JP2006261485A5 - - Google Patents

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Publication number
JP2006261485A5
JP2006261485A5 JP2005078581A JP2005078581A JP2006261485A5 JP 2006261485 A5 JP2006261485 A5 JP 2006261485A5 JP 2005078581 A JP2005078581 A JP 2005078581A JP 2005078581 A JP2005078581 A JP 2005078581A JP 2006261485 A5 JP2006261485 A5 JP 2006261485A5
Authority
JP
Japan
Prior art keywords
main surface
insulating film
semiconductor device
back surface
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005078581A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006261485A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005078581A priority Critical patent/JP2006261485A/ja
Priority claimed from JP2005078581A external-priority patent/JP2006261485A/ja
Priority to TW095105294A priority patent/TW200636938A/zh
Priority to CNB2006100586776A priority patent/CN100568498C/zh
Priority to KR1020060024883A priority patent/KR20060101385A/ko
Priority to US11/378,449 priority patent/US7408252B2/en
Publication of JP2006261485A publication Critical patent/JP2006261485A/ja
Publication of JP2006261485A5 publication Critical patent/JP2006261485A5/ja
Priority to US12/147,905 priority patent/US7576422B2/en
Priority to US12/497,174 priority patent/US7803658B2/en
Pending legal-status Critical Current

Links

JP2005078581A 2005-03-18 2005-03-18 半導体装置およびその製造方法 Pending JP2006261485A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2005078581A JP2006261485A (ja) 2005-03-18 2005-03-18 半導体装置およびその製造方法
TW095105294A TW200636938A (en) 2005-03-18 2006-02-16 A semiconductor device and a manufacturing method of the same
CNB2006100586776A CN100568498C (zh) 2005-03-18 2006-03-08 半导体器件及其制造方法
KR1020060024883A KR20060101385A (ko) 2005-03-18 2006-03-17 반도체 장치 및 그 제조 방법
US11/378,449 US7408252B2 (en) 2005-03-18 2006-03-20 Semiconductor device and a manufacturing method of the same
US12/147,905 US7576422B2 (en) 2005-03-18 2008-06-27 Semiconductor device
US12/497,174 US7803658B2 (en) 2005-03-18 2009-07-02 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005078581A JP2006261485A (ja) 2005-03-18 2005-03-18 半導体装置およびその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010127486A Division JP2010187037A (ja) 2010-06-03 2010-06-03 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2006261485A JP2006261485A (ja) 2006-09-28
JP2006261485A5 true JP2006261485A5 (enExample) 2008-04-24

Family

ID=37002905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005078581A Pending JP2006261485A (ja) 2005-03-18 2005-03-18 半導体装置およびその製造方法

Country Status (5)

Country Link
US (3) US7408252B2 (enExample)
JP (1) JP2006261485A (enExample)
KR (1) KR20060101385A (enExample)
CN (1) CN100568498C (enExample)
TW (1) TW200636938A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007335581A (ja) 2006-06-14 2007-12-27 Renesas Technology Corp 半導体装置の製造方法
JP2008288400A (ja) * 2007-05-18 2008-11-27 Panasonic Corp 回路基板，樹脂封止型半導体装置，樹脂封止型半導体装置の製造方法，トレイおよび検査ソケット
US8357998B2 (en) * 2009-02-09 2013-01-22 Advanced Semiconductor Engineering, Inc. Wirebonded semiconductor package
JP2010278306A (ja) * 2009-05-29 2010-12-09 Sanyo Electric Co Ltd 半導体装置
TWI416636B (zh) * 2009-10-22 2013-11-21 欣興電子股份有限公司 封裝結構之製法
TWI388018B (zh) * 2009-10-22 2013-03-01 欣興電子股份有限公司 封裝結構之製法
CN102054714B (zh) * 2009-11-06 2012-10-03 欣兴电子股份有限公司 封装结构的制法
US8742603B2 (en) * 2010-05-20 2014-06-03 Qualcomm Incorporated Process for improving package warpage and connection reliability through use of a backside mold configuration (BSMC)
JP2012033637A (ja) 2010-07-29 2012-02-16 Nitto Denko Corp ダイシングテープ一体型半導体裏面用フィルム及び半導体装置の製造方法
US9406579B2 (en) * 2012-05-14 2016-08-02 STATS ChipPAC Pte. Ltd. Semiconductor device and method of controlling warpage in semiconductor package
CN110429036A (zh) * 2019-06-19 2019-11-08 惠州市志金电子科技有限公司 接触式身份识别卡的封装工艺及接触式身份识别卡
JP2021093417A (ja) * 2019-12-09 2021-06-17 イビデン株式会社 プリント配線板、及び、プリント配線板の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3408630A1 (de) * 1984-03-09 1985-09-12 Hoechst Ag, 6230 Frankfurt Verfahren und schichtmaterial zur herstellung durchkontaktierter elektrischer leiterplatten
JP2001284491A (ja) * 2000-03-31 2001-10-12 Sumitomo Metal Electronics Devices Inc プラスチック基板
JP2004152778A (ja) * 2001-09-05 2004-05-27 Hitachi Chem Co Ltd 半導体搭載用基板とその製造方法とそれを用いた半導体パッケージ並びにその製造方法
JP4963148B2 (ja) 2001-09-18 2012-06-27 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US7579251B2 (en) * 2003-05-15 2009-08-25 Fujitsu Limited Aerosol deposition process
JP4260617B2 (ja) * 2003-12-24 2009-04-30 株式会社ルネサステクノロジ 半導体装置の製造方法
US7489032B2 (en) * 2003-12-25 2009-02-10 Casio Computer Co., Ltd. Semiconductor device including a hard sheet to reduce warping of a base plate and method of fabricating the same
JP2005277356A (ja) * 2004-03-26 2005-10-06 Sanyo Electric Co Ltd 回路装置
KR100557540B1 (ko) * 2004-07-26 2006-03-03 삼성전기주식회사 Ｂｇａ 패키지 기판 및 그 제작 방법

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