DE68926082T2 - Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine - Google Patents
Photoinitiator enthaltende Halogenmethyl-1,3,5-TriazineInfo
- Publication number
- DE68926082T2 DE68926082T2 DE68926082T DE68926082T DE68926082T2 DE 68926082 T2 DE68926082 T2 DE 68926082T2 DE 68926082 T DE68926082 T DE 68926082T DE 68926082 T DE68926082 T DE 68926082T DE 68926082 T2 DE68926082 T2 DE 68926082T2
- Authority
- DE
- Germany
- Prior art keywords
- halomethyl
- containing photoinitiator
- triazines containing
- triazines
- photoinitiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US24133988A | 1988-09-07 | 1988-09-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68926082D1 DE68926082D1 (de) | 1996-05-02 |
DE68926082T2 true DE68926082T2 (de) | 1996-11-28 |
Family
ID=22910318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68926082T Expired - Fee Related DE68926082T2 (de) | 1988-09-07 | 1989-08-29 | Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0361682B1 (de) |
JP (1) | JPH02115176A (de) |
KR (1) | KR0137465B1 (de) |
DE (1) | DE68926082T2 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69225990T2 (de) * | 1991-03-15 | 1998-10-22 | Fuji Photo Film Co Ltd | Lichtempfindliche Bistrihalomethyl-s-triazin-Verbindung und photopolymerisierbare Zusammensetzung, dieselbe enthaltend |
ES2251395T3 (es) | 1999-07-26 | 2006-05-01 | Banyu Pharmaceutical Co., Ltd. | Derivados de biarilureas. |
KR100481686B1 (ko) * | 2001-11-16 | 2005-04-07 | 상신화학공업 주식회사 | 접착력이 우수한 수분산성 폴리우레탄-아크릴 접착제 및그 제조방법 |
CA2560346A1 (en) * | 2004-04-13 | 2005-10-27 | Icagen, Inc. | Polycyclic pyridines as potassium ion channel modulators |
JP4770244B2 (ja) * | 2005-04-11 | 2011-09-14 | Jsr株式会社 | オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
KR100763744B1 (ko) * | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
JP5732731B2 (ja) * | 2010-01-19 | 2015-06-10 | 横浜ゴム株式会社 | ウレタン結合含有スルホニウム塩化合物およびその製造法 |
WO2014074372A1 (en) * | 2012-11-08 | 2014-05-15 | 3M Innovative Properties Company | Uv-curable silicone release compositions |
CN115352177B (zh) * | 2022-08-31 | 2023-12-08 | 浙江康尔达新材料股份有限公司 | 一种具有显色功能的紫外光敏感平版印刷版前体及其制版方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4476215A (en) * | 1983-11-25 | 1984-10-09 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist composition |
GB8719730D0 (en) * | 1987-08-20 | 1987-09-30 | Vickers Plc | Radiation sensitive compounds |
-
1989
- 1989-08-29 EP EP89308687A patent/EP0361682B1/de not_active Expired - Lifetime
- 1989-08-29 DE DE68926082T patent/DE68926082T2/de not_active Expired - Fee Related
- 1989-09-06 KR KR1019890012945A patent/KR0137465B1/ko not_active IP Right Cessation
- 1989-09-06 JP JP1231342A patent/JPH02115176A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH02115176A (ja) | 1990-04-27 |
EP0361682A1 (de) | 1990-04-04 |
KR900004705A (ko) | 1990-04-12 |
DE68926082D1 (de) | 1996-05-02 |
EP0361682B1 (de) | 1996-03-27 |
KR0137465B1 (ko) | 1998-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |