JP2005205915A - インプリント・エンボッシング位置合せシステム - Google Patents
インプリント・エンボッシング位置合せシステム Download PDFInfo
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- JP2005205915A JP2005205915A JP2005013161A JP2005013161A JP2005205915A JP 2005205915 A JP2005205915 A JP 2005205915A JP 2005013161 A JP2005013161 A JP 2005013161A JP 2005013161 A JP2005013161 A JP 2005013161A JP 2005205915 A JP2005205915 A JP 2005205915A
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/263—Preparing and using a stamper, e.g. pressing or injection molding substrates
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S425/00—Plastic article or earthenware shaping or treating: apparatus
- Y10S425/81—Sound record
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/21—Circular sheet or circular blank
- Y10T428/219—Edge structure
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
【解決手段】一実施形態において、このシステムは、底面を有するダイと、底面の上に配置されたエンボッシング箔と、ダイの中央部を貫通するロッド部を有する、基板を受け取るための円筒とを備える。このシステムは、ロッド部のまわりに配置されたボール・ブッシングと、ボール・ブッシングとエンボッシング箔の間に配置されて、ロッド部の中心線とエンボッシング箔の中心線との正確な位置合せを維持する環状部をも備える。
【選択図】図2
Description
Claims (26)
- 底面を有するダイと、
前記底面の上に配置されたエンボッシング箔と、
前記ダイの中央部を貫通するロッド部を有し、基板を受け取るマンドレルと、
前記ロッド部のまわりに配置されたボール・ブッシングと、
前記ボール・ブッシングと前記エンボッシング箔の間に配置されて、前記ロッド部の中心線と前記エンボッシング箔の中心線との正確な位置合せを維持する環状部とを備えた装置。 - 前記マンドレルが、先細りになって、基板の内側寸法の縁によって区画された穴を有する前記基板を受け取る請求項1に記載の装置。
- 前記ロッド部のまわりに配置され、前記エンボッシング箔に接触する外側スリーブをさらに備える請求項2に記載の装置。
- 前記ボール・ブッシングの熱膨張によって、前記環状部が前記エンボッシング箔の内側寸法に固定されて、前記基板を前記エンボッシング箔の中心に合わせる請求項3に記載の装置。
- 前記外側スリーブが、前記エンボッシング箔の中央部を持ち上げて、前記基板を前記エンボッシング箔から分離させる請求項3に記載の装置。
- 前記底面が弾性パッドを備える請求項1に記載の装置。
- 前記基板がディスクを含む請求項1に記載の装置。
- 軸およびエンボッシング箔を有するダイ組立品を設ける工程と、
前記軸のまわりに配置されたボール・ブッシングを加熱する工程と、
前記軸の中心線と前記エンボッシング箔の中心線の位置を合わせる工程とを含む方法。 - 加熱する工程が、前記ボール・ブッシングを膨張させて、前記軸を前記エンボッシング箔に固定する工程をさらに含む請求項8に記載の方法。
- 位置を合わせる工程が、前記軸のまわりに配置された環状部を前記エンボッシング箔に結合させる工程をさらに含む請求項9に記載の方法。
- 位置を合わせる工程が、基板の内側寸法の縁によって区画された穴を有し、エンボス可能フィルムが配置された基板を受け取る工程をさらに含む請求項10に記載の方法。
- 前記基板の中心線と前記エンボッシング箔の中心線の位置を合わせる工程をさらに含む請求項11に記載の方法。
- 前記エンボッシング箔を前記基板の前記エンボス可能フィルムに押しつける工程をさらに含む請求項12に記載の方法。
- 前記エンボス可能フィルムから前記エンボッシング箔を分離する工程をさらに含む請求項13に記載の方法。
- 分離する工程が、前記基板の内径付近まで前記環状部を引き上げる工程をさらに含む請求項14に記載の方法。
- 前記エンボス可能箔をほぼエンボス温度に予備加熱することをさらに含む請求項10に記載の方法。
- ダイ組立品内に基板を配置する手段と、
ボール・ブッシングを前記ダイ組立品内に配置した状態で、前記基板の中心をエンボッシング箔に対して合わせる手段とを備えた装置。 - 中心を合わせる手段が、前記ボール・ブッシングを膨張させて、前記基板の中心線に対して前記エンボスの中心線に合わせる手段をさらに備える請求項17に記載の装置。
- 前記エンボッシング箔を前記基板上に配置されたエンボス可能フィルムに押しつける手段をさらに備える請求項18に記載の装置。
- 前記エンボス可能箔を前記エンボス可能フィルムから分離する手段をさらに備えた請求項19に記載の装置。
- 前記エンボス可能フィルムを予備加熱する手段をさらに備えた請求項20に記載の装置。
- 上部ダイ組立品と、
下部ダイ組立品と、
前記上部ダイ組立品を前記下部ダイ組立品に結合させるための引張棒と、
前記下部ダイ組立品の下に配置されたプレス底板と、
前記上部組立品を引張棒に沿って前記下部ダイ組立品の方へ移動させるように、前記プレス底板の下に配置されたガス・アクチェータとを備えた装置。 - 前記上部ダイ組立品の上に配置され、前記引張棒に結合された横棒をさらに備える請求項22に記載の装置。
- 前記ガス駆動ブラダの膨張によって、前記横棒を下げる請求項23に記載の装置。
- 前記上部ダイ組立品と前記下部ダイ組立品の間に配置された支柱をさらに含む請求項22に記載の装置。
- 前記ガス駆動が強力密封ブラダを備える請求項22に記載の装置。
Applications Claiming Priority (2)
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US10/761,464 | 2004-01-20 | ||
US10/761,464 US7686606B2 (en) | 2004-01-20 | 2004-01-20 | Imprint embossing alignment system |
Publications (3)
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JP2005205915A true JP2005205915A (ja) | 2005-08-04 |
JP2005205915A5 JP2005205915A5 (ja) | 2008-02-28 |
JP4814527B2 JP4814527B2 (ja) | 2011-11-16 |
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US (2) | US7686606B2 (ja) |
JP (1) | JP4814527B2 (ja) |
DE (1) | DE102005001476A1 (ja) |
MY (1) | MY142294A (ja) |
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---|---|---|---|---|
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US8253941B2 (en) | 2006-05-09 | 2012-08-28 | Samsung Electronics Co., Ltd. | Apparatus for manufacturing display panel and method for manufacturing the same |
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---|---|---|---|---|
US7686606B2 (en) | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
US7684152B2 (en) * | 2004-09-24 | 2010-03-23 | Wd Media, Inc. | Method of mitigating eccentricity in a disk drive with DTR media |
US7363854B2 (en) | 2004-12-16 | 2008-04-29 | Asml Holding N.V. | System and method for patterning both sides of a substrate utilizing imprint lithography |
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US7410591B2 (en) * | 2004-12-16 | 2008-08-12 | Asml Holding N.V. | Method and system for making a nano-plate for imprint lithography |
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US7331283B2 (en) * | 2004-12-16 | 2008-02-19 | Asml Holding N.V. | Method and apparatus for imprint pattern replication |
EP1924425B1 (en) * | 2005-08-26 | 2012-07-04 | Quickstep Technologies Pty, Ltd | Reticulation system for composite component production |
AR061903A1 (es) * | 2007-07-17 | 2008-10-01 | Eduardo Jose Collazuol | Sistema de cambio rapido de dispositivos neumaticos de expulsion de pastillas de jabones de la matriz |
JP5117895B2 (ja) | 2008-03-17 | 2013-01-16 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体及びその製造方法 |
JP2009238299A (ja) | 2008-03-26 | 2009-10-15 | Hoya Corp | 垂直磁気記録媒体および垂直磁気記録媒体の製造方法 |
JP5453666B2 (ja) * | 2008-03-30 | 2014-03-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク及びその製造方法 |
WO2009129441A2 (en) * | 2008-04-17 | 2009-10-22 | Massachusetts Institute Of Technology | Symmetric thermocentric flexure with minimal yaw error motion |
JP5370806B2 (ja) * | 2008-04-22 | 2013-12-18 | 富士電機株式会社 | インプリント方法およびその装置 |
JP5077764B2 (ja) * | 2008-04-22 | 2012-11-21 | 富士電機株式会社 | インプリント方法およびその装置 |
US7924519B2 (en) * | 2008-09-29 | 2011-04-12 | Wd Media, Inc. | Eccentricity determination for a disk |
WO2010038773A1 (ja) | 2008-09-30 | 2010-04-08 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
WO2010064724A1 (ja) | 2008-12-05 | 2010-06-10 | Hoya株式会社 | 磁気ディスク及びその製造方法 |
JP5218909B2 (ja) * | 2008-12-22 | 2013-06-26 | 富士電機株式会社 | インプリント装置 |
US9558778B2 (en) | 2009-03-28 | 2017-01-31 | Wd Media (Singapore) Pte. Ltd. | Lubricant compound for magnetic disk and magnetic disk |
US8431258B2 (en) | 2009-03-30 | 2013-04-30 | Wd Media (Singapore) Pte. Ltd. | Perpendicular magnetic recording medium and method of manufacturing the same |
US20100300884A1 (en) | 2009-05-26 | 2010-12-02 | Wd Media, Inc. | Electro-deposited passivation coatings for patterned media |
US8496466B1 (en) | 2009-11-06 | 2013-07-30 | WD Media, LLC | Press system with interleaved embossing foil holders for nano-imprinting of recording media |
US8402638B1 (en) | 2009-11-06 | 2013-03-26 | Wd Media, Inc. | Press system with embossing foil free to expand for nano-imprinting of recording media |
US9330685B1 (en) | 2009-11-06 | 2016-05-03 | WD Media, LLC | Press system for nano-imprinting of recording media with a two step pressing method |
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JP5634749B2 (ja) | 2010-05-21 | 2014-12-03 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 垂直磁気ディスク |
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JP2011248969A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
JP2011248968A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスク |
JP2011248967A (ja) | 2010-05-28 | 2011-12-08 | Wd Media (Singapore) Pte. Ltd | 垂直磁気ディスクの製造方法 |
JP2012009086A (ja) | 2010-06-22 | 2012-01-12 | Wd Media (Singapore) Pte. Ltd | 垂直磁気記録媒体及びその製造方法 |
US8889275B1 (en) | 2010-08-20 | 2014-11-18 | WD Media, LLC | Single layer small grain size FePT:C film for heat assisted magnetic recording media |
US8743666B1 (en) | 2011-03-08 | 2014-06-03 | Western Digital Technologies, Inc. | Energy assisted magnetic recording medium capable of suppressing high DC readback noise |
US8711499B1 (en) | 2011-03-10 | 2014-04-29 | WD Media, LLC | Methods for measuring media performance associated with adjacent track interference |
US8491800B1 (en) | 2011-03-25 | 2013-07-23 | WD Media, LLC | Manufacturing of hard masks for patterning magnetic media |
US9028985B2 (en) | 2011-03-31 | 2015-05-12 | WD Media, LLC | Recording media with multiple exchange coupled magnetic layers |
US8565050B1 (en) | 2011-12-20 | 2013-10-22 | WD Media, LLC | Heat assisted magnetic recording media having moment keeper layer |
US9029308B1 (en) | 2012-03-28 | 2015-05-12 | WD Media, LLC | Low foam media cleaning detergent |
US9269480B1 (en) | 2012-03-30 | 2016-02-23 | WD Media, LLC | Systems and methods for forming magnetic recording media with improved grain columnar growth for energy assisted magnetic recording |
US8941950B2 (en) | 2012-05-23 | 2015-01-27 | WD Media, LLC | Underlayers for heat assisted magnetic recording (HAMR) media |
US8993134B2 (en) | 2012-06-29 | 2015-03-31 | Western Digital Technologies, Inc. | Electrically conductive underlayer to grow FePt granular media with (001) texture on glass substrates |
US9034492B1 (en) | 2013-01-11 | 2015-05-19 | WD Media, LLC | Systems and methods for controlling damping of magnetic media for heat assisted magnetic recording |
US10115428B1 (en) | 2013-02-15 | 2018-10-30 | Wd Media, Inc. | HAMR media structure having an anisotropic thermal barrier layer |
US9153268B1 (en) | 2013-02-19 | 2015-10-06 | WD Media, LLC | Lubricants comprising fluorinated graphene nanoribbons for magnetic recording media structure |
US9183867B1 (en) | 2013-02-21 | 2015-11-10 | WD Media, LLC | Systems and methods for forming implanted capping layers in magnetic media for magnetic recording |
US9196283B1 (en) | 2013-03-13 | 2015-11-24 | Western Digital (Fremont), Llc | Method for providing a magnetic recording transducer using a chemical buffer |
US20140264998A1 (en) | 2013-03-14 | 2014-09-18 | Q1 Nanosystems Corporation | Methods for manufacturing three-dimensional metamaterial devices with photovoltaic bristles |
US9954126B2 (en) | 2013-03-14 | 2018-04-24 | Q1 Nanosystems Corporation | Three-dimensional photovoltaic devices including cavity-containing cores and methods of manufacture |
US9190094B2 (en) | 2013-04-04 | 2015-11-17 | Western Digital (Fremont) | Perpendicular recording media with grain isolation initiation layer and exchange breaking layer for signal-to-noise ratio enhancement |
US9093122B1 (en) | 2013-04-05 | 2015-07-28 | WD Media, LLC | Systems and methods for improving accuracy of test measurements involving aggressor tracks written to disks of hard disk drives |
US8947987B1 (en) | 2013-05-03 | 2015-02-03 | WD Media, LLC | Systems and methods for providing capping layers for heat assisted magnetic recording media |
US8867322B1 (en) | 2013-05-07 | 2014-10-21 | WD Media, LLC | Systems and methods for providing thermal barrier bilayers for heat assisted magnetic recording media |
US9296082B1 (en) | 2013-06-11 | 2016-03-29 | WD Media, LLC | Disk buffing apparatus with abrasive tape loading pad having a vibration absorbing layer |
US9406330B1 (en) | 2013-06-19 | 2016-08-02 | WD Media, LLC | Method for HDD disk defect source detection |
US9607646B2 (en) | 2013-07-30 | 2017-03-28 | WD Media, LLC | Hard disk double lubrication layer |
US9389135B2 (en) | 2013-09-26 | 2016-07-12 | WD Media, LLC | Systems and methods for calibrating a load cell of a disk burnishing machine |
US9177585B1 (en) | 2013-10-23 | 2015-11-03 | WD Media, LLC | Magnetic media capable of improving magnetic properties and thermal management for heat-assisted magnetic recording |
US9581510B1 (en) | 2013-12-16 | 2017-02-28 | Western Digital Technologies, Inc. | Sputter chamber pressure gauge with vibration absorber |
US9382496B1 (en) | 2013-12-19 | 2016-07-05 | Western Digital Technologies, Inc. | Lubricants with high thermal stability for heat-assisted magnetic recording |
US9824711B1 (en) | 2014-02-14 | 2017-11-21 | WD Media, LLC | Soft underlayer for heat assisted magnetic recording media |
US9447368B1 (en) | 2014-02-18 | 2016-09-20 | WD Media, LLC | Detergent composition with low foam and high nickel solubility |
US9431045B1 (en) | 2014-04-25 | 2016-08-30 | WD Media, LLC | Magnetic seed layer used with an unbalanced soft underlayer |
US9042053B1 (en) | 2014-06-24 | 2015-05-26 | WD Media, LLC | Thermally stabilized perpendicular magnetic recording medium |
US9159350B1 (en) | 2014-07-02 | 2015-10-13 | WD Media, LLC | High damping cap layer for magnetic recording media |
US10054363B2 (en) | 2014-08-15 | 2018-08-21 | WD Media, LLC | Method and apparatus for cryogenic dynamic cooling |
US9082447B1 (en) | 2014-09-22 | 2015-07-14 | WD Media, LLC | Determining storage media substrate material type |
US9685184B1 (en) | 2014-09-25 | 2017-06-20 | WD Media, LLC | NiFeX-based seed layer for magnetic recording media |
US8995078B1 (en) | 2014-09-25 | 2015-03-31 | WD Media, LLC | Method of testing a head for contamination |
US9227324B1 (en) | 2014-09-25 | 2016-01-05 | WD Media, LLC | Mandrel for substrate transport system with notch |
US9449633B1 (en) | 2014-11-06 | 2016-09-20 | WD Media, LLC | Smooth structures for heat-assisted magnetic recording media |
US9818442B2 (en) | 2014-12-01 | 2017-11-14 | WD Media, LLC | Magnetic media having improved magnetic grain size distribution and intergranular segregation |
US9401300B1 (en) | 2014-12-18 | 2016-07-26 | WD Media, LLC | Media substrate gripper including a plurality of snap-fit fingers |
US9218850B1 (en) | 2014-12-23 | 2015-12-22 | WD Media, LLC | Exchange break layer for heat-assisted magnetic recording media |
US9257134B1 (en) | 2014-12-24 | 2016-02-09 | Western Digital Technologies, Inc. | Allowing fast data zone switches on data storage devices |
US9990940B1 (en) | 2014-12-30 | 2018-06-05 | WD Media, LLC | Seed structure for perpendicular magnetic recording media |
US9280998B1 (en) | 2015-03-30 | 2016-03-08 | WD Media, LLC | Acidic post-sputter wash for magnetic recording media |
US9822441B2 (en) | 2015-03-31 | 2017-11-21 | WD Media, LLC | Iridium underlayer for heat assisted magnetic recording media |
US9275669B1 (en) | 2015-03-31 | 2016-03-01 | WD Media, LLC | TbFeCo in PMR media for SNR improvement |
US11074934B1 (en) | 2015-09-25 | 2021-07-27 | Western Digital Technologies, Inc. | Heat assisted magnetic recording (HAMR) media with Curie temperature reduction layer |
US10236026B1 (en) | 2015-11-06 | 2019-03-19 | WD Media, LLC | Thermal barrier layers and seed layers for control of thermal and structural properties of HAMR media |
US9406329B1 (en) | 2015-11-30 | 2016-08-02 | WD Media, LLC | HAMR media structure with intermediate layer underlying a magnetic recording layer having multiple sublayers |
US10121506B1 (en) | 2015-12-29 | 2018-11-06 | WD Media, LLC | Magnetic-recording medium including a carbon overcoat implanted with nitrogen and hydrogen |
CN110142704B (zh) * | 2019-04-24 | 2021-02-12 | 贵州永红航空机械有限责任公司 | 一种铝制板翅式散热器焊接检验方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5836417A (ja) * | 1981-08-27 | 1983-03-03 | Matsushita Electric Ind Co Ltd | 情報担体の製造方法 |
JPH07186194A (ja) * | 1993-12-27 | 1995-07-25 | Sony Disc Technol:Kk | スタンパーの自動交換装置 |
JPH08124223A (ja) * | 1994-10-24 | 1996-05-17 | Pioneer Video Corp | 光ディスクの製造方法 |
JP2002251784A (ja) * | 2001-02-22 | 2002-09-06 | Ricoh Co Ltd | 光ディスク基板及び光ディスク |
JP2003291178A (ja) * | 2002-03-29 | 2003-10-14 | Mitsubishi Materials Corp | 成形用金型装置 |
Family Cites Families (97)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3946634A (en) * | 1972-04-03 | 1976-03-30 | Letson And Burpee Ltd. | Band mill strain mechanism |
US4062600A (en) * | 1976-04-05 | 1977-12-13 | Litton Systems, Inc. | Dual-gimbal gyroscope flexure suspension |
US4343025A (en) * | 1979-10-05 | 1982-08-03 | Nortronics Company, Inc. | Transducer arm assembly for floppy disk |
DE3481978D1 (de) * | 1983-10-06 | 1990-05-23 | Servichem Ag | Vorrichtung zur herstellung von gegenstaenden aus einer materialbahn einer thermoplastischen folie und die verwendung derselben zur herstellung von behaelterteilen. |
US4694703A (en) * | 1984-06-28 | 1987-09-22 | Lear Siegler, Inc. | Circumferentially oriented flexure suspension |
US4571320A (en) | 1984-10-31 | 1986-02-18 | General Motors Corporation | Method and apparatus for loading and unloading sheet molding compound in and from a press |
US5091047A (en) * | 1986-09-11 | 1992-02-25 | National Semiconductor Corp. | Plasma etching using a bilayer mask |
US5045150A (en) * | 1986-09-11 | 1991-09-03 | National Semiconductor Corp. | Plasma etching using a bilayer mask |
US4931351A (en) * | 1987-01-12 | 1990-06-05 | Eastman Kodak Company | Bilayer lithographic process |
US4770739A (en) * | 1987-02-03 | 1988-09-13 | Texas Instruments Incorporated | Bilayer photoresist process |
US4786564A (en) * | 1987-02-25 | 1988-11-22 | Komag, Inc. | Method for manufacturing a magnetic disk having reduced bit shift, minimized noise, increased resolution and uniform magnetic characteristics, and the resulting disk |
US5080549A (en) * | 1987-05-11 | 1992-01-14 | Epsilon Technology, Inc. | Wafer handling system with Bernoulli pick-up |
DE3719200A1 (de) * | 1987-06-09 | 1988-12-29 | Ibm Deutschland | Optische speicherplatte und verfahren zu ihrer herstellung |
US5455145A (en) * | 1988-12-24 | 1995-10-03 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing double layer resist pattern and double layer resist structure |
JP2865690B2 (ja) * | 1989-02-17 | 1999-03-08 | 株式会社日立製作所 | 嵌合挿入装置 |
US5018037A (en) * | 1989-10-10 | 1991-05-21 | Krounbi Mohamad T | Magnetoresistive read transducer having hard magnetic bias |
US5571473A (en) * | 1989-12-28 | 1996-11-05 | Idemitsu Petrochemical Co., Ltd. | Process for thermoforming thermoplastic resin sheet |
US5045165A (en) * | 1990-02-01 | 1991-09-03 | Komag, Inc. | Method for sputtering a hydrogen-doped carbon protective film on a magnetic disk |
EP0458477A3 (en) * | 1990-05-18 | 1991-12-04 | Imperial Chemical Industries Plc | Stabilisation of flexible optical media |
DE4017796C1 (ja) | 1990-06-01 | 1991-12-19 | Richard 8057 Eching De Herbst | |
US5219788A (en) * | 1991-02-25 | 1993-06-15 | Ibm Corporation | Bilayer metallization cap for photolithography |
JP2917615B2 (ja) * | 1991-06-20 | 1999-07-12 | 富士電機株式会社 | 圧電アクチュエータ応用のプレス装置 |
US5320934A (en) * | 1991-06-28 | 1994-06-14 | Misium George R | Bilayer photolithographic process |
JPH0580530A (ja) * | 1991-09-24 | 1993-04-02 | Hitachi Ltd | 薄膜パターン製造方法 |
US5322987A (en) * | 1992-06-10 | 1994-06-21 | Iomega Corporation | Pneumatic hub locking device for etching optical servo tracks on magnetic disks |
US6019930A (en) * | 1992-07-14 | 2000-02-01 | Thermal Wave Molding Corp. | Process for forming a molten material into molded article |
US6276656B1 (en) * | 1992-07-14 | 2001-08-21 | Thermal Wave Molding Corp. | Mold for optimizing cooling time to form molded article |
US5290397A (en) * | 1992-08-21 | 1994-03-01 | Cornell Research Foundation, Inc. | Bilayer resist and process for preparing same |
JP2900012B2 (ja) * | 1993-08-23 | 1999-06-02 | アイダエンジニアリング株式会社 | プレスのスライド下死点位置補正装置 |
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
JPH07297118A (ja) * | 1994-04-27 | 1995-11-10 | Canon Inc | 基板および基板保持方法ならびにその装置 |
US5537282A (en) * | 1994-07-15 | 1996-07-16 | Treves; David | Data storage disk having improved tracking capability |
TW297910B (ja) * | 1995-02-02 | 1997-02-11 | Tokyo Electron Co Ltd | |
US5820769A (en) * | 1995-05-24 | 1998-10-13 | Regents Of The University Of Minnesota | Method for making magnetic storage having discrete elements with quantized magnetic moments |
DE19532110C1 (de) * | 1995-08-31 | 1996-11-07 | Kodak Ag | Klemmvorrichtung zum Bedrucken von scheibenförmigen Informationsträgern |
US6518189B1 (en) * | 1995-11-15 | 2003-02-11 | Regents Of The University Of Minnesota | Method and apparatus for high density nanostructures |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US6482742B1 (en) | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
US6309580B1 (en) * | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
JP3689949B2 (ja) * | 1995-12-19 | 2005-08-31 | 株式会社ニコン | 投影露光装置、及び該投影露光装置を用いたパターン形成方法 |
US5915915A (en) * | 1996-03-07 | 1999-06-29 | Komag, Incorporated | End effector and method for loading and unloading disks at a processing station |
US6257866B1 (en) * | 1996-06-18 | 2001-07-10 | Hy-Tech Forming Systems, Inc. | Apparatus for accurately forming plastic sheet |
US5888433A (en) * | 1996-07-31 | 1999-03-30 | Kitano Engineering Co., Ltd. | Method of correcting nonalignment of a storage disc |
JP3287234B2 (ja) * | 1996-09-19 | 2002-06-04 | 信越化学工業株式会社 | リフトオフ法用ポジ型レジスト組成物及びパターン形成方法 |
US5985524A (en) * | 1997-03-28 | 1999-11-16 | International Business Machines Incorporated | Process for using bilayer photoresist |
US6150015A (en) * | 1997-12-04 | 2000-11-21 | Komag, Incorporated | Ultra-thin nucleation layer for magnetic thin film media and the method for manufacturing the same |
US6381090B1 (en) * | 1998-05-21 | 2002-04-30 | Komag, Incorporated | Hard disk drive head-media system having reduced stiction and low fly height |
US6713238B1 (en) * | 1998-10-09 | 2004-03-30 | Stephen Y. Chou | Microscale patterning and articles formed thereby |
JP2000124203A (ja) * | 1998-10-16 | 2000-04-28 | Shin Etsu Chem Co Ltd | 微細パターン形成方法 |
US6281679B1 (en) | 1998-12-21 | 2001-08-28 | Honeywell - Measurex | Web thickness measurement system |
US6665145B2 (en) * | 1999-02-10 | 2003-12-16 | Tdk Corporation | Magnetic recording medium with unit minute recording portions |
BR0008208A (pt) * | 1999-02-12 | 2002-02-19 | Gen Electric | Meios de armazenamento de dados |
US6218056B1 (en) | 1999-03-30 | 2001-04-17 | International Business Machines Corporation | Method of making highly defined bilayer lift-off mask |
US6086730A (en) * | 1999-04-22 | 2000-07-11 | Komag, Incorporated | Method of sputtering a carbon protective film on a magnetic disk with high sp3 content |
JP3229871B2 (ja) * | 1999-07-13 | 2001-11-19 | 松下電器産業株式会社 | 微細形状転写方法および光学部品の製造方法 |
US6242718B1 (en) * | 1999-11-04 | 2001-06-05 | Asm America, Inc. | Wafer holder |
SE515607C2 (sv) | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
JP2001266417A (ja) * | 2000-03-17 | 2001-09-28 | Sony Corp | 転写方法 |
US6921615B2 (en) * | 2000-07-16 | 2005-07-26 | Board Of Regents, The University Of Texas System | High-resolution overlay alignment methods for imprint lithography |
US7322287B2 (en) * | 2000-07-18 | 2008-01-29 | Nanonex Corporation | Apparatus for fluid pressure imprint lithography |
US7717696B2 (en) * | 2000-07-18 | 2010-05-18 | Nanonex Corp. | Apparatus for double-sided imprint lithography |
US6703099B2 (en) * | 2000-07-27 | 2004-03-09 | Seagate Technology Llc | Perpendicular magnetic recording media with patterned soft magnetic underlayer |
KR101031528B1 (ko) * | 2000-10-12 | 2011-04-27 | 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 | 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿 |
US6705853B1 (en) | 2000-10-20 | 2004-03-16 | Durakon Industries, Inc. | Six station rotary thermoforming machine |
JP3861197B2 (ja) * | 2001-03-22 | 2006-12-20 | 株式会社東芝 | 記録媒体の製造方法 |
US6749794B2 (en) * | 2001-08-13 | 2004-06-15 | R + S Technik Gmbh | Method and apparatus for molding components with molded-in surface texture |
US6757116B1 (en) * | 2001-08-16 | 2004-06-29 | Seagate Technology Llc | Disk biasing for manufacture of servo patterned media |
US20030071016A1 (en) * | 2001-10-11 | 2003-04-17 | Wu-Sheng Shih | Patterned structure reproduction using nonsticking mold |
US20030080472A1 (en) * | 2001-10-29 | 2003-05-01 | Chou Stephen Y. | Lithographic method with bonded release layer for molding small patterns |
US6793476B2 (en) * | 2001-12-05 | 2004-09-21 | General Shale Products Llc | Apparatus for providing aging effect for brick |
US6869557B1 (en) * | 2002-03-29 | 2005-03-22 | Seagate Technology Llc | Multi-level stamper for improved thermal imprint lithography |
US7144539B2 (en) * | 2002-04-04 | 2006-12-05 | Obducat Ab | Imprint method and device |
DE60328879D1 (de) * | 2002-04-24 | 2009-10-01 | Obducat Ab | Vorrichtung und verfahren zum übertragen eines musters auf ein substrat |
AU2003241245A1 (en) * | 2002-06-07 | 2003-12-22 | Obducat Ab | Method for transferring a pattern |
US7252492B2 (en) * | 2002-06-20 | 2007-08-07 | Obducat Ab | Devices and methods for aligning a stamp and a substrate |
US20040132301A1 (en) * | 2002-09-12 | 2004-07-08 | Harper Bruce M. | Indirect fluid pressure imprinting |
US6939120B1 (en) * | 2002-09-12 | 2005-09-06 | Komag, Inc. | Disk alignment apparatus and method for patterned media production |
JP4105513B2 (ja) * | 2002-09-25 | 2008-06-25 | Tdk株式会社 | 金型装置 |
JP4105573B2 (ja) * | 2003-03-26 | 2008-06-25 | Tdk株式会社 | 金型部品および金型装置 |
TW570290U (en) * | 2003-05-02 | 2004-01-01 | Ind Tech Res Inst | Uniform pressing device for nanometer transfer-print |
TW568349U (en) * | 2003-05-02 | 2003-12-21 | Ind Tech Res Inst | Parallelism adjusting device for nano-transferring |
JP4185808B2 (ja) * | 2003-05-09 | 2008-11-26 | Tdk株式会社 | インプリント装置およびインプリント方法 |
US6951173B1 (en) * | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
US7030504B2 (en) * | 2003-05-30 | 2006-04-18 | Asm Technology Singapore Pte Ltd. | Sectional molding system |
US20050094298A1 (en) * | 2003-09-22 | 2005-05-05 | Kabushiki Kaisha Toshiba | Imprint stamper, method for manufacturing the same, recording medium, method for manufacturing the same, information recording/reproducing method, and information recording/reproducing apparatus |
US20050151300A1 (en) * | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece isothermal imprinting |
US20050150862A1 (en) * | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece alignment assembly |
US7329114B2 (en) | 2004-01-20 | 2008-02-12 | Komag, Inc. | Isothermal imprint embossing system |
US20050155554A1 (en) * | 2004-01-20 | 2005-07-21 | Saito Toshiyuki M. | Imprint embossing system |
US7686606B2 (en) | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
US7229266B2 (en) * | 2004-03-23 | 2007-06-12 | Komag, Inc. | Press die alignment |
US7162810B2 (en) * | 2004-08-11 | 2007-01-16 | Intel Corporation | Micro tool alignment apparatus and method |
US7363854B2 (en) | 2004-12-16 | 2008-04-29 | Asml Holding N.V. | System and method for patterning both sides of a substrate utilizing imprint lithography |
US7281920B2 (en) * | 2005-03-28 | 2007-10-16 | Komag, Inc. | Die set utilizing compliant gasket |
ATE549294T1 (de) * | 2005-12-09 | 2012-03-15 | Obducat Ab | Vorrichtung und verfahren zum transfer von mustern mit zwischenstempel |
JP5266615B2 (ja) * | 2006-01-18 | 2013-08-21 | Tdk株式会社 | スタンパー、凹凸パターン形成方法および情報記録媒体製造方法 |
JP4478164B2 (ja) | 2007-03-12 | 2010-06-09 | 株式会社日立ハイテクノロジーズ | 微細構造転写装置、スタンパおよび微細構造の製造方法 |
-
2004
- 2004-01-20 US US10/761,464 patent/US7686606B2/en not_active Expired - Fee Related
-
2005
- 2005-01-12 DE DE200510001476 patent/DE102005001476A1/de not_active Withdrawn
- 2005-01-20 JP JP2005013161A patent/JP4814527B2/ja not_active Expired - Fee Related
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2009
- 2009-09-08 US US12/555,780 patent/US8100685B1/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5836417A (ja) * | 1981-08-27 | 1983-03-03 | Matsushita Electric Ind Co Ltd | 情報担体の製造方法 |
JPH07186194A (ja) * | 1993-12-27 | 1995-07-25 | Sony Disc Technol:Kk | スタンパーの自動交換装置 |
JPH08124223A (ja) * | 1994-10-24 | 1996-05-17 | Pioneer Video Corp | 光ディスクの製造方法 |
JP2002251784A (ja) * | 2001-02-22 | 2002-09-06 | Ricoh Co Ltd | 光ディスク基板及び光ディスク |
JP2003291178A (ja) * | 2002-03-29 | 2003-10-14 | Mitsubishi Materials Corp | 成形用金型装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007118548A (ja) * | 2005-10-31 | 2007-05-17 | Toshiba Corp | 板状構造体の製造装置及び磁気ディスク製造方法 |
JP2007210191A (ja) * | 2006-02-09 | 2007-08-23 | Toppan Printing Co Ltd | モールドの欠陥修正方法及びモールド |
US8253941B2 (en) | 2006-05-09 | 2012-08-28 | Samsung Electronics Co., Ltd. | Apparatus for manufacturing display panel and method for manufacturing the same |
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US20050158163A1 (en) | 2005-07-21 |
JP4814527B2 (ja) | 2011-11-16 |
US8100685B1 (en) | 2012-01-24 |
US7686606B2 (en) | 2010-03-30 |
DE102005001476A1 (de) | 2005-09-15 |
MY142294A (en) | 2010-11-15 |
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