JP2007519032A - 輻射線感応組成物およびこれをベースとする画像形成性要素 - Google Patents
輻射線感応組成物およびこれをベースとする画像形成性要素 Download PDFInfo
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- JP2007519032A JP2007519032A JP2006541828A JP2006541828A JP2007519032A JP 2007519032 A JP2007519032 A JP 2007519032A JP 2006541828 A JP2006541828 A JP 2006541828A JP 2006541828 A JP2006541828 A JP 2006541828A JP 2007519032 A JP2007519032 A JP 2007519032A
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- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006352 cycloaddition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- PUFGCEQWYLJYNJ-UHFFFAOYSA-N didodecyl benzene-1,2-dicarboxylate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCCCCCC PUFGCEQWYLJYNJ-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical class OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 1
- SNQXJPARXFUULZ-UHFFFAOYSA-N dioxolane Chemical compound C1COOC1 SNQXJPARXFUULZ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- MSOLGAJLRIINNF-UHFFFAOYSA-N ethyl 7-(diethylamino)-2-oxochromene-3-carboxylate Chemical compound C1=C(N(CC)CC)C=C2OC(=O)C(C(=O)OCC)=CC2=C1 MSOLGAJLRIINNF-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- UKZQEOHHLOYJLY-UHFFFAOYSA-M ethyl eosin Chemical compound [K+].CCOC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C([O-])=C(Br)C=C21 UKZQEOHHLOYJLY-UHFFFAOYSA-M 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- DWYMPOCYEZONEA-UHFFFAOYSA-L fluoridophosphate Chemical compound [O-]P([O-])(F)=O DWYMPOCYEZONEA-UHFFFAOYSA-L 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229920001477 hydrophilic polymer Polymers 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- DAHPIMYBWVSMKQ-UHFFFAOYSA-N n-hydroxy-n-phenylnitrous amide Chemical class O=NN(O)C1=CC=CC=C1 DAHPIMYBWVSMKQ-UHFFFAOYSA-N 0.000 description 1
- VXLFYNFOITWQPM-UHFFFAOYSA-N n-phenyl-4-phenyldiazenylaniline Chemical compound C=1C=C(N=NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 VXLFYNFOITWQPM-UHFFFAOYSA-N 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000001209 o-nitrophenyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])[N+]([O-])=O 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000004010 onium ions Chemical class 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000006025 oxidative dimerization reaction Methods 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- HZLFQUWNZMMHQM-UHFFFAOYSA-N piperazin-1-ylmethanol Chemical compound OCN1CCNCC1 HZLFQUWNZMMHQM-UHFFFAOYSA-N 0.000 description 1
- 150000004885 piperazines Chemical class 0.000 description 1
- PRAYXGYYVXRDDW-UHFFFAOYSA-N piperidin-2-ylmethanol Chemical compound OCC1CCCCN1 PRAYXGYYVXRDDW-UHFFFAOYSA-N 0.000 description 1
- VUNPWIPIOOMCPT-UHFFFAOYSA-N piperidin-3-ylmethanol Chemical compound OCC1CCCNC1 VUNPWIPIOOMCPT-UHFFFAOYSA-N 0.000 description 1
- 150000003053 piperidines Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000000135 prohibitive effect Effects 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 102200076864 rs869312138 Human genes 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- URAYPUMNDPQOKB-UHFFFAOYSA-N triacetin Chemical compound CC(=O)OCC(OC(C)=O)COC(C)=O URAYPUMNDPQOKB-UHFFFAOYSA-N 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- DWWMSEANWMWMCB-UHFFFAOYSA-N tribromomethylsulfonylbenzene Chemical compound BrC(Br)(Br)S(=O)(=O)C1=CC=CC=C1 DWWMSEANWMWMCB-UHFFFAOYSA-N 0.000 description 1
- VZUBRRXYUOJBRS-UHFFFAOYSA-N trichloromethylsulfonylbenzene Chemical compound ClC(Cl)(Cl)S(=O)(=O)C1=CC=CC=C1 VZUBRRXYUOJBRS-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31591—Next to cellulosic
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2003156847 DE10356847B4 (de) | 2003-12-05 | 2003-12-05 | Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente |
| PCT/EP2004/013138 WO2005054952A1 (en) | 2003-12-05 | 2004-11-18 | Radiation-sensitive compositions and imageable elements based thereon |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007519032A true JP2007519032A (ja) | 2007-07-12 |
| JP2007519032A5 JP2007519032A5 (enExample) | 2007-11-08 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006541828A Pending JP2007519032A (ja) | 2003-12-05 | 2004-11-18 | 輻射線感応組成物およびこれをベースとする画像形成性要素 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7574959B2 (enExample) |
| EP (1) | EP1690138B1 (enExample) |
| JP (1) | JP2007519032A (enExample) |
| CN (1) | CN1890605B (enExample) |
| BR (1) | BRPI0417045A (enExample) |
| DE (1) | DE10356847B4 (enExample) |
| WO (1) | WO2005054952A1 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006519405A (ja) * | 2003-02-21 | 2006-08-24 | コダック ポリクロウム グラフィクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | オキサゾール誘導体を含む輻射線感受性組成物、及び該組成物に基づく画像形成性要素 |
| JP2006249154A (ja) * | 2005-03-08 | 2006-09-21 | Fuji Photo Film Co Ltd | インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版 |
| JP2007058170A (ja) * | 2005-07-25 | 2007-03-08 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| JP2007147885A (ja) * | 2005-11-25 | 2007-06-14 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2014108974A (ja) * | 2012-11-30 | 2014-06-12 | Sanyo Chem Ind Ltd | 感光性組成物 |
| WO2015111501A1 (ja) * | 2014-01-22 | 2015-07-30 | Dic株式会社 | 硬化性組成物、その硬化物、成形品及びディスプレイ部材 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4820640B2 (ja) * | 2005-12-20 | 2011-11-24 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5075450B2 (ja) * | 2007-03-30 | 2012-11-21 | 富士フイルム株式会社 | 平版印刷版原版 |
| US8389203B2 (en) | 2007-05-08 | 2013-03-05 | Esko-Graphics Imaging Gmbh | Exposing printing plates using light emitting diodes |
| EP2098367A1 (en) | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| EP2194429A1 (en) | 2008-12-02 | 2010-06-09 | Eastman Kodak Company | Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| EP2293144B1 (en) | 2009-09-04 | 2012-11-07 | Eastman Kodak Company | Method of drying lithographic printing plates after single-step-processing |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| US8927197B2 (en) | 2012-11-16 | 2015-01-06 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| EP2735903B1 (en) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a hyperbranched binder material |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (en) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negative working radiation-sensitive elements |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| CN107765510B (zh) * | 2016-08-16 | 2020-02-07 | 常州强力电子新材料股份有限公司 | 一种9-苯基吖啶大分子类光敏剂及其制备方法和应用 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
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- 2004-11-18 JP JP2006541828A patent/JP2007519032A/ja active Pending
- 2004-11-18 US US10/580,357 patent/US7574959B2/en not_active Expired - Fee Related
- 2004-11-18 CN CN2004800360317A patent/CN1890605B/zh not_active Expired - Fee Related
- 2004-11-18 WO PCT/EP2004/013138 patent/WO2005054952A1/en not_active Ceased
- 2004-11-18 EP EP20040803184 patent/EP1690138B1/en not_active Expired - Lifetime
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006519405A (ja) * | 2003-02-21 | 2006-08-24 | コダック ポリクロウム グラフィクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | オキサゾール誘導体を含む輻射線感受性組成物、及び該組成物に基づく画像形成性要素 |
| JP2006249154A (ja) * | 2005-03-08 | 2006-09-21 | Fuji Photo Film Co Ltd | インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版 |
| JP2007058170A (ja) * | 2005-07-25 | 2007-03-08 | Fujifilm Corp | 平版印刷版の作製方法および平版印刷版原版 |
| JP2007147885A (ja) * | 2005-11-25 | 2007-06-14 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP2014108974A (ja) * | 2012-11-30 | 2014-06-12 | Sanyo Chem Ind Ltd | 感光性組成物 |
| WO2015111501A1 (ja) * | 2014-01-22 | 2015-07-30 | Dic株式会社 | 硬化性組成物、その硬化物、成形品及びディスプレイ部材 |
| JP2015157962A (ja) * | 2014-01-22 | 2015-09-03 | Dic株式会社 | 硬化性組成物、その硬化物、成形品及びディスプレイ部材 |
| JP5839250B1 (ja) * | 2014-01-22 | 2016-01-06 | Dic株式会社 | 硬化性組成物、その硬化物、成形品及びディスプレイ部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070142490A1 (en) | 2007-06-21 |
| BRPI0417045A (pt) | 2007-02-06 |
| US7574959B2 (en) | 2009-08-18 |
| CN1890605A (zh) | 2007-01-03 |
| EP1690138A1 (en) | 2006-08-16 |
| DE10356847A1 (de) | 2005-07-14 |
| WO2005054952A1 (en) | 2005-06-16 |
| DE10356847B4 (de) | 2005-10-06 |
| EP1690138B1 (en) | 2012-04-11 |
| CN1890605B (zh) | 2010-10-27 |
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