BRPI0417045A - composição sensìvel à radiação, elemento sensìvel à radiação de trabalho negativo, processo para formar imagem de um elemento sensìvel à radiação, e, elemento convertido em imagem - Google Patents

composição sensìvel à radiação, elemento sensìvel à radiação de trabalho negativo, processo para formar imagem de um elemento sensìvel à radiação, e, elemento convertido em imagem

Info

Publication number
BRPI0417045A
BRPI0417045A BRPI0417045-8A BRPI0417045A BRPI0417045A BR PI0417045 A BRPI0417045 A BR PI0417045A BR PI0417045 A BRPI0417045 A BR PI0417045A BR PI0417045 A BRPI0417045 A BR PI0417045A
Authority
BR
Brazil
Prior art keywords
radiation sensitive
image
group
sensitive element
sensitive composition
Prior art date
Application number
BRPI0417045-8A
Other languages
English (en)
Portuguese (pt)
Inventor
Harald Baumann
Udo Dwars
Michael Flugel
Original Assignee
Kodak Polychrome Graphics Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Gmbh filed Critical Kodak Polychrome Graphics Gmbh
Publication of BRPI0417045A publication Critical patent/BRPI0417045A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31591—Next to cellulosic

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BRPI0417045-8A 2003-12-05 2004-11-18 composição sensìvel à radiação, elemento sensìvel à radiação de trabalho negativo, processo para formar imagem de um elemento sensìvel à radiação, e, elemento convertido em imagem BRPI0417045A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2003156847 DE10356847B4 (de) 2003-12-05 2003-12-05 Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
PCT/EP2004/013138 WO2005054952A1 (en) 2003-12-05 2004-11-18 Radiation-sensitive compositions and imageable elements based thereon

Publications (1)

Publication Number Publication Date
BRPI0417045A true BRPI0417045A (pt) 2007-02-06

Family

ID=34638376

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0417045-8A BRPI0417045A (pt) 2003-12-05 2004-11-18 composição sensìvel à radiação, elemento sensìvel à radiação de trabalho negativo, processo para formar imagem de um elemento sensìvel à radiação, e, elemento convertido em imagem

Country Status (7)

Country Link
US (1) US7574959B2 (enExample)
EP (1) EP1690138B1 (enExample)
JP (1) JP2007519032A (enExample)
CN (1) CN1890605B (enExample)
BR (1) BRPI0417045A (enExample)
DE (1) DE10356847B4 (enExample)
WO (1) WO2005054952A1 (enExample)

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DE10307453B4 (de) * 2003-02-21 2005-07-21 Kodak Polychrome Graphics Gmbh Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
JP4619832B2 (ja) * 2005-03-08 2011-01-26 富士フイルム株式会社 インクジェト記録用インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
JP4792326B2 (ja) * 2005-07-25 2011-10-12 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
JP2007147885A (ja) * 2005-11-25 2007-06-14 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4820640B2 (ja) * 2005-12-20 2011-11-24 富士フイルム株式会社 平版印刷版の作製方法
JP5075450B2 (ja) * 2007-03-30 2012-11-21 富士フイルム株式会社 平版印刷版原版
US8389203B2 (en) 2007-05-08 2013-03-05 Esko-Graphics Imaging Gmbh Exposing printing plates using light emitting diodes
EP2098367A1 (en) * 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
JP2014108974A (ja) * 2012-11-30 2014-06-12 Sanyo Chem Ind Ltd 感光性組成物
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
KR102284382B1 (ko) * 2014-01-22 2021-08-03 디아이씨 가부시끼가이샤 경화성 조성물, 그 경화물, 성형품 및 디스플레이 부재
CN107765510B (zh) * 2016-08-16 2020-02-07 常州强力电子新材料股份有限公司 一种9-苯基吖啶大分子类光敏剂及其制备方法和应用
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

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DE4217495A1 (de) * 1992-05-27 1993-12-02 Hoechst Ag Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
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DE19518118C2 (de) * 1995-05-17 1998-06-18 Sun Chemical Corp Lichtempfindliche Zusammensetzung
JP3275809B2 (ja) * 1996-12-26 2002-04-22 三菱化学株式会社 感光性平版印刷版
US20030186165A1 (en) 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
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DE10307453B4 (de) * 2003-02-21 2005-07-21 Kodak Polychrome Graphics Gmbh Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE10326324B4 (de) * 2003-06-11 2007-02-08 Kodak Polychrome Graphics Gmbh Lithographiedruckplatten-Vorläufer mit 1,4-Dihydropyridin-Sensibilisator enthaltender Beschichtung, Verfahren zum Bebildern und Bebilderte Lithographiedruckplatte
DE102004003143A1 (de) * 2004-01-21 2005-08-18 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren
DE102004022137B3 (de) * 2004-05-05 2005-09-08 Kodak Polychrome Graphics Gmbh π-verzweigte Sensibilisatoren enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
JP4591045B2 (ja) * 2004-11-08 2010-12-01 株式会社東京ベル製作所 ベル装置の打撃機構
DE102005007615B3 (de) * 2005-02-18 2006-11-02 Kodak Polychrome Graphics Gmbh Verfahren zur Herstellung von Lithographie-Druckplatten
US7175949B1 (en) * 2006-02-17 2007-02-13 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
WO2007135894A1 (ja) * 2006-05-24 2007-11-29 Konica Minolta Medical & Graphic, Inc. 感光性組成物、感光性レジスト用シート、レジストパターンの形成方法及びプリント配線板の製造方法

Also Published As

Publication number Publication date
US7574959B2 (en) 2009-08-18
US20070142490A1 (en) 2007-06-21
JP2007519032A (ja) 2007-07-12
DE10356847B4 (de) 2005-10-06
DE10356847A1 (de) 2005-07-14
EP1690138B1 (en) 2012-04-11
CN1890605A (zh) 2007-01-03
CN1890605B (zh) 2010-10-27
EP1690138A1 (en) 2006-08-16
WO2005054952A1 (en) 2005-06-16

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]