ID17338A - Alkilsulfoniloksim untuk fotoresis garis-i beresolusi dan sensitivitas tinggi - Google Patents

Alkilsulfoniloksim untuk fotoresis garis-i beresolusi dan sensitivitas tinggi

Info

Publication number
ID17338A
ID17338A IDP973037A ID973037A ID17338A ID 17338 A ID17338 A ID 17338A ID P973037 A IDP973037 A ID P973037A ID 973037 A ID973037 A ID 973037A ID 17338 A ID17338 A ID 17338A
Authority
ID
Indonesia
Prior art keywords
c4alkyl
group
unsubstituted
substituted
hydrogen
Prior art date
Application number
IDP973037A
Other languages
English (en)
Inventor
Kurt Dr Dietliker
Martin Dr Kunz
Hitoshi Dr Yamato
Christoph De Leo
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of ID17338A publication Critical patent/ID17338A/id

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Steroid Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IDP973037A 1996-09-02 1997-08-29 Alkilsulfoniloksim untuk fotoresis garis-i beresolusi dan sensitivitas tinggi ID17338A (id)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH214796 1996-09-02

Publications (1)

Publication Number Publication Date
ID17338A true ID17338A (id) 1997-12-18

Family

ID=4226975

Family Applications (1)

Application Number Title Priority Date Filing Date
IDP973037A ID17338A (id) 1996-09-02 1997-08-29 Alkilsulfoniloksim untuk fotoresis garis-i beresolusi dan sensitivitas tinggi

Country Status (14)

Country Link
EP (1) EP0925529B1 (id)
JP (1) JP3875271B2 (id)
KR (1) KR100686473B1 (id)
CN (1) CN1133901C (id)
AT (1) ATE237830T1 (id)
AU (1) AU726458B2 (id)
BR (1) BR9713311A (id)
CA (1) CA2263254A1 (id)
DE (1) DE69721019T2 (id)
ES (1) ES2194218T3 (id)
ID (1) ID17338A (id)
MY (1) MY118505A (id)
TW (1) TW497011B (id)
WO (1) WO1998010335A1 (id)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DK199901098A (da) * 1998-08-18 2000-02-19 Ciba Sc Holding Ag Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse
TW575792B (en) * 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
WO2000014602A1 (en) * 1998-09-04 2000-03-16 Polaroid Corporation Process for forming a color filter
WO2000026219A1 (en) * 1998-10-29 2000-05-11 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use thereof as latent acids
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6576394B1 (en) 2000-06-16 2003-06-10 Clariant Finance (Bvi) Limited Negative-acting chemically amplified photoresist composition
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TW589514B (en) * 2001-09-13 2004-06-01 Matsushita Electric Ind Co Ltd Pattern formation material and pattern formation method
JP2005517026A (ja) * 2002-02-06 2005-06-09 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド スルホナート誘導体及び潜酸としてのその使用
WO2006046398A1 (ja) * 2004-10-29 2006-05-04 Nissan Chemical Industries, Ltd. 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
CN101506734B (zh) * 2006-08-24 2012-04-11 西巴控股有限公司 Uv量指示剂
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN101638374A (zh) * 2008-07-28 2010-02-03 住友化学株式会社 肟类化合物及包含该化合物的抗蚀剂组合物
US20120043480A1 (en) 2009-03-30 2012-02-23 Basf Se Uv-dose indicator films
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
US20200209749A1 (en) * 2018-12-27 2020-07-02 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123255A (en) * 1977-01-03 1978-10-31 Chevron Research Company O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
KR900005226A (ko) * 1988-09-29 1990-04-13 윌리엄 비이 해리스 감광성 조성물 및 양화 상과 음화 상의 생성방법
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
DE59309494D1 (de) * 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤

Also Published As

Publication number Publication date
EP0925529B1 (en) 2003-04-16
CN1133901C (zh) 2004-01-07
AU4455297A (en) 1998-03-26
CA2263254A1 (en) 1998-03-12
EP0925529A1 (en) 1999-06-30
WO1998010335A1 (en) 1998-03-12
KR20000068387A (ko) 2000-11-25
CN1228851A (zh) 1999-09-15
DE69721019T2 (de) 2003-12-24
AU726458B2 (en) 2000-11-09
JP3875271B2 (ja) 2007-01-31
TW497011B (en) 2002-08-01
ATE237830T1 (de) 2003-05-15
DE69721019D1 (de) 2003-05-22
MY118505A (en) 2004-11-30
BR9713311A (pt) 2000-02-01
JP2000517067A (ja) 2000-12-19
KR100686473B1 (ko) 2007-02-26
ES2194218T3 (es) 2003-11-16

Similar Documents

Publication Publication Date Title
ID17338A (id) Alkilsulfoniloksim untuk fotoresis garis-i beresolusi dan sensitivitas tinggi
KR100258834B1 (en) High resolution i-line photoresist
US4857438A (en) Photochromic system and layers produced therewith
NL1004387A1 (nl) Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren.
SE9902913D0 (sv) Ljusaktiverbar komposition
ATE44383T1 (de) Bisacylphosphinoxide, ihre herstellung und verwendung.
ATE458211T1 (de) Oximderivate und ihre verwendung als latente saüre
ATE6422T1 (de) 3-aryloxy-3-phenylpropylamine.
ATE167741T1 (de) Sensibilisatoren für photothermographische elemente
FI822124A0 (fi) Tryckkaensligt eller vaermekaensligt uppteckningsmaterial
FI943508A0 (fi) Pyridiinikarboksimidamidiyhdisteet ja niiden käyttö
TR200400857T4 (tr) Yeni galantamın türevleri ve analogları
SE7906638L (sv) Peptidderivat
ATE137231T1 (de) Säurelabile lösungsinhibitoren und darauf basierende positiv und negativ arbeitende strahlungsempfindliche zusammensetzung
ATE15896T1 (de) Pyridazinon-derivate, verfahren zu ihrer herstellung und ihre verwendung als fungizide.
FI812804L (fi) 2-(1,4-bensodioxan-2-ylalkyl)-imidazoler anvaendbara som antidepressiva laekemedel
EA199900798A1 (ru) Соединения
JPS5731655A (en) Benzenesulfonamide derivative and plant blight controlling agent containing said compound as active compound
ES2106038T3 (es) Granulados estables de acidos peroxicarboxilicos.
JPS5293770A (en) Benzotriazoles
DE69533573D1 (de) Anxiolytischer wirkstoff
TH34656A (th) อัคคิลซัลโฟนิลออกไซม์สำหรับสารต้านทางแสงไอ-ไลน์แยกตัวดีและมีความไวสูง
ATE256106T1 (de) Positiv arbeitende lichtempfindliche zusammensetzung
ES2077359T3 (es) Mono(indoliletilenil)ftalidas.
DK232883D0 (da) Fremgangsmade til fremstilling af optisk aktive imidazolylpropanolforbindelser