JP2005536589A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005536589A5 JP2005536589A5 JP2004529165A JP2004529165A JP2005536589A5 JP 2005536589 A5 JP2005536589 A5 JP 2005536589A5 JP 2004529165 A JP2004529165 A JP 2004529165A JP 2004529165 A JP2004529165 A JP 2004529165A JP 2005536589 A5 JP2005536589 A5 JP 2005536589A5
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- ethylenically unsaturated
- photoresist composition
- containing copolymer
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052731 fluorine Inorganic materials 0.000 claims description 34
- 229920002120 photoresistant polymer Polymers 0.000 claims description 31
- 239000011737 fluorine Substances 0.000 claims description 28
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 27
- 229920001577 copolymer Polymers 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 13
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 150000001923 cyclic compounds Chemical class 0.000 claims description 6
- 125000005842 heteroatom Chemical group 0.000 claims description 6
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 6
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical group FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 5
- -1 norbornyl fluoroalcohol Chemical compound 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical group 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- GQRTVVANIGOXRF-UHFFFAOYSA-N (2-methyl-1-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)C2(OC(=O)C=C)C3 GQRTVVANIGOXRF-UHFFFAOYSA-N 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 2
- RFJVDJWCXSPUBY-UHFFFAOYSA-N 2-(difluoromethylidene)-4,4,5-trifluoro-5-(trifluoromethyl)-1,3-dioxolane Chemical compound FC(F)=C1OC(F)(F)C(F)(C(F)(F)F)O1 RFJVDJWCXSPUBY-UHFFFAOYSA-N 0.000 description 2
- ZYDBICLIXOCJJB-UHFFFAOYSA-N 2-chloro-1,3,4,4,5,6,6,7,8,8,8-undecafluoro-7-(trifluoromethyl)oct-1-ene Chemical compound FC(C(C(F)(F)F)(C(C(C(C(C(=CF)Cl)F)(F)F)F)(F)F)F)(F)F ZYDBICLIXOCJJB-UHFFFAOYSA-N 0.000 description 2
- YSYRISKCBOPJRG-UHFFFAOYSA-N 4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC1=C(F)OC(C(F)(F)F)(C(F)(F)F)O1 YSYRISKCBOPJRG-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US40437402P | 2002-08-19 | 2002-08-19 | |
| PCT/US2003/026088 WO2004016664A1 (en) | 2002-08-19 | 2003-08-19 | Fluorinated polymers useful as photoresists, and processes for microlithography |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005536589A JP2005536589A (ja) | 2005-12-02 |
| JP2005536589A5 true JP2005536589A5 (enExample) | 2006-09-21 |
| JP4578971B2 JP4578971B2 (ja) | 2010-11-10 |
Family
ID=31888358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004529165A Expired - Fee Related JP4578971B2 (ja) | 2002-08-19 | 2003-08-19 | フォトレジストとして有用なフッ素化ポリマーおよび微細平版印刷のための方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7312287B2 (enExample) |
| EP (1) | EP1551886B1 (enExample) |
| JP (1) | JP4578971B2 (enExample) |
| KR (1) | KR20050062540A (enExample) |
| CN (1) | CN1675262A (enExample) |
| AT (1) | ATE408173T1 (enExample) |
| AU (1) | AU2003259951A1 (enExample) |
| DE (1) | DE60323521D1 (enExample) |
| TW (1) | TW200403257A (enExample) |
| WO (1) | WO2004016664A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4578971B2 (ja) * | 2002-08-19 | 2010-11-10 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジストとして有用なフッ素化ポリマーおよび微細平版印刷のための方法 |
| JP5560854B2 (ja) * | 2010-03-31 | 2014-07-30 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物およびそれに用いる重合体 |
| EP2645178B1 (en) * | 2010-11-24 | 2021-06-23 | AGC Inc. | Seal ring for automobile, and seal ring and sliding member for industrial gas compressor |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5229473A (en) * | 1989-07-07 | 1993-07-20 | Daikin Industries Ltd. | Fluorine-containing copolymer and method of preparing the same |
| JP4034896B2 (ja) * | 1997-11-19 | 2008-01-16 | 松下電器産業株式会社 | レジスト組成物及びこれを用いたパターン形成方法 |
| JPH11265067A (ja) * | 1998-01-16 | 1999-09-28 | Jsr Corp | 感放射線性樹脂組成物 |
| WO2000017712A1 (en) * | 1998-09-23 | 2000-03-30 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| EP1183571B1 (en) | 1999-05-04 | 2010-06-02 | E.I. Du Pont De Nemours And Company | Fluorinated photoresists and processes for microlithography |
| KR100535149B1 (ko) * | 1999-08-17 | 2005-12-07 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물 |
| JP4240786B2 (ja) * | 1999-09-17 | 2009-03-18 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| US6872503B2 (en) * | 2000-05-05 | 2005-03-29 | E. I. Du Pont De Nemours And Company | Copolymers for photoresists and processes therefor |
| EP1246013A3 (en) * | 2001-03-30 | 2003-11-19 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| US6737215B2 (en) * | 2001-05-11 | 2004-05-18 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep ultraviolet lithography |
| JP4578971B2 (ja) * | 2002-08-19 | 2010-11-10 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | フォトレジストとして有用なフッ素化ポリマーおよび微細平版印刷のための方法 |
-
2003
- 2003-08-19 JP JP2004529165A patent/JP4578971B2/ja not_active Expired - Fee Related
- 2003-08-19 WO PCT/US2003/026088 patent/WO2004016664A1/en not_active Ceased
- 2003-08-19 DE DE60323521T patent/DE60323521D1/de not_active Expired - Lifetime
- 2003-08-19 TW TW092122760A patent/TW200403257A/zh unknown
- 2003-08-19 EP EP03788676A patent/EP1551886B1/en not_active Expired - Lifetime
- 2003-08-19 CN CNA038189178A patent/CN1675262A/zh active Pending
- 2003-08-19 KR KR1020057002754A patent/KR20050062540A/ko not_active Withdrawn
- 2003-08-19 US US10/523,490 patent/US7312287B2/en not_active Expired - Fee Related
- 2003-08-19 AT AT03788676T patent/ATE408173T1/de not_active IP Right Cessation
- 2003-08-19 AU AU2003259951A patent/AU2003259951A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005533907A5 (enExample) | ||
| JP5923566B2 (ja) | 光酸発生剤、フォトレジスト及びコーティングされた基板、並びに、電子デバイスを形成するための方法 | |
| JP2012103679A5 (enExample) | ||
| CN1263612A (zh) | 化学增强的抗蚀剂组合物 | |
| JP2009258722A5 (enExample) | ||
| CN107112440A (zh) | 装置的光刻图案化 | |
| JP2005509177A5 (enExample) | ||
| JP2023052183A5 (enExample) | ||
| JP6581811B2 (ja) | レジスト組成物及びレジストパターン形成方法 | |
| JP4683887B2 (ja) | ラクトン化合物、ラクトン含有単量体、高分子化合物、それを用いたレジスト材料及びパターン形成方法 | |
| JP2003292547A5 (enExample) | ||
| KR100998068B1 (ko) | 포토레지스트 조성물 | |
| CN107251190A (zh) | 电子装置的光刻图案化 | |
| JP2004526844A5 (enExample) | ||
| JP6461616B2 (ja) | レジスト組成物及びレジストパターン形成方法 | |
| JP2005536589A5 (enExample) | ||
| JP2004280049A5 (enExample) | ||
| JP2008535950A5 (enExample) | ||
| JP4261303B2 (ja) | 水酸化され、光酸で切断可能な基を有するフォトレジスト | |
| CN1837957A (zh) | 光刻胶组合物 | |
| CN1821869A (zh) | 光刻胶组合物 | |
| JP2003248316A5 (enExample) | ||
| KR20040002447A (ko) | 포토레지스트 조성물 | |
| CN1432869A (zh) | 短波长成像用光致抗蚀剂组合物 | |
| JP2004012898A5 (enExample) |