JP5884959B2 - 圧電体膜の製造方法、圧電素子及び液体噴射ヘッド並びに液体噴射装置 - Google Patents
圧電体膜の製造方法、圧電素子及び液体噴射ヘッド並びに液体噴射装置 Download PDFInfo
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- JP5884959B2 JP5884959B2 JP2010256346A JP2010256346A JP5884959B2 JP 5884959 B2 JP5884959 B2 JP 5884959B2 JP 2010256346 A JP2010256346 A JP 2010256346A JP 2010256346 A JP2010256346 A JP 2010256346A JP 5884959 B2 JP5884959 B2 JP 5884959B2
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- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
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- C04B35/465—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
- C04B35/468—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
- C04B35/4682—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates based on BaTiO3 perovskite phase
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
かかる態様では、Bi、Fe、Mn、Ba及びTiを含有し、Bi/(Fe+Mn)(モル比)が1.02以上1.08以下である圧電体膜形成用組成物を用いることにより、歪量が大きい圧電体膜を製造することができる。
図1は、本発明の実施形態1に係る液体噴射ヘッドの一例であるインクジェット式記録ヘッドの概略構成を示す分解斜視図であり、図2は、図1の平面図であり、図3は図2のA−A′線断面図である。図1〜図3に示すように、本実施形態の流路形成基板10は、シリコン単結晶基板からなり、その一方の面には二酸化シリコンからなる弾性膜50が形成されている。
まず、(100)に配向した単結晶シリコン基板の表面に熱酸化により膜厚1200nmの二酸化シリコン膜を形成した。次に、二酸化シリコン膜上にRFマグネトロンスパッタ法により膜厚40nmのチタン膜を形成し、熱酸化することで酸化チタン膜を形成した。次に、酸化チタン膜上にRFマグネトロンスパッタ法により膜厚100nmの白金膜を形成し、(111)に配向した第1電極60とした。
各元素の前駆体溶液の混合割合を変更して表1に示す元素比の前駆体溶液とした以外は、実施例1と同様にして、圧電素子300を形成した。
実施例1〜4及び比較例1〜2の各圧電素子について、アグザクト社製の変位測定装置(DBLI)を用い室温(25℃)で、φ=500μmの電極パターンを使用し、周波数1kHzの電圧を印加して、d33方向の歪量及び歪割合(歪率)を求めた。印加電界555kV/cmでの値を表2及び図9に示す。
実施例1〜4及び比較例1〜2の各圧電素子について、Bruker AXS社製の「D8 Discover」を用い、X線源にCuKα線を使用し、室温で、圧電体層70の粉末X線回折パターンを求めた。結果の一例として、実施例1〜4及び比較例1の回折強度−回折角2θの相関関係を示す図であるX線回折パターンを、図10及び図11に示す。なお、図10及び図11は、図9の各線を重ねて記載した拡大図である。
実施例1、3〜4及び比較例1〜2の各圧電素子について、ヒューレットパッカード社製「4140B」を用い、室温(25℃)でHold Timeを0.5秒、DelayTimeを2秒に設定し、2V毎に電圧を印加して、電流密度と電圧との関係(I−V曲線)を求めた。なお、測定は、それぞれ2回行った。実施例1、3〜4及び比較例1の結果を図12に示す。
以上、本発明の一実施形態を説明したが、本発明の基本的構成は上述したものに限定されるものではない。例えば、上述した実施形態では、流路形成基板10として、シリコン単結晶基板を例示したが、特にこれに限定されず、例えば、SOI基板、ガラス等の材料を用いるようにしてもよい。
Claims (5)
- ペロブスカイト構造のAサイトの元素としてBi及びBaを含有し、Bサイトの元素としてFe、Mn及びTiを含有し、AサイトのBi以外の元素の総量とBサイトのFe及びMn以外の元素の総量とがモル比で1:1であり、Bi、Fe、Mn、Ba及びTiを含有し、Biと、Fe及びMnの総量とのモル比であるBi/(Fe+Mn)が、1.04以上1.08以下である圧電体膜形成用組成物により圧電体前駆体膜を形成する工程と、
前記圧電体前駆体膜を加熱して結晶化する工程と、
を有することを特徴とする圧電体膜の製造方法。 - 前記圧電体前駆体膜を加熱して結晶化する温度が、600〜850℃であることを特徴とする請求項1に記載する圧電体膜の製造方法。
- 圧電体膜と、前記圧電体膜に電圧を印加する電極とを有し、
前記圧電体膜は、Bi、Fe、Mn、Ba及びTiを含むペロブスカイト構造を有する複合酸化物からなり、
前記ペロブスカイト構造のAサイトの元素としてBi及びBaを含有し、Bサイトの元素としてFe、Mn及びTiを含有し、
前記ペロブスカイト構造のAサイトのBi以外の元素の総量とBサイトのFe及びMn以外の元素の総量とがモル比で1:1であり、
前記圧電体膜のBiと、Fe及びMnの総量とのモル比であるBi/(Fe+Mn)が、1.04以上1.08以下であることを特徴とする圧電素子。 - 請求項3に記載する圧電素子を、ノズル開口に連通する圧力発生室内の液体を前記ノズル開口から吐出させるための圧力を発生させる圧力発生手段として具備することを特徴とする液体噴射ヘッド。
- 請求項4に記載する液体噴射ヘッドを具備することを特徴とする液体噴射装置。
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US13/296,102 US9403366B2 (en) | 2010-11-16 | 2011-11-14 | Method of manufacturing a liquid ejecting head |
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JP2015230994A (ja) | 2014-06-05 | 2015-12-21 | セイコーエプソン株式会社 | 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置及び超音波測定装置 |
JP2016004854A (ja) | 2014-06-16 | 2016-01-12 | セイコーエプソン株式会社 | 圧電素子、液体噴射ヘッド、液体噴射装置、アクチュエーター、センサー及び圧電材料 |
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JPS60217674A (ja) * | 1984-04-13 | 1985-10-31 | Toray Ind Inc | 耐熱性に優れた高分子圧電体の製造方法 |
JP4051654B2 (ja) | 2000-02-08 | 2008-02-27 | セイコーエプソン株式会社 | 圧電体素子、インクジェット式記録ヘッド及びこれらの製造方法並びにインクジェットプリンタ |
TWI290539B (en) * | 2004-08-31 | 2007-12-01 | Showa Denko Kk | Barium titanate and capacitor |
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JP2007287745A (ja) * | 2006-04-12 | 2007-11-01 | Seiko Epson Corp | 圧電材料および圧電素子 |
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JP5507097B2 (ja) | 2008-03-12 | 2014-05-28 | 富士フイルム株式会社 | ペロブスカイト型酸化物とその製造方法、圧電体、圧電素子、液体吐出装置 |
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