2 (en) 2010-11-23 2015-05-05 Soitec Methods of forming bulk III-nitride materials on metal-nitride growth template layers, and structures formed by such methods
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US9171715B2 (en) 2012-09-05 2015-10-27 Asm Ip Holding B.V. Atomic layer deposition of GeO2
US9218963B2 (en) 2013-12-19 2015-12-22 Asm Ip Holding B.V. Cyclical deposition of germanium
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US10734527B2 (en) 2018-02-06 2020-08-04 Micron Technology, Inc. Transistors comprising a pair of source/drain regions having a channel there-between
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WO2024005276A1 (ko) * 2022-07-01 2024-01-04 주식회사 비아트론 에피택시 공정을 이용한 반도체 소자 제조 방법 및 이를 위한 제조 장치

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