JP2004036005A - 微細及び超微細の金属粉体 - Google Patents
微細及び超微細の金属粉体 Download PDFInfo
- Publication number
- JP2004036005A JP2004036005A JP2003366114A JP2003366114A JP2004036005A JP 2004036005 A JP2004036005 A JP 2004036005A JP 2003366114 A JP2003366114 A JP 2003366114A JP 2003366114 A JP2003366114 A JP 2003366114A JP 2004036005 A JP2004036005 A JP 2004036005A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- plasma
- copper
- fine
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/12—Making metallic powder or suspensions thereof using physical processes starting from gaseous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/02—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor for obtaining at least one reaction product which, at normal temperature, is in the solid state
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00121—Controlling the temperature by direct heating or cooling
- B01J2219/00123—Controlling the temperature by direct heating or cooling adding a temperature modifying medium to the reactants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/0015—Controlling the temperature by thermal insulation means
- B01J2219/00155—Controlling the temperature by thermal insulation means using insulating materials or refractories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0845—Details relating to the type of discharge
- B01J2219/0847—Glow discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0879—Solid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
- B01J2219/0898—Hot plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Discharge Heating (AREA)
- Powder Metallurgy (AREA)
Abstract
【解決手段】 粒径分布を特定する尺度の一つであるSpanが、ある一定値以下であり、かつ、高度に結晶性で、微細及び超微細の銅又はニッケル粉体。
【選択図】 図1
Description
D90は銅又はニッケル粉体の90%の平均直径(μm)を示し、
D10は上記粉体の10%の平均直径(μm)を示し、
D50は上記粉体の50%の平均直径(μm)を示す、
で定義されるSpanが3.3以下である制御された粒径分布を有することを特徴とする高度に結晶性で、微細及び超微細の銅又はニッケル粉体が提供される。
−材料を蒸発又は分解してその蒸気を形成するに十分な高温を有するプラズマを作るために材料と電極との間でアークを飛ばし、
−プラズマ リアクターにおいて所望により希釈ガスを送り込み、
−プラズマ ガスの手段による蒸気及び所望の希釈ガスを、蒸気が凝結され粉体の形成が生ずる冷却管内に移送し、冷却管が
−粒子の成長及び結晶化を実質的に制御するために、内部にある蒸気及びいかなる粒子 も間接的に冷却し又は加熱する第1区画、及び
−第1区画に連結され内部にある蒸気及びいかなる粒子も直接冷却するための第2区画を備え、更に
−収集ユニットにおいて粉体粒子を収集しかつ所望により濾過する
諸段階を含む方法により製造される。
制御された平均粒子寸法と分布とを有する微細な銅の粉体が作られた。表1及び2に、異なった冷却管運転条件を使った平均粒子寸法の制御が示される。移行型アーク リアクターの条件は実質的に同様である。試験1において平均粒子寸法0.78μmが、そして試験2において1.74μmが得られた。
制御された結晶化度を有する微細なニッケルの粉体が作られた。表4及び5に異なる冷却管運転条件を使った結晶化度の制御が示される。リアクター条件は実質的に同じである。結晶化度は、与えられた粉体標本に対するX線拡散の最大ピークカウントにより測定された。このピークは、ニッケルについてはほぼ2θ=44.5゜において、また銅については2θ=43.3゜において生ずる。試験4において作られたニッケル粉体に対する最大ピ−クカウントは、試験5において作られたニッケル粉体に対する9300と比較して24800であった。
Claims (5)
- Spanが1.24以下である請求項1記載の制御された粒径分布を有するニッケル粉体。
- Spanが3.3以下である請求項1記載の制御された粒径分布を有する銅粉体。
- 銅金属又はニッケル金属の蒸気を、第1段階ではその蒸気を間接的に冷却及び/又は加熱することによりその粒子を所望の大きさ及び粒径分布となるように該粒子の核化及び生長を増進し、次いで第2段階において該粒子を冷却することにより該金属粉体が製造されたものである請求項1記載の微細及び超微細の銅又はニッケル粉体。
- 該金属粉体は、0.5kg/時以上で蒸気化する速度でその金属蒸気から金属粉体が製造されたものである請求項1記載の微細及び超微細の銅又はニッケル粉体。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/136,043 US6379419B1 (en) | 1998-08-18 | 1998-08-18 | Method and transferred arc plasma system for production of fine and ultrafine powders |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000566062A Division JP3541939B2 (ja) | 1998-08-18 | 1999-08-16 | 微細及び超微細の粉体の製造方法及び移行型アークプラズマシステム |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005034922A Division JP2005163188A (ja) | 1998-08-18 | 2005-02-10 | 微細及び超微細の金属粉体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004036005A true JP2004036005A (ja) | 2004-02-05 |
JP2004036005A5 JP2004036005A5 (ja) | 2005-05-26 |
Family
ID=22470991
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000566062A Expired - Lifetime JP3541939B2 (ja) | 1998-08-18 | 1999-08-16 | 微細及び超微細の粉体の製造方法及び移行型アークプラズマシステム |
JP2003366114A Pending JP2004036005A (ja) | 1998-08-18 | 2003-10-27 | 微細及び超微細の金属粉体 |
JP2005034922A Pending JP2005163188A (ja) | 1998-08-18 | 2005-02-10 | 微細及び超微細の金属粉体 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000566062A Expired - Lifetime JP3541939B2 (ja) | 1998-08-18 | 1999-08-16 | 微細及び超微細の粉体の製造方法及び移行型アークプラズマシステム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005034922A Pending JP2005163188A (ja) | 1998-08-18 | 2005-02-10 | 微細及び超微細の金属粉体 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6379419B1 (ja) |
EP (1) | EP1115523B1 (ja) |
JP (3) | JP3541939B2 (ja) |
KR (1) | KR100594562B1 (ja) |
AT (1) | ATE240177T1 (ja) |
AU (1) | AU5275299A (ja) |
CA (1) | CA2340669C (ja) |
DE (1) | DE69907933T2 (ja) |
WO (1) | WO2000010756A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013084650A1 (ja) * | 2011-12-06 | 2013-06-13 | 昭栄化学工業株式会社 | 金属粉末製造用プラズマ装置 |
JP2013224458A (ja) * | 2012-04-20 | 2013-10-31 | Shoei Chem Ind Co | 金属粉末の製造方法 |
CN105252012A (zh) * | 2015-11-18 | 2016-01-20 | 长春工业大学 | 一种多电极等离子弧连续制造金属粉末的装置及方法 |
Families Citing this family (115)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7576296B2 (en) * | 1995-03-14 | 2009-08-18 | Battelle Energy Alliance, Llc | Thermal synthesis apparatus |
US6972115B1 (en) | 1999-09-03 | 2005-12-06 | American Inter-Metallics, Inc. | Apparatus and methods for the production of powders |
KR100743844B1 (ko) * | 1999-12-01 | 2007-08-02 | 도와 마이닝 가부시끼가이샤 | 구리 분말 및 구리 분말의 제조 방법 |
WO2001046067A1 (en) * | 1999-12-21 | 2001-06-28 | Bechtel Bwxt Idaho, Llc | Hydrogen and elemental carbon production from natural gas and other hydrocarbons |
US7022155B2 (en) * | 2000-02-10 | 2006-04-04 | Tetronics Limited | Plasma arc reactor for the production of fine powders |
ATE311268T1 (de) * | 2000-02-18 | 2005-12-15 | Canadian Electronic Powders Co | Nickelpulver zur verwendung als elektroden in keramischen mehrschicht-grundmetallelktroden- kondensatoren |
US6924004B2 (en) * | 2000-07-19 | 2005-08-02 | Regents Of The University Of Minnesota | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
US6468497B1 (en) | 2000-11-09 | 2002-10-22 | Cyprus Amax Minerals Company | Method for producing nano-particles of molybdenum oxide |
US7572430B2 (en) * | 2000-11-09 | 2009-08-11 | Cyprus Amax Minerals Company | Method for producing nano-particles |
AUPR186200A0 (en) * | 2000-12-04 | 2001-01-04 | Tesla Group Holdings Pty Limited | Plasma reduction processing of materials |
US7442227B2 (en) | 2001-10-09 | 2008-10-28 | Washington Unniversity | Tightly agglomerated non-oxide particles and method for producing the same |
US7097691B2 (en) * | 2001-11-06 | 2006-08-29 | Cyprus Amax Minerals Company | Method for producing pigment nano-particles |
US6688494B2 (en) * | 2001-12-20 | 2004-02-10 | Cima Nanotech, Inc. | Process for the manufacture of metal nanoparticle |
US6755886B2 (en) * | 2002-04-18 | 2004-06-29 | The Regents Of The University Of California | Method for producing metallic microparticles |
US6902601B2 (en) | 2002-09-12 | 2005-06-07 | Millennium Inorganic Chemicals, Inc. | Method of making elemental materials and alloys |
US6868896B2 (en) * | 2002-09-20 | 2005-03-22 | Edward Scott Jackson | Method and apparatus for melting titanium using a combination of plasma torches and direct arc electrodes |
US7794629B2 (en) * | 2003-11-25 | 2010-09-14 | Qinetiq Limited | Composite materials |
US7494527B2 (en) * | 2004-01-26 | 2009-02-24 | Tekna Plasma Systems Inc. | Process for plasma synthesis of rhenium nano and micro powders, and for coatings and near net shape deposits thereof and apparatus therefor |
US7384448B2 (en) * | 2004-02-16 | 2008-06-10 | Climax Engineered Materials, Llc | Method and apparatus for producing nano-particles of silver |
JP2005289776A (ja) * | 2004-04-05 | 2005-10-20 | Canon Inc | 結晶製造方法および結晶製造装置 |
JP3938770B2 (ja) * | 2004-04-16 | 2007-06-27 | Tdk株式会社 | ニッケル粉の製造方法とニッケル粉の製造装置とニッケル粉製造用坩堝 |
JP5628472B2 (ja) * | 2004-04-19 | 2014-11-19 | エスディーシーマテリアルズ, インコーポレイテッド | 気相合成による高スループットの材料発見方法 |
US7465430B2 (en) * | 2004-07-20 | 2008-12-16 | E. I. Du Pont De Nemours And Company | Apparatus for making metal oxide nanopowder |
CA2512317A1 (en) * | 2004-07-20 | 2006-01-20 | E.I. Dupont De Nemours And Company | Process for making metal oxide nanoparticles |
US7297619B2 (en) * | 2004-08-24 | 2007-11-20 | California Institute Of Technology | System and method for making nanoparticles using atmospheric-pressure plasma microreactor |
WO2006042109A2 (en) | 2004-10-08 | 2006-04-20 | Sdc Materials, Llc | An apparatus for and method of sampling and collecting powders flowing in a gas stream |
US7476851B2 (en) * | 2004-11-12 | 2009-01-13 | Regents Of The University Of Minnesota | Aerodynamic focusing of nanoparticle or cluster beams |
US7354561B2 (en) * | 2004-11-17 | 2008-04-08 | Battelle Energy Alliance, Llc | Chemical reactor and method for chemically converting a first material into a second material |
CN101160166B (zh) | 2005-01-28 | 2011-02-09 | 泰克纳等离子系统公司 | 纳米粉末的感应等离子体合成 |
US8079838B2 (en) * | 2005-03-16 | 2011-12-20 | Horiba, Ltd. | Pure particle generator |
DE102005028463A1 (de) * | 2005-06-17 | 2006-12-28 | Basf Ag | Verfahren zur Herstellung von nanopartikulären Lanthanoid/Bor-Verbindungen von nanopartikuläre Lanthanoid/Bor-Verbindungen enthaltenden Feststoffgemischen |
CN100431748C (zh) * | 2005-07-27 | 2008-11-12 | 北京工业大学 | 稀土元素钆的纳米颗粒及纳米晶块体材料的制备方法 |
US8240190B2 (en) * | 2005-08-23 | 2012-08-14 | Uwm Research Foundation, Inc. | Ambient-temperature gas sensor |
US8268405B2 (en) * | 2005-08-23 | 2012-09-18 | Uwm Research Foundation, Inc. | Controlled decoration of carbon nanotubes with aerosol nanoparticles |
CA2581806C (en) * | 2006-03-08 | 2012-06-26 | Tekna Plasma Systems Inc. | Plasma synthesis of nanopowders |
KR100840229B1 (ko) | 2006-09-08 | 2008-06-23 | 재단법인 포항산업과학연구원 | 초미세 솔더 분말, 초미세 솔더 분말의 제조방법 및 그제조장치 |
US7736421B2 (en) * | 2006-10-10 | 2010-06-15 | Aerosol Dynamics Inc. | High saturation ratio water condensation device and method |
JP5052291B2 (ja) * | 2006-11-02 | 2012-10-17 | 株式会社日清製粉グループ本社 | 合金超微粒子、およびその製造方法 |
KR100788413B1 (ko) | 2007-03-13 | 2007-12-24 | 호서대학교 산학협력단 | 열플라즈마를 이용한 나노 복합 분말 제조 방법 |
WO2008140786A1 (en) * | 2007-05-11 | 2008-11-20 | Sdc Materials, Inc. | Method and apparatus for making uniform and ultrasmall nanoparticles |
US9630162B1 (en) * | 2007-10-09 | 2017-04-25 | University Of Louisville Research Foundation, Inc. | Reactor and method for production of nanostructures |
US8575059B1 (en) | 2007-10-15 | 2013-11-05 | SDCmaterials, Inc. | Method and system for forming plug and play metal compound catalysts |
EP2107862B1 (de) | 2008-04-03 | 2015-09-02 | Maicom Quarz GmbH | Verfahren und Vorrichtung zur Behandlung von Dispersionsmaterialien |
USD627900S1 (en) | 2008-05-07 | 2010-11-23 | SDCmaterials, Inc. | Glove box |
KR101009656B1 (ko) | 2008-09-17 | 2011-01-19 | 희성금속 주식회사 | 초미세 귀금속 분말 제조방법 |
CN102196997A (zh) * | 2008-10-27 | 2011-09-21 | 巴斯夫欧洲公司 | 制备纳米颗粒状金属硼化物悬浮液的方法 |
KR101024971B1 (ko) | 2008-12-12 | 2011-03-25 | 희성금속 주식회사 | 열플라즈마를 이용한 귀금속 분말 및 귀금속 타겟 제조방법 |
US9516734B2 (en) | 2009-03-24 | 2016-12-06 | Tekna Plasma Systems Inc. | Plasma reactor for the synthesis of nanopowders and materials processing |
US8591821B2 (en) | 2009-04-23 | 2013-11-26 | Battelle Energy Alliance, Llc | Combustion flame-plasma hybrid reactor systems, and chemical reactant sources |
KR100943453B1 (ko) * | 2009-08-18 | 2010-02-22 | 이대식 | 초미세 금속분말 제조 장치 및 방법, 이에 사용되는 금속증발장치 |
KR101134501B1 (ko) * | 2009-12-07 | 2012-04-13 | 주식회사 풍산 | 열플라즈마를 이용한 고순도 구리분말의 제조방법 |
US9126191B2 (en) | 2009-12-15 | 2015-09-08 | SDCmaterials, Inc. | Advanced catalysts for automotive applications |
US8545652B1 (en) | 2009-12-15 | 2013-10-01 | SDCmaterials, Inc. | Impact resistant material |
US8557727B2 (en) * | 2009-12-15 | 2013-10-15 | SDCmaterials, Inc. | Method of forming a catalyst with inhibited mobility of nano-active material |
US8652992B2 (en) | 2009-12-15 | 2014-02-18 | SDCmaterials, Inc. | Pinning and affixing nano-active material |
US8803025B2 (en) | 2009-12-15 | 2014-08-12 | SDCmaterials, Inc. | Non-plugging D.C. plasma gun |
US9149797B2 (en) | 2009-12-15 | 2015-10-06 | SDCmaterials, Inc. | Catalyst production method and system |
US9039916B1 (en) | 2009-12-15 | 2015-05-26 | SDCmaterials, Inc. | In situ oxide removal, dispersal and drying for copper copper-oxide |
US8470112B1 (en) | 2009-12-15 | 2013-06-25 | SDCmaterials, Inc. | Workflow for novel composite materials |
US9394632B2 (en) | 2010-03-22 | 2016-07-19 | The Regents Of The University Of California | Method and device to synthesize boron nitride nanotubes and related nanoparticles |
KR101175676B1 (ko) * | 2010-03-25 | 2012-08-22 | 희성금속 주식회사 | 폐 루테늄(Ru) 타겟을 이용한 고순도화 및 미세화된 루테늄(Ru)분말 제조법 |
KR101193683B1 (ko) | 2010-03-29 | 2012-10-22 | 현대제철 주식회사 | 지르코늄 코어드 와이어 투입법을 이용한 지르코늄 함유 철계 합금 제조 방법 및 그 제조 장치 |
RU2455119C2 (ru) * | 2010-08-27 | 2012-07-10 | Алексей Александрович Калачев | Способ получения наночастиц |
CN102166654B (zh) * | 2010-12-30 | 2015-11-25 | 广东高鑫科技股份有限公司 | 高效镍-石墨粉体的制备方法及其专用装置 |
US8669202B2 (en) | 2011-02-23 | 2014-03-11 | SDCmaterials, Inc. | Wet chemical and plasma methods of forming stable PtPd catalysts |
KR101285284B1 (ko) * | 2011-04-26 | 2013-07-11 | 희성금속 주식회사 | 폐 루테늄(Ru) 타겟을 이용한 초고순도 루테늄(Ru) 분말 및 타겟의 제조방법 |
CN102211197B (zh) * | 2011-05-06 | 2014-06-04 | 宁波广博纳米新材料股份有限公司 | 金属蒸发装置及用该装置制备超微细金属粉末的方法 |
RU2460816C1 (ru) * | 2011-05-20 | 2012-09-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Казанский национальный исследовательский технический университет им. А.Н.Туполева - КАИ" (КНИТУ-КАИ) | Способ получения порошкового материала на основе меди |
JP5824906B2 (ja) * | 2011-06-24 | 2015-12-02 | 昭栄化学工業株式会社 | 金属粉末製造用プラズマ装置及び金属粉末製造方法 |
JP2014524352A (ja) | 2011-08-19 | 2014-09-22 | エスディーシーマテリアルズ, インコーポレイテッド | 触媒作用および触媒コンバータに使用するための被覆基材ならびにウォッシュコート組成物で基材を被覆する方法 |
JP5821579B2 (ja) * | 2011-12-01 | 2015-11-24 | 昭栄化学工業株式会社 | 金属粉末製造用プラズマ装置 |
JP2015526271A (ja) * | 2012-06-05 | 2015-09-10 | ダウ コーニング コーポレーションDow Corning Corporation | ナノ粒子の流体捕捉 |
CN102950293B (zh) * | 2012-10-15 | 2015-01-07 | 宁波广博纳米新材料股份有限公司 | 纳米铝粉的生产方法 |
CN102950290B (zh) * | 2012-10-15 | 2014-11-26 | 宁波广博纳米新材料股份有限公司 | 纳米级镍锰合金粉的生产方法 |
CN102950291B (zh) * | 2012-10-15 | 2015-02-11 | 宁波广博纳米新材料股份有限公司 | 亚微米级锡铜合金粉的生产方法 |
CN102950292B (zh) * | 2012-10-15 | 2015-07-08 | 宁波广博纳米新材料股份有限公司 | 亚微米级铜锰镍合金粉的生产方法 |
CN102950289B (zh) * | 2012-10-15 | 2014-10-15 | 宁波广博纳米新材料股份有限公司 | 纳米级铜锰合金粉的生产方法 |
CN102873323B (zh) * | 2012-11-01 | 2014-04-23 | 泰克科技(苏州)有限公司 | 电子钽粉性能改善装置 |
CN103008673B (zh) * | 2012-11-07 | 2014-08-06 | 宁波广博纳米新材料股份有限公司 | 蒸发冷凝法制备含硫镍粉的方法 |
JP6089186B2 (ja) * | 2012-11-12 | 2017-03-08 | 国立大学法人弘前大学 | 超微細粉末、高強度鋼焼結体及びそれらの製造方法 |
US9156025B2 (en) | 2012-11-21 | 2015-10-13 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
US9511352B2 (en) | 2012-11-21 | 2016-12-06 | SDCmaterials, Inc. | Three-way catalytic converter using nanoparticles |
KR20150003580A (ko) * | 2013-07-01 | 2015-01-09 | 희성금속 주식회사 | 루테늄 분말 및 루테늄 타겟의 제조방법 |
WO2015013545A1 (en) | 2013-07-25 | 2015-01-29 | SDCmaterials, Inc. | Washcoats and coated substrates for catalytic converters |
CN103537703B (zh) * | 2013-09-12 | 2017-04-12 | 江苏博迁新材料股份有限公司 | 一种内回流式除垃圾方法 |
JP2016536120A (ja) | 2013-10-22 | 2016-11-24 | エスディーシーマテリアルズ, インコーポレイテッド | ヘビーデューティディーゼルの燃焼機関のための触媒デザイン |
CA2926135A1 (en) | 2013-10-22 | 2015-04-30 | SDCmaterials, Inc. | Compositions of lean nox trap |
WO2015143225A1 (en) | 2014-03-21 | 2015-09-24 | SDCmaterials, Inc. | Compositions for passive nox adsorption (pna) systems |
CN104084595B (zh) * | 2014-07-11 | 2016-08-24 | 湖南娄底华星锑业有限公司 | 一种锑粉生产系统 |
DE102014220817B4 (de) * | 2014-10-14 | 2021-02-04 | Universität Duisburg-Essen | Lichtbogenreaktor und Verfahren zur Herstellung von Nanopartikeln |
CN104722764B (zh) * | 2015-03-11 | 2017-01-25 | 江永斌 | 循环冷却的金属粉体蒸发制取装置 |
CN104690266A (zh) * | 2015-03-18 | 2015-06-10 | 宁波广博纳米新材料股份有限公司 | 用于制备晶片电阻器正面、背面电极的铜锰合金粉 |
JP5954470B2 (ja) * | 2015-06-26 | 2016-07-20 | 昭栄化学工業株式会社 | 金属粉末製造用プラズマ装置及び金属粉末製造方法 |
US10850330B2 (en) | 2015-10-19 | 2020-12-01 | Sumitomo Metal Mining Co., Ltd. | Process for producing nickel powder |
JP6573563B2 (ja) | 2016-03-18 | 2019-09-11 | 住友金属鉱山株式会社 | ニッケル粉末、ニッケル粉末の製造方法、およびニッケル粉末を用いた内部電極ペーストならびに電子部品 |
CN105598460B (zh) * | 2016-03-21 | 2018-03-06 | 台州市金博超导纳米材料科技有限公司 | 用于制造微纳米级金属粉末的高温蒸发器 |
KR102253292B1 (ko) | 2016-12-05 | 2021-05-20 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 니켈 분말의 제조 방법 |
JP6920676B2 (ja) * | 2017-04-19 | 2021-08-18 | パナソニックIpマネジメント株式会社 | 微粒子製造装置および微粒子製造方法 |
CN107030292A (zh) * | 2017-05-03 | 2017-08-11 | 江苏天楹环保能源成套设备有限公司 | 一种多级冷却制备金属粉末的等离子体雾化装置 |
JP7194544B2 (ja) * | 2017-10-03 | 2022-12-22 | 三井金属鉱業株式会社 | 粒子の製造方法 |
CN108130524A (zh) * | 2017-12-22 | 2018-06-08 | 中国科学院电工研究所 | 等离子体射流沉积薄膜装置及浅化表面陷阱能级的方法 |
US10612111B2 (en) * | 2018-08-21 | 2020-04-07 | Robert Ten | Method and apparatus for extracting high-purity gold from ore |
KR102141225B1 (ko) * | 2018-08-29 | 2020-08-04 | 한국생산기술연구원 | 온도급감장치를 구비한 열플라즈마 토치 및 이를 이용한 금속 나노 분말 가공장치. |
KR20220038023A (ko) | 2019-07-31 | 2022-03-25 | 스미토모 긴조쿠 고잔 가부시키가이샤 | 니켈 분말, 니켈 분말의 제조 방법 |
WO2021088217A1 (zh) * | 2019-11-07 | 2021-05-14 | 深圳航科新材料有限公司 | 新型球形粉末及其制备方法 |
JP7557689B2 (ja) * | 2020-03-25 | 2024-09-30 | 国立大学法人弘前大学 | 高強度Zn焼結体の製造方法 |
RU2746197C1 (ru) * | 2020-05-11 | 2021-04-08 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Пензенский государственный университет" | Способ получения мелкодисперсного порошка тугоплавкого материала |
RU2746673C1 (ru) * | 2020-10-09 | 2021-04-19 | федеральное государственное автономное образовательное учреждение высшего образования «Национальный исследовательский Томский политехнический университет» | СПОСОБ ПОЛУЧЕНИЯ ПОРОШКА, СОДЕРЖАЩЕГО ОДНОФАЗНЫЙ ВЫСОКОЭНТРОПИЙНЫЙ КАРБИД СОСТАВА Ti-Nb-Zr-Hf-Ta-C С КУБИЧЕСКОЙ РЕШЕТКОЙ |
CN214260700U (zh) * | 2021-01-08 | 2021-09-24 | 江苏博迁新材料股份有限公司 | 一种使用等离子转移弧加热的高温蒸发器 |
WO2022156229A1 (zh) * | 2021-01-25 | 2022-07-28 | 钟笔 | 一种用于控制超微粉粒子成型的控制器 |
CN216421070U (zh) * | 2021-10-19 | 2022-05-03 | 江苏博迁新材料股份有限公司 | 一种物理气相法制备超细粉体材料用的金属蒸气成核装置 |
KR102572728B1 (ko) * | 2021-11-19 | 2023-08-31 | 한국생산기술연구원 | 금속분말 제조장치 및 이를 이용한 금속분말 제조방법 |
RU210733U1 (ru) * | 2022-01-28 | 2022-04-28 | Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Томский политехнический университет" | Устройство для получения порошка на основе карбида бора |
JP2023183703A (ja) | 2022-06-16 | 2023-12-28 | 昭栄化学工業株式会社 | 金属粉末の製造方法および金属粉末の製造装置 |
KR102465825B1 (ko) * | 2022-09-06 | 2022-11-09 | 이용복 | 열플라즈마를 이용한 금속분말 제조장치 및 그 제조방법 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE269157C (ja) | 1911-12-12 | |||
US4076640A (en) * | 1975-02-24 | 1978-02-28 | Xerox Corporation | Preparation of spheroidized particles |
GB2002208B (en) * | 1977-08-01 | 1982-04-28 | Thermo Electron Corp | Process of and apparatus for producing a particulate product from a feed material |
US4376470A (en) | 1980-11-06 | 1983-03-15 | Little Giant Industries, Inc. | Fiberglass ladder |
US4376740A (en) | 1981-01-05 | 1983-03-15 | National Research Institute For Metals | Process for production fine metal particles |
DD269157A1 (de) * | 1987-12-28 | 1989-06-21 | Akad Wissenschaften Ddr | Plasmareaktor fuer die pyrolyse hochviskoser, teerartiger, kohlenwasserstoffhaltiger produkte |
US4990179A (en) * | 1990-04-23 | 1991-02-05 | Fmc Corporation | Process for increasing the life of carbon crucibles in plasma furnaces |
US5147448A (en) * | 1990-10-01 | 1992-09-15 | Nuclear Metals, Inc. | Techniques for producing fine metal powder |
WO1992014576A1 (en) * | 1991-02-22 | 1992-09-03 | Idaho Research Foundation | Plama production of ultra-fine ceramic carbides |
JP3245965B2 (ja) * | 1992-05-29 | 2002-01-15 | 株式会社村田製作所 | 銅粉末の製造方法 |
US5460701A (en) * | 1993-07-27 | 1995-10-24 | Nanophase Technologies Corporation | Method of making nanostructured materials |
US5514350A (en) | 1994-04-22 | 1996-05-07 | Rutgers, The State University Of New Jersey | Apparatus for making nanostructured ceramic powders and whiskers |
US5855642A (en) * | 1996-06-17 | 1999-01-05 | Starmet Corporation | System and method for producing fine metallic and ceramic powders |
US5782952A (en) * | 1996-08-30 | 1998-07-21 | Massachusetts Institute Of Technology | Method for production of magnesium |
JPH10102109A (ja) * | 1996-09-30 | 1998-04-21 | Tanaka Kikinzoku Kogyo Kk | ニッケル粉末の製造方法 |
-
1998
- 1998-08-18 US US09/136,043 patent/US6379419B1/en not_active Expired - Lifetime
-
1999
- 1999-08-16 JP JP2000566062A patent/JP3541939B2/ja not_active Expired - Lifetime
- 1999-08-16 DE DE69907933T patent/DE69907933T2/de not_active Expired - Lifetime
- 1999-08-16 EP EP99938107A patent/EP1115523B1/en not_active Expired - Lifetime
- 1999-08-16 CA CA002340669A patent/CA2340669C/en not_active Expired - Lifetime
- 1999-08-16 WO PCT/CA1999/000759 patent/WO2000010756A1/en active IP Right Grant
- 1999-08-16 AU AU52752/99A patent/AU5275299A/en not_active Abandoned
- 1999-08-16 KR KR1020017002087A patent/KR100594562B1/ko not_active IP Right Cessation
- 1999-08-16 AT AT99938107T patent/ATE240177T1/de not_active IP Right Cessation
-
2003
- 2003-10-27 JP JP2003366114A patent/JP2004036005A/ja active Pending
-
2005
- 2005-02-10 JP JP2005034922A patent/JP2005163188A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013084650A1 (ja) * | 2011-12-06 | 2013-06-13 | 昭栄化学工業株式会社 | 金属粉末製造用プラズマ装置 |
US9375789B2 (en) | 2011-12-06 | 2016-06-28 | Shoei Chemical Inc. | Plasma device for production of metal powder |
JP2013224458A (ja) * | 2012-04-20 | 2013-10-31 | Shoei Chem Ind Co | 金属粉末の製造方法 |
US9561543B2 (en) | 2012-04-20 | 2017-02-07 | Shoei Chemical Inc. | Method for manufacturing metal powder |
CN105252012A (zh) * | 2015-11-18 | 2016-01-20 | 长春工业大学 | 一种多电极等离子弧连续制造金属粉末的装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1115523B1 (en) | 2003-05-14 |
CA2340669A1 (en) | 2000-03-02 |
DE69907933D1 (de) | 2003-06-18 |
KR20010099622A (ko) | 2001-11-09 |
JP3541939B2 (ja) | 2004-07-14 |
KR100594562B1 (ko) | 2006-06-30 |
AU5275299A (en) | 2000-03-14 |
EP1115523A1 (en) | 2001-07-18 |
DE69907933T2 (de) | 2004-04-01 |
WO2000010756A1 (en) | 2000-03-02 |
JP2005163188A (ja) | 2005-06-23 |
CA2340669C (en) | 2009-04-07 |
ATE240177T1 (de) | 2003-05-15 |
US6379419B1 (en) | 2002-04-30 |
JP2002530521A (ja) | 2002-09-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3541939B2 (ja) | 微細及び超微細の粉体の製造方法及び移行型アークプラズマシステム | |
US8859931B2 (en) | Plasma synthesis of nanopowders | |
JP5133065B2 (ja) | ナノ粉末の誘導プラズマ合成 | |
US9516734B2 (en) | Plasma reactor for the synthesis of nanopowders and materials processing | |
EP0282291B1 (en) | Process for producing ultrafine particles of metals, metal compounds and ceramics and apparatus used therefor | |
US8092570B2 (en) | Method for producing titanium metal | |
US20120027955A1 (en) | Reactor and method for production of nanostructures | |
AU2010252965B2 (en) | Method for producing titanium metal | |
KR20090026512A (ko) | 아크 플라즈마 장치를 이용한 니켈 나노분말의 제조방법 및장치 | |
US9163299B2 (en) | Device for producing titanium metal, and method for producing titanium metal | |
Akashi | Progress in thermal plasma deposition of alloys and ceramic fine particles | |
WO1993002787A1 (en) | Process for the production of ultra-fine powdered materials | |
JPS5941772B2 (ja) | 超微粉合成炉 | |
WO2007086973A2 (en) | High temperature reactor for the production of nanophase wc/co powder | |
JP2002180112A (ja) | 高融点金属粉末材料の製造方法 | |
Samokhin et al. | Characteristics of heat and mass transfer to the wall of a confined-jet plasma flow reactor in the processes of nanopowder preparation from metals and their compounds |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20040604 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040614 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20040604 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040810 |
|
A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20040729 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20041110 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20041129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050210 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20050210 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20050510 |