JP2015532721A5 - - Google Patents

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Publication number
JP2015532721A5
JP2015532721A5 JP2015526548A JP2015526548A JP2015532721A5 JP 2015532721 A5 JP2015532721 A5 JP 2015532721A5 JP 2015526548 A JP2015526548 A JP 2015526548A JP 2015526548 A JP2015526548 A JP 2015526548A JP 2015532721 A5 JP2015532721 A5 JP 2015532721A5
Authority
JP
Japan
Prior art keywords
group
photocurable composition
composition according
pfpe
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015526548A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015532721A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2013/050586 external-priority patent/WO2014025498A1/en
Publication of JP2015532721A publication Critical patent/JP2015532721A/ja
Publication of JP2015532721A5 publication Critical patent/JP2015532721A5/ja
Pending legal-status Critical Current

Links

JP2015526548A 2012-08-09 2013-07-16 光硬化性組成物 Pending JP2015532721A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261681393P 2012-08-09 2012-08-09
US61/681,393 2012-08-09
PCT/US2013/050586 WO2014025498A1 (en) 2012-08-09 2013-07-16 Photocurable compositions

Publications (2)

Publication Number Publication Date
JP2015532721A JP2015532721A (ja) 2015-11-12
JP2015532721A5 true JP2015532721A5 (enExample) 2016-06-23

Family

ID=48914433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015526548A Pending JP2015532721A (ja) 2012-08-09 2013-07-16 光硬化性組成物

Country Status (5)

Country Link
US (1) US8883402B2 (enExample)
EP (1) EP2892938A1 (enExample)
JP (1) JP2015532721A (enExample)
CN (1) CN104520347B (enExample)
WO (1) WO2014025498A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9217920B2 (en) * 2012-08-09 2015-12-22 3M Innovative Properties Company Photocurable compositions
JP6410460B2 (ja) * 2014-04-23 2018-10-24 キヤノン株式会社 組成物、該組成物を用いた膜の製造方法、および液体吐出ヘッドの製造方法
JP6547384B2 (ja) * 2015-04-17 2019-07-24 ダイキン工業株式会社 表面処理組成物
WO2017108510A1 (en) * 2015-12-23 2017-06-29 Solvay Specialty Polymers Italy S.P.A. Method for coating printed circuit boards
CN108610868B (zh) * 2018-04-12 2020-05-15 太仓中化环保化工有限公司 一种微米级强耐盐雾拒水型电路板三防漆
TWI897970B (zh) * 2020-06-11 2025-09-21 美商3M新設資產公司 包含全氟化基團、可水解矽烷基團、及（甲基）丙烯醯基之胺甲酸酯化合物
KR102656558B1 (ko) * 2023-02-06 2024-04-09 동우 화인켐 주식회사 퍼플루오로폴리에테르기 함유 아크릴 화합물 및 이를 포함하는 조성물

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046121A (en) 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
BE516129A (enExample) 1949-07-23
US3046119A (en) 1950-08-01 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
US3046112A (en) 1951-06-30 1962-07-24 Azoplate Corp Quinone diazide printing plates
US2716097A (en) 1951-09-13 1955-08-23 Eastman Kodak Co Polymers of vinyl substituted benzal acetophenones
DE938233C (de) 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
US2940853A (en) 1958-08-21 1960-06-14 Eastman Kodak Co Azide sensitized resin photographic resist
US3149975A (en) 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
GB1375461A (enExample) 1972-05-05 1974-11-27
JPS5934293B2 (ja) 1977-04-20 1984-08-21 王子製紙株式会社 感光性組成物
US4180404A (en) 1977-11-17 1979-12-25 Asahi Kasei Kogyo Kabushiki Kaisha Heat resistant photoresist composition and process for preparing the same
US4262072A (en) 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
DE3107109A1 (de) 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4377631A (en) 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4596763A (en) 1984-10-01 1986-06-24 American Hoechst Corporation Positive photoresist processing with mid U-V range exposure
US4588670A (en) 1985-02-28 1986-05-13 American Hoechst Corporation Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
JPS61243869A (ja) 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
DE3588111T2 (de) 1985-06-29 1996-10-31 Asahi Chem Res Lab Kunststoffzusammensetzung für Lötschutztinte
US4788339A (en) * 1985-09-06 1988-11-29 Minnesota Mining And Manufacturing Company Perfluoroaminoethers
CA1307695C (en) 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US5034304A (en) 1986-01-13 1991-07-23 Rohm And Haas Company Photosensitive compounds and thermally stable and aqueous developable negative images
JPS63286841A (ja) 1987-05-19 1988-11-24 Hitachi Chem Co Ltd 感光性樹脂組成物溶液
JPH0268A (ja) 1987-11-13 1990-01-05 Toshiba Corp ソルダ−レジスト組成物
CA1338252C (en) 1989-07-05 1996-04-16 Osamu Ogitani Resist ink composition
JPH08234432A (ja) 1994-11-11 1996-09-13 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物
JP3190251B2 (ja) 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
JP3276833B2 (ja) 1995-12-13 2002-04-22 太陽インキ製造株式会社 光硬化性・熱硬化性艶消しレジストインキ組成物
JP4855616B2 (ja) 1999-10-27 2012-01-18 スリーエム イノベイティブ プロパティズ カンパニー フルオロケミカルスルホンアミド界面活性剤
US6906115B2 (en) * 2001-06-27 2005-06-14 Daikin Industries, Ltd. Surface treatment composition and preparation thereof
JP3888573B2 (ja) 2001-06-29 2007-03-07 富士電機ホールディングス株式会社 ハンダ組成物
US20060216524A1 (en) 2005-03-23 2006-09-28 3M Innovative Properties Company Perfluoropolyether urethane additives having (meth)acryl groups and hard coats
US20090163615A1 (en) 2005-08-31 2009-06-25 Izhar Halahmi Uv curable hybridcuring ink jet ink composition and solder mask using the same
US8609742B2 (en) * 2006-03-02 2013-12-17 Daikin Industries, Ltd. High energy ray-curable composition
JP2008040262A (ja) * 2006-08-08 2008-02-21 Daikin Ind Ltd 反射防止膜形成用の硬化性組成物
JP2008105999A (ja) 2006-10-25 2008-05-08 Idemitsu Kosan Co Ltd アダマンタン誘導体、その製造方法、樹脂組成物およびその硬化物
CN101896171B (zh) 2007-05-08 2012-05-23 陶氏环球技术公司 水分散性聚合物组合物
US7897678B2 (en) 2007-07-26 2011-03-01 3M Innovative Properties Company Fluorochemical urethane compounds having pendent silyl groups
US8015970B2 (en) 2007-07-26 2011-09-13 3M Innovative Properties Company Respirator, welding helmet, or face shield that has low surface energy hard-coat lens
JP5224130B2 (ja) * 2008-03-10 2013-07-03 ナガセケムテックス株式会社 撥液性樹脂組成物
EP2269116A4 (en) * 2008-03-11 2011-09-07 3M Innovative Properties Co PHOTOGRAPHIC MASKS HAVING PROTECTIVE LAYER
JP5470957B2 (ja) * 2009-03-25 2014-04-16 Ｄｉｃ株式会社 フィルム保護層用活性エネルギー線硬化型樹脂組成物
US8748060B2 (en) * 2009-09-16 2014-06-10 3M Innovative Properties Company Fluorinated coating and phototools made therewith
US8420281B2 (en) * 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
CN102549042B (zh) * 2009-09-16 2015-01-28 3M创新有限公司 氟化涂料和用其制作的底片
US8715904B2 (en) * 2012-04-27 2014-05-06 3M Innovative Properties Company Photocurable composition

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