DE68926082D1 - Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine - Google Patents

Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine

Info

Publication number
DE68926082D1
DE68926082D1 DE68926082T DE68926082T DE68926082D1 DE 68926082 D1 DE68926082 D1 DE 68926082D1 DE 68926082 T DE68926082 T DE 68926082T DE 68926082 T DE68926082 T DE 68926082T DE 68926082 D1 DE68926082 D1 DE 68926082D1
Authority
DE
Germany
Prior art keywords
halomethyl
containing photoinitiator
triazines containing
triazines
photoinitiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68926082T
Other languages
English (en)
Other versions
DE68926082T2 (de
Inventor
Mitchell A C O Minneso Rossman
James A C O Minnesota M Bonham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Application granted granted Critical
Publication of DE68926082D1 publication Critical patent/DE68926082D1/de
Publication of DE68926082T2 publication Critical patent/DE68926082T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/22—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to two ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE68926082T 1988-09-07 1989-08-29 Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine Expired - Fee Related DE68926082T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US24133988A 1988-09-07 1988-09-07

Publications (2)

Publication Number Publication Date
DE68926082D1 true DE68926082D1 (de) 1996-05-02
DE68926082T2 DE68926082T2 (de) 1996-11-28

Family

ID=22910318

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68926082T Expired - Fee Related DE68926082T2 (de) 1988-09-07 1989-08-29 Photoinitiator enthaltende Halogenmethyl-1,3,5-Triazine

Country Status (4)

Country Link
EP (1) EP0361682B1 (de)
JP (1) JPH02115176A (de)
KR (1) KR0137465B1 (de)
DE (1) DE68926082T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69225990T2 (de) * 1991-03-15 1998-10-22 Fuji Photo Film Co Ltd Lichtempfindliche Bistrihalomethyl-s-triazin-Verbindung und photopolymerisierbare Zusammensetzung, dieselbe enthaltend
ES2251395T3 (es) 1999-07-26 2006-05-01 Banyu Pharmaceutical Co., Ltd. Derivados de biarilureas.
KR100481686B1 (ko) * 2001-11-16 2005-04-07 상신화학공업 주식회사 접착력이 우수한 수분산성 폴리우레탄-아크릴 접착제 및그 제조방법
CA2560346A1 (en) * 2004-04-13 2005-10-27 Icagen, Inc. Polycyclic pyridines as potassium ion channel modulators
JP4770244B2 (ja) * 2005-04-11 2011-09-14 Ｊｓｒ株式会社 オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物
KR100763744B1 (ko) * 2005-11-07 2007-10-04 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물
JP5732731B2 (ja) * 2010-01-19 2015-06-10 横浜ゴム株式会社 ウレタン結合含有スルホニウム塩化合物およびその製造法
WO2014074372A1 (en) * 2012-11-08 2014-05-15 3M Innovative Properties Company Uv-curable silicone release compositions
CN115352177B (zh) * 2022-08-31 2023-12-08 浙江康尔达新材料股份有限公司 一种具有显色功能的紫外光敏感平版印刷版前体及其制版方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds

Also Published As

Publication number Publication date
JPH02115176A (ja) 1990-04-27
DE68926082T2 (de) 1996-11-28
EP0361682A1 (de) 1990-04-04
KR900004705A (ko) 1990-04-12
EP0361682B1 (de) 1996-03-27
KR0137465B1 (ko) 1998-06-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee