JP2002528550A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002528550A5 JP2002528550A5 JP2000579607A JP2000579607A JP2002528550A5 JP 2002528550 A5 JP2002528550 A5 JP 2002528550A5 JP 2000579607 A JP2000579607 A JP 2000579607A JP 2000579607 A JP2000579607 A JP 2000579607A JP 2002528550 A5 JP2002528550 A5 JP 2002528550A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- phenyl
- substituted
- unsubstituted
- sulfonyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 21
- 125000000217 alkyl group Chemical group 0.000 description 12
- -1 anthracyl Chemical group 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 12
- 229910052736 halogen Inorganic materials 0.000 description 10
- 150000002367 halogens Chemical class 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 8
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 125000005561 phenanthryl group Chemical group 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 125000006331 halo benzoyl group Chemical group 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- WMGVPDQNPUQRND-UHFFFAOYSA-N (2-methylphenyl)acetonitrile Chemical compound CC1=CC=CC=C1CC#N WMGVPDQNPUQRND-UHFFFAOYSA-N 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- JIZRGGUCOQKGQD-UHFFFAOYSA-N 2-nitrothiophene Chemical compound [O-][N+](=O)C1=CC=CS1 JIZRGGUCOQKGQD-UHFFFAOYSA-N 0.000 description 1
- WLHCBQAPPJAULW-UHFFFAOYSA-N 4-methylbenzenethiol Chemical compound CC1=CC=C(S)C=C1 WLHCBQAPPJAULW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000008366 benzophenones Chemical group 0.000 description 1
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98811084 | 1998-10-29 | ||
| EP98811084.7 | 1998-10-29 | ||
| PCT/EP1999/007876 WO2000026219A1 (en) | 1998-10-29 | 1999-10-18 | Oxime derivatives and the use thereof as latent acids |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002528550A JP2002528550A (ja) | 2002-09-03 |
| JP2002528550A5 true JP2002528550A5 (enExample) | 2006-11-30 |
Family
ID=8236416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000579607A Ceased JP2002528550A (ja) | 1998-10-29 | 1999-10-18 | オキシム誘導体及び潜在性酸としてのその使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6485886B1 (enExample) |
| EP (1) | EP1124832B1 (enExample) |
| JP (1) | JP2002528550A (enExample) |
| KR (1) | KR100634037B1 (enExample) |
| CN (2) | CN1205215C (enExample) |
| AU (1) | AU6340899A (enExample) |
| DE (1) | DE69904073T2 (enExample) |
| WO (1) | WO2000026219A1 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1205215C (zh) * | 1998-10-29 | 2005-06-08 | 西巴特殊化学品控股有限公司 | 肟衍生物及其作为潜酸的用途 |
| NL1014545C2 (nl) * | 1999-03-31 | 2002-02-26 | Ciba Sc Holding Ag | Oxim-derivaten en de toepassing daarvan als latente zuren. |
| EP1392675B1 (en) * | 2001-06-01 | 2005-02-09 | Ciba SC Holding AG | Substituted oxime derivatives and the use thereof as latent acids |
| US7098463B2 (en) * | 2003-03-03 | 2006-08-29 | Heuris Pharma, Llc | Three-dimensional dosimeter for penetrating radiation and method of use |
| EP1609024B1 (en) * | 2003-03-11 | 2015-09-30 | Fujifilm Electronic Materials USA, Inc. | Photosensitive resin compositions |
| US20070020793A1 (en) * | 2004-03-01 | 2007-01-25 | Adamovics John A | Three-dimensional shaped solid dosimeter and method of use |
| JP2008506826A (ja) * | 2004-07-21 | 2008-03-06 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化方法及び逆転した２段階工程による触媒の使用 |
| JP4548617B2 (ja) * | 2006-06-09 | 2010-09-22 | 信越化学工業株式会社 | 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法 |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| JP2012522084A (ja) | 2009-03-30 | 2012-09-20 | ビーエーエスエフ ソシエタス・ヨーロピア | Ｕｖ線量インジケータフィルム |
| KR101542648B1 (ko) | 2009-09-18 | 2015-08-06 | 헨켈 아이피 앤드 홀딩 게엠베하 | 포스포네이트 결합 조성물 |
| US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
| US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| WO2014025370A1 (en) | 2012-08-10 | 2014-02-13 | Hallstar Innovations Corp. | Tricyclic energy quencher compounds for reducing singlet oxygen generation |
| US10106629B2 (en) | 2014-05-30 | 2018-10-23 | Igm Resins Italia S.R.L. | Multifunctional acylphosphine oxide photoinitiators |
| MX375374B (es) | 2015-04-29 | 2025-03-06 | Bsn Medical Gmbh | Dispositivo de baño médico. |
| CA2984044A1 (en) | 2015-04-29 | 2016-11-03 | Bsn Medical Gmbh | Steady-state no production via ph control |
| DE102016111590A1 (de) | 2016-06-24 | 2017-12-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse |
| KR102646304B1 (ko) * | 2017-02-23 | 2024-03-11 | 에이치디 마이크로시스템즈 가부시키가이샤 | 감광성 수지 조성물, 경화 패턴의 제조 방법, 경화물, 층간절연막, 커버 코트층, 표면 보호막, 및 전자부품 |
| DE102017126215A1 (de) | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren |
| WO2020031240A1 (ja) | 2018-08-06 | 2020-02-13 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| US11555081B2 (en) | 2018-09-07 | 2023-01-17 | Igm Resins Italia S.R.L. | Multifunctional bisacylphosphine oxide photoinitiators |
| DE102018127854A1 (de) | 2018-11-08 | 2020-05-14 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse |
| KR102888120B1 (ko) | 2018-12-28 | 2025-11-18 | 아이지엠 레진스 이탈리아 에스.알.엘. | 광개시제 |
| US11981650B2 (en) | 2019-10-11 | 2024-05-14 | Igm Resins Italia S.R.L. | Coumarin glyoxylates for LED photocuring |
| IT202000023815A1 (it) | 2020-10-09 | 2022-04-09 | Igm Resins Italia Srl | Ketoquinolones as photonitiators |
| IT202100014885A1 (it) | 2021-06-08 | 2022-12-08 | Igm Resins Italia Srl | Fotoiniziatori a base di silicio bifunzionali |
| IT202100025868A1 (it) | 2021-10-08 | 2023-04-08 | Igm Resins Italia Srl | Nuovi fotoiniziatori |
| JP2025507677A (ja) | 2022-02-24 | 2025-03-21 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 光開始剤 |
| DE102022106647A1 (de) | 2022-03-22 | 2023-09-28 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Niedertemperaturhärtende Massen auf Basis von Glycidylethern |
| EP4273200A1 (en) | 2022-05-06 | 2023-11-08 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers |
| EP4519376A1 (en) | 2022-05-06 | 2025-03-12 | IGM Group B.V. | Photoinitiator package comprising phosphine oxide photoinitiators, coumarin-based sensitizers and amine additives |
| JP2025514446A (ja) | 2022-05-06 | 2025-05-02 | アイジーエム グループ ビー．ヴィ． | ホスフィンオキシド光開始剤、オキサゾール系増感剤及びアミン添加剤を含む光開始剤パッケージ |
| JP2025533845A (ja) | 2022-10-05 | 2025-10-09 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | ポリマー性（メタ）アクリレート光開始剤 |
| IT202300004737A1 (it) | 2023-03-14 | 2024-09-14 | Igm Resins Italia Srl | Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led |
| WO2025027517A1 (en) | 2023-08-03 | 2025-02-06 | Igm Resins Italia S.R.L. | 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions |
| EP4534614A1 (en) | 2023-10-02 | 2025-04-09 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers |
| WO2025140854A2 (en) | 2023-12-28 | 2025-07-03 | Igm Resins Italia S.R.L. | NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE |
| EP4579344A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Thioalkylcoumarin photosensitizers for photopolymerization |
| EP4578918A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Photosensitizers for photopolymerization |
| CN120737322B (zh) * | 2025-09-02 | 2025-11-28 | 西北工业大学 | 一种基于手性主链的液晶聚合物及其制备方法和应用 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4540598A (en) | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| JPH04362647A (ja) * | 1991-06-10 | 1992-12-15 | Konica Corp | 感光性組成物 |
| EP0571330B1 (de) | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JPH0990627A (ja) * | 1995-09-27 | 1997-04-04 | Toray Ind Inc | 感光性ポリイミド前駆体組成物 |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3591743B2 (ja) * | 1996-02-02 | 2004-11-24 | 東京応化工業株式会社 | 化学増幅型レジスト組成物 |
| BR9713311A (pt) * | 1996-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alquisulfoniloximas para fotorresists i-linha de alta resolução de alta sensibilidade |
| JP3655030B2 (ja) * | 1996-12-10 | 2005-06-02 | 東京応化工業株式会社 | ネガ型化学増幅型レジスト組成物 |
| TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| CN1205215C (zh) * | 1998-10-29 | 2005-06-08 | 西巴特殊化学品控股有限公司 | 肟衍生物及其作为潜酸的用途 |
| AU761671B2 (en) * | 1999-03-05 | 2003-06-05 | Exxonmobil Research And Engineering Company | Rare earth metal ion exchanged ferrierite |
-
1999
- 1999-10-18 CN CNB99812849XA patent/CN1205215C/zh not_active Expired - Fee Related
- 1999-10-18 EP EP99950753A patent/EP1124832B1/en not_active Expired - Lifetime
- 1999-10-18 JP JP2000579607A patent/JP2002528550A/ja not_active Ceased
- 1999-10-18 CN CNA2004100925757A patent/CN1636971A/zh active Pending
- 1999-10-18 US US09/830,248 patent/US6485886B1/en not_active Expired - Fee Related
- 1999-10-18 WO PCT/EP1999/007876 patent/WO2000026219A1/en not_active Ceased
- 1999-10-18 AU AU63408/99A patent/AU6340899A/en not_active Abandoned
- 1999-10-18 DE DE69904073T patent/DE69904073T2/de not_active Expired - Lifetime
- 1999-10-18 KR KR1020017005334A patent/KR100634037B1/ko not_active Expired - Fee Related