JP2002523398A5 - - Google Patents

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Publication number
JP2002523398A5
JP2002523398A5 JP2000566246A JP2000566246A JP2002523398A5 JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5 JP 2000566246 A JP2000566246 A JP 2000566246A JP 2000566246 A JP2000566246 A JP 2000566246A JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5
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JP
Japan
Prior art keywords
phenyl
alkyl
substituted
unsubstituted
compound
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000566246A
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English (en)
Japanese (ja)
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JP2002523398A (ja
JP4489954B2 (ja
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Application filed filed Critical
Priority claimed from PCT/EP1999/005698 external-priority patent/WO2000010972A1/en
Publication of JP2002523398A publication Critical patent/JP2002523398A/ja
Publication of JP2002523398A5 publication Critical patent/JP2002523398A5/ja
Application granted granted Critical
Publication of JP4489954B2 publication Critical patent/JP4489954B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000566246A 1998-08-19 1999-08-06 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途 Expired - Fee Related JP4489954B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98810810.6 1998-08-19
EP98810810 1998-08-19
PCT/EP1999/005698 WO2000010972A1 (en) 1998-08-19 1999-08-06 New unsaturated oxime derivatives and the use thereof as latent acids

Publications (3)

Publication Number Publication Date
JP2002523398A JP2002523398A (ja) 2002-07-30
JP2002523398A5 true JP2002523398A5 (enExample) 2006-09-14
JP4489954B2 JP4489954B2 (ja) 2010-06-23

Family

ID=8236266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000566246A Expired - Fee Related JP4489954B2 (ja) 1998-08-19 1999-08-06 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途

Country Status (10)

Country Link
US (1) US6703182B1 (enExample)
EP (1) EP1105373B1 (enExample)
JP (1) JP4489954B2 (enExample)
KR (1) KR100640092B1 (enExample)
CN (1) CN100340547C (enExample)
AU (1) AU5373999A (enExample)
DE (1) DE69903453T2 (enExample)
MY (1) MY117695A (enExample)
TW (1) TW575792B (enExample)
WO (1) WO2000010972A1 (enExample)

Families Citing this family (39)

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US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4685265B2 (ja) * 2001-05-10 2011-05-18 コダック株式会社 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
AU2003206787A1 (en) 2002-02-06 2003-09-02 Ciba Specialty Chemicals Holding Inc. Sulfonate derivatives and the use therof as latent acids
CN100361815C (zh) * 2002-04-24 2008-01-16 东芝泰格有限公司 喷墨记录设备
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
MXPA05008118A (es) * 2003-02-19 2005-09-30 Ciba Sc Holding Ag Derivados de oxima halogenados y el uso de los mismos como acidos latentes.
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
JP4996870B2 (ja) * 2006-03-28 2012-08-08 富士フイルム株式会社 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US8728686B2 (en) * 2007-07-17 2014-05-20 Fujifilm Corporation Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
DE102008038943A1 (de) 2008-08-11 2010-02-18 Borealis Agrolinz Melamine Gmbh Vernetzbare Acrylatharze
JP2012522084A (ja) 2009-03-30 2012-09-20 ビーエーエスエフ ソシエタス・ヨーロピア Ｕｖ線量インジケータフィルム
US8957224B2 (en) 2009-12-07 2015-02-17 Agfa Graphics Nv Photoinitiators for UV-LED curable compositions and inks
CN102640055B (zh) 2009-12-07 2015-02-25 爱克发印艺公司 Uv-led可固化组合物和墨水
WO2011104127A1 (en) * 2010-02-24 2011-09-01 Basf Se Latent acids and their use
JP6599446B2 (ja) 2014-05-30 2019-10-30 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多官能性アシルホスフィンオキシド光重合開始剤
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
EP3902878B1 (en) 2018-12-28 2026-05-06 IGM Resins Italia S.r.l. Photoinitiators
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
EP4482881B1 (en) 2022-02-24 2026-08-12 IGM Resins Italia S.r.l. Photoinitiators
ES3071453T3 (es) 2022-05-06 2026-06-23 Igm Group B V Envase fotoiniciador que comprende fotoiniciadores especializados de óxido de bisacilfosfina y sensibilizadores de abrillantadores ópticos
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
CA3256585A1 (en) 2022-05-06 2023-11-09 Igm Group B. V. PHOTO-INITIATOR SYSTEM COMPRISING PHOSPHINE OXIDE-BASED PHOTO-INITIATORS, OXAZOLE-BASED SENSITIZING AGENTS, AND AMINE-TYPE ADDITIVES
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization

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US4347372A (en) * 1978-09-01 1982-08-31 Ciba-Geigy Corporation Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives
US4346094A (en) * 1980-09-22 1982-08-24 Eli Lilly And Company 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels
US4510294A (en) * 1982-07-02 1985-04-09 Polaroid Corporation Polymerization of monomeric hydrogen-blocked oxime derivatives
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
KR900005226A (ko) * 1988-09-29 1990-04-13 윌리엄 비이 해리스 감광성 조성물 및 양화 상과 음화 상의 생성방법
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
AU726458B2 (en) * 1996-09-02 2000-11-09 Ciba Specialty Chemicals Holding Inc. Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition

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