TW575792B - New unsaturated oxime derivatives and the use thereof as latent acids - Google Patents
New unsaturated oxime derivatives and the use thereof as latent acids Download PDFInfo
- Publication number
- TW575792B TW575792B TW88111895A TW88111895A TW575792B TW 575792 B TW575792 B TW 575792B TW 88111895 A TW88111895 A TW 88111895A TW 88111895 A TW88111895 A TW 88111895A TW 575792 B TW575792 B TW 575792B
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- Prior art keywords
- acid
- phenyl
- alkyl
- cns
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- 239000002253 acid Substances 0.000 title claims description 66
- 150000002923 oximes Chemical class 0.000 title description 26
- 150000007513 acids Chemical class 0.000 title description 8
- -1 1-C4 fluorenyl fluorenyl Chemical group 0.000 claims description 180
- 239000000203 mixture Substances 0.000 claims description 87
- 150000001875 compounds Chemical class 0.000 claims description 81
- 125000000217 alkyl group Chemical group 0.000 claims description 59
- 238000000576 coating method Methods 0.000 claims description 53
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 53
- 229920002120 photoresistant polymer Polymers 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 26
- 229920000642 polymer Polymers 0.000 claims description 23
- 238000004132 cross linking Methods 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 18
- 239000000853 adhesive Substances 0.000 claims description 14
- 230000001070 adhesive effect Effects 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims description 11
- 238000007639 printing Methods 0.000 claims description 11
- 230000009471 action Effects 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 239000000976 ink Substances 0.000 claims description 5
- 239000003999 initiator Substances 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 claims 1
- 101000714953 Hololena curta Mu-agatoxin-Hc1b Proteins 0.000 claims 1
- 229910052740 iodine Inorganic materials 0.000 description 50
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- 238000006243 chemical reaction Methods 0.000 description 32
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 30
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- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 23
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Chemical group C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 23
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- 125000001424 substituent group Chemical group 0.000 description 19
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- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
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- 125000003545 alkoxy group Chemical group 0.000 description 17
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- 229910052736 halogen Inorganic materials 0.000 description 17
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- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 11
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- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 10
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- 239000000654 additive Substances 0.000 description 10
- 125000002619 bicyclic group Chemical group 0.000 description 10
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
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- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 7
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- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 6
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- 125000002947 alkylene group Chemical group 0.000 description 6
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
- C07C309/66—Methanesulfonates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Plural Heterocyclic Compounds (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98810810 | 1998-08-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW575792B true TW575792B (en) | 2004-02-11 |
Family
ID=8236266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW88111895A TW575792B (en) | 1998-08-19 | 1999-07-12 | New unsaturated oxime derivatives and the use thereof as latent acids |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6703182B1 (enExample) |
| EP (1) | EP1105373B1 (enExample) |
| JP (1) | JP4489954B2 (enExample) |
| KR (1) | KR100640092B1 (enExample) |
| CN (1) | CN100340547C (enExample) |
| AU (1) | AU5373999A (enExample) |
| DE (1) | DE69903453T2 (enExample) |
| MY (1) | MY117695A (enExample) |
| TW (1) | TW575792B (enExample) |
| WO (1) | WO2000010972A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI742165B (zh) * | 2017-09-27 | 2021-10-11 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置 |
Families Citing this family (38)
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| ATE330254T1 (de) | 1999-03-03 | 2006-07-15 | Ciba Sc Holding Ag | Oximderivate und ihre verwendung als photoinitiatoren |
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
| JP4685265B2 (ja) * | 2001-05-10 | 2011-05-18 | コダック株式会社 | 感光性組成物、感光性平版印刷版および平版印刷版の作成方法 |
| JP4951827B2 (ja) * | 2001-08-17 | 2012-06-13 | Jsr株式会社 | スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物 |
| BR0307501A (pt) | 2002-02-06 | 2004-12-07 | Ciba Sc Holding Ag | Derivados de sulfonato e o uso destes como ácidos latentes |
| CN100361815C (zh) * | 2002-04-24 | 2008-01-16 | 东芝泰格有限公司 | 喷墨记录设备 |
| AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
| WO2004074242A2 (en) * | 2003-02-19 | 2004-09-02 | Ciba Specialty Chemicals Holding Inc. | Halogenated oxime derivatives and the use thereof as latent acids |
| US8026296B2 (en) * | 2005-12-20 | 2011-09-27 | 3M Innovative Properties Company | Dental compositions including a thermally labile component, and the use thereof |
| JP4996870B2 (ja) * | 2006-03-28 | 2012-08-08 | 富士フイルム株式会社 | 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| EP2037323B1 (en) * | 2007-07-17 | 2014-12-10 | FUJIFILM Corporation | Photosensitive compositions |
| JP5507054B2 (ja) * | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
| DE102008038943A1 (de) | 2008-08-11 | 2010-02-18 | Borealis Agrolinz Melamine Gmbh | Vernetzbare Acrylatharze |
| WO2010112408A1 (en) | 2009-03-30 | 2010-10-07 | Basf Se | Uv-dose indicator films |
| CN102640055B (zh) | 2009-12-07 | 2015-02-25 | 爱克发印艺公司 | Uv-led可固化组合物和墨水 |
| US8957224B2 (en) | 2009-12-07 | 2015-02-17 | Agfa Graphics Nv | Photoinitiators for UV-LED curable compositions and inks |
| KR101813298B1 (ko) * | 2010-02-24 | 2017-12-28 | 바스프 에스이 | 잠재성 산 및 그의 용도 |
| ES2706881T3 (es) | 2014-05-30 | 2019-04-01 | Igm Resins Italia Srl | Fotoiniciadores de óxido de acilfosfina multifuncionales |
| JP7408909B2 (ja) | 2018-09-07 | 2024-01-09 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 多機能性ビスアシルホスフィンオキシド光開始剤 |
| JP7472429B2 (ja) | 2018-12-28 | 2024-04-23 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 光開始剤 |
| WO2021070152A1 (en) | 2019-10-11 | 2021-04-15 | Igm Resins Italia S.R.L. | Coumarin glyoxylates for led photocuring |
| IT202000023815A1 (it) | 2020-10-09 | 2022-04-09 | Igm Resins Italia Srl | Ketoquinolones as photonitiators |
| IT202100014885A1 (it) | 2021-06-08 | 2022-12-08 | Igm Resins Italia Srl | Fotoiniziatori a base di silicio bifunzionali |
| IT202100025868A1 (it) | 2021-10-08 | 2023-04-08 | Igm Resins Italia Srl | Nuovi fotoiniziatori |
| WO2023161049A1 (en) | 2022-02-24 | 2023-08-31 | Igm Resins Italia S.R.L. | Photoinitiators |
| KR20250006220A (ko) | 2022-05-06 | 2025-01-10 | 아이지엠 그룹 비.브이. | 포스핀 산화물 광개시제, 쿠마린계 감응제 및 아민 첨가제를 포함하는 광개시제 패키지 |
| CN119137225A (zh) | 2022-05-06 | 2024-12-13 | Igm集团公司 | 包含氧化膦光引发剂、基于噁唑的敏化剂和胺添加剂的光引发剂包 |
| EP4273200A1 (en) | 2022-05-06 | 2023-11-08 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers |
| WO2024074945A1 (en) | 2022-10-05 | 2024-04-11 | Igm Resins Italia S.R.L. | Polymeric (meth)acrylate photoinitiators |
| IT202300004737A1 (it) | 2023-03-14 | 2024-09-14 | Igm Resins Italia Srl | Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led |
| WO2025027517A1 (en) | 2023-08-03 | 2025-02-06 | Igm Resins Italia S.R.L. | 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions |
| EP4534614A1 (en) | 2023-10-02 | 2025-04-09 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers |
| WO2025140854A2 (en) | 2023-12-28 | 2025-07-03 | Igm Resins Italia S.R.L. | NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE |
| EP4578918A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Photosensitizers for photopolymerization |
| EP4579344A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Thioalkylcoumarin photosensitizers for photopolymerization |
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| US4123255A (en) * | 1977-01-03 | 1978-10-31 | Chevron Research Company | O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes |
| US4347372A (en) * | 1978-09-01 | 1982-08-31 | Ciba-Geigy Corporation | Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives |
| US4346094A (en) * | 1980-09-22 | 1982-08-24 | Eli Lilly And Company | 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels |
| US4510294A (en) * | 1982-07-02 | 1985-04-09 | Polaroid Corporation | Polymerization of monomeric hydrogen-blocked oxime derivatives |
| US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| GB8608528D0 (en) * | 1986-04-08 | 1986-05-14 | Ciba Geigy Ag | Production of positive images |
| KR900005226A (ko) * | 1988-09-29 | 1990-04-13 | 윌리엄 비이 해리스 | 감광성 조성물 및 양화 상과 음화 상의 생성방법 |
| US5019488A (en) * | 1988-09-29 | 1991-05-28 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
| EP0571330B1 (de) | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
| MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| CN1133901C (zh) * | 1996-09-02 | 2004-01-07 | 西巴特殊化学品控股有限公司 | 用于高感光的高分辨性i-谱线光致抗蚀剂的烷基磺酰肟化合物 |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
-
1999
- 1999-07-12 TW TW88111895A patent/TW575792B/zh not_active IP Right Cessation
- 1999-07-21 MY MYPI99003079A patent/MY117695A/en unknown
- 1999-08-06 AU AU53739/99A patent/AU5373999A/en not_active Abandoned
- 1999-08-06 CN CNB998098116A patent/CN100340547C/zh not_active Expired - Fee Related
- 1999-08-06 US US09/763,016 patent/US6703182B1/en not_active Expired - Lifetime
- 1999-08-06 DE DE69903453T patent/DE69903453T2/de not_active Expired - Lifetime
- 1999-08-06 EP EP99939454A patent/EP1105373B1/en not_active Expired - Lifetime
- 1999-08-06 KR KR1020017002132A patent/KR100640092B1/ko not_active Expired - Fee Related
- 1999-08-06 WO PCT/EP1999/005698 patent/WO2000010972A1/en not_active Ceased
- 1999-08-06 JP JP2000566246A patent/JP4489954B2/ja not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI742165B (zh) * | 2017-09-27 | 2021-10-11 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4489954B2 (ja) | 2010-06-23 |
| CN100340547C (zh) | 2007-10-03 |
| KR20010085415A (ko) | 2001-09-07 |
| KR100640092B1 (ko) | 2006-10-31 |
| JP2002523398A (ja) | 2002-07-30 |
| US6703182B1 (en) | 2004-03-09 |
| EP1105373B1 (en) | 2002-10-09 |
| WO2000010972A1 (en) | 2000-03-02 |
| CN1313850A (zh) | 2001-09-19 |
| DE69903453D1 (de) | 2002-11-14 |
| MY117695A (en) | 2004-07-31 |
| DE69903453T2 (de) | 2003-07-03 |
| EP1105373A1 (en) | 2001-06-13 |
| AU5373999A (en) | 2000-03-14 |
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Legal Events
| Date | Code | Title | Description |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |