CN1205215C - 肟衍生物及其作为潜酸的用途 - Google Patents

肟衍生物及其作为潜酸的用途 Download PDF

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Publication number
CN1205215C
CN1205215C CNB99812849XA CN99812849A CN1205215C CN 1205215 C CN1205215 C CN 1205215C CN B99812849X A CNB99812849X A CN B99812849XA CN 99812849 A CN99812849 A CN 99812849A CN 1205215 C CN1205215 C CN 1205215C
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CN
China
Prior art keywords
phenyl
alkyl
compound
resist
replace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB99812849XA
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English (en)
Chinese (zh)
Other versions
CN1325401A (zh
Inventor
H·亚马托
T·阿萨库拉
J·-L·比尔鲍姆
K·迪特利克
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BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
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Publication date
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Publication of CN1325401A publication Critical patent/CN1325401A/zh
Application granted granted Critical
Publication of CN1205215C publication Critical patent/CN1205215C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
CNB99812849XA 1998-10-29 1999-10-18 肟衍生物及其作为潜酸的用途 Expired - Fee Related CN1205215C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98811084 1998-10-29
EP98811084.7 1998-10-29

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CNA2004100925757A Division CN1636971A (zh) 1998-10-29 1999-10-18 肟衍生物及其作为潜酸的用途

Publications (2)

Publication Number Publication Date
CN1325401A CN1325401A (zh) 2001-12-05
CN1205215C true CN1205215C (zh) 2005-06-08

Family

ID=8236416

Family Applications (2)

Application Number Title Priority Date Filing Date
CNA2004100925757A Pending CN1636971A (zh) 1998-10-29 1999-10-18 肟衍生物及其作为潜酸的用途
CNB99812849XA Expired - Fee Related CN1205215C (zh) 1998-10-29 1999-10-18 肟衍生物及其作为潜酸的用途

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CNA2004100925757A Pending CN1636971A (zh) 1998-10-29 1999-10-18 肟衍生物及其作为潜酸的用途

Country Status (8)

Country Link
US (1) US6485886B1 (enExample)
EP (1) EP1124832B1 (enExample)
JP (1) JP2002528550A (enExample)
KR (1) KR100634037B1 (enExample)
CN (2) CN1636971A (enExample)
AU (1) AU6340899A (enExample)
DE (1) DE69904073T2 (enExample)
WO (1) WO2000026219A1 (enExample)

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ATE288907T1 (de) * 2001-06-01 2005-02-15 Ciba Sc Holding Ag Substituierte oxim-derivate und ihre verwendung als latente säuren
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WO2004081664A2 (en) * 2003-03-11 2004-09-23 Arch Specialty Chemicals, Inc. Novel photosensitive resin compositions
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JP2008506826A (ja) * 2004-07-21 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 光活性化方法及び逆転した２段階工程による触媒の使用
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
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WO2011032998A1 (en) * 2009-09-18 2011-03-24 Loctite (R&D) Limited Phosphonate bonding compositions
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
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MX375374B (es) 2015-04-29 2025-03-06 Bsn Medical Gmbh Dispositivo de baño médico.
CA2984044A1 (en) 2015-04-29 2016-11-03 Bsn Medical Gmbh Steady-state no production via ph control
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
WO2018155547A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
WO2020049378A1 (en) 2018-09-07 2020-03-12 Igm Resins Italia S.R.L. Multifunctional bisacylphosphine oxide photoinitiators
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
CN113518805B (zh) 2018-12-28 2023-08-08 意大利艾坚蒙树脂有限公司 光引发剂
WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
DE102022106647A1 (de) 2022-03-22 2023-09-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Niedertemperaturhärtende Massen auf Basis von Glycidylethern
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
EP4519377A1 (en) 2022-05-06 2025-03-12 IGM Group B.V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
EP4273200A1 (en) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
EP4598967A1 (en) 2022-10-05 2025-08-13 IGM Resins Italia S.r.l. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
WO2025027517A1 (en) 2023-08-03 2025-02-06 Igm Resins Italia S.R.L. 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions
EP4534614A1 (en) 2023-10-02 2025-04-09 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
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Also Published As

Publication number Publication date
CN1325401A (zh) 2001-12-05
AU6340899A (en) 2000-05-22
EP1124832B1 (en) 2002-11-20
EP1124832A1 (en) 2001-08-22
WO2000026219A1 (en) 2000-05-11
DE69904073T2 (de) 2003-07-17
DE69904073D1 (de) 2003-01-02
KR20010081100A (ko) 2001-08-27
KR100634037B1 (ko) 2006-10-17
CN1636971A (zh) 2005-07-13
JP2002528550A (ja) 2002-09-03
US6485886B1 (en) 2002-11-26

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C10 Entry into substantive examination
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Granted publication date: 20050608

Termination date: 20111018