JP2005518478A5 - - Google Patents

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Publication number
JP2005518478A5
JP2005518478A5 JP2003568120A JP2003568120A JP2005518478A5 JP 2005518478 A5 JP2005518478 A5 JP 2005518478A5 JP 2003568120 A JP2003568120 A JP 2003568120A JP 2003568120 A JP2003568120 A JP 2003568120A JP 2005518478 A5 JP2005518478 A5 JP 2005518478A5
Authority
JP
Japan
Prior art keywords
patterned
aperture mask
deposition
organic semiconductor
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003568120A
Other languages
English (en)
Japanese (ja)
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JP2005518478A (ja
Filing date
Publication date
Priority claimed from US10/076,003 external-priority patent/US20030151118A1/en
Application filed filed Critical
Publication of JP2005518478A publication Critical patent/JP2005518478A/ja
Publication of JP2005518478A5 publication Critical patent/JP2005518478A5/ja
Pending legal-status Critical Current

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JP2003568120A 2002-02-14 2003-01-21 回路製作用アパーチャマスク Pending JP2005518478A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/076,003 US20030151118A1 (en) 2002-02-14 2002-02-14 Aperture masks for circuit fabrication
PCT/US2003/001751 WO2003069014A1 (en) 2002-02-14 2003-01-21 Aperture masks for circuit fabrication

Publications (2)

Publication Number Publication Date
JP2005518478A JP2005518478A (ja) 2005-06-23
JP2005518478A5 true JP2005518478A5 (enExample) 2006-03-09

Family

ID=27660170

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003568120A Pending JP2005518478A (ja) 2002-02-14 2003-01-21 回路製作用アパーチャマスク

Country Status (9)

Country Link
US (2) US20030151118A1 (enExample)
EP (2) EP2060654A1 (enExample)
JP (1) JP2005518478A (enExample)
KR (1) KR20040091037A (enExample)
CN (1) CN1633515B (enExample)
AT (1) ATE431440T1 (enExample)
AU (1) AU2003209312A1 (enExample)
DE (1) DE60327597D1 (enExample)
WO (1) WO2003069014A1 (enExample)

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CN108026291B (zh) 2015-09-28 2021-04-13 3M创新有限公司 包含可裂解交联剂的图案化膜制品和方法
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