JP2005268781A5 - - Google Patents

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Publication number
JP2005268781A5
JP2005268781A5 JP2005059886A JP2005059886A JP2005268781A5 JP 2005268781 A5 JP2005268781 A5 JP 2005268781A5 JP 2005059886 A JP2005059886 A JP 2005059886A JP 2005059886 A JP2005059886 A JP 2005059886A JP 2005268781 A5 JP2005268781 A5 JP 2005268781A5
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JP
Japan
Prior art keywords
exposure
projection system
projection
illumination
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005059886A
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English (en)
Japanese (ja)
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JP2005268781A (ja
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Publication date
Priority claimed from DE102004013886A external-priority patent/DE102004013886A1/de
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Publication of JP2005268781A publication Critical patent/JP2005268781A/ja
Publication of JP2005268781A5 publication Critical patent/JP2005268781A5/ja
Pending legal-status Critical Current

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JP2005059886A 2004-03-16 2005-03-04 多重露光方法、マイクロリソグラフィー投影露光装置および投影系 Pending JP2005268781A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004013886A DE102004013886A1 (de) 2004-03-16 2004-03-16 Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem

Related Child Applications (1)

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JP2010216895A Division JP2011029655A (ja) 2004-03-16 2010-09-28 多重露光方法、マイクロリソグラフィー投影露光装置および投影系

Publications (2)

Publication Number Publication Date
JP2005268781A JP2005268781A (ja) 2005-09-29
JP2005268781A5 true JP2005268781A5 (enExample) 2008-04-03

Family

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Family Applications (2)

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JP2005059886A Pending JP2005268781A (ja) 2004-03-16 2005-03-04 多重露光方法、マイクロリソグラフィー投影露光装置および投影系
JP2010216895A Pending JP2011029655A (ja) 2004-03-16 2010-09-28 多重露光方法、マイクロリソグラフィー投影露光装置および投影系

Family Applications After (1)

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JP2010216895A Pending JP2011029655A (ja) 2004-03-16 2010-09-28 多重露光方法、マイクロリソグラフィー投影露光装置および投影系

Country Status (3)

Country Link
US (3) US7561253B2 (enExample)
JP (2) JP2005268781A (enExample)
DE (1) DE102004013886A1 (enExample)

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CN103019041B (zh) * 2012-11-26 2014-10-22 京东方科技集团股份有限公司 一种曝光机
TWI676083B (zh) * 2013-09-25 2019-11-01 荷蘭商Asml荷蘭公司 光束傳遞裝置及方法
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DE102014215088A1 (de) * 2014-07-31 2016-02-04 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung für ein Projektionsbelichtungssystem
DE102014221173A1 (de) * 2014-10-17 2016-04-21 Carl Zeiss Smt Gmbh Strahlungsquellenmodul
TWI701517B (zh) 2014-12-23 2020-08-11 德商卡爾蔡司Smt有限公司 光學構件
DE102014226918A1 (de) * 2014-12-23 2016-06-23 Carl Zeiss Smt Gmbh Optische Komponente
DE102015212878A1 (de) * 2015-07-09 2017-01-12 Carl Zeiss Smt Gmbh Strahlführungsvorrichtung
DE102022205272A1 (de) 2022-05-25 2023-11-30 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
DE102022205273B3 (de) 2022-05-25 2023-01-26 Carl Zeiss Smt Gmbh Beleuchtungssystem, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren

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