JP2003316007A5 - - Google Patents
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- Publication number
- JP2003316007A5 JP2003316007A5 JP2002126433A JP2002126433A JP2003316007A5 JP 2003316007 A5 JP2003316007 A5 JP 2003316007A5 JP 2002126433 A JP2002126433 A JP 2002126433A JP 2002126433 A JP2002126433 A JP 2002126433A JP 2003316007 A5 JP2003316007 A5 JP 2003316007A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- represent
- resist composition
- general formula
- positive resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- 125000005843 halogen group Chemical group 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 125000005647 linker group Chemical group 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002126433A JP4007582B2 (ja) | 2002-04-26 | 2002-04-26 | ポジ型レジスト組成物 |
| KR1020030026279A KR100955006B1 (ko) | 2002-04-26 | 2003-04-25 | 포지티브 레지스트 조성물 |
| US10/422,789 US7198880B2 (en) | 2002-04-26 | 2003-04-25 | Positive resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002126433A JP4007582B2 (ja) | 2002-04-26 | 2002-04-26 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003316007A JP2003316007A (ja) | 2003-11-06 |
| JP2003316007A5 true JP2003316007A5 (enExample) | 2005-09-22 |
| JP4007582B2 JP4007582B2 (ja) | 2007-11-14 |
Family
ID=29540847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002126433A Expired - Fee Related JP4007582B2 (ja) | 2002-04-26 | 2002-04-26 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4007582B2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4494161B2 (ja) * | 2004-10-14 | 2010-06-30 | 東京応化工業株式会社 | 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法 |
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| JP4562537B2 (ja) * | 2005-01-28 | 2010-10-13 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP4524207B2 (ja) * | 2005-03-02 | 2010-08-11 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| WO2009087981A1 (ja) * | 2008-01-11 | 2009-07-16 | Kri Inc. | 重合性化合物及びこの製造方法 |
| JP5117484B2 (ja) * | 2009-12-28 | 2013-01-16 | 東京応化工業株式会社 | 新規な化合物、及びその製造方法 |
| JP6134603B2 (ja) * | 2013-08-02 | 2017-05-24 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
| JP6152804B2 (ja) * | 2014-01-29 | 2017-06-28 | Jsr株式会社 | 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物 |
| WO2016158711A1 (ja) | 2015-03-31 | 2016-10-06 | 富士フイルム株式会社 | パターン形成方法、及び電子デバイスの製造方法 |
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2002
- 2002-04-26 JP JP2002126433A patent/JP4007582B2/ja not_active Expired - Fee Related