JP2002523398A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002523398A5 JP2002523398A5 JP2000566246A JP2000566246A JP2002523398A5 JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5 JP 2000566246 A JP2000566246 A JP 2000566246A JP 2000566246 A JP2000566246 A JP 2000566246A JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5
- Authority
- JP
- Japan
- Prior art keywords
- phenyl
- alkyl
- substituted
- unsubstituted
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 anthracyl Chemical group 0.000 description 38
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 19
- 125000000217 alkyl group Chemical group 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 14
- 229910052736 halogen Inorganic materials 0.000 description 9
- 150000002367 halogens Chemical class 0.000 description 9
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 7
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 6
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 6
- 125000005561 phenanthryl group Chemical group 0.000 description 5
- 125000001589 carboacyl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004957 naphthylene group Chemical group 0.000 description 3
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 2
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 125000004769 (C1-C4) alkylsulfonyl group Chemical group 0.000 description 1
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000006331 halo benzoyl group Chemical group 0.000 description 1
- 125000004441 haloalkylsulfonyl group Chemical group 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98810810 | 1998-08-19 | ||
| EP98810810.6 | 1998-08-19 | ||
| PCT/EP1999/005698 WO2000010972A1 (en) | 1998-08-19 | 1999-08-06 | New unsaturated oxime derivatives and the use thereof as latent acids |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002523398A JP2002523398A (ja) | 2002-07-30 |
| JP2002523398A5 true JP2002523398A5 (enExample) | 2006-09-14 |
| JP4489954B2 JP4489954B2 (ja) | 2010-06-23 |
Family
ID=8236266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000566246A Expired - Fee Related JP4489954B2 (ja) | 1998-08-19 | 1999-08-06 | 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6703182B1 (enExample) |
| EP (1) | EP1105373B1 (enExample) |
| JP (1) | JP4489954B2 (enExample) |
| KR (1) | KR100640092B1 (enExample) |
| CN (1) | CN100340547C (enExample) |
| AU (1) | AU5373999A (enExample) |
| DE (1) | DE69903453T2 (enExample) |
| MY (1) | MY117695A (enExample) |
| TW (1) | TW575792B (enExample) |
| WO (1) | WO2000010972A1 (enExample) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1163553B1 (en) | 1999-03-03 | 2006-06-14 | Ciba SC Holding AG | Oxime derivatives and the use thereof as photoinitiators |
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
| JP4685265B2 (ja) * | 2001-05-10 | 2011-05-18 | コダック株式会社 | 感光性組成物、感光性平版印刷版および平版印刷版の作成方法 |
| JP4951827B2 (ja) * | 2001-08-17 | 2012-06-13 | Ｊｓｒ株式会社 | スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物 |
| BR0307501A (pt) | 2002-02-06 | 2004-12-07 | Ciba Sc Holding Ag | Derivados de sulfonato e o uso destes como ácidos latentes |
| CN100361815C (zh) * | 2002-04-24 | 2008-01-16 | 东芝泰格有限公司 | 喷墨记录设备 |
| AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
| JP4560507B2 (ja) * | 2003-02-19 | 2010-10-13 | チバ ホールディング インコーポレーテッド | ハロゲン化オキシム誘導体及び潜在的酸としてのそれらの使用 |
| US8026296B2 (en) * | 2005-12-20 | 2011-09-27 | 3M Innovative Properties Company | Dental compositions including a thermally labile component, and the use thereof |
| JP4996870B2 (ja) * | 2006-03-28 | 2012-08-08 | 富士フイルム株式会社 | 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| EP2037323B1 (en) * | 2007-07-17 | 2014-12-10 | FUJIFILM Corporation | Photosensitive compositions |
| JP5507054B2 (ja) * | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
| DE102008038943A1 (de) | 2008-08-11 | 2010-02-18 | Borealis Agrolinz Melamine Gmbh | Vernetzbare Acrylatharze |
| EP2414894B1 (en) | 2009-03-30 | 2014-02-12 | Basf Se | Uv-dose indicator films |
| EP2510400B1 (en) | 2009-12-07 | 2015-04-29 | AGFA Graphics NV | Uv-led curable compositions and inks |
| EP2509948B1 (en) * | 2009-12-07 | 2017-05-03 | Agfa Graphics N.V. | Photoinitiators for uv-led curable compositions and inks |
| CN102781911B (zh) * | 2010-02-24 | 2015-07-22 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| WO2015181332A1 (en) | 2014-05-30 | 2015-12-03 | Igm Resins Italia S.R.L. | Multifunctional acylphosphine oxide photoinitiators |
| TWI742165B (zh) * | 2017-09-27 | 2021-10-11 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置 |
| CN112673012B (zh) | 2018-09-07 | 2024-05-24 | 意大利艾坚蒙树脂有限公司 | 多官能双酰基氧化膦光引发剂 |
| EP3902878A1 (en) | 2018-12-28 | 2021-11-03 | IGM Resins Italia S.r.l. | Photoinitiators |
| CN114829348B (zh) | 2019-10-11 | 2024-08-23 | 意大利艾坚蒙树脂有限公司 | 用于led光固化的香豆素乙醛酸酯 |
| IT202000023815A1 (it) | 2020-10-09 | 2022-04-09 | Igm Resins Italia Srl | Ketoquinolones as photonitiators |
| IT202100014885A1 (it) | 2021-06-08 | 2022-12-08 | Igm Resins Italia Srl | Fotoiniziatori a base di silicio bifunzionali |
| IT202100025868A1 (it) | 2021-10-08 | 2023-04-08 | Igm Resins Italia Srl | Nuovi fotoiniziatori |
| EP4482881A1 (en) | 2022-02-24 | 2025-01-01 | IGM Resins Italia S.r.l. | Photoinitiators |
| KR20250006945A (ko) | 2022-05-06 | 2025-01-13 | 아이지엠 그룹 비.브이. | 포스핀 산화물 광개시제, 옥사졸계 감응제 및 아민 첨가제를 포함하는 광개시제 패키지 |
| EP4519376A1 (en) | 2022-05-06 | 2025-03-12 | IGM Group B.V. | Photoinitiator package comprising phosphine oxide photoinitiators, coumarin-based sensitizers and amine additives |
| EP4273200A1 (en) | 2022-05-06 | 2023-11-08 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers |
| KR20250088509A (ko) | 2022-10-05 | 2025-06-17 | 아이지엠 레진스 이탈리아 에스.알.엘. | 폴리머 (메트)아크릴레이트 광개시제 |
| IT202300004737A1 (it) | 2023-03-14 | 2024-09-14 | Igm Resins Italia Srl | Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led |
| WO2025027517A1 (en) | 2023-08-03 | 2025-02-06 | Igm Resins Italia S.R.L. | 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions |
| EP4534614A1 (en) | 2023-10-02 | 2025-04-09 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers |
| WO2025140854A2 (en) | 2023-12-28 | 2025-07-03 | Igm Resins Italia S.R.L. | NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE |
| EP4579344A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Thioalkylcoumarin photosensitizers for photopolymerization |
| EP4578918A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Photosensitizers for photopolymerization |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4123255A (en) * | 1977-01-03 | 1978-10-31 | Chevron Research Company | O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes |
| US4347372A (en) * | 1978-09-01 | 1982-08-31 | Ciba-Geigy Corporation | Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives |
| US4346094A (en) * | 1980-09-22 | 1982-08-24 | Eli Lilly And Company | 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels |
| US4510294A (en) * | 1982-07-02 | 1985-04-09 | Polaroid Corporation | Polymerization of monomeric hydrogen-blocked oxime derivatives |
| US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| GB8608528D0 (en) * | 1986-04-08 | 1986-05-14 | Ciba Geigy Ag | Production of positive images |
| KR900005226A (ko) * | 1988-09-29 | 1990-04-13 | 윌리엄 비이 해리스 | 감광성 조성물 및 양화 상과 음화 상의 생성방법 |
| US5019488A (en) * | 1988-09-29 | 1991-05-28 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
| DE59309494D1 (de) | 1992-05-22 | 1999-05-12 | Ciba Geigy Ag | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| CA2263254A1 (en) * | 1996-09-02 | 1998-03-12 | Ciba Specialty Chemicals Holding Inc. | Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
-
1999
- 1999-07-12 TW TW88111895A patent/TW575792B/zh not_active IP Right Cessation
- 1999-07-21 MY MYPI99003079A patent/MY117695A/en unknown
- 1999-08-06 AU AU53739/99A patent/AU5373999A/en not_active Abandoned
- 1999-08-06 WO PCT/EP1999/005698 patent/WO2000010972A1/en not_active Ceased
- 1999-08-06 DE DE69903453T patent/DE69903453T2/de not_active Expired - Lifetime
- 1999-08-06 US US09/763,016 patent/US6703182B1/en not_active Expired - Lifetime
- 1999-08-06 CN CNB998098116A patent/CN100340547C/zh not_active Expired - Fee Related
- 1999-08-06 KR KR1020017002132A patent/KR100640092B1/ko not_active Expired - Fee Related
- 1999-08-06 JP JP2000566246A patent/JP4489954B2/ja not_active Expired - Fee Related
- 1999-08-06 EP EP99939454A patent/EP1105373B1/en not_active Expired - Lifetime
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002523398A5 (enExample) | ||
| JP2002528550A5 (enExample) | ||
| JP2000169511A5 (enExample) | ||
| KR970022553A (ko) | 옥심술폰산 에스테르 및 잠재적 술폰산으로서 이들의 용도 | |
| JP2000314956A5 (enExample) | ||
| US4966828A (en) | Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds | |
| CA2428255A1 (en) | Onium salts and the use therof as latent acids | |
| CN101390016B (zh) | 光致聚合的组合物 | |
| JP2004526984A5 (enExample) | ||
| JP3271052B2 (ja) | α−アミノアセトフェノン誘導体 | |
| US5141841A (en) | Radiation sensitive compound | |
| JP2005517026A5 (enExample) | ||
| JP2006517950A5 (enExample) | ||
| KR970065546A (ko) | 알킬페닐비스아실포스핀 옥사이드 및 광개시제 혼합물 | |
| JPH10319595A5 (enExample) | ||
| JPS623843B2 (enExample) | ||
| US4876175A (en) | Dye sensitized photographic imaging systems | |
| JP2007506125A5 (enExample) | ||
| EP0401166B1 (de) | Neue, stickstoffhaltige Titanocene und deren Verwendung | |
| JPS63298339A (ja) | 感光性組成物 | |
| JP2011523971A5 (enExample) | ||
| JP2005504013A5 (enExample) | ||
| KR100798282B1 (ko) | 화학 증폭형 포지티브 내식막 조성물 | |
| DE4435487A1 (de) | Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische | |
| JP2575178B2 (ja) | 光重合可能の記録材料ならびにこの記録材料を主体とするフォトレジスト層及び平版印刷版体 |