TWI326006B - - Google Patents

Download PDF

Info

Publication number
TWI326006B
TWI326006B TW92121521A TW92121521A TWI326006B TW I326006 B TWI326006 B TW I326006B TW 92121521 A TW92121521 A TW 92121521A TW 92121521 A TW92121521 A TW 92121521A TW I326006 B TWI326006 B TW I326006B
Authority
TW
Taiwan
Prior art keywords
group
photosensitive
photoresist layer
compound
image forming
Prior art date
Application number
TW92121521A
Other languages
English (en)
Chinese (zh)
Other versions
TW200416487A (en
Inventor
Urano Toshiyuki
Yasuhiro Kameyama
Takashi Miyazawa
Eriko Toshimitsu
Original Assignee
Nippon Synthetic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chem Ind filed Critical Nippon Synthetic Chem Ind
Publication of TW200416487A publication Critical patent/TW200416487A/zh
Application granted granted Critical
Publication of TWI326006B publication Critical patent/TWI326006B/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW92121521A 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof TW200416487A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002229416 2002-08-07
JP2002365470 2002-12-17
JP2003017559 2003-01-27
JP2003034161 2003-02-12
JP2003044649 2003-02-21

Publications (2)

Publication Number Publication Date
TW200416487A TW200416487A (en) 2004-09-01
TWI326006B true TWI326006B (enExample) 2010-06-11

Family

ID=31721816

Family Applications (2)

Application Number Title Priority Date Filing Date
TW96137263A TW200839443A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor
TW92121521A TW200416487A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method thereof

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW96137263A TW200839443A (en) 2002-08-07 2003-08-06 Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor

Country Status (5)

Country Link
KR (2) KR20050047088A (enExample)
CN (2) CN101135850B (enExample)
AU (1) AU2003254812A1 (enExample)
TW (2) TW200839443A (enExample)
WO (1) WO2004015497A1 (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100970357B1 (ko) * 2003-09-25 2010-07-16 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
US20080118867A1 (en) * 2004-05-12 2008-05-22 Morimasa Sato Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process
EP1780599A4 (en) * 2004-07-14 2010-09-01 Asahi Kasei E Materials Corp LIGHT-SENSITIVE COMPOSITION, STRUCTURAL PRODUCTION MATERIAL, LIGHT-SENSITIVE LAMINATE, STRUCTURAL PRODUCTION DEVICE AND METHOD OF STRUCTURING PRODUCTION
JP2006154740A (ja) * 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
TW200622491A (en) * 2004-09-28 2006-07-01 Fuji Photo Film Co Ltd Pattern-forming material, pattern-forming device and pattern-forming method
TWI358613B (en) * 2006-03-10 2012-02-21 Rohm & Haas Elect Mat Compositions and processes for photolithography
KR101313538B1 (ko) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
JP4975579B2 (ja) * 2007-10-01 2012-07-11 太陽ホールディングス株式会社 組成物、ドライフィルム、硬化物及びプリント配線板
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5296828B2 (ja) * 2011-04-15 2013-09-25 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
KR20140031948A (ko) * 2011-05-31 2014-03-13 덴끼 가가꾸 고교 가부시키가이샤 에너지선 경화성 수지 조성물
EP2682440A1 (en) * 2012-07-06 2014-01-08 Basf Se A chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt
CN103298265B (zh) * 2013-04-09 2016-04-06 王俊生 一种电路板外层线路成型方法
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用
WO2018030198A1 (ja) 2016-08-08 2018-02-15 日産化学工業株式会社 光硬化性組成物及び半導体装置の製造方法
US10520813B2 (en) 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer
WO2018197379A1 (en) * 2017-04-25 2018-11-01 Merck Patent Gmbh Negative resist formulation for producing undercut pattern profiles
US20230229084A1 (en) * 2020-07-01 2023-07-20 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified photosensitive composition, photosensitive dry film, production method of substrate having template for plating, and production method of plated article
US20220067489A1 (en) 2020-08-28 2022-03-03 Illumina, Inc. Detecting and Filtering Clusters Based on Artificial Intelligence-Predicted Base Calls
EP4315343A1 (en) 2021-03-31 2024-02-07 Illumina, Inc. Artificial intelligence-based base caller with contextual awareness
CN117631439B (zh) * 2022-08-31 2025-10-31 长春人造树脂厂股份有限公司 光阻膜及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09281698A (ja) 1996-04-11 1997-10-31 Mitsubishi Chem Corp カラーフィルター用光重合性組成物
US6468711B1 (en) 1998-09-09 2002-10-22 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
US6335144B1 (en) 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
EP1739484B1 (en) * 2000-04-19 2011-08-24 AGFA Graphics NV Photosensitive lithographic printing plate and method for making a prinitng plate.
JP2002072460A (ja) * 2000-09-05 2002-03-12 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003195526A (ja) * 2001-12-27 2003-07-09 Mitsubishi Chemicals Corp 感光性平版印刷版の刷版方法

Also Published As

Publication number Publication date
CN100573321C (zh) 2009-12-23
WO2004015497A1 (ja) 2004-02-19
CN101135850B (zh) 2011-02-16
TW200839443A (en) 2008-10-01
KR20050047088A (ko) 2005-05-19
CN1675588A (zh) 2005-09-28
KR101003323B1 (ko) 2010-12-22
CN101135850A (zh) 2008-03-05
KR20080011351A (ko) 2008-02-01
TW200416487A (en) 2004-09-01
AU2003254812A1 (en) 2004-02-25

Similar Documents

Publication Publication Date Title
TWI326006B (enExample)
US6261743B1 (en) Antireflective coating compositions comprising photoacid generators
TWI496766B (zh) 鋶衍生物及其作為潛酸之用途
JP4134760B2 (ja) 反射防止膜形成組成物および反射防止膜
JP5782797B2 (ja) 近赤外光吸収色素化合物、近赤外光吸収膜形成材料、及びこれにより形成される近赤外光吸収膜
CZ20004772A3 (cs) Jodoniové soli a jejich použití jako fotoiniciátory v kompozicích, citlivých vůči záření
TW201700468A (zh) 潛酸及其用途
JP2004521372A (ja) 光感応性酸発生剤およびそれらを含むフォトレジスト
JPWO2008038544A1 (ja) レジスト下層膜形成方法及びそれに用いるレジスト下層膜用組成物並びにパターン形成方法
TW200837501A (en) Composition for forming resist underlayer film and method for forming pattern
JP2005128412A (ja) 画像形成材及びそれを用いた画像形成方法
JP4096857B2 (ja) 青紫色レーザー感光性画像形成材料、青紫色レーザー感光性画像形成材及び画像形成方法
TWI354864B (enExample)
JP4501390B2 (ja) 青紫半導体レーザー感光性画像形成材
JP4556531B2 (ja) 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP4337485B2 (ja) 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004295058A (ja) 感光性組成物
JP2004199031A (ja) 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法
TWI639662B (zh) 與上塗光阻合用之塗覆組成物
JP4581387B2 (ja) 感光性樹脂組成物、並びにそれを用いた感光性画像形成材料及び感光性画像形成材
JP4325392B2 (ja) 感光性樹脂組成物、並びにそれを用いた感光性画像形成材料及び感光性画像形成材
JPH1045741A (ja) クマリン化合物およびその用途
JP2008181143A (ja) 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JPWO2012014576A1 (ja) ネガ型感放射線性樹脂組成物
JP2007079567A (ja) 青紫色レーザー感光性レジスト材層を有する画像形成材及びそのレジスト画像形成方法

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent