Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
  • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/022—Quinonediazides
  • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
  • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
  • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
  • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
  • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
  • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
  • Y10S430/1055—Radiation sensitive composition or product or process of making
  • Y10S430/106—Binder containing
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
  • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
  • Y10S430/1055—Radiation sensitive composition or product or process of making
  • Y10S430/106—Binder containing
  • Y10S430/111—Polymer of unsaturated acid or ester

Definitions

• Photoresist Compositions Comprising Acetals and Ketals as Solvents
• This invention relates to photoresist compositions and to a process for forming an image on a substrate utilizing said photoresist compositions.
• Photoresist compositions are used in microlithography processes for making miniaturized electronic components such as in the fabrication of computer chips and integrated circuits.
• a thin coating of film of a photoresist composition is first applied to a substrate material, such as silicon wafers used for making integrated circuits.
• the coated substrate is then baked to evaporate any solvent in the photoresist composition and to fix the coating onto the substrate.
• the photoresist coated on the substrate is next subjected to an image-wise exposure to radiation.
• the radiation exposure causes a chemical transformation in the exposed areas of the coated surface.
• Visible light, ultraviolet (UV) light, electron beam and X-ray radiant energy are radiation types commonly used today in microlithographic processes.
• the coated substrate is treated with a developer solution to dissolve and remove either the radiation exposed or the unexposed areas of the photoresist.
• photoresist compositions there are two types, negative-working and positive-working.
• negative-working photoresist compositions When negative-working photoresist compositions are exposed image-wise to radiation, the areas of the resist composition exposed to the radiation become less soluble to a developer solution (e.g. a cross-linking reaction occurs) while the unexposed areas of the photoresist coating remain relatively soluble to such a solution.
• a developer solution e.g. a cross-linking reaction occurs
• treatment of an exposed negative-working resist with a developer causes removal of the non-exposed areas of the photoresist coating and the creation of a negative image in the coating, thereby uncovering a desired portion of the underlying substrate surface on which the photoresist composition was deposited.
• Photoresist resolution is defined as the smallest feature, which the resist composition can transfer from the photomask to the substrate with a high degree of image edge acuity after exposure and development. In many manufacturing applications today, resist resolution on the order of less than one micron are necessary. In addition, it is almost always desirable that the developed photoresist wall profiles be near vertical relative to the substrate. Such demarcations between developed and undeveloped areas of the resist coating translate into accurate pattern transfer of the mask image onto the substrate. This becomes even more critical as the push toward miniaturization reduces the critical dimensions on the devices.
• a photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of
• binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof.
• the photosensitive element is useful in making color proofs.
• Japanese patent application JP9031044 inventor Atsushi, Sumitomo Chemical Co. discloses that to solve the problem of producing an azide-based photosensitizer capable of shortening the filtration time with a crystal having a large grain diameter at a high reactionai rate by using 1 ,3-dioxolane without any problem in safety as a reactionai solvent, a compound having phenolic hydroxyl group (e.g. 2,3,4,4,'- tetrahydroxybenzophenone) is condensed with a 2- naphthoquinone diazide-4- or a 2-naphthoquinone diazide-5-sulfonyl halide (e.g.
• the present invention provides a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals.
• the present invention also provides a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals.
• the present invention also provides a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
• the present invention provides a photoresist composition
• a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals.
• Novolak resins of the present invention are those that have been commonly used in the art of photoresist manufacture as exemplified by "Chemistry and
• the novolak resins typically comprise the addition-condensation reaction product of at least one phenolic compound with at least one aldehyde source.
• the phenolic compounds include for example cresols (including all isomers), xylenols
• Aldehyde sources that can be used in this invention include formaldehyde, paraformaldehyde, trioxane, acetaldehyde, chloroacetaldehyde, and reactive equivalents of these aldehyde sources. Among these formaldehyde and paraformaldehyde are preferable. In addition mixtures of two or more different aldehydes can be used.
• the acid catalyst used for the addition-condensation reaction includes hydrochloric acid, sulfuric acid, formic acid, acetic acid, oxalic acid, p- toluenesulfonic acid and the like.
• the polyhydroxystyrene can be any polyhydroxystyrene, including single polymers of vinylphenol; copolymers of vinylphenol and an acrylate derivative, acrylonitrile, a methacrylate derivative, methacrylonitrile, styrene, or a styrene derivative such as alpha-methylstyrene, p-methylstyrene, o-hydrogenated resins derived from single polymers of vinylphenol; and hydrogenated resins derived from copolymers of vinylphenol and the above-described acrylate derivative, methacrylate derivative, or styrene derivative.
• substituted polyhydroxystyrenes in which the hydrogen atoms of some of the hydroxyl groups in the original polyhydroxystyrene have been replaced with alkali-solubility- suppressing groups, can be suitably used.
• alkali-solubility-suppressing groups may be, for example, tert-butyl groups, tert-butoxycarbonyl groups, tert- aminooxycarbonyl groups, ethoxyethyl groups, methoxypropyl groups, tetrahydropyranyl groups, tetrahydrofuranyl groups, benzyl groups, or trimethylsilyl groups.
• the photoactive component can be any compound known to be useful for use in phtoresist compositons.
• PAC diazonaphthoquinone sulfonate ester of a polyhydroxy compound. It can be prepared by esterification of 1 ,2-napthoquinonediazide-5-sulfonyl chloride and/or 1,2-naphthoquinonediazide-4-sulfonyl chloride with a polyhydroxy compound having 2-7 phenolic moieties and in the presence of basic catalyst.
• the number of the phenolic moieties per one molecule of the polyhydroxy compound used as a backbone of PAC is in the range of 2-7, and more preferably in the range of 3-5.
• polyhydroxy compounds are: (a) Polyhydroxybenzophenones such as 2,3,4-trihydroxybenzophenone, 2,4,4'- trihydroxybenzophenone, 2,4,6-trihydroxybenzophenone, 2,3,4-trihydroxy-2'- methylbenzophenone, 2,3,4,4'-tetrahydroxybenzophenone, 2,2'4,4'- tetrahydroxybenzophenone, 2,4,6,3' ,4'-pentahydroxybenzophenone, 2,3,4,2',4'- pentahydroxy-benzophenone, 2,3,4,2',5'-pentahydroxybenzophenone,
• Alkylene di(polyhydroxybenzoates) such as ethyleneglycol-di(3,5- dihydroxybenzoate) and ethylene glycoldi(3,4,5-trihydroxybenzoate);
• 4-253058 such as alpha, alpha' alpha"-tris (4-hydroxyphenyl)-1,3,5-triisopropylbenzene, alpha, alpha', alpha"- tris(3,5-dimethyl-4-hydroxyphenyl)-1 ,3,5-triisopropylbenzene, alpha, alpha', alpha"- tris (3,5-diethyl-4-hydroxyphenyl)-1 ,3,5-triisopropylbenzene, alpha, alpha', alpha"- tris (3,5-di-n-propyl-4-hydroxyphenyl)-1 ,3,5-tri-isopropylbenzene, alpha, alpha , ,alpha"-tris(3,5-diisopropyl-4-hydroxyphenyl)-1 ,3,5-triisopropylbenzene, alpha, alpha', alpha"-tris(3,5-di-n-butyl-4-hydroxyphen
• o-quinonediazide photoactive compounds include condensation products of novolak resins with an o-quinonediazide sulfonyl chloride. These condensation products (also called capped novolaks) may be used instead of o-quinonediazide esters of polyhydroxy compounds or used in combination therewith. Numerous U.S. Patents describe such capped novolaks. U.S. Pat. No. 5,225,311 is one such example.
• the photoacid generator (PAG) of the present invention can be any PAG known to one of ordinary skill in the art that is useful in photoresist compositions.
• PAG plays an important role in the imaging process for both positive-working and negative-working chemically amplified resists, because PAG governs light response properties, such as absorption of light or quantum yield of acid formation, and, in addition, governs the properties of the produced acid, such as acid strength, mobility, or volatility.
• Useful PAGs for both positive-working and negative-working chemically amplified resists include ionic onium salts, particularly iodonium salts or sulfonium salts with strong non-nucleophilic anions (U.S. Pat.
• the photoresist composition of the present invention can be a chemically amplified photoresist composition comprising a PAG.
• the acetals and ketals of the present solvent composition include both acyclic and cyclic compounds.
• the acyclic acetal or ketal is represented by the formula
• R 1 and R 2 are independently hydrogen or a hydrocarbyl group of 1 to about 10 carbon atoms, and in one embodiment 1 to 5 carbon atoms; and R 3 and R 4 are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and in one embodiment, 1 to 5 carbon atoms.
• Two preferred examples of acyclic compounds useful in the present invention are dimethoxymethane and diethoxyethane.
• hydrocarbyl substituent or “hydrocarbyl group” is used in its ordinary sense, which is well-known to those skilled in the art. Specifically, it refers to a group having a carbon atom directly attached to the remainder of the molecule and having predominantly hydrocarbon character.
• hydrocarbyl groups include:
• hydrocarbon substituents that is, aliphatic (e.g., alkyl or alkenyl), alicyclic (e.g., cycloalkyl, cycloalkenyl) substituents, and aromatic-, aliphatic-, and alicyclic-substituted aromatic substituents, as well as cyclic substituents wherein the ring is completed through another portion of the molecule (e.g., two substituents together form an alicyclic radical);
• aliphatic e.g., alkyl or alkenyl
• alicyclic e.g., cycloalkyl, cycloalkenyl
• aromatic-, aliphatic-, and alicyclic-substituted aromatic substituents as well as cyclic substituents wherein the ring is completed through another portion of the molecule (e.g., two substituents together form an alicyclic radical);
• substituted hydrocarbon substituents that is, substituents containing non-hydrocarbon groups which, in the context of this invention, do not alter the predominantly hydrocarbon substituent (e.g., halo (especially chloro and fluoro), hydroxy, alkoxy, mercapto, alkylmercapto, nitro, nitroso, and sulfoxy);
• hetero substituents that is, substituents which, while having a predominantly hydrocarbon character, in the context of this invention, contain other than carbon in a ring or chain otherwise composed of carbon atoms.
• Heteroatoms include sulfur, oxygen, nitrogen, and encompass substituents as pyridyl, furyl, thienyl and imidazolyl.
• no more than two, preferably no more than one, non-hydrocarbon substituent will be present for every ten carbon atoms in the hydrocarbyl group; typically, there will be no non-hydrocarbon substituents in the hydrocarbyl group.
• the cyclic acetal or ketal is a 4-7 member ring compound.
• the ring compound is represented by the formula
• R 1 -R 4 are independently hydrogen, or hydrocarbyl groups of 1 to about 10 carbon atoms, and n is 1, 2, 3, or 4.
• the cyclic acetal or ketal is 1 ,3-dioxolane.
• the solvent composition in addition to the presently claimed acetals and ketals can also comprise at least one suitable photoresist solvents.
• useful photoresist solvents include, but are not limited to, ethyleneglycol monomethyl ether, ethyleneglycol monoethyl ether, propylene glycol monomethyl ether (PGME) ethyleneglycol monoethyl ether acetate, propyleneglycol alkyl ether acetate (such as propyleneglycol methyl ether acetate (PGMEA), propyleneglycol propyl ether acetate), methylbenzene, dimethylbenzene, methylethyl ketone, 2-heptanone, anisole, 3-methyl-3-methoxybutanol, cyclohexanone, ethyl-2-hydroxypropionate (ethyl lactate (EL)), ethyl-2-hydroxy-2-methyl propionate, ethyl hydroxyacetate, 2- hydroxy-3-
• the photoresist composition is capable of forming photoresists having a resist film thickness of 1 to 100 micrometers ( ⁇ m), and in one embodiment, 10-90 ⁇ m, and in one embodiment 20-75 ⁇ m, and in one embodiment at least 30 ⁇ m, and in one embodiment, at least 50 ⁇ m.
• the present photoresist composition is useful for forming thick film photoresists.
• the present invention also provides a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of the aforementioned acetals and ketals.
• the polycarbonate resin may be any polycarbonate resin, including a homopolymer or copolymer of a linear or branched thermoplastic aromatic polycarbonate prepared by reacting an aromatic dihydroxy compound or a mixture of the aromatic dihydroxy compound and a small amount of a polyhydroxy compound with phosgene or diester of carbonic acid, as disclosed in U. S. Patent No. 6,359,028 B1.
• a polyhydroxy compound such as fluoroglucine, 2,6-
• the polycarbonate resin is a homopolycarbonate based on Bisphenol A, available commercially as "Makrolon TM 2608" from Bayer Corporation.
• M w weight average molecular weight of the polycarbonate resin ranges from 2000 to 100,000, and in one embodiment, 10,000 to 60,000.
• Optional ingredients for the photoresist compositions of the present invention include colorants, dyes, anti-striation agents, leveling agents, plasticizers, adhesion promoters, speed enhancers, solvents and such surfactants as non-ionic surfactants, which may be added to the solution of the film forming resin, sensitizer and solvent before the photoresist composition is coated onto a substrate.
• dye additives that may be used together with the photoresist compositions of the present invention include Methyl Violet 2B (C.I. No. 42535), Crystal Violet (C.I. 42555). Malachite Green (C.I. No. 42000), Victoria Blue B (C.I. No. 44045) and Neutral Red (C.I. No. 50040) at one to ten percent weight levels, based on the combined weight of the film forming resin and sensitizer.
• the dye additives help provide increased resolution by inhibiting back scattering of light off the substrate.
• Anti-striation agents may be used at up to a five percent weight level, based on the combined weight of the film forming resin and sensitizer.
• Plasticizers which may be used include, for example, phosphoric acid tri-(beta-chloroethyl)-ester; stearic acid; dicamphor; polypropylene; acetal resins; phenoxy resins; and alkyl resins, at one to ten percent weight levels, based on the combined weight of the film forming resin and sensitizer.
• the plasticizer additives improve the coating properties of the material and enable the application of a film that is smooth and of uniform thickness to the substrate.
• Adhesion promoters which may be used include, for example, beta-(3,4 epoxy-cyclohexyl)-ethyltrimethoxysilane; p-methyl-disilane-methyl methacrylate; vinyl trichlorosilane; and gamma-amino-propyl triethoxysilane, up to a 4 percent weight level, based on the combined weight of the film forming resin and sensitizer.
• Development speed enhancers that may be used include, for example, picric acid, nicotinic acid or nitrocinnamic acid up to a 20 percent weight level, based on the combined weight of the film forming resin and sensitizer.
• the solvents may be present in the overall composition in an amount of up to 95% by weight of the solids in the composition. Solvents, of course are substantially removed after coating of the photoresist solution on a substrate and subsequent drying.
• Non-ionic surfactants include, for example, nonylphenoxy poly(ethyleneoxy) ethanol; octylphenoxy ethanol at up to 10% weight levels, based on the combined weight of the film forming resin and sensitizer.
• the present invention also provides a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with the aforementioned photoresist composition comprising the forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; the photoactive compound or photoacid generator; and the solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
• the present invention also provides a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with the aforementioned photoresist composition comprising the polycarbonate resin and the solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.
• the photoresist composition can be applied to the substrate by any conventional method used in the photoresist art, including dipping, spraying, whirling and spin coating.
• spin coating for example, the resist solution can be adjusted with respect to the percentage of solids content, in order to provide a coating of the desired thickness, given the type of spinning equipment utilized and the amount of time allowed for the spinning process.
• Suitable substrates include silicon, aluminum, polymeric resins, silicon dioxide, doped silicon dioxide, silicon nitride, tantalum, copper, polysilicon, ceramics, aluminum/copper mixtures; gallium arsenide and other such Group lll/V compounds.
• the photoresist composition may also be coated over an antireflective coating.
• the photoresist compositions produced by the described procedure are particularly suitable for application to thermally grown silicon/silicon dioxide-coated wafers, such as are utilized in the production of microprocessors and other miniaturized integrated circuit components.
• An aluminum/aluminum oxide wafer can also be used.
• the substrate may also comprise various polymeric resins, especially transparent polymers such as polyesters.
• the substrate may have an adhesion promoted layer of a suitable composition, such as one containing hexa- alkyl disilazane, preferably hexamethyl disilazane (HMDS).
• HMDS hexamethyl disilazane
• the photoresist composition is coated onto the substrate, and the coated substrate is heat treated until substantially all of the solvent is removed.
• heat treatment of the coated substrate involves heating the coated substrate at a temperature from 70°C to 150°C for from 30 seconds to 180 seconds on a hot plate or for from 15 to 90 minutes in a convection oven. This temperature treatment is selected in order to reduce the concentration of residual solvents in the photoresist composition, while not causing substantial thermal degradation of the photosensitizer.
• this first temperature treatment is conducted until substantially all of the solvents have evaporated and a thin coating of photoresist composition, on the order of one micron in thickness, remains on the substrate.
• the temperature is from 95°C to 120°C.
• the treatment is conducted until the rate of change of solvent removal becomes relatively insignificant.
• the temperature and time selection depends on the photoresist properties desired by the user, as well as the equipment used and commercially desired coating times.
• the coated substrate can then be exposed to actinic radiation, e.g., radiation at a wavelength of from 100 nm to 450 nm including i-line (365 nm), g- line (436 nm) deep UV (248 nm) ArF (193 nm) and F 2 (157 nm) radiations), x-ray, electron beam, ion beam or laser radiation, in any desired pattern, produced by use of suitable masks, negatives, stencils, templates, etc.
• actinic radiation e.g., radiation at a wavelength of from 100 nm to 450 nm including i-line (365 nm), g- line (436 nm) deep UV (248 nm) ArF (193 nm) and F 2 (157 nm) radiations
• actinic radiation e.g., radiation at a wavelength of from 100 nm to 450 nm including i-line (365 nm), g- line (436 nm) deep UV (2
• the substrate coated with the photoresist composition is then optionally subjected to a post exposure second baking or heat treatment, either before or after development.
• the heating temperatures may range from 90°C to 150°C, more preferably from 100°C to 130°C.
• the heating may be conducted for from 30 seconds to 2 minutes, more preferably from 60 seconds to 90 seconds on a hot plate or 30 to 45 minutes by convection oven.
• the exposed photoresist-coated substrates are developed to remove the image-wise exposed areas (positive photoresists), or the unexposed areas (negative photoresists), by immersion, in an alkaline developing solution or developed by a spray development process.
• the solution is preferably agitated, for example, by nitrogen burst agitation.
• the substrates are allowed to remain in the developer until all, or substantially all, of the photoresist coating has dissolved from the exposed or unexposed areas.
• Developers can include aqueous solutions of ammonium or alkali metal hydroxides.
• One preferred hydroxide is tetramethyl ammonium hydroxide.
• the post-development heat treatment can comprise the oven baking of the coating and substrate below the coating's softening point.
• the developed substrates may be treated with a buffered, hydrofluoric acid base etching solution.
• the photoresist compositions of the present invention are resistant to acid-base etching solutions and provide effective protection for the unexposed photoresist-coating areas of the substrate.
• Silicon wafers were coated to the same nominal coating thickness of 65 ⁇ m and were exposed at 365 nm through a positive photomask. The wafers were then developed with a tetramethyl ammonium hydroxide developer and the images were analyzed. Sample A required 4000 mJ/cm2 for optimum resolution while Sample B could be exposed in only 1500 mJ/cm2 showing almost a 2.5 fold increase in photospeed. Both resists could resolve 50 ⁇ m contact holes under the same conditions.
• Example 2 A negative acting photoresist was prepared comparing the control Sample A of Table 1 above using the standard solvent against the test Sample B containing a portion of the solvent replaced by 1 ,3-dioxolane, as shown in Table 2 below.
• Wafers were coated at 30 ⁇ m dry coating weight onto silicon wafers. The wafers were exposed through a negative mask using a broad band exposure unit.
• Sample B showed about a 15% faster photospeed when compared to Sample A.
• the side wall profile of the imaged lines for Sample B was straighter and closer to vertical when compared to the lines evident with Sample A.
• Example 3 Positive resist samples were prepared with mixed solvent systems.
• Sample A the control sample was prepared with a mixture of standard resist solvents while Sample B contained 1 ,3-dioxolane as a portion of the solvent system, as shown in Table 3 below. Table 3
• Samples were spin coated onto hexamethyl disilazane treated Silicon wafers at about 1 ⁇ m thickness and were exposed through a positive photomask at 365 nm. Optimum exposure for Sample B was 5% faster than that for Sample A. In addition, Sample B images had an improved depth of focus of about 0.3 ⁇ m.
• Example 4 Polycarbonate resins have limited solubility in many typical organic solvents. In a coating application for these resins the only other viable solvent was n-methyl pyrolidinone (NMP). Solutions (containing 0.7% solids) of a commercial polycarbonate resin (Makrolon TM 2608, available from Bayer Corporation) were made in NMP and 1 ,3-dioxolane respectively. Sealed vials of the solutions were stored at 50°C. and were sampled for viscosity vs. time. Whereas the solution made with NMP changed in viscosity from about 60 cst (mm 2 /sec) to ⁇ 40 cst in about a week, the sample prepared in 1 ,3-dioxolane remained unchanged.
• NMP n-methyl pyrolidinone
• Example 5 Polycarbonate composition (solutions of Makrolon TM 2608 in 1 ,3-dioxolane or NMP) from Example 4 above was coated onto glass substrates and were imaged with high energy ionic radiation (e.g., as disclosed in the following references: 1 ) "Etched heavy ion tracks in polycarbonate as template for copper nanowires", Toimil Molares, M.E.; Brotz, J.; Buschmann, V.; Dobrev, D.; Neumann, R.; Scholz, R.; Schuchert, I.U.; Trautmann, C; Vetter, J. Gellschaft fur Schwerionenforschung-GSI, Darmstadt, Germany.
• Imaged areas contained products of polymer chain scission and could be developed while non-image areas remained intact.
• the compositions in 1,3- dioxolane could be coated to the desired thickness even when stored under ambient conditions for more than six months while the coating thickness possible under the same coating conditions with the compositions in NMP continued to get thinner due to premature scission of the polymer in solution. After less than one week the NMP solutions of the composition could not be used. Imaging performance of the NMP solutions deteriorated at the same time since contrast between image and non-image areas deteriorated as well.
• Example 6 Two positive acting resists were prepared.
• a control Sample A contained the standard solvents whereas Sample B contained a portion of a cyclic acetal solvent, shown in Table 4 below.
• Both resists could be readily coated to 65 ⁇ m.
• both could be readily developed in dilute tetramethyl ammonium hydroxide developer (0.26N; available as AZ TM MIF 300, from AZ Electronic Materials, Clariant Corporation)

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