JP2004280049A5 - - Google Patents
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- Publication number
- JP2004280049A5 JP2004280049A5 JP2003346258A JP2003346258A JP2004280049A5 JP 2004280049 A5 JP2004280049 A5 JP 2004280049A5 JP 2003346258 A JP2003346258 A JP 2003346258A JP 2003346258 A JP2003346258 A JP 2003346258A JP 2004280049 A5 JP2004280049 A5 JP 2004280049A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- alkyl
- ether oxygen
- substituted
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 77
- 229920002120 photoresistant polymer Polymers 0.000 claims description 45
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 42
- 229910052760 oxygen Inorganic materials 0.000 claims description 42
- 239000001301 oxygen Substances 0.000 claims description 42
- 229910052799 carbon Inorganic materials 0.000 claims description 35
- 229920000642 polymer Polymers 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 17
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 14
- AQYSYJUIMQTRMV-UHFFFAOYSA-N hypofluorous acid Chemical group FO AQYSYJUIMQTRMV-UHFFFAOYSA-N 0.000 claims description 9
- 125000001033 ether group Chemical group 0.000 claims description 7
- 125000003367 polycyclic group Chemical group 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 150000001721 carbon Chemical group 0.000 claims description 5
- 239000000178 monomer Substances 0.000 claims description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 4
- YRPLSAWATHBYFB-UHFFFAOYSA-N (2-methyl-2-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)(OC(=O)C=C)C2C3 YRPLSAWATHBYFB-UHFFFAOYSA-N 0.000 claims description 3
- RFJVDJWCXSPUBY-UHFFFAOYSA-N 2-(difluoromethylidene)-4,4,5-trifluoro-5-(trifluoromethyl)-1,3-dioxolane Chemical compound FC(F)=C1OC(F)(F)C(F)(C(F)(F)F)O1 RFJVDJWCXSPUBY-UHFFFAOYSA-N 0.000 claims description 3
- MYHAAONPWPYATB-UHFFFAOYSA-N 2-chloro-1,1,3,4,4,5,6,6,7,8,8,8-dodecafluoro-5-(trifluoromethyl)oct-1-ene Chemical compound FC(C(F)(F)F)C(C(C(F)(F)F)(C(C(C(=C(F)F)Cl)F)(F)F)F)(F)F MYHAAONPWPYATB-UHFFFAOYSA-N 0.000 claims description 3
- YSYRISKCBOPJRG-UHFFFAOYSA-N 4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole Chemical compound FC1=C(F)OC(C(F)(F)F)(C(F)(F)F)O1 YSYRISKCBOPJRG-UHFFFAOYSA-N 0.000 claims description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 claims description 3
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 claims description 3
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 claims description 3
- VNYGZQZFJDADCT-UHFFFAOYSA-N (3-methyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2C(C)(OC(=O)C=C)CC1C2 VNYGZQZFJDADCT-UHFFFAOYSA-N 0.000 claims description 2
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 claims description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- AEPWOCLBLLCOGZ-UHFFFAOYSA-N 2-cyanoethyl prop-2-enoate Chemical compound C=CC(=O)OCCC#N AEPWOCLBLLCOGZ-UHFFFAOYSA-N 0.000 claims description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 claims description 2
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- 125000000524 functional group Chemical group 0.000 claims description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 claims description 2
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000203 mixture Substances 0.000 description 10
- 239000000758 substrate Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- -1 glycol ethers Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41585502P | 2002-10-03 | 2002-10-03 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004280049A JP2004280049A (ja) | 2004-10-07 |
| JP2004280049A5 true JP2004280049A5 (enExample) | 2006-10-05 |
| JP4261303B2 JP4261303B2 (ja) | 2009-04-30 |
Family
ID=32043433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003346258A Expired - Fee Related JP4261303B2 (ja) | 2002-10-03 | 2003-10-03 | 水酸化され、光酸で切断可能な基を有するフォトレジスト |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7022457B2 (enExample) |
| EP (1) | EP1411389A1 (enExample) |
| JP (1) | JP4261303B2 (enExample) |
| KR (1) | KR101017801B1 (enExample) |
| TW (1) | TW200417818A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4289937B2 (ja) * | 2003-03-28 | 2009-07-01 | 東京応化工業株式会社 | ホトレジスト組成物及びそれを用いたレジストパターン形成方法 |
| US7132218B2 (en) * | 2004-03-23 | 2006-11-07 | Sumitomo Chemical Company, Limited | Chemically amplified positive resist composition |
| JP4628809B2 (ja) * | 2005-02-01 | 2011-02-09 | 東京応化工業株式会社 | ネガ型レジスト組成物およびレジストパターン形成方法 |
| US7358029B2 (en) * | 2005-09-29 | 2008-04-15 | International Business Machines Corporation | Low activation energy dissolution modification agents for photoresist applications |
| JP4684139B2 (ja) * | 2005-10-17 | 2011-05-18 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
| JP2010085921A (ja) * | 2008-10-02 | 2010-04-15 | Panasonic Corp | レジスト材料及びそれを用いたパターン形成方法 |
| JP6774214B2 (ja) * | 2015-05-08 | 2020-10-21 | 住友化学株式会社 | 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法 |
| JP7191981B2 (ja) * | 2018-12-21 | 2022-12-19 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、及び電子デバイスの製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1020463A (ja) * | 1996-07-04 | 1998-01-23 | Konica Corp | ハロゲン化銀カラー写真感光材料 |
| US6280897B1 (en) | 1996-12-24 | 2001-08-28 | Kabushiki Kaisha Toshiba | Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts |
| KR20020012206A (ko) * | 1999-05-04 | 2002-02-15 | 메리 이. 보울러 | 플루오르화 중합체, 포토레지스트 및 마이크로리소그래피방법 |
| US6596458B1 (en) * | 1999-05-07 | 2003-07-22 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
| KR100535149B1 (ko) * | 1999-08-17 | 2005-12-07 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물 |
| JP4838437B2 (ja) * | 2000-06-16 | 2011-12-14 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| US6764809B2 (en) * | 2000-10-12 | 2004-07-20 | North Carolina State University | CO2-processes photoresists, polymers, and photoactive compounds for microlithography |
-
2003
- 2003-09-24 US US10/669,492 patent/US7022457B2/en not_active Expired - Fee Related
- 2003-10-02 KR KR1020030068857A patent/KR101017801B1/ko not_active Expired - Fee Related
- 2003-10-03 TW TW092127441A patent/TW200417818A/zh unknown
- 2003-10-03 JP JP2003346258A patent/JP4261303B2/ja not_active Expired - Fee Related
- 2003-10-03 EP EP20030256267 patent/EP1411389A1/en not_active Withdrawn
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