JP2008535950A5 - - Google Patents

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Publication number
JP2008535950A5
JP2008535950A5 JP2008501061A JP2008501061A JP2008535950A5 JP 2008535950 A5 JP2008535950 A5 JP 2008535950A5 JP 2008501061 A JP2008501061 A JP 2008501061A JP 2008501061 A JP2008501061 A JP 2008501061A JP 2008535950 A5 JP2008535950 A5 JP 2008535950A5
Authority
JP
Japan
Prior art keywords
repeating unit
functional group
perfluoro
acid
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2008501061A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008535950A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2006/009050 external-priority patent/WO2006099380A2/en
Publication of JP2008535950A publication Critical patent/JP2008535950A/ja
Publication of JP2008535950A5 publication Critical patent/JP2008535950A5/ja
Abandoned legal-status Critical Current

Links

JP2008501061A 2005-03-11 2006-03-11 光画像形成可能な熱硬化性フッ素化レジスト Abandoned JP2008535950A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66066105P 2005-03-11 2005-03-11
PCT/US2006/009050 WO2006099380A2 (en) 2005-03-11 2006-03-11 Photoimageable, thermosettable fluorinated resists

Publications (2)

Publication Number Publication Date
JP2008535950A JP2008535950A (ja) 2008-09-04
JP2008535950A5 true JP2008535950A5 (enExample) 2009-04-23

Family

ID=36992357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008501061A Abandoned JP2008535950A (ja) 2005-03-11 2006-03-11 光画像形成可能な熱硬化性フッ素化レジスト

Country Status (4)

Country Link
US (1) US7459262B2 (enExample)
JP (1) JP2008535950A (enExample)
KR (1) KR20070119671A (enExample)
WO (1) WO2006099380A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101439538B1 (ko) * 2007-08-14 2014-09-12 삼성전자주식회사 보호막 형성용 조성물 및 이에 의한 보호막을 포함한유기박막 트랜지스터
KR101084267B1 (ko) * 2009-02-26 2011-11-16 삼성모바일디스플레이주식회사 유기 발광 표시 장치 및 그 제조 방법
US8388852B2 (en) * 2010-07-30 2013-03-05 Apple Inc. Method for fabricating touch sensor panels
JP5528493B2 (ja) * 2012-03-12 2014-06-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
TW201415161A (zh) * 2012-09-28 2014-04-16 Fujifilm Corp 感光性樹脂組成物、使用其的硬化膜的製造方法、硬化膜、液晶顯示裝置及有機ｅｌ顯示裝置
WO2014053202A1 (en) * 2012-10-04 2014-04-10 Merck Patent Gmbh Passivation layers for organic electronic devices
JP6492444B2 (ja) * 2013-09-04 2019-04-03 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び電子デバイス
JP2015069179A (ja) * 2013-09-30 2015-04-13 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法、及び表示素子
JPWO2015141525A1 (ja) * 2014-03-20 2017-04-06 住友ベークライト株式会社 感光性樹脂組成物、および電子装置
WO2015187413A1 (en) * 2014-06-03 2015-12-10 The Chemours Company Fc, Llc Passivation layer comprising a photocrosslinked fluoropolymer
JP7395278B2 (ja) * 2019-07-31 2023-12-11 日東電工株式会社 感光性組成物、デバイス及びデバイスの製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2928865A (en) 1957-03-25 1960-03-15 Du Pont Fluorinated tricyclononanes and tetracycloundecanes
US5229473A (en) 1989-07-07 1993-07-20 Daikin Industries Ltd. Fluorine-containing copolymer and method of preparing the same
US5401812A (en) * 1991-12-24 1995-03-28 Matsushita Electric Works, Ltd. Thermosetting polyimide composition, thermoset product thereof and manufacturing process thereof
US6232417B1 (en) * 1996-03-07 2001-05-15 The B. F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
JP3650985B2 (ja) 1997-05-22 2005-05-25 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物およびパターン製造法
DE60013270T2 (de) 1999-05-04 2005-09-22 E.I. Du Pont De Nemours And Co., Wilmington Polyfluorierte epoxide und assozierte polymere und verfahren
WO2002031596A1 (en) 2000-10-12 2002-04-18 University Of North Carolina At Chapel Hill Co2-processes photoresists, polymers, and photoactive compounds for microlithography
US6899995B2 (en) * 2000-11-29 2005-05-31 E.I. Du Pont De Nemours And Company Protecting groups in polymers, photoresists and processes for microlithography
JP2002372601A (ja) * 2001-04-13 2002-12-26 Fuji Photo Film Co Ltd 反射防止フィルムおよび画像表示装置と含フッ素共重合体
JP3570394B2 (ja) * 2001-05-25 2004-09-29 ソニー株式会社 アクティブマトリクス型表示装置およびアクティブマトリクス型有機エレクトロルミネッセンス表示装置、並びにそれらの駆動方法
US6692326B2 (en) 2001-06-16 2004-02-17 Cld, Inc. Method of making organic electroluminescent display
JP4186819B2 (ja) * 2001-07-12 2008-11-26 ダイキン工業株式会社 含フッ素ノルボルネン誘導体の製造法
US6723488B2 (en) 2001-11-07 2004-04-20 Clariant Finance (Bvi) Ltd Photoresist composition for deep UV radiation containing an additive
US6753096B2 (en) * 2001-11-27 2004-06-22 General Electric Company Environmentally-stable organic electroluminescent fibers
US6926572B2 (en) 2002-01-25 2005-08-09 Electronics And Telecommunications Research Institute Flat panel display device and method of forming passivation film in the flat panel display device
US6734625B2 (en) 2002-07-30 2004-05-11 Xerox Corporation Organic light emitting device (OLED) with multiple capping layers passivation region on an electrode
KR20050069979A (ko) * 2002-08-09 2005-07-05 이 아이 듀폰 디 네모아 앤드 캄파니 포토레지스트, 플루오르화 중합체 및 157 ｎｍ마이크로리소그래피법
US20050265685A1 (en) * 2002-08-13 2005-12-01 Daikin Industries, Ltd Optical material containing photocurable fluoropolymer and photocurable fluororesin composition

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