JP2004077810A5 - - Google Patents
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- Publication number
- JP2004077810A5 JP2004077810A5 JP2002238157A JP2002238157A JP2004077810A5 JP 2004077810 A5 JP2004077810 A5 JP 2004077810A5 JP 2002238157 A JP2002238157 A JP 2002238157A JP 2002238157 A JP2002238157 A JP 2002238157A JP 2004077810 A5 JP2004077810 A5 JP 2004077810A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkali
- hydrogen atom
- soluble resin
- resist composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000011347 resin Substances 0.000 claims 4
- 229920005989 resin Polymers 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 2
- 239000003431 cross linking reagent Substances 0.000 claims 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- 125000005042 acyloxymethyl group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004849 alkoxymethyl group Chemical group 0.000 claims 1
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000000753 cycloalkyl group Chemical group 0.000 claims 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- -1 nitrogen-containing basic compound Chemical class 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002238157A JP4213925B2 (ja) | 2002-08-19 | 2002-08-19 | ネガ型レジスト組成物 |
| US10/642,291 US7432034B2 (en) | 2002-08-19 | 2003-08-18 | Negative resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002238157A JP4213925B2 (ja) | 2002-08-19 | 2002-08-19 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004077810A JP2004077810A (ja) | 2004-03-11 |
| JP2004077810A5 true JP2004077810A5 (enExample) | 2005-09-22 |
| JP4213925B2 JP4213925B2 (ja) | 2009-01-28 |
Family
ID=31712188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002238157A Expired - Fee Related JP4213925B2 (ja) | 2002-08-19 | 2002-08-19 | ネガ型レジスト組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7432034B2 (enExample) |
| JP (1) | JP4213925B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030054287A1 (en) * | 2001-04-13 | 2003-03-20 | Fuji Photo Film Co., Ltd. | Resist composition |
| JP4770225B2 (ja) * | 2004-03-25 | 2011-09-14 | 三菱瓦斯化学株式会社 | レジスト組成物 |
| WO2008026401A1 (en) * | 2006-08-29 | 2008-03-06 | Jsr Corporation | Photosensitive insulation resin composition and cured product thereof |
| JP4990344B2 (ja) * | 2009-12-04 | 2012-08-01 | 富士フイルム株式会社 | ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP5597616B2 (ja) * | 2011-10-03 | 2014-10-01 | 富士フイルム株式会社 | ネガ型化学増幅レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| JP6267982B2 (ja) * | 2014-02-05 | 2018-01-24 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、電子デバイスの製造方法、新規化合物、及び、新規化合物の製造方法 |
| US10649339B2 (en) * | 2016-12-13 | 2020-05-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Resist material and method for forming semiconductor structure using resist layer |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4873176A (en) * | 1987-08-28 | 1989-10-10 | Shipley Company Inc. | Reticulation resistant photoresist coating |
| JPH0215270A (ja) | 1988-07-04 | 1990-01-18 | Tosoh Corp | フォトレジスト組成物 |
| CA2019693A1 (en) | 1989-07-07 | 1991-01-07 | Karen Ann Graziano | Acid-hardening photoresists of improved sensitivity |
| JP2861309B2 (ja) | 1990-07-12 | 1999-02-24 | 三菱化学株式会社 | ネガ型感光性組成物 |
| KR960015081A (ko) * | 1993-07-15 | 1996-05-22 | 마쯔모또 에이이찌 | 화학증폭형 레지스트 조성물 |
| JP3645362B2 (ja) * | 1996-07-22 | 2005-05-11 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| US6114082A (en) * | 1996-09-16 | 2000-09-05 | International Business Machines Corporation | Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same |
| US6190833B1 (en) * | 1997-03-30 | 2001-02-20 | Jsr Corporation | Radiation-sensitive resin composition |
| JP3929653B2 (ja) * | 1999-08-11 | 2007-06-13 | 富士フイルム株式会社 | ネガ型レジスト組成物 |
| JP3956078B2 (ja) | 1999-10-20 | 2007-08-08 | 信越化学工業株式会社 | レジスト組成物用ベースポリマー並びにレジスト材料及びパターン形成方法 |
| US6653043B1 (en) * | 1999-11-01 | 2003-11-25 | Kansai Research Institute, Inc. | Active particle, photosensitive resin composition, and process for forming pattern |
| JP3790649B2 (ja) | 1999-12-10 | 2006-06-28 | 信越化学工業株式会社 | レジスト材料 |
| SG98433A1 (en) * | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
| JP4070393B2 (ja) * | 2000-01-17 | 2008-04-02 | 富士フイルム株式会社 | ネガ型レジスト組成物 |
| US6576394B1 (en) | 2000-06-16 | 2003-06-10 | Clariant Finance (Bvi) Limited | Negative-acting chemically amplified photoresist composition |
| JP2002049155A (ja) | 2000-08-01 | 2002-02-15 | Fuji Photo Film Co Ltd | レジスト組成物 |
| JP2002131908A (ja) | 2000-10-20 | 2002-05-09 | Fuji Photo Film Co Ltd | 電子線又はｘ線用ネガ型レジスト組成物 |
| JP4645789B2 (ja) * | 2001-06-18 | 2011-03-09 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
| JP3790960B2 (ja) * | 2001-10-19 | 2006-06-28 | 富士写真フイルム株式会社 | ネガ型レジスト組成物 |
| US6977131B2 (en) * | 2002-05-30 | 2005-12-20 | Kodak Polychrome Graphics Llc | Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements |
-
2002
- 2002-08-19 JP JP2002238157A patent/JP4213925B2/ja not_active Expired - Fee Related
-
2003
- 2003-08-18 US US10/642,291 patent/US7432034B2/en not_active Expired - Fee Related