JP4501402B2 - 光硬化性組成物、並びにそれを用いた光硬化性画像形成材料、光硬化性画像形成材、及び画像形成方法 - Google Patents
光硬化性組成物、並びにそれを用いた光硬化性画像形成材料、光硬化性画像形成材、及び画像形成方法 Download PDFInfo
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- JP4501402B2 JP4501402B2 JP2003359494A JP2003359494A JP4501402B2 JP 4501402 B2 JP4501402 B2 JP 4501402B2 JP 2003359494 A JP2003359494 A JP 2003359494A JP 2003359494 A JP2003359494 A JP 2003359494A JP 4501402 B2 JP4501402 B2 JP 4501402B2
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- photocurable
- dimethylamino
- photocurable composition
- meth
- Prior art date
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- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 125000002130 sulfonic acid ester group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- REWDXIKKFOQRID-UHFFFAOYSA-N tetrabutylsilane Chemical compound CCCC[Si](CCCC)(CCCC)CCCC REWDXIKKFOQRID-UHFFFAOYSA-N 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- RYYWUUFWQRZTIU-UHFFFAOYSA-K thiophosphate Chemical compound [O-]P([O-])([O-])=S RYYWUUFWQRZTIU-UHFFFAOYSA-K 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 229940001496 tribasic sodium phosphate Drugs 0.000 description 1
- NNENFOSYDBTCBO-UHFFFAOYSA-M tributyl(hexadecyl)phosphanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC NNENFOSYDBTCBO-UHFFFAOYSA-M 0.000 description 1
- QEXITCCVENILJI-UHFFFAOYSA-M tributyl(phenyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)C1=CC=CC=C1 QEXITCCVENILJI-UHFFFAOYSA-M 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- KEIBTGABMNALIT-UHFFFAOYSA-N triethoxy(2-isocyanatoethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCN=C=O KEIBTGABMNALIT-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- NLKPPXKQMJDBFO-UHFFFAOYSA-N triethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCC)(OCC)OCC)CCC2OC21 NLKPPXKQMJDBFO-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- NIUZJTWSUGSWJI-UHFFFAOYSA-M triethyl(methyl)azanium;chloride Chemical compound [Cl-].CC[N+](C)(CC)CC NIUZJTWSUGSWJI-UHFFFAOYSA-M 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 1
- DBUFXGVMAMMWSD-UHFFFAOYSA-N trimethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OC)(OC)OC)CCC2OC21 DBUFXGVMAMMWSD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- LZTRCELOJRDYMQ-UHFFFAOYSA-N triphenylmethanol Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C1=CC=CC=C1 LZTRCELOJRDYMQ-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- BPFKTJMHOWDJKI-UHFFFAOYSA-N tris(4-chlorophenyl)methanol Chemical compound C=1C=C(Cl)C=CC=1C(C=1C=CC(Cl)=CC=1)(O)C1=CC=C(Cl)C=C1 BPFKTJMHOWDJKI-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Description
(A)水酸基と2以上の(メタ)アクリロイル基とを有するエチレン性不飽和化合物にシリカ及び/又はシリケートが化学結合してなる有機無機複合体
(B)光重合開始剤
(C)エポキシ樹脂のα,β−不飽和基含有カルボン酸付加体に、多価カルボン酸及び/又はその無水物が付加された、不飽和基及びカルボキシル基含有エポキシ樹脂を含むアルカリ可溶性樹脂
(D)エポキシ化合物
まず、本発明の光硬化性組成物に含まれる(A)〜(D)成分について説明する。
得られた感光性画像形成材料の感光性組成物層を、直径7cmのアルミ回転シリンダー状に固定、毎分10から100回転まで回転数を変化させながら中心波長405nm、レーザー出力5mWのレーザー光源(日亜化学工業社製「NLHV500C」)を用いて、像面照度2mW、ビームスポット径20μmで、ビーム走査間隔及び走査速度を変えながら走査露光し、次いで、25℃の0.8重量%炭酸ナトリウムと0.2重量%の炭酸水素ナトリウムからなる水溶液1重量%を現像液として0.15MPaとなるように吹き付け、最小現像時間の1.7倍の時間でスプレー現像することによりネガ画像を現出させた。得られた画像について、20μmの線幅が再現するのに要する露光量を求め、青紫色レーザーに対する感度とした。
画像形成材を50×60mmの大きさに切り出したサンプルを、回折分光照射装置(ナルミ社製「RM−23」)を用い、1kWキセノンランプ(ウシオ電機社製「UI−501C」)を光源として350〜650nmの波長域で分光した光を、横軸方向に露光波長が直線的に、縦軸方向に露光強度が対数的に変化するように設定して10秒間照射して露光し、次いで、25℃の0.8重量%炭酸ナトリウムと0.2重量%の炭酸水素ナトリウムからなる水溶液を現像液として0.15MPaとなるように吹き付け、最小現像時間の2倍の時間でスプレー現像することにより、各露光波長の感度に応じた画像を得、その画像高さから画像形成可能な露光エネルギーを算出し、横軸に波長、縦軸にその露光エネルギーの逆数をプロットすることにより得られる分光感度曲線における極大ピークを読み取った。
前記と同様にして350〜650nmの波長域で波長を変化させて露光し、現像したときの、波長410nmにおける画像形成可能な最小露光量〔S410〕(mJ/cm2)と波長450nmにおける画像形成可能な最小露光量〔S450〕(mJ/cm2)、及び、波長450nm超過650nm以下の各波長における画像形成可能な最小露光量〔S450-650〕/〔S450〕(mJ/cm2)をそれぞれ求め、その比〔S410〕/〔S450〕、及び〔S450-650〕/〔S450〕を算出し、以下の基準で評価した。
A:〔S410 〕/〔S450 〕が0.1以下。
B:〔S410 〕/〔S450 〕が0.1超過0.15以下。
C:〔S410 〕/〔S450 〕が0.15超過0.2以下。
D:〔S410 〕/〔S450 〕が0.2超過。
A:〔S450-650〕/〔S450〕が10超過。
B:〔S450-650〕/〔S450〕が5超過10以下。
C:〔S450-650〕/〔S450〕が1超過5以下。
D:〔S450-650〕/〔S450〕が1以下。
画像形成材を黄色灯照明(約470nm以下の波長の光を遮断した条件)下に、1分間、2分間、5分間、10分間、20分間、30分間放置した後、前記と同様にして、走査露光及び現像処理を行い、前記に比して画像に変化が生じるまでの放置時間を求め、以下の基準で評価した。
A:放置時間が20分以上
B:放置時間が10分以上20分未満
C:放置時間が1分以上10分未満
D:放置時間が1分未満
画像形成材を40℃で5日間放置した後、画像形成に必要な最小露光量でレーザー走査露光して全面硬化層を形成し、次いで、得られた硬化層を150℃で60分間加熱処理した後、硬化層上に1mm間隔で100個の枡目状になるようにカッターで切れ目を入れ、表面にフラックス(タムラ化研社製)を塗布した。次いで、295℃のソルダー浴に30秒間浸漬した後、室温に戻す操作を6回繰り返して行った。その後、硬化層上にセロファンテープ(ニチバン社製)を貼着し、該テープを剥離したときの硬化層の剥離枡目数を測定し、以下の基準で評価した。
A:100個の枡目のうち、硬化層の剥離枡目数が0。
B:100個の枡目のうち、硬化層の剥離枡目数が1個以上5個未満。
C:100個の枡目のうち、硬化層の剥離枡目数が5個以上10個未満。
D:100個の枡目のうち、硬化層の剥離枡目数が10個以上。
組成物塗布液を40℃で5日間放置した後、前記露光感度の測定におけると同様にして、走査露光及び現像処理を行い、前記感度に比しての感度の変化量を測定し、以下の基準で評価した。
A:放置前に比し放置後の感度の低下が1%未満。
B:放置前に比し放置後の感度の低下が1%以上20%以下。
C:放置前に比し放置後の感度の低下が20%超過60%以下。
D:放置前に比し放置後の感度の低下が60%超過。
画像形成材を40℃で5日間放置した後、前記露光感度の測定におけると同様にして、走査露光及び現像処理を行い、前記感度に比しての感度の変化量を測定し、以下の基準で評価した。
A:放置前に比し放置後の感度の低下が1%未満。
B:放置前に比し放置後の感度の低下が1%以上20%以下。
C:放置前に比し放置後の感度の低下が20%超過60%以下。
D:放置前に比し放置後の感度の低下が60%超過。
A−a:下記の方法で合成した有機無機複合体含有IPA溶液
3−イソシアナトプロピルトリメトキシシランと、ジペンタエリスリトールペンタアクリレートを67モル%含有するジペンタエリスリトールヘキサアクリレートとジペンタエリスリトールペンタアクリレートの混合物(日本化薬社製:カヤラッドDPHA、水酸基価69mg−KOH/g)とを、−NCO基/−OH基=1となるように各々205gと813gをフラスコにとり、ハイドロキノンモノメチルエーテル1g、ジラウリン酸ジ−n−ブチル錫0.2gを加え、110℃で3時間反応した。この反応物を赤外線吸収スペクトルにより分析したところ−NCO基の2250cm-1の吸収は認められず、反応が終了したことを確認した。
A’−a:ジペンタエリスリトールヘキサアクリレート
B−a:2−メチル−1−[4−(メチルチオ)フェニル]−2−モルホリノ−1−プ
ロパノン
B−b:2,4−ジエチルチオキサントン
B−c:2−ヒドロキシ−4−n−オクトキシベンゾフェノン
B−d:2,2’−ビス(o−クロロフェニル)−4,4’,5,5’−テトラフェニ
ルビイミダゾール
B−e:ジシクロペンタジエニルチタニウムビス〔2,6−ジフルオロ−3−(1−ピ
ロリル)フェニル〕
C−a:下記の構造を有するクレゾールノボラック型エポキシアクリレートテトラヒド
ロ無水フタル酸付加物樹脂(昭和高分子社製「PR−300」、酸価100m
g−KOH/g、GPC測定による重量平均分子量Mw5000)
水フタル酸付加物樹脂(日本化薬社製「カヤラッドZFR−1122」、酸価
100mg−KOH/g、GPC測定による重量平均分子量Mw4000)
D−a:2,4,6−トリグリシジルイソシアヌル酸(日産化学社製結晶性エポキシ化
合物「Tepic SP」、融点101℃)
D−b:ビキシレノールジグリシジルエーテル(ジャパンエポキシレジン社製結晶性エ
ポキシ化合物「YX4000」、融点105℃)
D−c:クレゾール・ノボラック型エポキシ樹脂(ジャパンエポキシレジン社製「18
0S70」)
D−d:フェノールノボラックオキタセン(宇部興産社製「PNOX−1009」)
アミノ化合物:熱架橋剤として三井サイアナミッド社製「サイメルC300」(メトキ
シメチルメラミン系、メトキシ化率90%以上)
タルク:日本タルク社製「BST」
硫酸バリウム:堺化学社製「B−55」
フタロシアニンブルー:大日精化社製「ブルー2」
エポキシの熱開始剤:ジシアンジアミド
シリカ:日本アエロジル社製「AEROSIL R972」
シリカゾル:日産化学工業株式会社製「IPA−ST」(IPA分散オルガノシリカゾ
ル溶液、固形分30重量%)
表1に示す配合の光硬化性組成物を調製した。
実施例1において、光重合開始剤と増感色素を変更し、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。なお、〔S410〕は14mJ/cm2であり、〔S410〕/〔S450〕,〔S450−650〕/〔S450〕の評価結果はいずれもAであり、黄色灯下でのセーフライト性もAであった。
実施例1において、光重合開始剤B−dと増感色素を配合せず、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例3において、更にエポキシの熱開始剤0.1重量部を配合し、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例3において、アミノ化合物を配合せず、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例3において、エポキシ化合物を変更し、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例4において、(B)エポキシ化合物を変更し、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例3において、更にシリカを配合し、表1に示す光硬化性組成物配合としたこと以外は同様にして光硬化性組成物塗布液を調製した。別に、銅張積層基板(厚み1.5mm、大きさ250mm×200mm)の銅箔表面を、住友スリーエム社製「スコッチブライトSF」を用いてバフロール研磨した後、水洗し、空気流中で乾燥させ、次いで、これをオーブンで60℃に予熱した後、その銅張積層板の銅箔上に、アプリケーターを用いて乾燥膜厚が25μmとなる量でこの塗布液を塗布し、90℃のオーブンで5分間乾燥させ光硬化性画像形成材料を制作し、同様に評価を行って結果を表2に示した。
実施例7において、(A)有機無機複合体の代りに(A’)エチレン性不飽和化合物を用い、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例7において、(D)エポキシ化合物を用いず、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
実施例7において、(A)有機無機複合体の代りにシリカゾルを用い、表1に示す光硬化性組成物配合としたこと以外は同様にして、光硬化性組成物、光硬化性画像形成材及び光硬化性画像形成材材を製造し、その評価結果を表2に示した。
Claims (10)
- 下記(A)成分、(B)成分、(C)成分及び(D)成分を含有することを特徴とする光硬化性組成物。
(A)水酸基と2以上の(メタ)アクリロイル基とを有するエチレン性不飽和化合物にシリカ及び/又はシリケートが化学結合してなる有機無機複合体
(B)光重合開始剤
(C)エポキシ樹脂のα,β−不飽和基含有カルボン酸付加体に、多価カルボン酸及び/又はその無水物が付加された、不飽和基及びカルボキシル基含有エポキシ樹脂を含むアルカリ可溶性樹脂
(D)エポキシ化合物 - (D)エポキシ化合物の融点が50℃以上であり、該エポキシ化合物は、全エポキシ化合物粒子のうち粒径5μm以下のエポキシ化合物粒子の割合が50%以上となるように組成物中に分散されていることを特徴とする請求項1に記載の光硬化性組成物。
- 更に、(E)紫外〜青紫色領域に吸収極大を有する増感色素を含有することを特徴とする請求項1又は2に記載の光硬化性組成物。
- (E)増感色素がジアルキルアミノベンゼン系化合物であることを特徴とする請求項3に記載の光硬化性組成物。
- (B)成分としてα−アミノアセトフェノン誘導体を含有することを特徴とする請求項1ないし4のいずれか1項に記載の光硬化性組成物。
- 仮支持フィルム上に、請求項1ないし5のいずれか1項に記載の光硬化性組成物の層が形成されてなることを特徴とする光硬化性画像形成材料。
- 被加工基板上に、請求項6に記載の光硬化性画像形成材料が該光硬化性組成物層側が該基板側となるように積層されてなることを特徴とする光硬化性画像形成材。
- 被加工基板上に積層された光硬化性組成物層の厚さが、5μm以上であることを特徴とする請求項7に記載の光硬化性画像形成材。
- 光硬化性組成物がソルダーレジストであることを特徴とする請求項7又は8に記載の光硬化性画像形成材。
- 請求項7ないし9のいずれか1項に記載の光硬化性画像形成材の光硬化性組成物層を、波長350〜430nmのレーザー光により走査露光し、現像処理してネガ画像を現出させることを特徴とする画像形成方法。
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JP4699257B2 (ja) * | 2006-03-29 | 2011-06-08 | 三洋化成工業株式会社 | 感光性樹脂組成物 |
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JP2010145425A (ja) * | 2007-03-30 | 2010-07-01 | Fujifilm Corp | 感光性樹脂組成物、感光性フィルム、並びにそれを用いたパターン形成方法及びプリント基板 |
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