CN101135850B - 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 - Google Patents

具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 Download PDF

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Publication number
CN101135850B
CN101135850B CN2007101823701A CN200710182370A CN101135850B CN 101135850 B CN101135850 B CN 101135850B CN 2007101823701 A CN2007101823701 A CN 2007101823701A CN 200710182370 A CN200710182370 A CN 200710182370A CN 101135850 B CN101135850 B CN 101135850B
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CN
China
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group
methyl
compound
material layer
photonasty
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Expired - Lifetime
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CN2007101823701A
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Chinese (zh)
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CN101135850A (zh
Inventor
浦野年由
龟山泰弘
藤田理惠子
宫泽隆司
利光惠理子
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Nichigo Morton Co ltd
Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Nippon Synthetic Chemical Industry Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2007101823701A 2002-08-07 2003-08-05 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法 Expired - Lifetime CN101135850B (zh)

Applications Claiming Priority (15)

Application Number Priority Date Filing Date Title
JP2002229416 2002-08-07
JP2002229416 2002-08-07
JP2002-229416 2002-08-07
JP2002365470 2002-12-17
JP2002-365470 2002-12-17
JP2002365470 2002-12-17
JP200317559 2003-01-27
JP2003017559 2003-01-27
JP2003-17559 2003-01-27
JP2003034161 2003-02-12
JP200334161 2003-02-12
JP2003-34161 2003-02-12
JP200344649 2003-02-21
JP2003-44649 2003-02-21
JP2003044649 2003-02-21

Related Parent Applications (1)

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CNB038187469A Division CN100573321C (zh) 2002-08-07 2003-08-05 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

Publications (2)

Publication Number Publication Date
CN101135850A CN101135850A (zh) 2008-03-05
CN101135850B true CN101135850B (zh) 2011-02-16

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CNB038187469A Expired - Lifetime CN100573321C (zh) 2002-08-07 2003-08-05 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法
CN2007101823701A Expired - Lifetime CN101135850B (zh) 2002-08-07 2003-08-05 具有青紫激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

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CNB038187469A Expired - Lifetime CN100573321C (zh) 2002-08-07 2003-08-05 具有青紫色激光感光性抗蚀剂材料层的成像材料及其抗蚀剂成像法

Country Status (5)

Country Link
KR (2) KR20050047088A (enExample)
CN (2) CN100573321C (enExample)
AU (1) AU2003254812A1 (enExample)
TW (2) TW200839443A (enExample)
WO (1) WO2004015497A1 (enExample)

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KR100970357B1 (ko) * 2003-09-25 2010-07-16 니뽄 고오세이가가꾸 고오교오 가부시끼가이샤 네가티브형 청자색 레이저 감광성 조성물, 화상 형성 재료,화상 형성재, 및 화상 형성 방법
US20080118867A1 (en) * 2004-05-12 2008-05-22 Morimasa Sato Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process
JP2006154740A (ja) * 2004-07-14 2006-06-15 Fuji Photo Film Co Ltd 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
EP1780599A4 (en) 2004-07-14 2010-09-01 Asahi Kasei E Materials Corp LIGHT-SENSITIVE COMPOSITION, STRUCTURAL PRODUCTION MATERIAL, LIGHT-SENSITIVE LAMINATE, STRUCTURAL PRODUCTION DEVICE AND METHOD OF STRUCTURING PRODUCTION
TW200622491A (en) * 2004-09-28 2006-07-01 Fuji Photo Film Co Ltd Pattern-forming material, pattern-forming device and pattern-forming method
TWI485064B (zh) * 2006-03-10 2015-05-21 羅門哈斯電子材料有限公司 用於光微影之組成物及製程
KR101313538B1 (ko) * 2006-04-06 2013-10-01 주식회사 동진쎄미켐 네가티브 감광성 수지 조성물
JP4975579B2 (ja) * 2007-10-01 2012-07-11 太陽ホールディングス株式会社 組成物、ドライフィルム、硬化物及びプリント配線板
TWI491982B (zh) * 2009-10-28 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
JP5296828B2 (ja) * 2011-04-15 2013-09-25 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
CN103562267B (zh) * 2011-05-31 2018-11-06 电化株式会社 能量线固化性树脂组合物
EP2682440A1 (en) * 2012-07-06 2014-01-08 Basf Se A chemical mechanical polishing (cmp) composition comprising a non-ionic surfactant and a carbonate salt
CN103298265B (zh) * 2013-04-09 2016-04-06 王俊生 一种电路板外层线路成型方法
KR102145934B1 (ko) * 2014-05-20 2020-08-19 동우 화인켐 주식회사 광경화 패턴의 형성 방법
CN105418674A (zh) * 2015-11-10 2016-03-23 中国乐凯集团有限公司 一种高折射率树脂及其应用
CN109563234B (zh) 2016-08-08 2022-08-23 日产化学株式会社 光固化性组合物及半导体装置的制造方法
US10520813B2 (en) * 2016-12-15 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd Extreme ultraviolet photoresist with high-efficiency electron transfer
TWI816671B (zh) * 2017-04-25 2023-10-01 德商馬克專利公司 用於產生底切圖樣輪廓之負型光阻調配物以及使光阻組合物成像之方法和用於使基板上之圖樣化光阻劑金屬化之剝離方法
US20230229084A1 (en) * 2020-07-01 2023-07-20 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified photosensitive composition, photosensitive dry film, production method of substrate having template for plating, and production method of plated article
US20220067489A1 (en) 2020-08-28 2022-03-03 Illumina, Inc. Detecting and Filtering Clusters Based on Artificial Intelligence-Predicted Base Calls
AU2022248999A1 (en) 2021-03-31 2023-02-02 Illumina, Inc. Artificial intelligence-based base caller with contextual awareness
CN117631439B (zh) * 2022-08-31 2025-10-31 长春人造树脂厂股份有限公司 光阻膜及其应用

Citations (6)

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JPH09281698A (ja) 1996-04-11 1997-10-31 Mitsubishi Chem Corp カラーフィルター用光重合性組成物
EP0985683A1 (en) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
EP1148387A1 (en) * 2000-04-19 2001-10-24 Mitsubishi Chemical Corporation Photosensitive lithographic printing plate and method for making the printing plate
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法

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US6335144B1 (en) 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
JP2002072460A (ja) * 2000-09-05 2002-03-12 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP4152597B2 (ja) * 2001-02-16 2008-09-17 三菱製紙株式会社 感光性組成物
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003195526A (ja) * 2001-12-27 2003-07-09 Mitsubishi Chemicals Corp 感光性平版印刷版の刷版方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09281698A (ja) 1996-04-11 1997-10-31 Mitsubishi Chem Corp カラーフィルター用光重合性組成物
EP0985683A1 (en) * 1998-09-09 2000-03-15 Fuji Photo Film Co., Ltd. Photosensitive composition and method for manufacturing lithographic printing plate
EP1148387A1 (en) * 2000-04-19 2001-10-24 Mitsubishi Chemical Corporation Photosensitive lithographic printing plate and method for making the printing plate
JP2002148801A (ja) * 2000-11-14 2002-05-22 Mitsui Chemicals Inc ポジ型可視光感光性樹脂組成物及びその用途
JP2002169275A (ja) * 2000-12-04 2002-06-14 Mitsui Chemicals Inc 光酸発生剤及びそれを用いた可視光感光性樹脂組成物
JP2002202598A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 感光性組成物およびそれを用いた光重合方法

Also Published As

Publication number Publication date
TWI326006B (enExample) 2010-06-11
CN100573321C (zh) 2009-12-23
KR101003323B1 (ko) 2010-12-22
WO2004015497A1 (ja) 2004-02-19
KR20080011351A (ko) 2008-02-01
AU2003254812A1 (en) 2004-02-25
KR20050047088A (ko) 2005-05-19
TW200416487A (en) 2004-09-01
TW200839443A (en) 2008-10-01
CN1675588A (zh) 2005-09-28
CN101135850A (zh) 2008-03-05

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Owner name: NICHIGO MORTON CO., LTD.

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Co-patentee after: Nichigo-Morton Co.,Ltd.

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