JP6920676B2 - 微粒子製造装置および微粒子製造方法 - Google Patents
微粒子製造装置および微粒子製造方法 Download PDFInfo
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- 239000010419 fine particle Substances 0.000 title claims description 113
- 238000004519 manufacturing process Methods 0.000 title claims description 52
- 239000000463 material Substances 0.000 claims description 257
- 238000010891 electric arc Methods 0.000 claims description 70
- 239000002245 particle Substances 0.000 claims description 56
- 238000011084 recovery Methods 0.000 claims description 9
- 239000007789 gas Substances 0.000 description 198
- 239000000112 cooling gas Substances 0.000 description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 11
- 239000000843 powder Substances 0.000 description 11
- 238000001704 evaporation Methods 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000010574 gas phase reaction Methods 0.000 description 3
- 239000000976 ink Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000003870 refractory metal Substances 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000002537 cosmetic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- -1 respectively Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910004012 SiCx Inorganic materials 0.000 description 1
- 229910004205 SiNX Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003985 ceramic capacitor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
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- 239000007791 liquid phase Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
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- 238000012986 modification Methods 0.000 description 1
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- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
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- 239000012808 vapor phase Substances 0.000 description 1
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Description
用途によって使用される微粒子は様々で、例えば電子材料としてはSiなどの材料の微粒子が用いられ、インク又は化粧品としてはTiO2などの微粒子が用いられている。
このようなナノメートルサイズの微粒子の製造方法として代表的なものには、固相反応法、液相反応法、及び、気相反応法の3種類がある。
本発明は、上述された従来の課題を考慮し、材料を効率良く大量にプラズマに投入し、生産量を増加させ、かつ低コストで生産することができる微粒子製造装置及び微粒子製造方法を提供することを目的とする。
真空チャンバーと、
前記真空チャンバーに接続されて材料粒子の供給を行う材料供給装置と、
前記真空チャンバーに接続されて先端が前記真空チャンバー内に突出してアーク放電によるプラズマを発生させる複数本の電極と、
前記電極のそれぞれに接続された交流電源と、
前記真空チャンバーに接続されて微粒子を回収する回収装置とを有しており、
前記真空チャンバー内で前記アーク放電を発生させ、前記材料粒子から前記微粒子を製造する微粒子製造装置であって、
前記真空チャンバー内において、前記材料粒子を含む材料ガスを供給する前記材料供給装置の複数の材料供給口は、前記複数本の電極より鉛直方向の下側に設置されており、
前記材料供給装置の前記複数の材料供給口が、前記複数本の電極先端を結んだ円周よりも内側に配置され、
前記材料供給装置の前記複数の材料供給口の内周に、第1シールドガスを供給する第1シールドガス供給口が配置されるとともに、前記複数の材料供給口の外周に、第2シールドガスを供給する複数の第2シールドガス供給口が配置され、
前記第1シールドガスの流速を前記材料ガスの流速よりも速い流速になるように調節し、かつ、前記第2シールドガスの流速を前記材料ガスの流速よりも遅い流速になるように調節するように前記材料供給装置から供給される前記材料ガスおよび前記第1及び第2シールドガス供給口から供給される前記第1及び第2シールドガスの流量をそれぞれ調節可能な流量調節装置及び絞りが前記材料供給装置に接続されている。
前記目的を達成するために、本発明の別の態様における微粒子製造方法は、
前記態様に記載の微粒子製造装置を利用して、
前記アーク放電を発生させ、
前記材料ガスを前記アーク放電に供給し、
前記微粒子を生成する微粒子製造方法であって、
前記材料ガスを前記材料供給装置の前記複数の材料供給口から前記真空チャンバー内の前記アーク放電に供給するとき、前記材料ガスの流速よりも速い流速で前記第1シールドガスを前記真空チャンバー内に供給するとともに、前記材料ガスの流速よりも遅い流速で前記第2シールドガスを前記真空チャンバー内に供給する。
図1は本発明における第1実施形態の微粒子製造装置の側面概略断面図を示している。また、図2は本発明における第1実施形態の微粒子製造装置の供給口の概略平面図を示している。また、図3は本発明における第1実施形態の微粒子製造装置の側面の供給口付近の拡大断面図を示している。
第1の実施形態に関わる微粒子製造装置は、図1、図2に示すように、真空チャンバー1と、材料供給装置10と、複数本の電極4と、交流電源5と、微粒子回収装置3とを少なくとも備えて、真空チャンバー1内でアーク放電16を発生させ、材料粒子17から微粒子18を製造するようにしている。真空チャンバーの一例は真空チャンバー1である。
前記構成にかかる微粒子製造装置を使用する微粒子製造方法は、
アーク放電16を生成し、
材料粒子17をアーク放電16に供給し、
微粒子18を生成する、
といった3つのステップで少なくとも構成されている。これらの動作は、制御装置100で動作制御されることにより自動的に実施可能である。
まず、アーク放電16を生成するとき、真空チャンバー1内で、複数の電極4のそれぞれに互いに位相が異なる交流電力を交流電源5から印加して、アーク放電16を生成する。
始めに、真空チャンバー1と微粒子回収部3と材料供給装置10とを排気ポンプ7によって数10Paまで排気することで、大気の酸素の影響を低減させる。
次に、ガス供給装置30からガス流量調整器31,32,33と絞り31v,32v,33vを介して、材料供給装置10と放電ガス供給管14と冷却ガス供給管15とにそれぞれガスを供給し、排気ポンプ7の前段に取付けた圧力調整バルブ6で真空チャンバー1内の圧力を調整する。真空チャンバー1の下側の放電ガス供給管14からは、複数個の供給口からガスを供給する。
アーク放電16を生成できるので、他の方法に比べ、材料を蒸発させるプラズマ
の面積を大きくすることができる。
3 微粒子回収装置
4 電極
5 交流電源
6 圧力調整バルブ
7 排気ポンプ
8 電極駆動装置
10 材料供給装置
11 材料供給管
12 材料供給口
13a,13b 第1及び第2シールドガス供給口
14 放電ガス供給管
15 冷却ガス供給管
16 アーク放電
17 材料粒子
18 微粒子
30 ガス供給装置
31,32,33 ガス流量調整器
40 電極の内側の先端を結ぶ円周
80 配管
100 制御装置
MG 材料ガス
SG1 第1シールドガス
SG2 第2シールドガス
Claims (5)
- 真空チャンバーと、
前記真空チャンバーに接続されて材料粒子の供給を行う材料供給装置と、
前記真空チャンバーに接続されて先端が前記真空チャンバー内に突出してアーク放電によるプラズマを発生させる複数本の電極と、
前記電極のそれぞれに接続された交流電源と、
前記真空チャンバーに接続されて微粒子を回収する回収装置とを有しており、
前記真空チャンバー内で前記アーク放電を発生させ、前記材料粒子から前記微粒子を製造する微粒子製造装置であって、
前記真空チャンバー内において、前記材料粒子を含む材料ガスを供給する前記材料供給装置の複数の材料供給口は、前記複数本の電極より鉛直方向の下側に設置されており、
前記材料供給装置の前記複数の材料供給口が、前記複数本の電極先端を結んだ円周よりも内側に配置され、
前記材料供給装置の前記複数の材料供給口の内周に、第1シールドガスを供給する第1シールドガス供給口が配置されるとともに、前記複数の材料供給口の外周に、第2シールドガスを供給する複数の第2シールドガス供給口が配置され、
前記第1シールドガスの流速を前記材料ガスの流速よりも速い流速になるように調節し、かつ、前記第2シールドガスの流速を前記材料ガスの流速よりも遅い流速になるように調節するように前記材料供給装置から供給される前記材料ガスおよび前記第1及び第2シールドガス供給口から供給される前記第1及び第2シールドガスの流量をそれぞれ調節可能な流量調節装置及び絞りが前記材料供給装置に接続されている微粒子製造装置。 - 前記第2シールドガス供給口は、前記複数本の電極と電極との間に配置されている請求項1に記載の微粒子製造装置。
- 前記第2シールドガス供給口は、前記複数本の電極先端を結んだ円周よりも外側に配置されている請求項1又は2に記載の微粒子製造装置。
- 請求項1〜3のいずれか1つに記載の微粒子製造装置を利用して、
前記アーク放電を発生させ、
前記材料ガスを前記アーク放電に供給し、
前記微粒子を生成する微粒子製造方法であって、
前記材料ガスを前記材料供給装置の前記複数の材料供給口から前記真空チャンバー内の前記アーク放電に供給するとき、前記材料ガスの流速よりも速い流速で前記第1シールドガスを前記真空チャンバー内に供給するとともに、前記材料ガスの流速よりも遅い流速で前記第2シールドガスを前記真空チャンバー内に供給する、微粒子製造方法。 - 請求項1〜3のいずれか1つに記載の微粒子製造装置を利用して、
前記アーク放電を発生させ、
前記材料ガスを前記アーク放電に供給し、
前記微粒子を生成する微粒子製造方法であって、
前記材料ガスを前記材料供給装置の前記複数の材料供給口から前記真空チャンバー内の前記アーク放電に供給するとき、前記材料ガスの流速よりも速い流速で前記第1シールドガスを前記真空チャンバー内に供給するとともに、前記材料ガスの流速よりも遅い流速で前記第2シールドガスを前記真空チャンバー内に供給するとともに、
前記流量調節装置により前記各材料供給口からの前記材料粒子の供給のタイミングと前記シールドガスの供給のタイミングとを同期させる、微粒子製造方法。
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