JP2004536924A5 - - Google Patents

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Publication number
JP2004536924A5
JP2004536924A5 JP2003515600A JP2003515600A JP2004536924A5 JP 2004536924 A5 JP2004536924 A5 JP 2004536924A5 JP 2003515600 A JP2003515600 A JP 2003515600A JP 2003515600 A JP2003515600 A JP 2003515600A JP 2004536924 A5 JP2004536924 A5 JP 2004536924A5
Authority
JP
Japan
Prior art keywords
sio
siloxane
units
group
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003515600A
Other languages
English (en)
Japanese (ja)
Other versions
JP4411067B2 (ja
JP2004536924A (ja
Filing date
Publication date
Priority claimed from US09/915,902 external-priority patent/US6872456B2/en
Application filed filed Critical
Publication of JP2004536924A publication Critical patent/JP2004536924A/ja
Publication of JP2004536924A5 publication Critical patent/JP2004536924A5/ja
Application granted granted Critical
Publication of JP4411067B2 publication Critical patent/JP4411067B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003515600A 2001-07-26 2002-07-16 シロキサン樹脂 Expired - Fee Related JP4411067B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/915,902 US6872456B2 (en) 2001-07-26 2001-07-26 Siloxane resins
PCT/US2002/023152 WO2003010246A1 (en) 2001-07-26 2002-07-16 Siloxane resins

Publications (3)

Publication Number Publication Date
JP2004536924A JP2004536924A (ja) 2004-12-09
JP2004536924A5 true JP2004536924A5 (enExample) 2006-01-05
JP4411067B2 JP4411067B2 (ja) 2010-02-10

Family

ID=25436405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003515600A Expired - Fee Related JP4411067B2 (ja) 2001-07-26 2002-07-16 シロキサン樹脂

Country Status (9)

Country Link
US (1) US6872456B2 (enExample)
EP (1) EP1412434B1 (enExample)
JP (1) JP4411067B2 (enExample)
KR (1) KR20040023683A (enExample)
CN (1) CN1535300A (enExample)
AT (1) ATE399822T1 (enExample)
DE (1) DE60227373D1 (enExample)
TW (1) TW593548B (enExample)
WO (1) WO2003010246A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7404990B2 (en) * 2002-11-14 2008-07-29 Air Products And Chemicals, Inc. Non-thermal process for forming porous low dielectric constant films
US6940173B2 (en) * 2003-01-29 2005-09-06 International Business Machines Corporation Interconnect structures incorporating low-k dielectric barrier films
TW200628981A (en) 2004-09-29 2006-08-16 Sumitomo Bakelite Co Semiconductor device
TW200619843A (en) * 2004-10-20 2006-06-16 Sumitomo Bakelite Co Semiconductor wafer and semiconductor device
CN101048704B (zh) * 2004-11-02 2011-04-13 陶氏康宁公司 抗蚀剂组合物
JP5107354B2 (ja) * 2006-08-04 2012-12-26 ダウ・コーニング・コーポレイション シリコーン樹脂およびシリコーン組成物
TWI434891B (zh) * 2007-02-22 2014-04-21 Silecs Oy 積體電路用高矽含量矽氧烷聚合物
CN101622296B (zh) * 2007-02-27 2013-10-16 Az电子材料美国公司 硅基抗反射涂料组合物
DE102008000353A1 (de) * 2008-02-20 2009-08-27 Wacker Chemie Ag Härtbare Polymerabmischungen
US20100291475A1 (en) * 2009-05-12 2010-11-18 Chenghong Li Silicone Coating Compositions
US20110111239A1 (en) * 2009-11-10 2011-05-12 Hemant Dandekar Sol-gel coating for steel and cast iron substrates and methods of making and using same
WO2012151747A1 (en) * 2011-05-11 2012-11-15 Henkel (China) Company Limited Silicone resin with improved barrier properties
CN109054560A (zh) * 2018-08-07 2018-12-21 常州工程职业技术学院 一种电工钢用绝缘涂料

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US3615272A (en) 1968-11-04 1971-10-26 Dow Corning Condensed soluble hydrogensilsesquioxane resin
US3730743A (en) * 1970-08-24 1973-05-01 Stauffer Chemical Co Zinc dust coating composition
US3965136A (en) * 1975-09-24 1976-06-22 Olin Corporation Alkoxysilane cluster compounds and their preparation
US4329485A (en) * 1981-06-29 1982-05-11 Olin Corporation Process for preparing alkoxysilane cluster compounds by reacting a trialkoxysilanol with a triamidosilane
US4756977A (en) 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
JP3134297B2 (ja) * 1990-08-29 2001-02-13 日立化成工業株式会社 シリカ系被膜形成用塗布液およびシリカ系被膜の製造法
JP2669988B2 (ja) * 1992-02-06 1997-10-29 沖電気工業株式会社 ポリ（アルコキシシロキサン）の製造方法
JP2726363B2 (ja) 1992-06-03 1998-03-11 沖電気工業株式会社 シリコーン樹脂及びこれを用いた組成物
JPH06326202A (ja) * 1993-03-16 1994-11-25 Showa Denko Kk 半導体及びその絶縁膜または平坦化膜の形成方法
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JP3435325B2 (ja) 1997-02-13 2003-08-11 株式会社東芝 低誘電率珪素酸化膜の形成方法
US6048804A (en) 1997-04-29 2000-04-11 Alliedsignal Inc. Process for producing nanoporous silica thin films
JPH1121510A (ja) * 1997-06-30 1999-01-26 Dow Corning Asia Ltd 撥水性被膜形成用シリコーンレジン及びその組成物
TW401376B (en) 1997-07-15 2000-08-11 Asahi Chemical Ind An alkoxysilane/organic polymer composition for use in producing an insulating thin film and uses thereof
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US6359096B1 (en) 1999-10-25 2002-03-19 Dow Corning Corporation Silicone resin compositions having good solution solubility and stability
EP1095958B1 (en) 1999-10-25 2006-02-08 Dow Corning Corporation Soluble silicone resin compositions
US6232424B1 (en) 1999-12-13 2001-05-15 Dow Corning Corporation Soluble silicone resin compositions having good solution stability
US6313045B1 (en) 1999-12-13 2001-11-06 Dow Corning Corporation Nanoporous silicone resins having low dielectric constants and method for preparation
US6143360A (en) 1999-12-13 2000-11-07 Dow Corning Corporation Method for making nanoporous silicone resins from alkylydridosiloxane resins

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