BR9713311A - Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade - Google Patents

Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade

Info

Publication number
BR9713311A
BR9713311A BR9713311-6A BR9713311A BR9713311A BR 9713311 A BR9713311 A BR 9713311A BR 9713311 A BR9713311 A BR 9713311A BR 9713311 A BR9713311 A BR 9713311A
Authority
BR
Brazil
Prior art keywords
c4alkyl
group
photorresists
alquisulfonyloximaxes
line
Prior art date
Application number
BR9713311-6A
Other languages
English (en)
Inventor
Kurt Dietliker
Martin Kunz
Histoshi Yamato
Christoph De Leo
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of BR9713311A publication Critical patent/BR9713311A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Steroid Compounds (AREA)

Abstract

Patente de Invenção:<B>"ALQUILSULFONILOXIMAS PARA FOTORRESISTS I-LINHA DE ALTA RESOLUçãO DE ALTA SENSIBILIDADE"<D>. A invenção descreve o uso de compostos de alquil sulfonato de oxima de fórmula 1, onde R é naftila, R~ 0~ é um grupo R~ 1~-X ou R~ 2~; X é uma ligação direta, um átomo de oxigênio ou um átomo de enxofre; R~ 1~ é hidrogênio, C~ 1~-C~ 4~ alquila ou um grupo fenila que é não-substituída ou substituída com um substituinte selecionado do grupo que consiste de cloro, bromo, C~ 1~-C~ 4~ alquila e C~ 1~-C~ 4~ alquilóxi; R~ 2~ é hidrogênio ou C~ 1~-C~ 4~ alquila; e R~ 3~ é C~ 1~-C~ 12~ alquila de cadeia reta ou ramificada, que é não-substituída ou substituída com um ou mais átomos de halogênio; como gerador de ácido fotossensível em um fotorresist quimicamente amplificado que é revelável em meio alcalino e que é sensível à radiação em um comprimento de onda de 340 a 390 nanómetros e por conseguinte composto de fotorresist positivos e negativos para a faixa de comprimento de onda mencionada acima.
BR9713311-6A 1996-09-02 1997-08-22 Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade BR9713311A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH214796 1996-09-02
PCT/EP1997/004566 WO1998010335A1 (en) 1996-09-02 1997-08-22 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity

Publications (1)

Publication Number Publication Date
BR9713311A true BR9713311A (pt) 2000-02-01

Family

ID=4226975

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9713311-6A BR9713311A (pt) 1996-09-02 1997-08-22 Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade

Country Status (14)

Country Link
EP (1) EP0925529B1 (pt)
JP (1) JP3875271B2 (pt)
KR (1) KR100686473B1 (pt)
CN (1) CN1133901C (pt)
AT (1) ATE237830T1 (pt)
AU (1) AU726458B2 (pt)
BR (1) BR9713311A (pt)
CA (1) CA2263254A1 (pt)
DE (1) DE69721019T2 (pt)
ES (1) ES2194218T3 (pt)
ID (1) ID17338A (pt)
MY (1) MY118505A (pt)
TW (1) TW497011B (pt)
WO (1) WO1998010335A1 (pt)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DK199901098A (da) * 1998-08-18 2000-02-19 Ciba Sc Holding Ag Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse
TW575792B (en) * 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
WO2000014602A1 (en) * 1998-09-04 2000-03-16 Polaroid Corporation Process for forming a color filter
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Sc Holding Ag Oximderivate und ihre verwendung als latente saüre
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6576394B1 (en) 2000-06-16 2003-06-10 Clariant Finance (Bvi) Limited Negative-acting chemically amplified photoresist composition
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TW589514B (en) * 2001-09-13 2004-06-01 Matsushita Electric Ind Co Ltd Pattern formation material and pattern formation method
CN100475798C (zh) * 2002-02-06 2009-04-08 西巴特殊化学品控股有限公司 磺酸衍生物及其作为潜酸的用途
WO2006046398A1 (ja) * 2004-10-29 2006-05-04 Nissan Chemical Industries, Ltd. 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
CN101506734B (zh) * 2006-08-24 2012-04-11 西巴控股有限公司 Uv量指示剂
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN101638374A (zh) * 2008-07-28 2010-02-03 住友化学株式会社 肟类化合物及包含该化合物的抗蚀剂组合物
US20120043480A1 (en) 2009-03-30 2012-02-23 Basf Se Uv-dose indicator films
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
US20200209749A1 (en) * 2018-12-27 2020-07-02 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123255A (en) * 1977-01-03 1978-10-31 Chevron Research Company O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
DE59309494D1 (de) * 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤

Also Published As

Publication number Publication date
EP0925529A1 (en) 1999-06-30
AU4455297A (en) 1998-03-26
CA2263254A1 (en) 1998-03-12
JP3875271B2 (ja) 2007-01-31
KR20000068387A (ko) 2000-11-25
ID17338A (id) 1997-12-18
MY118505A (en) 2004-11-30
ES2194218T3 (es) 2003-11-16
EP0925529B1 (en) 2003-04-16
ATE237830T1 (de) 2003-05-15
DE69721019T2 (de) 2003-12-24
AU726458B2 (en) 2000-11-09
KR100686473B1 (ko) 2007-02-26
WO1998010335A1 (en) 1998-03-12
DE69721019D1 (de) 2003-05-22
CN1228851A (zh) 1999-09-15
CN1133901C (zh) 2004-01-07
JP2000517067A (ja) 2000-12-19
TW497011B (en) 2002-08-01

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]