JP2006215202A5 - - Google Patents

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Publication number
JP2006215202A5
JP2006215202A5 JP2005026780A JP2005026780A JP2006215202A5 JP 2006215202 A5 JP2006215202 A5 JP 2006215202A5 JP 2005026780 A JP2005026780 A JP 2005026780A JP 2005026780 A JP2005026780 A JP 2005026780A JP 2006215202 A5 JP2006215202 A5 JP 2006215202A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005026780A
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JP2006215202A (ja
JP4439409B2 (ja
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Priority to JP2005026780A priority Critical patent/JP4439409B2/ja
Priority claimed from JP2005026780A external-priority patent/JP4439409B2/ja
Priority to US11/336,912 priority patent/US20060172226A1/en
Priority to EP06001970A priority patent/EP1693704A3/en
Publication of JP2006215202A publication Critical patent/JP2006215202A/ja
Publication of JP2006215202A5 publication Critical patent/JP2006215202A5/ja
Application granted granted Critical
Publication of JP4439409B2 publication Critical patent/JP4439409B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2005026780A 2005-02-02 2005-02-02 レジスト組成物及びそれを用いたパターン形成方法 Expired - Fee Related JP4439409B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005026780A JP4439409B2 (ja) 2005-02-02 2005-02-02 レジスト組成物及びそれを用いたパターン形成方法
US11/336,912 US20060172226A1 (en) 2005-02-02 2006-01-23 Resist composition and pattern forming method using the same
EP06001970A EP1693704A3 (en) 2005-02-02 2006-01-31 Resist composition and pattern forming method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005026780A JP4439409B2 (ja) 2005-02-02 2005-02-02 レジスト組成物及びそれを用いたパターン形成方法

Publications (3)

Publication Number Publication Date
JP2006215202A JP2006215202A (ja) 2006-08-17
JP2006215202A5 true JP2006215202A5 (ja) 2008-10-02
JP4439409B2 JP4439409B2 (ja) 2010-03-24

Family

ID=36636967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005026780A Expired - Fee Related JP4439409B2 (ja) 2005-02-02 2005-02-02 レジスト組成物及びそれを用いたパターン形成方法

Country Status (3)

Country Link
US (1) US20060172226A1 (ja)
EP (1) EP1693704A3 (ja)
JP (1) JP4439409B2 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009047105A1 (en) * 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
JP5611652B2 (ja) * 2010-05-06 2014-10-22 信越化学工業株式会社 ネガ型レジスト材料、パターン形成方法及びフォトマスクブランク
KR101830595B1 (ko) * 2010-11-09 2018-02-21 스미또모 가가꾸 가부시키가이샤 수지 및 포토레지스트 조성물
JP2012252077A (ja) * 2011-06-01 2012-12-20 Tokyo Ohka Kogyo Co Ltd レジスト組成物及びレジストパターン形成方法、並びに、高分子化合物及びその製造方法

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