JP2006265350A5 - - Google Patents

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Publication number
JP2006265350A5
JP2006265350A5 JP2005084206A JP2005084206A JP2006265350A5 JP 2006265350 A5 JP2006265350 A5 JP 2006265350A5 JP 2005084206 A JP2005084206 A JP 2005084206A JP 2005084206 A JP2005084206 A JP 2005084206A JP 2006265350 A5 JP2006265350 A5 JP 2006265350A5
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JP
Japan
Prior art keywords
group
compound
precursor composition
porous membrane
porous film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005084206A
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English (en)
Japanese (ja)
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JP2006265350A (ja
JP4894153B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2005084206A external-priority patent/JP4894153B2/ja
Priority to JP2005084206A priority Critical patent/JP4894153B2/ja
Priority to TW95108281A priority patent/TWI400754B/zh
Priority to KR1020077021964A priority patent/KR100956046B1/ko
Priority to PCT/JP2006/305350 priority patent/WO2006101027A1/ja
Priority to CN2006800093480A priority patent/CN101146874B/zh
Priority to US11/886,952 priority patent/US20090053503A1/en
Priority to HK08107333.3A priority patent/HK1117187B/xx
Priority to EP20060729340 priority patent/EP1867687B9/en
Publication of JP2006265350A publication Critical patent/JP2006265350A/ja
Publication of JP2006265350A5 publication Critical patent/JP2006265350A5/ja
Publication of JP4894153B2 publication Critical patent/JP4894153B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005084206A 2005-03-23 2005-03-23 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置 Expired - Fee Related JP4894153B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2005084206A JP4894153B2 (ja) 2005-03-23 2005-03-23 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置
TW95108281A TWI400754B (zh) 2005-03-23 2006-03-10 A precursor film composition of a porous film and a method for producing the same, a porous film and a method for producing the same, and a semiconductor device
HK08107333.3A HK1117187B (en) 2005-03-23 2006-03-17 Precursor composition for porous membrane and process for preparation thereof, porous membrane and process for production thereof, and semiconductor device
PCT/JP2006/305350 WO2006101027A1 (ja) 2005-03-23 2006-03-17 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置
CN2006800093480A CN101146874B (zh) 2005-03-23 2006-03-17 多孔质膜的前体组合物及其制备方法、多孔质膜及其制作方法以及半导体装置
US11/886,952 US20090053503A1 (en) 2005-03-23 2006-03-17 Precursor composition for porous film and method for preparing the composition, porous film and method for preparing the porous film, and semiconductor device
KR1020077021964A KR100956046B1 (ko) 2005-03-23 2006-03-17 다공질막의 전구체 조성물 및 그 제조 방법, 다공질막 및 그 제작 방법, 그리고 반도체 장치
EP20060729340 EP1867687B9 (en) 2005-03-23 2006-03-17 Precursor composition for porous membrane and process for preparation thereof, porous membrane and process for production thereof, and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005084206A JP4894153B2 (ja) 2005-03-23 2005-03-23 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置

Publications (3)

Publication Number Publication Date
JP2006265350A JP2006265350A (ja) 2006-10-05
JP2006265350A5 true JP2006265350A5 (enExample) 2007-12-20
JP4894153B2 JP4894153B2 (ja) 2012-03-14

Family

ID=37023688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005084206A Expired - Fee Related JP4894153B2 (ja) 2005-03-23 2005-03-23 多孔質膜の前駆体組成物及びその調製方法、多孔質膜及びその作製方法、並びに半導体装置

Country Status (7)

Country Link
US (1) US20090053503A1 (enExample)
EP (1) EP1867687B9 (enExample)
JP (1) JP4894153B2 (enExample)
KR (1) KR100956046B1 (enExample)
CN (1) CN101146874B (enExample)
TW (1) TWI400754B (enExample)
WO (1) WO2006101027A1 (enExample)

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JP5785325B2 (ja) * 2011-06-03 2015-09-30 エア プロダクツ アンド ケミカルズ インコーポレイテッドＡｉｒ Ｐｒｏｄｕｃｔｓ Ａｎｄ Ｃｈｅｍｉｃａｌｓ Ｉｎｃｏｒｐｏｒａｔｅｄ 炭素ドープケイ素含有膜を堆積するための組成物及び方法
JP6011364B2 (ja) * 2013-01-28 2016-10-19 旭硝子株式会社 撥水膜付き基体および輸送機器用物品
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US11443953B2 (en) * 2018-11-13 2022-09-13 Tokyo Electron Limited Method for forming and using stress-tuned silicon oxide films in semiconductor device patterning
CN117776778B (zh) * 2023-12-13 2026-03-20 山西炬华铝业股份有限公司 一种蜂窝状堇青石载体及其制备方法
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