KR20050083556A - 반도체 회로 장치의 시뮬레이션 방법 및 반도체 회로장치의 시뮬레이터 - Google Patents

반도체 회로 장치의 시뮬레이션 방법 및 반도체 회로장치의 시뮬레이터 Download PDF

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Publication number
KR20050083556A
KR20050083556A KR1020047012901A KR20047012901A KR20050083556A KR 20050083556 A KR20050083556 A KR 20050083556A KR 1020047012901 A KR1020047012901 A KR 1020047012901A KR 20047012901 A KR20047012901 A KR 20047012901A KR 20050083556 A KR20050083556 A KR 20050083556A
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South Korea
Prior art keywords
transistor
deterioration
amount
integers
negative bias
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Korean (ko)
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히로키 우스이
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소니 가부시끼 가이샤
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Publication of KR20050083556A publication Critical patent/KR20050083556A/ko
Ceased legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/36Circuit design at the analogue level
    • G06F30/367Design verification, e.g. using simulation, simulation program with integrated circuit emphasis [SPICE], direct methods or relaxation methods

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
KR1020047012901A 2002-12-19 2003-12-19 반도체 회로 장치의 시뮬레이션 방법 및 반도체 회로장치의 시뮬레이터 Ceased KR20050083556A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002368046A JP4214775B2 (ja) 2002-12-19 2002-12-19 半導体装置特性シミュレーション方法及び半導体装置特性シミュレータ
JPJP-P-2002-00368046 2002-12-19

Publications (1)

Publication Number Publication Date
KR20050083556A true KR20050083556A (ko) 2005-08-26

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KR1020047012901A Ceased KR20050083556A (ko) 2002-12-19 2003-12-19 반도체 회로 장치의 시뮬레이션 방법 및 반도체 회로장치의 시뮬레이터

Country Status (6)

Country Link
US (2) US7240308B2 (enExample)
JP (1) JP4214775B2 (enExample)
KR (1) KR20050083556A (enExample)
CN (1) CN100401461C (enExample)
TW (1) TWI236040B (enExample)
WO (1) WO2004057652A1 (enExample)

Cited By (1)

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KR101478554B1 (ko) * 2008-10-02 2015-01-06 삼성전자 주식회사 오버 슈트 전압의 산출 방법 및 그를 이용한 게이트 절연막열화분석방법

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US7401304B2 (en) * 2004-01-28 2008-07-15 Gradient Design Automation Inc. Method and apparatus for thermal modeling and analysis of semiconductor chip designs
US7383520B2 (en) * 2004-08-05 2008-06-03 Gradient Design Automation Inc. Method and apparatus for optimizing thermal management system performance using full-chip thermal analysis of semiconductor chip designs
US7472363B1 (en) * 2004-01-28 2008-12-30 Gradient Design Automation Inc. Semiconductor chip design having thermal awareness across multiple sub-system domains
WO2007070879A1 (en) * 2005-12-17 2007-06-21 Gradient Design Automation, Inc. Simulation of ic temperature distributions using an adaptive 3d grid
US20090048801A1 (en) * 2004-01-28 2009-02-19 Rajit Chandra Method and apparatus for generating thermal test vectors
US7203920B2 (en) * 2004-01-28 2007-04-10 Gradient Design Automation Inc. Method and apparatus for retrofitting semiconductor chip performance analysis tools with full-chip thermal analysis capabilities
US7458052B1 (en) 2004-08-30 2008-11-25 Gradient Design Automation, Inc. Method and apparatus for normalizing thermal gradients over semiconductor chip designs
US7353471B1 (en) * 2004-08-05 2008-04-01 Gradient Design Automation Inc. Method and apparatus for using full-chip thermal analysis of semiconductor chip designs to compute thermal conductance
US8286111B2 (en) * 2004-03-11 2012-10-09 Gradient Design Automation Inc. Thermal simulation using adaptive 3D and hierarchical grid mechanisms
US8019580B1 (en) 2007-04-12 2011-09-13 Gradient Design Automation Inc. Transient thermal analysis
US7296247B1 (en) * 2004-08-17 2007-11-13 Xilinx, Inc. Method and apparatus to improve pass transistor performance
JP2006140284A (ja) * 2004-11-11 2006-06-01 Matsushita Electric Ind Co Ltd 半導体装置の信頼性シミュレーション方法及び信頼性シミュレータ
JP2008053692A (ja) * 2006-07-28 2008-03-06 Matsushita Electric Ind Co Ltd トランジスタのbt劣化のシミュレーションモデルおよびシミュレーションモデル化方法
US7594210B2 (en) * 2006-11-16 2009-09-22 Clk Design Automation, Inc. Timing variation characterization
US7793243B1 (en) 2006-12-04 2010-09-07 Clk Design Automation, Inc. Multi-engine static analysis
US7600204B1 (en) * 2007-02-14 2009-10-06 Xilinx, Inc. Method for simulation of negative bias and temperature instability
US8935146B2 (en) * 2007-03-05 2015-01-13 Fujitsu Semiconductor Limited Computer aided design apparatus, computer aided design program, computer aided design method for a semiconductor device and method of manufacturing a semiconductor circuit based on characteristic value and simulation parameter
JP4563501B2 (ja) * 2007-06-20 2010-10-13 富士通株式会社 回路シミュレーションモデル生成装置、回路シミュレーションモデル生成プログラム、回路シミュレーションモデル生成方法及び回路シミュレーション装置
US7750400B2 (en) 2008-08-15 2010-07-06 Texas Instruments Incorporated Integrated circuit modeling, design, and fabrication based on degradation mechanisms
CN101739471B (zh) * 2008-11-13 2011-09-28 上海华虹Nec电子有限公司 双极型晶体管工艺偏差模型参数的在线测试及提取方法
CN102054066B (zh) * 2009-10-30 2015-12-09 新思科技(上海)有限公司 集成电路的退化分析方法及装置
JP5394943B2 (ja) * 2010-01-15 2014-01-22 ラピスセミコンダクタ株式会社 試験結果記憶方法、試験結果表示方法、及び試験結果表示装置
CN102437025B (zh) * 2011-12-02 2013-04-24 南京大学 一种消除pmos中负偏压温度不稳定性影响的方法
US9323870B2 (en) 2012-05-01 2016-04-26 Advanced Micro Devices, Inc. Method and apparatus for improved integrated circuit temperature evaluation and IC design
US20140095139A1 (en) * 2012-10-03 2014-04-03 Lsi Corporation Hot-carrier injection reliability checks based on back bias effect on threshold voltage
US20140304445A1 (en) * 2013-04-09 2014-10-09 William Michael Gervasi Memory bus loading and conditioning module
CN103324813B (zh) * 2013-07-11 2016-01-20 深圳大学 Mos器件非均匀界面退化电荷的数值模拟方法及系统
US9857409B2 (en) 2013-08-27 2018-01-02 Synopsys, Inc. Negative bias thermal instability stress testing of transistors
CN104699880B (zh) * 2013-12-10 2018-06-01 中芯国际集成电路制造(上海)有限公司 一种半导体器件的评估方法和rc时序测试方法
CN103744008B (zh) * 2013-12-12 2016-02-03 华为技术有限公司 确定电路老化性能的方法和装置
KR102268591B1 (ko) * 2014-08-18 2021-06-25 삼성전자주식회사 회로의 자가 발열 특성을 예측하는 시뮬레이션 시스템 및 그것의 회로 설계 방법
US9996650B2 (en) 2015-03-17 2018-06-12 International Business Machines Corporation Modeling the performance of a field effect transistor having a dynamically depleted channel region
CN105067985B (zh) * 2015-07-22 2018-01-02 工业和信息化部电子第五研究所 基于nbti效应pmos管参数退化的失效预警装置
US10621494B2 (en) * 2017-11-08 2020-04-14 Samsung Electronics Co., Ltd. System and method for circuit simulation based on recurrent neural networks

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JP2000323709A (ja) 1999-03-09 2000-11-24 Fujitsu Ltd ホットキャリア劣化シミュレーション方法、半導体装置の製造方法、およびコンピュータ可読記録媒体
US6795802B2 (en) * 2000-03-17 2004-09-21 Matsushita Electric Industrial Co., Ltd. Apparatus and method for calculating temporal deterioration margin amount of LSI, and LSI inspection method
JP2001267260A (ja) * 2000-03-22 2001-09-28 Oki Electric Ind Co Ltd 半導体モデリング方法
JP2001308317A (ja) 2000-04-18 2001-11-02 Nec Corp 半導体装置の製造方法
JP2001352059A (ja) * 2000-06-09 2001-12-21 Nec Corp Pmosトランジスタの特性劣化シミュレーション方法
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101478554B1 (ko) * 2008-10-02 2015-01-06 삼성전자 주식회사 오버 슈트 전압의 산출 방법 및 그를 이용한 게이트 절연막열화분석방법

Also Published As

Publication number Publication date
TW200416799A (en) 2004-09-01
US20050138581A1 (en) 2005-06-23
WO2004057652A1 (ja) 2004-07-08
CN100401461C (zh) 2008-07-09
US20070209027A1 (en) 2007-09-06
US7240308B2 (en) 2007-07-03
JP2004200461A (ja) 2004-07-15
TWI236040B (en) 2005-07-11
JP4214775B2 (ja) 2009-01-28
CN1692471A (zh) 2005-11-02

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