JP2006520104A5 - - Google Patents

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Publication number
JP2006520104A5
JP2006520104A5 JP2006508689A JP2006508689A JP2006520104A5 JP 2006520104 A5 JP2006520104 A5 JP 2006520104A5 JP 2006508689 A JP2006508689 A JP 2006508689A JP 2006508689 A JP2006508689 A JP 2006508689A JP 2006520104 A5 JP2006520104 A5 JP 2006520104A5
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JP
Japan
Prior art keywords
immersion
layer
carbon dioxide
photoresist layer
fluid
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Pending
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JP2006508689A
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English (en)
Japanese (ja)
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JP2006520104A (ja
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Priority claimed from US10/386,356 external-priority patent/US7029832B2/en
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Publication of JP2006520104A publication Critical patent/JP2006520104A/ja
Publication of JP2006520104A5 publication Critical patent/JP2006520104A5/ja
Pending legal-status Critical Current

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JP2006508689A 2003-03-11 2004-01-23 二酸化炭素を使用した浸漬リソグラフィ方法 Pending JP2006520104A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/386,356 US7029832B2 (en) 2003-03-11 2003-03-11 Immersion lithography methods using carbon dioxide
PCT/US2004/003556 WO2004081666A1 (en) 2003-03-11 2004-01-23 Immersion lithography methods using carbon dioxide

Publications (2)

Publication Number Publication Date
JP2006520104A JP2006520104A (ja) 2006-08-31
JP2006520104A5 true JP2006520104A5 (enExample) 2007-03-08

Family

ID=32961680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006508689A Pending JP2006520104A (ja) 2003-03-11 2004-01-23 二酸化炭素を使用した浸漬リソグラフィ方法

Country Status (5)

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US (1) US7029832B2 (enExample)
EP (1) EP1602012A1 (enExample)
JP (1) JP2006520104A (enExample)
TW (1) TW200504864A (enExample)
WO (1) WO2004081666A1 (enExample)

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