JP2004200461A5 - - Google Patents
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- JP2004200461A5 JP2004200461A5 JP2002368046A JP2002368046A JP2004200461A5 JP 2004200461 A5 JP2004200461 A5 JP 2004200461A5 JP 2002368046 A JP2002368046 A JP 2002368046A JP 2002368046 A JP2002368046 A JP 2002368046A JP 2004200461 A5 JP2004200461 A5 JP 2004200461A5
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- JP
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- Prior art keywords
- amount
- deterioration
- transistor
- degradation
- gate voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000006866 deterioration Effects 0.000 description 217
- 238000006731 degradation reaction Methods 0.000 description 122
- 230000015556 catabolic process Effects 0.000 description 119
- 238000011084 recovery Methods 0.000 description 98
- 238000004088 simulation Methods 0.000 description 91
- 239000004065 semiconductor Substances 0.000 description 67
- 238000000034 method Methods 0.000 description 40
- 238000004364 calculation method Methods 0.000 description 35
- 230000008859 change Effects 0.000 description 21
- 238000002474 experimental method Methods 0.000 description 17
- 230000008569 process Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 10
- 238000013461 design Methods 0.000 description 9
- 235000013599 spices Nutrition 0.000 description 9
- 230000006870 function Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000012212 insulator Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000002123 temporal effect Effects 0.000 description 2
- 230000036962 time dependent Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001564 chemical vapour infiltration Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002368046A JP4214775B2 (ja) | 2002-12-19 | 2002-12-19 | 半導体装置特性シミュレーション方法及び半導体装置特性シミュレータ |
| TW092135987A TWI236040B (en) | 2002-12-19 | 2003-12-18 | Simulation method and simulator of semiconductor circuit device |
| PCT/JP2003/016385 WO2004057652A1 (ja) | 2002-12-19 | 2003-12-19 | 半導体回路装置のシミュレーション方法および半導体回路装置のシミュレータ |
| CNB2003801002555A CN100401461C (zh) | 2002-12-19 | 2003-12-19 | 半导体电路器件模拟方法和半导体电路器件模拟器 |
| US10/502,621 US7240308B2 (en) | 2002-12-19 | 2003-12-19 | Simulation method for semiconductor circuit device and simulator for semiconductor circuit device |
| KR1020047012901A KR20050083556A (ko) | 2002-12-19 | 2003-12-19 | 반도체 회로 장치의 시뮬레이션 방법 및 반도체 회로장치의 시뮬레이터 |
| US11/796,262 US20070209027A1 (en) | 2002-12-19 | 2007-04-27 | Simulation method for semiconductor circuit device and simulator for semiconductor circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002368046A JP4214775B2 (ja) | 2002-12-19 | 2002-12-19 | 半導体装置特性シミュレーション方法及び半導体装置特性シミュレータ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004200461A JP2004200461A (ja) | 2004-07-15 |
| JP2004200461A5 true JP2004200461A5 (enExample) | 2005-04-07 |
| JP4214775B2 JP4214775B2 (ja) | 2009-01-28 |
Family
ID=32677106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002368046A Expired - Fee Related JP4214775B2 (ja) | 2002-12-19 | 2002-12-19 | 半導体装置特性シミュレーション方法及び半導体装置特性シミュレータ |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7240308B2 (enExample) |
| JP (1) | JP4214775B2 (enExample) |
| KR (1) | KR20050083556A (enExample) |
| CN (1) | CN100401461C (enExample) |
| TW (1) | TWI236040B (enExample) |
| WO (1) | WO2004057652A1 (enExample) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7401304B2 (en) * | 2004-01-28 | 2008-07-15 | Gradient Design Automation Inc. | Method and apparatus for thermal modeling and analysis of semiconductor chip designs |
| US7353471B1 (en) * | 2004-08-05 | 2008-04-01 | Gradient Design Automation Inc. | Method and apparatus for using full-chip thermal analysis of semiconductor chip designs to compute thermal conductance |
| WO2007070879A1 (en) * | 2005-12-17 | 2007-06-21 | Gradient Design Automation, Inc. | Simulation of ic temperature distributions using an adaptive 3d grid |
| US7472363B1 (en) * | 2004-01-28 | 2008-12-30 | Gradient Design Automation Inc. | Semiconductor chip design having thermal awareness across multiple sub-system domains |
| US20090048801A1 (en) * | 2004-01-28 | 2009-02-19 | Rajit Chandra | Method and apparatus for generating thermal test vectors |
| US7458052B1 (en) | 2004-08-30 | 2008-11-25 | Gradient Design Automation, Inc. | Method and apparatus for normalizing thermal gradients over semiconductor chip designs |
| US20090224356A1 (en) * | 2004-01-28 | 2009-09-10 | Rajit Chandra | Method and apparatus for thermally aware design improvement |
| US7203920B2 (en) * | 2004-01-28 | 2007-04-10 | Gradient Design Automation Inc. | Method and apparatus for retrofitting semiconductor chip performance analysis tools with full-chip thermal analysis capabilities |
| US20090077508A1 (en) * | 2004-01-28 | 2009-03-19 | Rubin Daniel I | Accelerated life testing of semiconductor chips |
| US7383520B2 (en) * | 2004-08-05 | 2008-06-03 | Gradient Design Automation Inc. | Method and apparatus for optimizing thermal management system performance using full-chip thermal analysis of semiconductor chip designs |
| US8019580B1 (en) | 2007-04-12 | 2011-09-13 | Gradient Design Automation Inc. | Transient thermal analysis |
| US8286111B2 (en) * | 2004-03-11 | 2012-10-09 | Gradient Design Automation Inc. | Thermal simulation using adaptive 3D and hierarchical grid mechanisms |
| US7296247B1 (en) * | 2004-08-17 | 2007-11-13 | Xilinx, Inc. | Method and apparatus to improve pass transistor performance |
| JP2006140284A (ja) * | 2004-11-11 | 2006-06-01 | Matsushita Electric Ind Co Ltd | 半導体装置の信頼性シミュレーション方法及び信頼性シミュレータ |
| JP2008053692A (ja) * | 2006-07-28 | 2008-03-06 | Matsushita Electric Ind Co Ltd | トランジスタのbt劣化のシミュレーションモデルおよびシミュレーションモデル化方法 |
| US7594210B2 (en) * | 2006-11-16 | 2009-09-22 | Clk Design Automation, Inc. | Timing variation characterization |
| US7793243B1 (en) | 2006-12-04 | 2010-09-07 | Clk Design Automation, Inc. | Multi-engine static analysis |
| US7600204B1 (en) * | 2007-02-14 | 2009-10-06 | Xilinx, Inc. | Method for simulation of negative bias and temperature instability |
| US8935146B2 (en) * | 2007-03-05 | 2015-01-13 | Fujitsu Semiconductor Limited | Computer aided design apparatus, computer aided design program, computer aided design method for a semiconductor device and method of manufacturing a semiconductor circuit based on characteristic value and simulation parameter |
| JP4563501B2 (ja) * | 2007-06-20 | 2010-10-13 | 富士通株式会社 | 回路シミュレーションモデル生成装置、回路シミュレーションモデル生成プログラム、回路シミュレーションモデル生成方法及び回路シミュレーション装置 |
| US7750400B2 (en) | 2008-08-15 | 2010-07-06 | Texas Instruments Incorporated | Integrated circuit modeling, design, and fabrication based on degradation mechanisms |
| KR101478554B1 (ko) * | 2008-10-02 | 2015-01-06 | 삼성전자 주식회사 | 오버 슈트 전압의 산출 방법 및 그를 이용한 게이트 절연막열화분석방법 |
| CN101739471B (zh) * | 2008-11-13 | 2011-09-28 | 上海华虹Nec电子有限公司 | 双极型晶体管工艺偏差模型参数的在线测试及提取方法 |
| CN102054066B (zh) * | 2009-10-30 | 2015-12-09 | 新思科技(上海)有限公司 | 集成电路的退化分析方法及装置 |
| JP5394943B2 (ja) * | 2010-01-15 | 2014-01-22 | ラピスセミコンダクタ株式会社 | 試験結果記憶方法、試験結果表示方法、及び試験結果表示装置 |
| CN102437025B (zh) * | 2011-12-02 | 2013-04-24 | 南京大学 | 一种消除pmos中负偏压温度不稳定性影响的方法 |
| US9323870B2 (en) | 2012-05-01 | 2016-04-26 | Advanced Micro Devices, Inc. | Method and apparatus for improved integrated circuit temperature evaluation and IC design |
| US20140095126A1 (en) * | 2012-10-03 | 2014-04-03 | Lsi Corporation | Hot-carrier injection reliability checks based on gate voltage dependency |
| US20140304445A1 (en) * | 2013-04-09 | 2014-10-09 | William Michael Gervasi | Memory bus loading and conditioning module |
| CN103324813B (zh) * | 2013-07-11 | 2016-01-20 | 深圳大学 | Mos器件非均匀界面退化电荷的数值模拟方法及系统 |
| US9857409B2 (en) | 2013-08-27 | 2018-01-02 | Synopsys, Inc. | Negative bias thermal instability stress testing of transistors |
| CN104699880B (zh) * | 2013-12-10 | 2018-06-01 | 中芯国际集成电路制造(上海)有限公司 | 一种半导体器件的评估方法和rc时序测试方法 |
| CN103744008B (zh) * | 2013-12-12 | 2016-02-03 | 华为技术有限公司 | 确定电路老化性能的方法和装置 |
| KR102268591B1 (ko) * | 2014-08-18 | 2021-06-25 | 삼성전자주식회사 | 회로의 자가 발열 특성을 예측하는 시뮬레이션 시스템 및 그것의 회로 설계 방법 |
| US9996650B2 (en) | 2015-03-17 | 2018-06-12 | International Business Machines Corporation | Modeling the performance of a field effect transistor having a dynamically depleted channel region |
| CN105067985B (zh) * | 2015-07-22 | 2018-01-02 | 工业和信息化部电子第五研究所 | 基于nbti效应pmos管参数退化的失效预警装置 |
| US10621494B2 (en) * | 2017-11-08 | 2020-04-14 | Samsung Electronics Co., Ltd. | System and method for circuit simulation based on recurrent neural networks |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6587994B1 (en) * | 1999-03-09 | 2003-07-01 | Fujitsu Limited | Hot-carrier degradation simulation of a semiconductor device |
| JP2000323709A (ja) * | 1999-03-09 | 2000-11-24 | Fujitsu Ltd | ホットキャリア劣化シミュレーション方法、半導体装置の製造方法、およびコンピュータ可読記録媒体 |
| US6795802B2 (en) * | 2000-03-17 | 2004-09-21 | Matsushita Electric Industrial Co., Ltd. | Apparatus and method for calculating temporal deterioration margin amount of LSI, and LSI inspection method |
| JP2001267260A (ja) * | 2000-03-22 | 2001-09-28 | Oki Electric Ind Co Ltd | 半導体モデリング方法 |
| JP2001308317A (ja) * | 2000-04-18 | 2001-11-02 | Nec Corp | 半導体装置の製造方法 |
| JP2001352059A (ja) * | 2000-06-09 | 2001-12-21 | Nec Corp | Pmosトランジスタの特性劣化シミュレーション方法 |
| JP2003264292A (ja) * | 2002-03-11 | 2003-09-19 | Fujitsu Display Technologies Corp | シミュレーション方法 |
-
2002
- 2002-12-19 JP JP2002368046A patent/JP4214775B2/ja not_active Expired - Fee Related
-
2003
- 2003-12-18 TW TW092135987A patent/TWI236040B/zh not_active IP Right Cessation
- 2003-12-19 US US10/502,621 patent/US7240308B2/en not_active Expired - Fee Related
- 2003-12-19 WO PCT/JP2003/016385 patent/WO2004057652A1/ja not_active Ceased
- 2003-12-19 CN CNB2003801002555A patent/CN100401461C/zh not_active Expired - Fee Related
- 2003-12-19 KR KR1020047012901A patent/KR20050083556A/ko not_active Ceased
-
2007
- 2007-04-27 US US11/796,262 patent/US20070209027A1/en not_active Abandoned
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