JP2002528550A5 - - Google Patents
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- Publication number
- JP2002528550A5 JP2002528550A5 JP2000579607A JP2000579607A JP2002528550A5 JP 2002528550 A5 JP2002528550 A5 JP 2002528550A5 JP 2000579607 A JP2000579607 A JP 2000579607A JP 2000579607 A JP2000579607 A JP 2000579607A JP 2002528550 A5 JP2002528550 A5 JP 2002528550A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- phenyl
- substituted
- unsubstituted
- sulfonyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 12
- -1 anthracyl Chemical group 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 229910052736 halogen Inorganic materials 0.000 description 10
- 150000002367 halogens Chemical class 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000005561 phenanthryl group Chemical group 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 125000006331 halo benzoyl group Chemical group 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- WMGVPDQNPUQRND-UHFFFAOYSA-N (2-methylphenyl)acetonitrile Chemical compound CC1=CC=CC=C1CC#N WMGVPDQNPUQRND-UHFFFAOYSA-N 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- JIZRGGUCOQKGQD-UHFFFAOYSA-N 2-nitrothiophene Chemical compound [O-][N+](=O)C1=CC=CS1 JIZRGGUCOQKGQD-UHFFFAOYSA-N 0.000 description 1
- WLHCBQAPPJAULW-UHFFFAOYSA-N 4-methylbenzenethiol Chemical compound CC1=CC=C(S)C=C1 WLHCBQAPPJAULW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000008366 benzophenones Chemical group 0.000 description 1
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98811084.7 | 1998-10-29 | ||
| EP98811084 | 1998-10-29 | ||
| PCT/EP1999/007876 WO2000026219A1 (en) | 1998-10-29 | 1999-10-18 | Oxime derivatives and the use thereof as latent acids |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002528550A JP2002528550A (ja) | 2002-09-03 |
| JP2002528550A5 true JP2002528550A5 (enExample) | 2006-11-30 |
Family
ID=8236416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000579607A Ceased JP2002528550A (ja) | 1998-10-29 | 1999-10-18 | オキシム誘導体及び潜在性酸としてのその使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6485886B1 (enExample) |
| EP (1) | EP1124832B1 (enExample) |
| JP (1) | JP2002528550A (enExample) |
| KR (1) | KR100634037B1 (enExample) |
| CN (2) | CN1205215C (enExample) |
| AU (1) | AU6340899A (enExample) |
| DE (1) | DE69904073T2 (enExample) |
| WO (1) | WO2000026219A1 (enExample) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002528550A (ja) * | 1998-10-29 | 2002-09-03 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | オキシム誘導体及び潜在性酸としてのその使用 |
| NL1014545C2 (nl) * | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
| KR100875612B1 (ko) * | 2001-06-01 | 2008-12-24 | 시바 홀딩 인크 | 치환된 옥심 유도체 및 이를 포함하는 조성물 |
| US7098463B2 (en) * | 2003-03-03 | 2006-08-29 | Heuris Pharma, Llc | Three-dimensional dosimeter for penetrating radiation and method of use |
| WO2004081664A2 (en) * | 2003-03-11 | 2004-09-23 | Arch Specialty Chemicals, Inc. | Novel photosensitive resin compositions |
| US20070020793A1 (en) * | 2004-03-01 | 2007-01-25 | Adamovics John A | Three-dimensional shaped solid dosimeter and method of use |
| EP1789188A2 (en) * | 2004-07-21 | 2007-05-30 | CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
| JP4548617B2 (ja) * | 2006-06-09 | 2010-09-22 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| JP2012522084A (ja) | 2009-03-30 | 2012-09-20 | ビーエーエスエフ ソシエタス・ヨーロピア | Ｕｖ線量インジケータフィルム |
| EP2477997B1 (en) | 2009-09-18 | 2014-08-20 | Henkel Ireland Limited | Phosphonate bonding compositions |
| US9926289B2 (en) | 2012-08-10 | 2018-03-27 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| US9867800B2 (en) | 2012-08-10 | 2018-01-16 | Hallstar Innovations Corp. | Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen |
| US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
| US9765051B2 (en) | 2012-08-10 | 2017-09-19 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| JP6599446B2 (ja) | 2014-05-30 | 2019-10-30 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 多官能性アシルホスフィンオキシド光重合開始剤 |
| JP6942058B2 (ja) | 2015-04-29 | 2021-09-29 | ビーエスエヌ メディカル ゲーエムベーハー | Ｎｏ生成のための多段階プロセス |
| BR112017023170B1 (pt) | 2015-04-29 | 2022-08-16 | Bsn Medical Gmbh | Dispositivo de banho medicinal e seu uso |
| DE102016111590A1 (de) | 2016-06-24 | 2017-12-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse |
| WO2018155547A1 (ja) * | 2017-02-23 | 2018-08-30 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品 |
| DE102017126215A1 (de) | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren |
| WO2020031240A1 (ja) | 2018-08-06 | 2020-02-13 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| EP3847179A1 (en) | 2018-09-07 | 2021-07-14 | IGM Resins Italia S.r.l. | Multifunctional bisacylphosphine oxide photoinitiators |
| DE102018127854A1 (de) | 2018-11-08 | 2020-05-14 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse |
| EP3902878B1 (en) | 2018-12-28 | 2026-05-06 | IGM Resins Italia S.r.l. | Photoinitiators |
| EP4041719A1 (en) | 2019-10-11 | 2022-08-17 | IGM Resins Italia S.r.l. | Coumarin glyoxylates for led photocuring |
| IT202000023815A1 (it) | 2020-10-09 | 2022-04-09 | Igm Resins Italia Srl | Ketoquinolones as photonitiators |
| IT202100014885A1 (it) | 2021-06-08 | 2022-12-08 | Igm Resins Italia Srl | Fotoiniziatori a base di silicio bifunzionali |
| IT202100025868A1 (it) | 2021-10-08 | 2023-04-08 | Igm Resins Italia Srl | Nuovi fotoiniziatori |
| EP4482881B1 (en) | 2022-02-24 | 2026-08-12 | IGM Resins Italia S.r.l. | Photoinitiators |
| DE102022106647A1 (de) | 2022-03-22 | 2023-09-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Niedertemperaturhärtende Massen auf Basis von Glycidylethern |
| ES3071453T3 (es) | 2022-05-06 | 2026-06-23 | Igm Group B V | Envase fotoiniciador que comprende fotoiniciadores especializados de óxido de bisacilfosfina y sensibilizadores de abrillantadores ópticos |
| CN119137224A (zh) | 2022-05-06 | 2024-12-13 | Igm集团公司 | 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包 |
| CA3256585A1 (en) | 2022-05-06 | 2023-11-09 | Igm Group B. V. | PHOTO-INITIATOR SYSTEM COMPRISING PHOSPHINE OXIDE-BASED PHOTO-INITIATORS, OXAZOLE-BASED SENSITIZING AGENTS, AND AMINE-TYPE ADDITIVES |
| WO2024074945A1 (en) | 2022-10-05 | 2024-04-11 | Igm Resins Italia S.R.L. | Polymeric (meth)acrylate photoinitiators |
| IT202300004737A1 (it) | 2023-03-14 | 2024-09-14 | Igm Resins Italia Srl | Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led |
| CN121646581A (zh) | 2023-08-03 | 2026-03-10 | 意大利艾坚蒙树脂有限公司 | 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物 |
| EP4534614B1 (en) | 2023-10-02 | 2026-04-15 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers |
| IT202300028218A1 (it) | 2023-12-28 | 2025-06-28 | Igm Resins Italia Srl | Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido |
| EP4579344A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Thioalkylcoumarin photosensitizers for photopolymerization |
| EP4578918A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Photosensitizers for photopolymerization |
| CN120737322B (zh) * | 2025-09-02 | 2025-11-28 | 西北工业大学 | 一种基于手性主链的液晶聚合物及其制备方法和应用 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4540598A (en) | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| JPH04362647A (ja) * | 1991-06-10 | 1992-12-15 | Konica Corp | 感光性組成物 |
| DE59309494D1 (de) | 1992-05-22 | 1999-05-12 | Ciba Geigy Ag | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JPH0990627A (ja) * | 1995-09-27 | 1997-04-04 | Toray Ind Inc | 感光性ポリイミド前駆体組成物 |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| MY117352A (en) | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3591743B2 (ja) * | 1996-02-02 | 2004-11-24 | 東京応化工業株式会社 | 化学増幅型レジスト組成物 |
| AU726458B2 (en) | 1996-09-02 | 2000-11-09 | Ciba Specialty Chemicals Holding Inc. | Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity |
| JP3655030B2 (ja) | 1996-12-10 | 2005-06-02 | 東京応化工業株式会社 | ネガ型化学増幅型レジスト組成物 |
| TW550439B (en) | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| JP2002528550A (ja) * | 1998-10-29 | 2002-09-03 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | オキシム誘導体及び潜在性酸としてのその使用 |
| DE69908827T2 (de) * | 1999-03-05 | 2004-05-06 | Exxonmobil Research And Engineering Co. | Mit seltenem erdmetall ionenausgetauschtes ferrierit |
-
1999
- 1999-10-18 JP JP2000579607A patent/JP2002528550A/ja not_active Ceased
- 1999-10-18 DE DE69904073T patent/DE69904073T2/de not_active Expired - Lifetime
- 1999-10-18 CN CNB99812849XA patent/CN1205215C/zh not_active Expired - Fee Related
- 1999-10-18 US US09/830,248 patent/US6485886B1/en not_active Expired - Fee Related
- 1999-10-18 KR KR1020017005334A patent/KR100634037B1/ko not_active Expired - Fee Related
- 1999-10-18 EP EP99950753A patent/EP1124832B1/en not_active Expired - Lifetime
- 1999-10-18 CN CNA2004100925757A patent/CN1636971A/zh active Pending
- 1999-10-18 AU AU63408/99A patent/AU6340899A/en not_active Abandoned
- 1999-10-18 WO PCT/EP1999/007876 patent/WO2000026219A1/en not_active Ceased
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