JP2006024941A5 - - Google Patents

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Publication number
JP2006024941A5
JP2006024941A5 JP2005198439A JP2005198439A JP2006024941A5 JP 2006024941 A5 JP2006024941 A5 JP 2006024941A5 JP 2005198439 A JP2005198439 A JP 2005198439A JP 2005198439 A JP2005198439 A JP 2005198439A JP 2006024941 A5 JP2006024941 A5 JP 2006024941A5
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image
aberration
change
predicted
control signal
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JP2005198439A
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Japanese (ja)
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JP4027382B2 (ja
JP2006024941A (ja
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Priority claimed from US10/886,051 external-priority patent/US7403264B2/en
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JP2005198439A 2004-07-08 2005-07-07 リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法 Expired - Fee Related JP4027382B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/886,051 US7403264B2 (en) 2004-07-08 2004-07-08 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus

Publications (3)

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JP2006024941A JP2006024941A (ja) 2006-01-26
JP2006024941A5 true JP2006024941A5 (https=) 2007-10-18
JP4027382B2 JP4027382B2 (ja) 2007-12-26

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JP2005198439A Expired - Fee Related JP4027382B2 (ja) 2004-07-08 2005-07-07 リソグラフィ投影装置及びそのリソグラフィ投影装置を使用するデバイス製造方法

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US (2) US7403264B2 (https=)
EP (2) EP1626310B1 (https=)
JP (1) JP4027382B2 (https=)
KR (1) KR100795140B1 (https=)
CN (1) CN100524041C (https=)
DE (1) DE602005010014D1 (https=)
TW (1) TWI266358B (https=)

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KR102037994B1 (ko) * 2015-07-20 2019-10-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 제어하는 방법, 리소그래피 장치 및 디바이스 제조 방법
JP6588766B2 (ja) * 2015-08-10 2019-10-09 キヤノン株式会社 評価方法、露光方法、露光装置、プログラム、および物品の製造方法
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KR102215539B1 (ko) 2015-11-20 2021-02-16 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 작동시키는 방법
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US10948832B2 (en) 2017-04-06 2021-03-16 Asml Netherlands B.V. Lithographic method and apparatus
KR102352673B1 (ko) 2017-08-07 2022-01-17 에이에스엠엘 네델란즈 비.브이. 컴퓨테이션 계측법
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CN110502132B (zh) * 2018-05-18 2022-08-12 致伸科技股份有限公司 鼠标装置
JP2019070812A (ja) * 2018-11-29 2019-05-09 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
CN113126443B (zh) * 2019-12-31 2021-12-10 上海微电子装备（集团）股份有限公司 解决光刻机像面畸变的工艺方法及装置、掩膜版设计方法
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