JPWO2025141733A1 - - Google Patents
Info
- Publication number
- JPWO2025141733A1 JPWO2025141733A1 JP2025532617A JP2025532617A JPWO2025141733A1 JP WO2025141733 A1 JPWO2025141733 A1 JP WO2025141733A1 JP 2025532617 A JP2025532617 A JP 2025532617A JP 2025532617 A JP2025532617 A JP 2025532617A JP WO2025141733 A1 JPWO2025141733 A1 JP WO2025141733A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/046809 WO2025141733A1 (ja) | 2023-12-26 | 2023-12-26 | 投影露光装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2025141733A1 true JPWO2025141733A1 (https=) | 2025-07-03 |
Family
ID=96217411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025532617A Pending JPWO2025141733A1 (https=) | 2023-12-26 | 2023-12-26 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2025141733A1 (https=) |
| KR (1) | KR20250168615A (https=) |
| CN (1) | CN121002451A (https=) |
| WO (1) | WO2025141733A1 (https=) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3209186B2 (ja) | 1991-04-24 | 2001-09-17 | 株式会社ニコン | 露光装置及び方法 |
| JPH0950959A (ja) | 1995-06-01 | 1997-02-18 | Nikon Corp | 投影露光装置 |
| JP3604801B2 (ja) | 1996-03-26 | 2004-12-22 | キヤノン株式会社 | 露光装置および露光方法 |
| JPH1012520A (ja) | 1996-06-21 | 1998-01-16 | Nikon Corp | 投影露光装置 |
| JP3031321B2 (ja) | 1997-12-15 | 2000-04-10 | 株式会社ニコン | 投影露光装置及び方法 |
| US7403264B2 (en) | 2004-07-08 | 2008-07-22 | Asml Netherlands B.V. | Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus |
| JP5219534B2 (ja) * | 2008-01-31 | 2013-06-26 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
| US20110027542A1 (en) | 2009-07-28 | 2011-02-03 | Nsk Ltd. | Exposure apparatus and exposure method |
| JP2011192900A (ja) * | 2010-03-16 | 2011-09-29 | Nikon Corp | 投影光学装置及び露光装置並びにデバイス製造方法 |
| CN102253604B (zh) * | 2010-05-21 | 2013-08-14 | 上海微电子装备有限公司 | 一种空间像的质量检测方法 |
| JP2013004942A (ja) * | 2011-06-22 | 2013-01-07 | Renesas Electronics Corp | 半導体装置の製造方法 |
| JP2015170764A (ja) * | 2014-03-07 | 2015-09-28 | 株式会社東芝 | 収差量算出方法および位置ずれ量算出方法 |
-
2023
- 2023-12-26 WO PCT/JP2023/046809 patent/WO2025141733A1/ja active Pending
- 2023-12-26 JP JP2025532617A patent/JPWO2025141733A1/ja active Pending
- 2023-12-26 CN CN202380097397.8A patent/CN121002451A/zh active Pending
- 2023-12-26 KR KR1020257036719A patent/KR20250168615A/ko active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025141733A1 (ja) | 2025-07-03 |
| CN121002451A (zh) | 2025-11-21 |
| KR20250168615A (ko) | 2025-12-02 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250604 |