JP2007519032A5 - - Google Patents
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- Publication number
- JP2007519032A5 JP2007519032A5 JP2006541828A JP2006541828A JP2007519032A5 JP 2007519032 A5 JP2007519032 A5 JP 2007519032A5 JP 2006541828 A JP2006541828 A JP 2006541828A JP 2006541828 A JP2006541828 A JP 2006541828A JP 2007519032 A5 JP2007519032 A5 JP 2007519032A5
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- JP
- Japan
- Prior art keywords
- group
- optionally substituted
- ring
- optionally
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000623 heterocyclic group Chemical group 0.000 claims 10
- 230000005855 radiation Effects 0.000 claims 10
- 125000003710 aryl alkyl group Chemical group 0.000 claims 9
- 125000000217 alkyl group Chemical group 0.000 claims 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 7
- 125000002837 carbocyclic group Chemical group 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 6
- 239000000203 mixture Substances 0.000 claims 6
- 125000000547 substituted alkyl group Chemical group 0.000 claims 5
- 125000003107 substituted aryl group Chemical group 0.000 claims 5
- 125000003118 aryl group Chemical group 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- YNGDWRXWKFWCJY-UHFFFAOYSA-N 1,4-Dihydropyridine Chemical class C1C=CNC=C1 YNGDWRXWKFWCJY-UHFFFAOYSA-N 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 125000004925 dihydropyridyl group Chemical group N1(CC=CC=C1)* 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- -1 oxazole compound Chemical class 0.000 claims 2
- 150000003254 radicals Chemical class 0.000 claims 2
- 229920006395 saturated elastomer Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000001960 7 membered carbocyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 239000012986 chain transfer agent Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000003086 colorant Substances 0.000 claims 1
- 125000005520 diaryliodonium group Chemical group 0.000 claims 1
- 125000005442 diisocyanate group Chemical group 0.000 claims 1
- 239000000975 dye Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 239000003112 inhibitor Substances 0.000 claims 1
- 239000011256 inorganic filler Substances 0.000 claims 1
- 229910003475 inorganic filler Inorganic materials 0.000 claims 1
- 239000012948 isocyanate Substances 0.000 claims 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims 1
- 150000002513 isocyanates Chemical class 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000004014 plasticizer Substances 0.000 claims 1
- 238000010526 radical polymerization reaction Methods 0.000 claims 1
- 239000000376 reactant Substances 0.000 claims 1
- 125000006850 spacer group Chemical group 0.000 claims 1
- 238000001228 spectrum Methods 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 238000012719 thermal polymerization Methods 0.000 claims 1
- 125000005409 triarylsulfonium group Chemical group 0.000 claims 1
- 0 CIC1C(*)=C(*)IC(*)=C1* Chemical compound CIC1C(*)=C(*)IC(*)=C1* 0.000 description 3
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2003156847 DE10356847B4 (de) | 2003-12-05 | 2003-12-05 | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| PCT/EP2004/013138 WO2005054952A1 (en) | 2003-12-05 | 2004-11-18 | Radiation-sensitive compositions and imageable elements based thereon |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007519032A JP2007519032A (ja) | 2007-07-12 |
| JP2007519032A5 true JP2007519032A5 (enExample) | 2007-11-08 |
Family
ID=34638376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006541828A Pending JP2007519032A (ja) | 2003-12-05 | 2004-11-18 | 輻射線感応組成物およびこれをベースとする画像形成性要素 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7574959B2 (enExample) |
| EP (1) | EP1690138B1 (enExample) |
| JP (1) | JP2007519032A (enExample) |
| CN (1) | CN1890605B (enExample) |
| BR (1) | BRPI0417045A (enExample) |
| DE (1) | DE10356847B4 (enExample) |
| WO (1) | WO2005054952A1 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10307453B4 (de) * | 2003-02-21 | 2005-07-21 | Kodak Polychrome Graphics Gmbh | Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| JP4619832B2 (ja) * | 2005-03-08 | 2011-01-26 | 富士フイルム株式会社 | インクジェト記録用インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版 |
| JP4792326B2 (ja) * | 2005-07-25 | 2011-10-12 | 富士フイルム株式会社 | 平版印刷版の作製方法および平版印刷版原版 |
| JP2007147885A (ja) * | 2005-11-25 | 2007-06-14 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP4820640B2 (ja) * | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5075450B2 (ja) * | 2007-03-30 | 2012-11-21 | 富士フイルム株式会社 | 平版印刷版原版 |
| US8389203B2 (en) | 2007-05-08 | 2013-03-05 | Esko-Graphics Imaging Gmbh | Exposing printing plates using light emitting diodes |
| EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| JP2014108974A (ja) * | 2012-11-30 | 2014-06-12 | Sanyo Chem Ind Ltd | 感光性組成物 |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| WO2015111501A1 (ja) * | 2014-01-22 | 2015-07-30 | Dic株式会社 | 硬化性組成物、その硬化物、成形品及びディスプレイ部材 |
| CN107765510B (zh) * | 2016-08-16 | 2020-02-07 | 常州强力电子新材料股份有限公司 | 一种9-苯基吖啶大分子类光敏剂及其制备方法和应用 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE287796C (enExample) | ||||
| US3686371A (en) * | 1969-05-22 | 1972-08-22 | Tadashi Hasegawa | Method for producing copolymerizable compound containing functional group of phosphoric acid |
| DE2758209C3 (de) * | 1977-12-27 | 1980-07-10 | Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf | Lichtempfindliches Aufzeichnungsmaterial |
| DE3024772A1 (de) * | 1980-06-30 | 1982-01-28 | Hoechst Ag, 6000 Frankfurt | Elastische, laminierbare lichtempfindliche schicht |
| JPS62180355A (ja) * | 1986-02-05 | 1987-08-07 | Daicel Chem Ind Ltd | 光重合性組成物 |
| DE3824903A1 (de) * | 1988-07-22 | 1990-02-01 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| DE3927632A1 (de) * | 1989-08-22 | 1991-02-28 | Basf Ag | Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material |
| DD287796A5 (de) * | 1989-09-14 | 1991-03-07 | Tech Hochschule C Schorlemmer | Spektral sensibilisiertes photopolymerisierbares material |
| US5506326A (en) * | 1991-03-06 | 1996-04-09 | Loctite (Ireland) Limited | Air-activatable polymerizable compositions containing onium salts |
| EP0534005A1 (en) * | 1991-09-24 | 1993-03-31 | Agfa-Gevaert N.V. | Electrophotographic recording material |
| DE4217495A1 (de) | 1992-05-27 | 1993-12-02 | Hoechst Ag | Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial |
| US5567761A (en) * | 1993-05-10 | 1996-10-22 | Guertin Bros. Coatings And Sealants Ltd. | Aqueous two-part isocyanate-free curable, polyurethane resin systems |
| DE19518118C2 (de) * | 1995-05-17 | 1998-06-18 | Sun Chemical Corp | Lichtempfindliche Zusammensetzung |
| JP3275809B2 (ja) * | 1996-12-26 | 2002-04-22 | 三菱化学株式会社 | 感光性平版印刷版 |
| US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
| EP1349006B1 (en) * | 2002-03-28 | 2013-09-25 | Agfa Graphics N.V. | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm. |
| DE10307453B4 (de) * | 2003-02-21 | 2005-07-21 | Kodak Polychrome Graphics Gmbh | Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| DE10326324B4 (de) * | 2003-06-11 | 2007-02-08 | Kodak Polychrome Graphics Gmbh | Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte |
| DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
| DE102004022137B3 (de) * | 2004-05-05 | 2005-09-08 | Kodak Polychrome Graphics Gmbh | π-verzweigte Sensibilisatoren enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| JP4591045B2 (ja) * | 2004-11-08 | 2010-12-01 | 株式会社東京ベル製作所 | ベル装置の打撃機構 |
| DE102005007615B3 (de) * | 2005-02-18 | 2006-11-02 | Kodak Polychrome Graphics Gmbh | Verfahren zur Herstellung von Lithographie-Druckplatten |
| US7175949B1 (en) * | 2006-02-17 | 2007-02-13 | Eastman Kodak Company | Radiation-sensitive compositions and imageable materials |
| WO2007135894A1 (ja) * | 2006-05-24 | 2007-11-29 | Konica Minolta Medical & Graphic, Inc. | 感光性組成物、感光性レジスト用シート、レジストパターンの形成方法及びプリント配線板の製造方法 |
-
2003
- 2003-12-05 DE DE2003156847 patent/DE10356847B4/de not_active Expired - Fee Related
-
2004
- 2004-11-18 WO PCT/EP2004/013138 patent/WO2005054952A1/en not_active Ceased
- 2004-11-18 EP EP20040803184 patent/EP1690138B1/en not_active Expired - Lifetime
- 2004-11-18 JP JP2006541828A patent/JP2007519032A/ja active Pending
- 2004-11-18 US US10/580,357 patent/US7574959B2/en not_active Expired - Fee Related
- 2004-11-18 CN CN2004800360317A patent/CN1890605B/zh not_active Expired - Fee Related
- 2004-11-18 BR BRPI0417045-8A patent/BRPI0417045A/pt not_active Application Discontinuation
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