JP2005517026A5 - - Google Patents

Download PDF

Info

Publication number
JP2005517026A5
JP2005517026A5 JP2003566624A JP2003566624A JP2005517026A5 JP 2005517026 A5 JP2005517026 A5 JP 2005517026A5 JP 2003566624 A JP2003566624 A JP 2003566624A JP 2003566624 A JP2003566624 A JP 2003566624A JP 2005517026 A5 JP2005517026 A5 JP 2005517026A5
Authority
JP
Japan
Prior art keywords
twenty
alkyl
cycloalkyl
haloalkyl
oso
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003566624A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005517026A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2003/000821 external-priority patent/WO2003067332A2/en
Publication of JP2005517026A publication Critical patent/JP2005517026A/ja
Publication of JP2005517026A5 publication Critical patent/JP2005517026A5/ja
Pending legal-status Critical Current

Links

JP2003566624A 2002-02-06 2003-01-28 スルホナート誘導体及び潜酸としてのその使用 Pending JP2005517026A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02405082 2002-02-06
PCT/EP2003/000821 WO2003067332A2 (en) 2002-02-06 2003-01-28 Sulfonate derivatives and the use therof as latent acids

Publications (2)

Publication Number Publication Date
JP2005517026A JP2005517026A (ja) 2005-06-09
JP2005517026A5 true JP2005517026A5 (enExample) 2006-03-16

Family

ID=27675790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003566624A Pending JP2005517026A (ja) 2002-02-06 2003-01-28 スルホナート誘導体及び潜酸としてのその使用

Country Status (11)

Country Link
US (2) US7326511B2 (enExample)
EP (1) EP1472576B1 (enExample)
JP (1) JP2005517026A (enExample)
KR (1) KR20040089607A (enExample)
CN (1) CN100475798C (enExample)
AU (1) AU2003206787A1 (enExample)
BR (1) BR0307501A (enExample)
CA (1) CA2474532A1 (enExample)
MX (1) MXPA04006581A (enExample)
TW (1) TWI288859B (enExample)
WO (1) WO2003067332A2 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004036264A2 (en) * 2002-10-16 2004-04-29 Georgia Tech Research Corporation Polymers, methods of use thereof, and methods of decomposition thereof
US7399577B2 (en) * 2003-02-19 2008-07-15 Ciba Specialty Chemicals Corporation Halogenated oxime derivatives and the use thereof
CA2574054A1 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
JP4924813B2 (ja) * 2004-10-29 2012-04-25 日産化学工業株式会社 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
US7183036B2 (en) * 2004-11-12 2007-02-27 International Business Machines Corporation Low activation energy positive resist
JP4484681B2 (ja) * 2004-12-03 2010-06-16 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
JP4780586B2 (ja) * 2006-05-08 2011-09-28 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
TW200804243A (en) * 2006-06-20 2008-01-16 Ciba Sc Holding Ag Oxime sulfonates and the use thereof as latent acids
RU2453886C2 (ru) * 2006-08-24 2012-06-20 Циба Холдинг Инк. Индикаторы дозы уф-излучения
JP4866783B2 (ja) * 2007-04-27 2012-02-01 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
JP5649567B2 (ja) * 2008-05-23 2015-01-07 クオルネルル ユニバーシティー 電子及び電気デバイスに使用される有機材料の直交方法
TW201016651A (en) * 2008-07-28 2010-05-01 Sumitomo Chemical Co Oxime compound and resist composition containing the same
CN102318040B (zh) * 2009-03-06 2014-09-17 E.I.内穆尔杜邦公司 形成电活性层的方法
JP2012522084A (ja) 2009-03-30 2012-09-20 ビーエーエスエフ ソシエタス・ヨーロピア Ｕｖ線量インジケータフィルム
EP2539316B1 (en) * 2010-02-24 2019-10-23 Basf Se Latent acids and their use
WO2012029758A1 (ja) * 2010-08-30 2012-03-08 富士フイルム株式会社 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5840146B2 (ja) * 2011-01-17 2016-01-06 株式会社クラレ ビニルスルホン酸エステル誘導体、高分子化合物およびフォトレジスト組成物
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
WO2014025370A1 (en) 2012-08-10 2014-02-13 Hallstar Innovations Corp. Tricyclic energy quencher compounds for reducing singlet oxygen generation
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
JP2015147925A (ja) * 2014-01-10 2015-08-20 住友化学株式会社 樹脂及びレジスト組成物
JP6904662B2 (ja) * 2016-01-29 2021-07-21 株式会社アドテックエンジニアリング 露光装置
US9950999B2 (en) 2016-08-12 2018-04-24 International Business Machines Corporation Non-ionic low diffusing photo-acid generators
JP6594570B2 (ja) 2017-03-20 2019-10-23 フォーマ セラピューティクス，インコーポレイテッド ピルビン酸キナーゼ（ｐｋｒ）活性化剤としてのピロロピロール組成物
WO2020061255A1 (en) 2018-09-19 2020-03-26 Forma Therapeutics, Inc. Activating pyruvate kinase r
WO2020061378A1 (en) 2018-09-19 2020-03-26 Forma Therapeutics, Inc. Treating sickle cell disease with a pyruvate kinase r activating compound
AU2020350763A1 (en) 2019-09-19 2022-04-07 Novo Nordisk Health Care Ag Pyruvate kinase R (PKR) activating compositions
IT201900022233A1 (it) * 2019-11-27 2021-05-27 Epta Inks S P A Inchiostro fotosensibile e embossabile
JP7041201B2 (ja) * 2020-06-30 2022-03-23 株式会社アドテックエンジニアリング 露光方法
US12128035B2 (en) 2021-03-19 2024-10-29 Novo Nordisk Health Care Ag Activating pyruvate kinase R
CN117042327B (zh) * 2022-12-27 2024-01-30 珠海浩奕电子科技有限公司 一种高强度低介电常数印刷电路板及其制备工艺

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4346094A (en) 1980-09-22 1982-08-24 Eli Lilly And Company 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
EP0199672B1 (de) 1985-04-12 1988-06-01 Ciba-Geigy Ag Oximsulfonate mit reaktiven Gruppen
JPS6336240A (ja) 1986-07-28 1988-02-16 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン レジスト構造の作成方法
JPH0225850A (ja) 1988-07-15 1990-01-29 Hitachi Ltd 放射線感応性組成物およびそれを用いたパターン形成法
EP0361906A3 (en) 1988-09-29 1991-05-02 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
JPH03100657A (ja) 1989-09-14 1991-04-25 Fuji Photo Film Co Ltd 電子写真感光体
JPH03223860A (ja) 1990-01-30 1991-10-02 Wako Pure Chem Ind Ltd 新規レジスト材料
JP3008594B2 (ja) 1990-08-31 2000-02-14 和光純薬工業株式会社 新規なレジスト材料及びパタ−ン形成方法
JPH04199152A (ja) 1990-11-29 1992-07-20 Toshiba Corp 感光性組成物
JPH04295458A (ja) 1991-03-22 1992-10-20 Fuji Photo Film Co Ltd 光照射により酸を発生する化合物
JPH04328552A (ja) 1991-04-26 1992-11-17 Konica Corp 感光性組成物
DE4390097T1 (de) 1992-01-10 1994-12-01 Fuji Photo Film Co Ltd Vorstufe für eine elektrophotographische Flachdruckplatte
US5714289A (en) 1992-02-12 1998-02-03 Fuji Photo Film Co., Ltd. Method of preparation of electrophotographic printing plate
EP0571330B1 (de) 1992-05-22 1999-04-07 Ciba SC Holding AG Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
DE4236068A1 (de) 1992-10-26 1994-04-28 Hoechst Ag Positiv arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
US6159665A (en) 1993-06-17 2000-12-12 Lucent Technologies Inc. Processes using photosensitive materials including a nitro benzyl ester photoacid generator
DE59409351D1 (de) 1993-10-13 2000-06-21 Ciba Sc Holding Ag Pyrrolo[3,4-c]pyrrole
EP0648817B1 (de) 1993-10-13 1999-11-10 Ciba SC Holding AG Neue Fluoreszenzfarbstoffe
EP0654711B1 (en) 1993-11-22 1999-06-02 Ciba SC Holding AG Compositions for making structured color images and application thereof
EP0717319B1 (en) 1994-12-06 2001-04-11 Ocg Microelectronic Materials, Inc. Photoacid generating composition used in radiation-sensitive compositions
EP0742255B1 (en) 1995-05-12 2004-04-14 Ciba SC Holding AG Colouration of high molecular weight organic materials in the mass with soluble phthalocyanine precursors
JP3456808B2 (ja) 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
JP3830183B2 (ja) 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) * 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
US20010037037A1 (en) 1995-10-31 2001-11-01 Kurt Dietliker Oximesulfonic acid esters and the use thereof as latent sulfonic acids
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
BR9713311A (pt) * 1996-09-02 2000-02-01 Ciba Sc Holding Ag Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade
DE69821049T2 (de) 1997-05-09 2004-10-21 Fuji Photo Film Co Ltd Positiv arbeitende lichtempfindliche Zusammensetzung
EP0878738B1 (en) 1997-05-12 2002-01-09 Fuji Photo Film Co., Ltd. Positive resist composition
TW550439B (en) 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
TW575792B (en) 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
TWI272451B (en) 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4210439B2 (ja) * 2001-04-05 2009-01-21 富士フイルム株式会社 ポジ型フォトレジスト組成物
EP1392675B1 (en) * 2001-06-01 2005-02-09 Ciba SC Holding AG Substituted oxime derivatives and the use thereof as latent acids
JP2003182218A (ja) * 2001-12-13 2003-07-03 Fuji Photo Film Co Ltd 感熱記録材料

Similar Documents

Publication Publication Date Title
JP2005517026A5 (enExample)
JP2004526984A5 (enExample)
JP2000314956A5 (enExample)
JP2006517950A5 (enExample)
JP6138179B2 (ja) 光酸発生剤およびこれを含むフォトレジスト
CN102026967B (zh) 锍盐引发剂
JP5570424B2 (ja) スルホニウム塩開始剤
TWI393999B (zh) 肟衍生物及其作為潛酸之作用
JP5850863B2 (ja) 潜在性酸及びそれらの使用
JP5473921B2 (ja) スルホニウム塩開始剤
JP2002523398A5 (enExample)
KR101043905B1 (ko) 할로겐화 옥심 유도체 및 잠산으로서의 이의 용도
DK200000533A (da) Oximderivater og anvendelsen deraf som latente syrer
JP2004004760A (ja) 高感度の高解像度ｉ−線ホトレジスト
JP5809798B2 (ja) コラート光酸発生剤およびこれを含むフォトレジスト
KR20010062785A (ko) 설포늄염화합물 및 레지스트조성물과, 그것을 이용한패턴형성방법
US20130035503A1 (en) Sulfonium compound, photoacid generator, and resist composition
US7288363B2 (en) Chemically amplified positive resist composition and patterning process
CN101466804A (zh) 硫盐引发剂
JP2008506749A5 (enExample)
JP2005504013A5 (enExample)
JP2011523971A5 (enExample)
JPH11231516A5 (enExample)
KR20030052957A (ko) 사이클릭 설포늄 및 설폭소늄 포토애시드 발생제, 및 이를포함하는 포토레지스트
JP4677353B2 (ja) レジスト組成物、該レジスト組成物に用いる化合物及び該レジスト組成物を用いたパターン形成方法