JP2003520878A5 - - Google Patents
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- JP2003520878A5 JP2003520878A5 JP2001553849A JP2001553849A JP2003520878A5 JP 2003520878 A5 JP2003520878 A5 JP 2003520878A5 JP 2001553849 A JP2001553849 A JP 2001553849A JP 2001553849 A JP2001553849 A JP 2001553849A JP 2003520878 A5 JP2003520878 A5 JP 2003520878A5
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- cyano
- polymer according
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- 229920000642 polymer Polymers 0.000 description 21
- 125000004093 cyano group Chemical group *C#N 0.000 description 11
- 125000000217 alkyl group Chemical group 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 125000002947 alkylene group Chemical group 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 125000005731 2,5-thiophenylene group Chemical group [H]C1=C([*:1])SC([*:2])=C1[H] 0.000 description 1
- 125000004959 2,6-naphthylene group Chemical group [H]C1=C([H])C2=C([H])C([*:1])=C([H])C([H])=C2C([H])=C1[*:2] 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910003849 O-Si Inorganic materials 0.000 description 1
- 229910003872 O—Si Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000012952 cationic photoinitiator Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- -1 pyridine-2,5-diyl Chemical group 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0001543.8 | 2000-01-24 | ||
| GB0001543A GB0001543D0 (en) | 2000-01-24 | 2000-01-24 | Photoactive polymers |
| GB0005383.5 | 2000-03-06 | ||
| GB0005383A GB0005383D0 (en) | 2000-03-06 | 2000-03-06 | Photoactive polymers |
| PCT/CH2001/000044 WO2001053384A1 (en) | 2000-01-24 | 2001-01-22 | Photoactive polyimides, polyamide acids or esters with side chain photocrosslinkable groups |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003520878A JP2003520878A (ja) | 2003-07-08 |
| JP2003520878A5 true JP2003520878A5 (https=) | 2008-02-07 |
| JP4786104B2 JP4786104B2 (ja) | 2011-10-05 |
Family
ID=26243460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001553849A Expired - Fee Related JP4786104B2 (ja) | 2000-01-24 | 2001-01-22 | 側鎖の光架橋性基を有する光活性ポリイミド、ポリアミド酸又はエステル |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6831148B2 (https=) |
| EP (1) | EP1261659B1 (https=) |
| JP (1) | JP4786104B2 (https=) |
| KR (1) | KR100663661B1 (https=) |
| CN (1) | CN1152906C (https=) |
| AT (1) | ATE278731T1 (https=) |
| AU (1) | AU2001224973A1 (https=) |
| DE (1) | DE60106213T2 (https=) |
| HK (1) | HK1048644B (https=) |
| TW (1) | TW552282B (https=) |
| WO (1) | WO2001053384A1 (https=) |
Families Citing this family (88)
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| JP4513191B2 (ja) * | 2000-08-30 | 2010-07-28 | チッソ株式会社 | ポリアミド酸、ポリイミド、該ポリイミド膜を用いた液晶配向膜、および該配向膜を用いた液晶表示素子 |
| US7648815B2 (en) * | 2000-09-12 | 2010-01-19 | Pi R&D Co., Ltd. | Negative photosensitive polyimide composition and method for forming image the same |
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| EP1229066A1 (en) * | 2001-02-05 | 2002-08-07 | Rolic AG | Photoactive polymer |
| EP1277770A1 (en) * | 2001-07-17 | 2003-01-22 | Rolic AG | Photoactive materials |
| EP1353217A1 (en) * | 2002-03-29 | 2003-10-15 | JSR Corporation | Optical alignment method and liquid crystal display element |
| US6919404B2 (en) | 2002-05-31 | 2005-07-19 | Elsicon, Inc. | Hybrid polymer materials for liquid crystal alignment layers |
| US6900271B2 (en) | 2002-05-31 | 2005-05-31 | Elsicon, Inc | Hybrid polymer materials for liquid crystal alignment layers |
| AU2003218476A1 (en) | 2002-05-31 | 2003-12-19 | Elsicon, Inc. | Hybrid polymer materials for liquid crystal alignment layers |
| EP1386910A1 (en) | 2002-07-30 | 2004-02-04 | Rolic AG | Photoactive materials |
| KR20040046229A (ko) * | 2002-11-26 | 2004-06-05 | 한국화학연구원 | 감광성 투명 폴리아믹산 유도체와 폴리이미드계 수지 |
| KR101110090B1 (ko) | 2003-07-16 | 2012-02-15 | 롤리크 아게 | 배향층용의 중합 가능한 공중합체 |
| KR100562524B1 (ko) * | 2003-10-21 | 2006-03-23 | 한국화학연구원 | 평탄화 특성이 우수한 감광성 투명 폴리아믹산 올리고머와이를 경화하여 제조된 폴리이미드 수지 |
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| EP1860094A1 (en) * | 2006-05-23 | 2007-11-28 | Rolic AG | Photocrosslinkable materials |
| JP5269608B2 (ja) * | 2005-12-23 | 2013-08-21 | ロリク アーゲー | 光架橋性材料 |
| KR20080023645A (ko) * | 2006-09-11 | 2008-03-14 | 제이에스알 가부시끼가이샤 | 액정 배향제 및 액정 표시 소자 |
| EP2131233B1 (en) | 2007-03-26 | 2017-03-29 | Sharp Kabushiki Kaisha | Liquid crystal display device and polymer for aligning film material |
| EP2144951A1 (en) | 2007-05-02 | 2010-01-20 | Rolic AG | Thermally stable alignment materials |
| WO2008145225A2 (en) * | 2007-05-25 | 2008-12-04 | Rolic Ag | Photocrosslinkable materials comprising alicyclic group |
| KR101157338B1 (ko) | 2007-08-21 | 2012-06-18 | 제이에스알 가부시끼가이샤 | 액정 배향제, 액정 배향막의 제조 방법 및 액정 표시 소자 |
| KR100964434B1 (ko) | 2007-08-21 | 2010-06-16 | 제이에스알 가부시끼가이샤 | 액정 배향제, 액정 배향막의 형성 방법 및 액정 표시 소자 |
| EP2182407A4 (en) | 2007-08-21 | 2011-03-23 | Jsr Corp | LIQUID CRYSTAL ORIENTATION PROCESS, METHOD FOR PRODUCING A LIQUID CRYSTAL ORIENTATION LAYER AND A LIQUID CRYSTAL DISPLAY DEVICE |
| KR101443216B1 (ko) * | 2007-09-05 | 2014-09-24 | 삼성전자주식회사 | 광 반응성 재료를 이용한 유기발광소자 및 그 제조 방법 |
| EP2222740B1 (en) | 2007-12-21 | 2017-10-11 | Rolic AG | Functionalized photoreactive compounds |
| KR101527402B1 (ko) | 2007-12-21 | 2015-06-09 | 롤릭 리미티드 | 광정렬 조성물 |
| US20110102720A1 (en) * | 2008-06-27 | 2011-05-05 | Masanobu Mizusaki | Liquid crystal display device and manufacturing method therefor |
| KR20110055637A (ko) * | 2008-09-03 | 2011-05-25 | 샤프 가부시키가이샤 | 배향막, 배향막 재료 및 배향막을 갖는 액정 표시 장치, 및 그 제조 방법 |
| US8597739B2 (en) * | 2008-11-27 | 2013-12-03 | Sharp Kabushiki Kaisha | Orientation film, liquid crystal display having orientation film, and method for forming orientation film |
| KR101541018B1 (ko) * | 2008-12-08 | 2015-07-31 | 삼성디스플레이 주식회사 | 광배향 화합물, 광배향 조성물, 배향막을 포함하는 표시 기판 및 이의 제조 방법 |
| JP5630013B2 (ja) | 2009-01-30 | 2014-11-26 | ソニー株式会社 | 液晶表示装置の製造方法 |
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| JPS5545748A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Photosensitive polymer and its production |
| JPH0646302B2 (ja) * | 1987-06-22 | 1994-06-15 | 株式会社日立製作所 | 耐熱感光性重合体組成物 |
| KR19980057660A (ko) * | 1996-12-30 | 1998-09-25 | 손욱 | 광배향성 조성물, 이로부터 형성된 배향막과 이배향막을 구비한 액정표시소자 |
| KR100205963B1 (ko) | 1997-05-29 | 1999-07-01 | 이서봉 | 액정 배향막용 신규 가용성 폴리이미드 수지 |
| EP1021479B1 (en) | 1997-09-25 | 2002-07-17 | Rolic AG | Photocrosslinkable polyimides |
| US6303742B1 (en) * | 1998-04-01 | 2001-10-16 | Kanekafuchi Kagaku Kogyo Kabushiki Kaisha | Polyimide compositions |
| JPH11305256A (ja) * | 1998-04-24 | 1999-11-05 | Hitachi Ltd | アクティブマトリクス型液晶表示装置 |
| JP2002515617A (ja) * | 1998-05-18 | 2002-05-28 | エルシコン・インコーポレーテッド | 液晶の整列を誘起する方法及び材料、並びに液晶光学素子 |
| JP2000281783A (ja) * | 1999-03-31 | 2000-10-10 | Kanegafuchi Chem Ind Co Ltd | 新規ジアミン及びこれを用いた新規ポリイミド組成物。 |
| EP1229066A1 (en) * | 2001-02-05 | 2002-08-07 | Rolic AG | Photoactive polymer |
-
2001
- 2001-01-22 AT AT01900356T patent/ATE278731T1/de not_active IP Right Cessation
- 2001-01-22 AU AU2001224973A patent/AU2001224973A1/en not_active Abandoned
- 2001-01-22 WO PCT/CH2001/000044 patent/WO2001053384A1/en not_active Ceased
- 2001-01-22 US US10/181,265 patent/US6831148B2/en not_active Expired - Lifetime
- 2001-01-22 CN CNB018040470A patent/CN1152906C/zh not_active Expired - Lifetime
- 2001-01-22 DE DE2001606213 patent/DE60106213T2/de not_active Expired - Lifetime
- 2001-01-22 JP JP2001553849A patent/JP4786104B2/ja not_active Expired - Fee Related
- 2001-01-22 HK HK03100238.9A patent/HK1048644B/en not_active IP Right Cessation
- 2001-01-22 KR KR1020027009486A patent/KR100663661B1/ko not_active Expired - Fee Related
- 2001-01-22 EP EP01900356A patent/EP1261659B1/en not_active Expired - Lifetime
- 2001-02-07 TW TW90102593A patent/TW552282B/zh not_active IP Right Cessation
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