DE69903453T2 - Ungesättigte oxim-derivate und ihre anwendung als latente säuren - Google Patents

Ungesättigte oxim-derivate und ihre anwendung als latente säuren

Info

Publication number
DE69903453T2
DE69903453T2 DE69903453T DE69903453T DE69903453T2 DE 69903453 T2 DE69903453 T2 DE 69903453T2 DE 69903453 T DE69903453 T DE 69903453T DE 69903453 T DE69903453 T DE 69903453T DE 69903453 T2 DE69903453 T2 DE 69903453T2
Authority
DE
Germany
Prior art keywords
phenyl
alkyl
substituted
unsubstituted
radicals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69903453T
Other languages
German (de)
English (en)
Other versions
DE69903453D1 (de
Inventor
Toshikage Asakura
Jean- Luc Birbaum
Hitoshi Yamato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of DE69903453D1 publication Critical patent/DE69903453D1/de
Application granted granted Critical
Publication of DE69903453T2 publication Critical patent/DE69903453T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE69903453T 1998-08-19 1999-08-06 Ungesättigte oxim-derivate und ihre anwendung als latente säuren Expired - Lifetime DE69903453T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98810810 1998-08-19
PCT/EP1999/005698 WO2000010972A1 (en) 1998-08-19 1999-08-06 New unsaturated oxime derivatives and the use thereof as latent acids

Publications (2)

Publication Number Publication Date
DE69903453D1 DE69903453D1 (de) 2002-11-14
DE69903453T2 true DE69903453T2 (de) 2003-07-03

Family

ID=8236266

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69903453T Expired - Lifetime DE69903453T2 (de) 1998-08-19 1999-08-06 Ungesättigte oxim-derivate und ihre anwendung als latente säuren

Country Status (10)

Country Link
US (1) US6703182B1 (enExample)
EP (1) EP1105373B1 (enExample)
JP (1) JP4489954B2 (enExample)
KR (1) KR100640092B1 (enExample)
CN (1) CN100340547C (enExample)
AU (1) AU5373999A (enExample)
DE (1) DE69903453T2 (enExample)
MY (1) MY117695A (enExample)
TW (1) TW575792B (enExample)
WO (1) WO2000010972A1 (enExample)

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BR0307501A (pt) 2002-02-06 2004-12-07 Ciba Sc Holding Ag Derivados de sulfonato e o uso destes como ácidos latentes
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AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
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US8957224B2 (en) 2009-12-07 2015-02-17 Agfa Graphics Nv Photoinitiators for UV-LED curable compositions and inks
KR101813298B1 (ko) * 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置
JP7408909B2 (ja) 2018-09-07 2024-01-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多機能性ビスアシルホスフィンオキシド光開始剤
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
KR20250006220A (ko) 2022-05-06 2025-01-10 아이지엠 그룹 비.브이. 포스핀 산화물 광개시제, 쿠마린계 감응제 및 아민 첨가제를 포함하는 광개시제 패키지
CN119137225A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于噁唑的敏化剂和胺添加剂的光引发剂包
EP4273200A1 (en) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
WO2025027517A1 (en) 2023-08-03 2025-02-06 Igm Resins Italia S.R.L. 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions
EP4534614A1 (en) 2023-10-02 2025-04-09 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
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EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization

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Also Published As

Publication number Publication date
JP4489954B2 (ja) 2010-06-23
CN100340547C (zh) 2007-10-03
KR20010085415A (ko) 2001-09-07
TW575792B (en) 2004-02-11
KR100640092B1 (ko) 2006-10-31
JP2002523398A (ja) 2002-07-30
US6703182B1 (en) 2004-03-09
EP1105373B1 (en) 2002-10-09
WO2000010972A1 (en) 2000-03-02
CN1313850A (zh) 2001-09-19
DE69903453D1 (de) 2002-11-14
MY117695A (en) 2004-07-31
EP1105373A1 (en) 2001-06-13
AU5373999A (en) 2000-03-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC