JP2006303426A5 - - Google Patents

Download PDF

Info

Publication number
JP2006303426A5
JP2006303426A5 JP2005359118A JP2005359118A JP2006303426A5 JP 2006303426 A5 JP2006303426 A5 JP 2006303426A5 JP 2005359118 A JP2005359118 A JP 2005359118A JP 2005359118 A JP2005359118 A JP 2005359118A JP 2006303426 A5 JP2006303426 A5 JP 2006303426A5
Authority
JP
Japan
Prior art keywords
piezoelectric layer
piezoelectric element
piezoelectric
liquid ejecting
element according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005359118A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006303426A (ja
JP5170356B2 (ja
Filing date
Publication date
Priority claimed from JP2005359118A external-priority patent/JP5170356B2/ja
Priority to JP2005359118A priority Critical patent/JP5170356B2/ja
Application filed filed Critical
Priority to EP20060005622 priority patent/EP1705725A1/en
Priority to US11/384,324 priority patent/US7362039B2/en
Priority to KR20060026069A priority patent/KR100835036B1/ko
Publication of JP2006303426A publication Critical patent/JP2006303426A/ja
Priority to US12/038,875 priority patent/US7520038B2/en
Publication of JP2006303426A5 publication Critical patent/JP2006303426A5/ja
Publication of JP5170356B2 publication Critical patent/JP5170356B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005359118A 2005-03-22 2005-12-13 圧電素子及び液体噴射ヘッド並びに液体噴射装置 Expired - Fee Related JP5170356B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005359118A JP5170356B2 (ja) 2005-03-22 2005-12-13 圧電素子及び液体噴射ヘッド並びに液体噴射装置
EP20060005622 EP1705725A1 (en) 2005-03-22 2006-03-20 Piezoelectric element, method of manufacturing the same, liquid-jet head, method of manufacturing the same, and liquid-jet apparatus
US11/384,324 US7362039B2 (en) 2005-03-22 2006-03-21 Piezoelectric element, method of manufacturing the same, liquid-jet head, method of manufacturing the same, and liquid-jet apparatus
KR20060026069A KR100835036B1 (ko) 2005-03-22 2006-03-22 압전 요소, 그 제조 방법, 액체 분사 헤드, 그 제조 방법,및 액체 분사 장치
US12/038,875 US7520038B2 (en) 2005-03-22 2008-02-28 Piezoelectric element, method of manufacturing the same, liquid-jet head, method of manufacturing the same, and liquid-jet apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005081729 2005-03-22
JP2005081729 2005-03-22
JP2005359118A JP5170356B2 (ja) 2005-03-22 2005-12-13 圧電素子及び液体噴射ヘッド並びに液体噴射装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008294164A Division JP2009049433A (ja) 2005-03-22 2008-11-18 圧電素子及びその製造方法、液体噴射ヘッド及びその製造方法並びに液体噴射装置

Publications (3)

Publication Number Publication Date
JP2006303426A JP2006303426A (ja) 2006-11-02
JP2006303426A5 true JP2006303426A5 (enExample) 2009-01-15
JP5170356B2 JP5170356B2 (ja) 2013-03-27

Family

ID=36601144

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005359118A Expired - Fee Related JP5170356B2 (ja) 2005-03-22 2005-12-13 圧電素子及び液体噴射ヘッド並びに液体噴射装置

Country Status (4)

Country Link
US (2) US7362039B2 (enExample)
EP (1) EP1705725A1 (enExample)
JP (1) JP5170356B2 (enExample)
KR (1) KR100835036B1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5170356B2 (ja) * 2005-03-22 2013-03-27 セイコーエプソン株式会社 圧電素子及び液体噴射ヘッド並びに液体噴射装置
JP4337833B2 (ja) * 2006-03-24 2009-09-30 セイコーエプソン株式会社 液滴吐出ヘッドおよび液滴吐出装置
JP2010131979A (ja) * 2008-10-27 2010-06-17 Seiko Epson Corp 液体噴射装置、及び、液体噴射装置の制御方法
JP5884959B2 (ja) * 2010-11-16 2016-03-15 セイコーエプソン株式会社 圧電体膜の製造方法、圧電素子及び液体噴射ヘッド並びに液体噴射装置
JP5394451B2 (ja) * 2011-07-26 2014-01-22 株式会社アドバンテスト アクチュエータの製造方法、スイッチ装置、伝送路切替装置、および試験装置
JP6146067B2 (ja) * 2013-03-14 2017-06-14 株式会社リコー 電気−機械変換素子、電気−機械変換素子の製造方法、液滴吐出ヘッド、液滴吐出装置
EP3196952B1 (en) * 2016-01-21 2019-06-19 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Mems piezoelectric transducer formed at a pcb support structure
JP6990053B2 (ja) * 2017-07-10 2022-01-12 エスアイアイ・プリンテック株式会社 液体噴射ヘッド及び液体噴射装置
JP7194528B2 (ja) * 2018-07-18 2022-12-22 株式会社アルバック Pzt素子、pzt素子製造方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB509838A (en) 1938-01-21 1939-07-21 Ass Equipment Co Ltd Improvements in or relating to liquid-fuel injection internal-combustion engines
US3110626A (en) 1961-08-17 1963-11-12 Minnesota Mining & Mfg Apparatus for coating discrete solid material
US3496323A (en) 1965-12-20 1970-02-17 Air Reduction Gas shielded arc welding of steel
JPS5143199B2 (enExample) * 1971-09-25 1976-11-19
US4397886A (en) * 1981-05-06 1983-08-09 Sprague Electric Company Method for making a ceramic intergranular barrier-layer capacitor
US4726099A (en) * 1986-09-17 1988-02-23 American Cyanamid Company Method of making piezoelectric composites
US4933230A (en) * 1986-09-17 1990-06-12 American Cyanamid Piezoelectric composites
US5112433A (en) * 1988-12-09 1992-05-12 Battelle Memorial Institute Process for producing sub-micron ceramic powders of perovskite compounds with controlled stoichiometry and particle size
US5219811A (en) * 1989-08-31 1993-06-15 Central Glass Company, Limited Powder composition for sintering into modified barium titanate semiconductive ceramic
GB9025706D0 (en) * 1990-11-27 1991-01-09 Xaar Ltd Laminate for use in manufacture of ink drop printheads
JP3327149B2 (ja) 1995-12-20 2002-09-24 セイコーエプソン株式会社 圧電体薄膜素子及びこれを用いたインクジェット式記録ヘッド
US5969935A (en) * 1996-03-15 1999-10-19 Ramtron International Corporation Use of calcium and strontium dopants to improve retention performance in a PZT ferroelectric film
US6340621B1 (en) * 1996-10-30 2002-01-22 The Research Foundation Of State University Of New York Thin film capacitor and method of manufacture
JP3576788B2 (ja) * 1998-02-13 2004-10-13 株式会社東芝 電子部品及びその製造方法
US6398349B1 (en) 1998-03-04 2002-06-04 Seiko Epson Corporation Piezoelectric device, ink-jet printing head, and method for manufacturing same, and printer
US6203608B1 (en) * 1998-04-15 2001-03-20 Ramtron International Corporation Ferroelectric thin films and solutions: compositions
JP2000173301A (ja) 1998-12-10 2000-06-23 Seiko Epson Corp 圧電発光素子、表示装置およびそれらの製造方法
JP3671791B2 (ja) 1999-02-08 2005-07-13 株式会社村田製作所 圧電磁器組成物およびそれを用いた圧電セラミック素子
JP2001113705A (ja) 1999-10-19 2001-04-24 Casio Comput Co Ltd ドライエッチング用金属マスク、これを備えたインクジェットプリンタヘッド及びその製造方法
JP2001152360A (ja) * 1999-11-25 2001-06-05 Ricoh Co Ltd セラミックス誘電体膜の形成方法、セラミックス誘電体膜/基板の積層構造体、及び電気−機械変換素子
JP3202012B1 (ja) 2000-03-29 2001-08-27 松下電器産業株式会社 圧電アクチュエータ、インクジェットヘッド及びインクジェット式記録装置
JP2001302348A (ja) 2000-04-19 2001-10-31 Tokin Corp 圧電磁器組成物
JP2001302349A (ja) 2000-04-19 2001-10-31 Tokin Corp 圧電磁器組成物
JP2001302350A (ja) 2000-04-19 2001-10-31 Tokin Corp 圧電磁器組成物
JP2002226266A (ja) 2001-01-30 2002-08-14 Nec Tokin Corp 圧電磁器組成物
JP4752156B2 (ja) * 2001-08-23 2011-08-17 株式会社村田製作所 積層圧電素子用圧電磁器組成物、積層圧電素子、積層圧電素子の製造方法および積層圧電装置
CA2438360C (en) 2001-12-18 2010-02-09 Matsushita Electric Industrial Co., Ltd. Piezoelectric element, ink jet head, angular velocity sensor, manufacturing method thereof, and ink jet printing apparatus
JP2004107181A (ja) * 2002-09-20 2004-04-08 Canon Inc 圧電体素子形成用組成物、圧電体膜の製造方法、圧電体素子及びインクジェット記録ヘッド
JP3971279B2 (ja) * 2002-09-20 2007-09-05 キヤノン株式会社 圧電体素子の製造方法
KR100631346B1 (ko) * 2002-09-20 2006-10-09 캐논 가부시끼가이샤 압전체막 형성용 조성물, 압전체막의 제조 방법, 압전체소자 및 잉크젯 기록 헤드
JP2004111835A (ja) * 2002-09-20 2004-04-08 Canon Inc 圧電体素子の製造方法、圧電体素子及びインクジェット式記録ヘッド
JP2004235553A (ja) 2003-01-31 2004-08-19 Canon Inc 圧電体膜成膜用支持基板、圧電体素子、インクジェット記録ヘッド
JP2005082424A (ja) 2003-09-05 2005-03-31 Nec Tokin Corp 圧電磁器組成物
US7132057B2 (en) * 2003-10-15 2006-11-07 Piezotech, Llc Compositions for high power piezoelectric ceramics
JP2006303425A (ja) * 2005-03-22 2006-11-02 Seiko Epson Corp 圧電素子及び液体噴射ヘッド並びに液体噴射装置
JP5170356B2 (ja) * 2005-03-22 2013-03-27 セイコーエプソン株式会社 圧電素子及び液体噴射ヘッド並びに液体噴射装置

Similar Documents

Publication Publication Date Title
US20170237366A1 (en) Transducer and electronic device
WO2008081741A1 (ja) 抵抗変化型素子および抵抗変化型記憶装置
WO2008081742A1 (ja) 抵抗変化型素子、抵抗変化型記憶装置、および抵抗変化型装置
JP2006303426A5 (enExample)
JP2006121088A5 (enExample)
WO2012166935A3 (en) Switching device having a non-linear element
JP2013541836A5 (enExample)
WO2008117494A1 (ja) 記憶素子及び記憶装置
US8873217B2 (en) Arrangement for igniting spark gaps
WO2010081151A3 (en) Memory cell having dielectric memory element
MX2017005427A (es) Dispositivos de almacenamiento de energia y metodos de produccion de los mismos.
TW200710845A (en) Variable resistor element and production method therefor and storage device provided with it
WO2013073179A3 (en) Power supply device
WO2008096639A1 (ja) タッチスイッチ構造
WO2008126366A1 (ja) 抵抗変化型素子、不揮発性スイッチング素子、および抵抗変化型記憶装置
WO2012113575A3 (en) Resistive structure and resistive voltage divider arrangement
TWI456214B (zh) 半導體基板的電氣特性之測定方法
JP2016210070A5 (enExample)
JP2011211144A5 (ja) 液体噴射ヘッド、液体噴射装置、圧電素子、焦電素子及びirセンサー
US9373773B2 (en) Multi-layer piezoelectric element, and piezoelectric actuator, injection device, and fuel injection system provided with the multi-layer piezoelectric element
WO2009148493A3 (en) Method for manufacturing electrodes for electric double layer devices based on mixture of fibrous polymeric material and carbon material
JP2010227877A5 (enExample)
WO2008093475A1 (ja) イオン発生器
JP2006121086A5 (enExample)
WO2009057589A1 (ja) キャパシタとそれを有する半導体装置およびキャパシタの製造方法