JP2005526989A5 - - Google Patents
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- Publication number
- JP2005526989A5 JP2005526989A5 JP2003582581A JP2003582581A JP2005526989A5 JP 2005526989 A5 JP2005526989 A5 JP 2005526989A5 JP 2003582581 A JP2003582581 A JP 2003582581A JP 2003582581 A JP2003582581 A JP 2003582581A JP 2005526989 A5 JP2005526989 A5 JP 2005526989A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist composition
- photoresist
- composition
- film
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 17
- 229920002120 photoresistant polymer Polymers 0.000 claims 17
- 239000002904 solvent Substances 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- -1 diazonaphthoquinone sulfonate ester Chemical class 0.000 claims 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 claims 1
- KLKFAASOGCDTDT-UHFFFAOYSA-N ethoxymethoxyethane Chemical compound CCOCOCC KLKFAASOGCDTDT-UHFFFAOYSA-N 0.000 claims 1
- 229940116333 ethyl lactate Drugs 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/120,952 US6911293B2 (en) | 2002-04-11 | 2002-04-11 | Photoresist compositions comprising acetals and ketals as solvents |
| PCT/EP2003/003255 WO2003085455A2 (en) | 2002-04-11 | 2003-03-28 | Photoresist compositions comprising acetals and ketals as solvents |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005526989A JP2005526989A (ja) | 2005-09-08 |
| JP2005526989A5 true JP2005526989A5 (enExample) | 2006-04-13 |
| JP4359151B2 JP4359151B2 (ja) | 2009-11-04 |
Family
ID=28790215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003582581A Expired - Fee Related JP4359151B2 (ja) | 2002-04-11 | 2003-03-28 | アセタール及びケタールを溶剤として含むフォトレジスト組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6911293B2 (enExample) |
| EP (1) | EP1497697B1 (enExample) |
| JP (1) | JP4359151B2 (enExample) |
| KR (1) | KR100869085B1 (enExample) |
| CN (2) | CN1650232A (enExample) |
| TW (2) | TWI318330B (enExample) |
| WO (1) | WO2003085455A2 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030036948A (ko) * | 2001-11-01 | 2003-05-12 | 삼성전자주식회사 | 포토레지스트용 노르보넨계 공중합체, 이의 제조방법 및이를 포함하는 포토레지스트 조성물 |
| US7108958B2 (en) * | 2002-07-31 | 2006-09-19 | Brewer Science Inc. | Photosensitive bottom anti-reflective coatings |
| JP5368674B2 (ja) * | 2003-10-15 | 2013-12-18 | ブルーワー サイエンス アイ エヌ シー． | 現像液に可溶な材料および現像液に可溶な材料をビアファーストデュアルダマシン適用において用いる方法 |
| JP4440600B2 (ja) * | 2003-10-31 | 2010-03-24 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜および超厚膜対応化学増幅型感光性樹脂組成物 |
| US20050255410A1 (en) | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
| US7255970B2 (en) * | 2005-07-12 | 2007-08-14 | Az Electronic Materials Usa Corp. | Photoresist composition for imaging thick films |
| US8263539B2 (en) * | 2005-10-28 | 2012-09-11 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and methods for its use |
| US7632796B2 (en) | 2005-10-28 | 2009-12-15 | Dynaloy, Llc | Dynamic multi-purpose composition for the removal of photoresists and method for its use |
| DE102006006022A1 (de) * | 2006-02-08 | 2007-08-09 | Clariant International Limited | Verfahren zur Reinigung von Metallteilen |
| US7914974B2 (en) | 2006-08-18 | 2011-03-29 | Brewer Science Inc. | Anti-reflective imaging layer for multiple patterning process |
| US20080096785A1 (en) * | 2006-10-19 | 2008-04-24 | Air Products And Chemicals, Inc. | Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue |
| FR2912414B1 (fr) * | 2007-02-13 | 2012-09-28 | Imaje Sa | Composition d'encre pour l'impression par jet d'encre. |
| US7709178B2 (en) * | 2007-04-17 | 2010-05-04 | Brewer Science Inc. | Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| KR101647158B1 (ko) | 2008-01-29 | 2016-08-09 | 브레우어 사이언스 인코포레이션 | 다중 다크 필드 노출에 의한, 하드마스크 패턴화를 위한 온-트랙 공정 |
| TWI450052B (zh) * | 2008-06-24 | 2014-08-21 | Dynaloy Llc | 用於後段製程操作有效之剝離溶液 |
| US20100151118A1 (en) * | 2008-12-17 | 2010-06-17 | Eastman Chemical Company | Carrier solvent compositions, coatings compositions, and methods to produce thick polymer coatings |
| US9640396B2 (en) | 2009-01-07 | 2017-05-02 | Brewer Science Inc. | Spin-on spacer materials for double- and triple-patterning lithography |
| JP5329999B2 (ja) * | 2009-01-29 | 2013-10-30 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | パターン形成方法 |
| KR101677058B1 (ko) * | 2009-10-13 | 2016-11-18 | 금호석유화학 주식회사 | 폴리아세탈 수지, 그 합성 방법 및 포토레지스트 조성물 |
| TWI539493B (zh) * | 2010-03-08 | 2016-06-21 | 黛納羅伊有限責任公司 | 用於摻雜具有分子單層之矽基材之方法及組合物 |
| US8987181B2 (en) | 2011-11-08 | 2015-03-24 | Dynaloy, Llc | Photoresist and post etch residue cleaning solution |
| US8853438B2 (en) | 2012-11-05 | 2014-10-07 | Dynaloy, Llc | Formulations of solutions and processes for forming a substrate including an arsenic dopant |
| US20140240645A1 (en) * | 2013-02-27 | 2014-08-28 | Samsung Display Co., Ltd. | Photosensitive resin composition, display device using the same and method of manufacturing the display device |
| US9587136B2 (en) | 2013-10-08 | 2017-03-07 | Wisconsin Alumni Research Foundation | Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography |
| CN118672057A (zh) * | 2015-11-05 | 2024-09-20 | 富士胶片株式会社 | 感光化射线性或感放射线性树脂组合物、图案形成方法及电子器件的制造方法 |
| KR102475604B1 (ko) * | 2016-08-25 | 2022-12-08 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치 |
| EP4066059B1 (en) * | 2019-11-25 | 2024-02-28 | Merck Patent GmbH | Chemically amplified photoresist |
| CN116256945A (zh) * | 2023-03-15 | 2023-06-13 | 青岛物元技术有限公司 | 光刻胶材料及其应用 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3752371T2 (de) | 1986-12-23 | 2004-04-15 | Shipley Co. Inc., Marlborough | Fotoresistzusammensetzungen und ihre Bestandteile |
| MY103006A (en) * | 1987-03-30 | 1993-03-31 | Microsi Inc | Photoresist compositions |
| DE3841437A1 (de) * | 1988-12-09 | 1990-06-13 | Basf Ag | Strahlungsempfindliches gemisch |
| DE4005212A1 (de) * | 1990-02-20 | 1991-08-22 | Basf Ag | Strahlungsempfindliches gemisch |
| EP0520654A1 (en) * | 1991-06-21 | 1992-12-30 | Hoechst Celanese Corporation | Deep UV light sensitive positive photoresist compositions |
| JPH08297372A (ja) * | 1995-04-26 | 1996-11-12 | Minolta Co Ltd | 有機感光体 |
| JP3689937B2 (ja) | 1995-07-19 | 2005-08-31 | 住友化学株式会社 | ナフトキノンジアジド系感光剤の製造方法 |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| JP4219435B2 (ja) * | 1997-12-15 | 2009-02-04 | 東京応化工業株式会社 | ポリフェノールジエステル化物の製造方法およびポジ型感光性組成物 |
| DE19825244A1 (de) * | 1998-06-05 | 1999-12-16 | Kodak Polychrome Graphics Gmbh | Offsetdruckplatte mit hoher Auflagenstabilität |
| US6613494B2 (en) * | 2001-03-13 | 2003-09-02 | Kodak Polychrome Graphics Llc | Imageable element having a protective overlayer |
| US6706454B2 (en) * | 2001-07-05 | 2004-03-16 | Kodak Polychrome Graphics Llc | Method for the production of a printing plate using particle growing acceleration by an additive polymer |
| US6517988B1 (en) * | 2001-07-12 | 2003-02-11 | Kodak Polychrome Graphics Llc | Radiation-sensitive, positive working coating composition based on carboxylic copolymers |
| US6645689B2 (en) * | 2002-03-13 | 2003-11-11 | Kodak Polychrome Graphics Llc | Solvent resistant polymers with improved bakeability features |
-
2002
- 2002-04-11 US US10/120,952 patent/US6911293B2/en not_active Expired - Fee Related
-
2003
- 2003-03-28 CN CN03808168.7A patent/CN1650232A/zh active Pending
- 2003-03-28 KR KR1020047016107A patent/KR100869085B1/ko not_active Expired - Fee Related
- 2003-03-28 JP JP2003582581A patent/JP4359151B2/ja not_active Expired - Fee Related
- 2003-03-28 EP EP03720384A patent/EP1497697B1/en not_active Expired - Lifetime
- 2003-03-28 CN CN201110317143.1A patent/CN102520583B/zh not_active Expired - Fee Related
- 2003-03-28 WO PCT/EP2003/003255 patent/WO2003085455A2/en not_active Ceased
- 2003-04-10 TW TW092108231A patent/TWI318330B/zh not_active IP Right Cessation
- 2003-04-10 TW TW098131968A patent/TWI396939B/zh not_active IP Right Cessation
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