AU6340899A - Oxime derivatives and the use thereof as latent acids - Google Patents

Oxime derivatives and the use thereof as latent acids

Info

Publication number
AU6340899A
AU6340899A AU63408/99A AU6340899A AU6340899A AU 6340899 A AU6340899 A AU 6340899A AU 63408/99 A AU63408/99 A AU 63408/99A AU 6340899 A AU6340899 A AU 6340899A AU 6340899 A AU6340899 A AU 6340899A
Authority
AU
Australia
Prior art keywords
oxime derivatives
latent acids
latent
acids
oxime
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU63408/99A
Other languages
English (en)
Inventor
Toshikage Asakura
Jean-Luc Birbaum
Kurt Dr. Dietliker
Hitoshi Yamato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU6340899A publication Critical patent/AU6340899A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C255/00—Carboxylic acid nitriles
    • C07C255/63—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C255/64—Carboxylic acid nitriles containing cyano groups and nitrogen atoms further bound to other hetero atoms, other than oxygen atoms of nitro or nitroso groups, bound to the same carbon skeleton with the nitrogen atoms further bound to oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Heterocyclic Compounds Containing Sulfur Atoms (AREA)
AU63408/99A 1998-10-29 1999-10-18 Oxime derivatives and the use thereof as latent acids Abandoned AU6340899A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98811084 1998-10-29
EP98811084 1998-10-29
PCT/EP1999/007876 WO2000026219A1 (en) 1998-10-29 1999-10-18 Oxime derivatives and the use thereof as latent acids

Publications (1)

Publication Number Publication Date
AU6340899A true AU6340899A (en) 2000-05-22

Family

ID=8236416

Family Applications (1)

Application Number Title Priority Date Filing Date
AU63408/99A Abandoned AU6340899A (en) 1998-10-29 1999-10-18 Oxime derivatives and the use thereof as latent acids

Country Status (8)

Country Link
US (1) US6485886B1 (enExample)
EP (1) EP1124832B1 (enExample)
JP (1) JP2002528550A (enExample)
KR (1) KR100634037B1 (enExample)
CN (2) CN1205215C (enExample)
AU (1) AU6340899A (enExample)
DE (1) DE69904073T2 (enExample)
WO (1) WO2000026219A1 (enExample)

Families Citing this family (44)

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JP2002528550A (ja) * 1998-10-29 2002-09-03 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド オキシム誘導体及び潜在性酸としてのその使用
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
KR100875612B1 (ko) * 2001-06-01 2008-12-24 시바 홀딩 인크 치환된 옥심 유도체 및 이를 포함하는 조성물
US7098463B2 (en) * 2003-03-03 2006-08-29 Heuris Pharma, Llc Three-dimensional dosimeter for penetrating radiation and method of use
WO2004081664A2 (en) * 2003-03-11 2004-09-23 Arch Specialty Chemicals, Inc. Novel photosensitive resin compositions
US20070020793A1 (en) * 2004-03-01 2007-01-25 Adamovics John A Three-dimensional shaped solid dosimeter and method of use
EP1789188A2 (en) * 2004-07-21 2007-05-30 CIBA SPECIALTY CHEMICALS HOLDING INC. Patent Departement Process for the photoactivation and use of a catalyst by an inverted two-stage procedure
JP4548617B2 (ja) * 2006-06-09 2010-09-22 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
JP2012522084A (ja) 2009-03-30 2012-09-20 ビーエーエスエフ ソシエタス・ヨーロピア Ｕｖ線量インジケータフィルム
EP2477997B1 (en) 2009-09-18 2014-08-20 Henkel Ireland Limited Phosphonate bonding compositions
US9926289B2 (en) 2012-08-10 2018-03-27 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
US9867800B2 (en) 2012-08-10 2018-01-16 Hallstar Innovations Corp. Method of quenching singlet and triplet excited states of pigments, such as porphyrin compounds, particularly protoporphyrin IX, with conjugated fused tricyclic compounds have electron withdrawing groups, to reduce generation of reactive oxygen species, particularly singlet oxygen
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
US9765051B2 (en) 2012-08-10 2017-09-19 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
JP6599446B2 (ja) 2014-05-30 2019-10-30 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多官能性アシルホスフィンオキシド光重合開始剤
JP6942058B2 (ja) 2015-04-29 2021-09-29 ビーエスエヌ メディカル ゲーエムベーハー Ｎｏ生成のための多段階プロセス
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
WO2018155547A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
WO2020031240A1 (ja) 2018-08-06 2020-02-13 日立化成デュポンマイクロシステムズ株式会社 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
EP3902878B1 (en) 2018-12-28 2026-05-06 IGM Resins Italia S.r.l. Photoinitiators
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
EP4482881B1 (en) 2022-02-24 2026-08-12 IGM Resins Italia S.r.l. Photoinitiators
DE102022106647A1 (de) 2022-03-22 2023-09-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Niedertemperaturhärtende Massen auf Basis von Glycidylethern
ES3071453T3 (es) 2022-05-06 2026-06-23 Igm Group B V Envase fotoiniciador que comprende fotoiniciadores especializados de óxido de bisacilfosfina y sensibilizadores de abrillantadores ópticos
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
CA3256585A1 (en) 2022-05-06 2023-11-09 Igm Group B. V. PHOTO-INITIATOR SYSTEM COMPRISING PHOSPHINE OXIDE-BASED PHOTO-INITIATORS, OXAZOLE-BASED SENSITIZING AGENTS, AND AMINE-TYPE ADDITIVES
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
CN120737322B (zh) * 2025-09-02 2025-11-28 西北工业大学 一种基于手性主链的液晶聚合物及其制备方法和应用

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US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
JPH04362647A (ja) * 1991-06-10 1992-12-15 Konica Corp 感光性組成物
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JPH0990627A (ja) * 1995-09-27 1997-04-04 Toray Ind Inc 感光性ポリイミド前駆体組成物
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3591743B2 (ja) * 1996-02-02 2004-11-24 東京応化工業株式会社 化学増幅型レジスト組成物
AU726458B2 (en) 1996-09-02 2000-11-09 Ciba Specialty Chemicals Holding Inc. Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity
JP3655030B2 (ja) 1996-12-10 2005-06-02 東京応化工業株式会社 ネガ型化学増幅型レジスト組成物
TW550439B (en) 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
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DE69908827T2 (de) * 1999-03-05 2004-05-06 Exxonmobil Research And Engineering Co. Mit seltenem erdmetall ionenausgetauschtes ferrierit

Also Published As

Publication number Publication date
EP1124832B1 (en) 2002-11-20
KR20010081100A (ko) 2001-08-27
WO2000026219A1 (en) 2000-05-11
KR100634037B1 (ko) 2006-10-17
EP1124832A1 (en) 2001-08-22
JP2002528550A (ja) 2002-09-03
CN1636971A (zh) 2005-07-13
US6485886B1 (en) 2002-11-26
CN1205215C (zh) 2005-06-08
DE69904073T2 (de) 2003-07-17
DE69904073D1 (de) 2003-01-02
CN1325401A (zh) 2001-12-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase