JP2003213437A5 - - Google Patents

Download PDF

Info

Publication number
JP2003213437A5
JP2003213437A5 JP2002016707A JP2002016707A JP2003213437A5 JP 2003213437 A5 JP2003213437 A5 JP 2003213437A5 JP 2002016707 A JP2002016707 A JP 2002016707A JP 2002016707 A JP2002016707 A JP 2002016707A JP 2003213437 A5 JP2003213437 A5 JP 2003213437A5
Authority
JP
Japan
Prior art keywords
metal salt
graft polymer
hydrophilic
forming
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002016707A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003213437A (ja
JP3866579B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002016707A priority Critical patent/JP3866579B2/ja
Priority claimed from JP2002016707A external-priority patent/JP3866579B2/ja
Priority to US10/347,736 priority patent/US20030149187A1/en
Priority to EP03001354A priority patent/EP1331285A3/en
Publication of JP2003213437A publication Critical patent/JP2003213437A/ja
Priority to US10/853,215 priority patent/US20050019502A1/en
Publication of JP2003213437A5 publication Critical patent/JP2003213437A5/ja
Application granted granted Critical
Publication of JP3866579B2 publication Critical patent/JP3866579B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002016707A 2002-01-25 2002-01-25 薄層金属膜 Expired - Fee Related JP3866579B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002016707A JP3866579B2 (ja) 2002-01-25 2002-01-25 薄層金属膜
US10/347,736 US20030149187A1 (en) 2002-01-25 2003-01-22 Thin-layer metal film
EP03001354A EP1331285A3 (en) 2002-01-25 2003-01-24 Thin-layer metal film
US10/853,215 US20050019502A1 (en) 2002-01-25 2004-05-26 Thin-layer metal film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002016707A JP3866579B2 (ja) 2002-01-25 2002-01-25 薄層金属膜

Publications (3)

Publication Number Publication Date
JP2003213437A JP2003213437A (ja) 2003-07-30
JP2003213437A5 true JP2003213437A5 (https=) 2005-07-14
JP3866579B2 JP3866579B2 (ja) 2007-01-10

Family

ID=19192012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002016707A Expired - Fee Related JP3866579B2 (ja) 2002-01-25 2002-01-25 薄層金属膜

Country Status (3)

Country Link
US (2) US20030149187A1 (https=)
EP (1) EP1331285A3 (https=)
JP (1) JP3866579B2 (https=)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY148655A (en) * 2003-11-27 2013-05-15 Fuji Photo Film Co Ltd Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same
US7291427B2 (en) * 2004-03-19 2007-11-06 Fujifilm Corporation Surface graft material, conductive pattern material, and production method thereof
JP4252919B2 (ja) * 2004-03-25 2009-04-08 富士フイルム株式会社 導電性パターン材料、金属微粒子パターン材料及びパターン形成方法
EP1581031B1 (en) * 2004-03-25 2010-10-06 FUJIFILM Corporation Methods of forming a pattern and a conductive pattern
US7527826B2 (en) * 2004-04-14 2009-05-05 University Of Massachusetts Adhesion of a metal layer to a substrate by utilizing an organic acid material
US20080014530A1 (en) * 2004-05-31 2008-01-17 Fujifilm Corporation Graft Pattern-Forming Method, Graft Pattern Material, Lithography Method, Conductive Pattern - Forming Method, Conductive Pattern, Color Filter Producing Method, Color Filter, and Mircrolens Producing Method
US20080038468A1 (en) * 2004-08-26 2008-02-14 Fujifilm Corporation Method for manufacturing an electro-conductive pattern material
JP2006078600A (ja) * 2004-09-07 2006-03-23 Fuji Photo Film Co Ltd 電気光学装置の製造方法
JP4583848B2 (ja) * 2004-09-07 2010-11-17 富士フイルム株式会社 マトリクスアレイ基板の製造方法、マトリクスアレイ基板、液晶表示装置、ｐｄｐ用データー電極の製造方法、ｐｄｐ用データー電極、及びｐｄｐ
JP4801362B2 (ja) * 2005-03-25 2011-10-26 ダイセル化学工業株式会社 めっき樹脂成形体の製造方法
JP4579048B2 (ja) * 2005-05-10 2010-11-10 富士フイルム株式会社 金属膜形成方法、それを用いた金属パターン形成方法及び金属膜
JP4850487B2 (ja) * 2005-11-07 2012-01-11 富士フイルム株式会社 プリント配線板用積層体、それを用いたプリント配線板、プリント配線基板の作製方法、電気部品、電子部品、および、電気機器
JP2007131875A (ja) * 2005-11-08 2007-05-31 Fujifilm Corp 金属膜形成方法及び金属パターン形成方法
US8647484B2 (en) * 2005-11-25 2014-02-11 Applied Materials, Inc. Target for sputtering chamber
WO2007069495A1 (ja) * 2005-12-16 2007-06-21 Konica Minolta Medical & Graphic, Inc. 電磁波遮蔽材料、電磁波遮蔽材料の製造方法及びプラズマディスプレイパネル用電磁波遮蔽材料
US8206828B2 (en) 2006-03-23 2012-06-26 Kimoto Co., Ltd. Material for forming electroless plate and method for forming electroless plate using the same
DE602007001344D1 (de) * 2006-04-10 2009-07-30 Linea Tergi Ltd Verfahren zur applizierung eines metalls auf ein substrat
DK2004907T3 (da) * 2006-04-10 2009-10-19 Linea Tergi Ltd Fremgangsmåde til påföring af et metal på papir
JP4155315B2 (ja) * 2006-06-28 2008-09-24 オムロン株式会社 金属膜の製造方法、下地組成物、金属膜およびその利用
US8968536B2 (en) * 2007-06-18 2015-03-03 Applied Materials, Inc. Sputtering target having increased life and sputtering uniformity
JP4321652B2 (ja) 2007-12-27 2009-08-26 オムロン株式会社 金属膜の製造方法
JP4321653B2 (ja) 2007-12-27 2009-08-26 オムロン株式会社 金属膜の製造方法
JP4458188B2 (ja) 2008-09-26 2010-04-28 オムロン株式会社 ハーフミラーおよびその製造方法
JP4853596B1 (ja) 2011-03-15 2012-01-11 オムロン株式会社 酸化金属膜を備えたセンサおよびその利用
JP5839541B2 (ja) 2011-05-13 2016-01-06 富士フイルム株式会社 導電シート及びタッチパネル
JP5675491B2 (ja) 2011-05-13 2015-02-25 富士フイルム株式会社 導電シート及びタッチパネル
JP5809846B2 (ja) 2011-05-13 2015-11-11 富士フイルム株式会社 導電シート及びタッチパネル
JP5670827B2 (ja) 2011-05-13 2015-02-18 富士フイルム株式会社 導電シート及びタッチパネル
JP2013149232A (ja) 2011-12-22 2013-08-01 Fujifilm Corp 導電シート及びタッチパネル
JP5875484B2 (ja) 2011-12-22 2016-03-02 富士フイルム株式会社 導電シート及びタッチパネル
JP5975907B2 (ja) * 2012-04-11 2016-08-23 株式会社半導体エネルギー研究所 半導体装置
JP6129769B2 (ja) 2013-05-24 2017-05-17 富士フイルム株式会社 タッチパネル用透明導電膜、透明導電膜の製造方法、タッチパネル及び表示装置
JP6026003B2 (ja) 2013-10-22 2016-11-16 富士フイルム株式会社 導電性フイルム、タッチパネル及び表示装置
JPWO2016136537A1 (ja) * 2015-02-26 2017-09-28 アルプス電気株式会社 部材、当該部材の製造方法および当該部材を備える電子部品
JP6348874B2 (ja) 2015-05-19 2018-06-27 富士フイルム株式会社 タッチセンサパネル
JP7185999B2 (ja) * 2017-10-06 2022-12-08 上村工業株式会社 無電解パラジウムめっき液
US20220057653A1 (en) * 2020-08-21 2022-02-24 Pegavision Corporation Contact lens and method of manufacturing the same
CN115896763B (zh) * 2022-11-12 2025-04-22 南昌大学 一种在Al-Mg-Si合金极板表面制备Ni/P涂层的方法

Family Cites Families (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL242470A (https=) * 1958-08-19
US3058845A (en) * 1959-06-23 1962-10-16 Du Pont Process for metallizing polyacrylonitrile shaped article by treating with a water soluble metal salt and reducing the salt to the free metal
DE2052397C2 (de) * 1969-12-15 1982-11-18 Československá akademie věd, Praha Verfahren zur Hydrophilierung von durchsichtigen Gegenständen aus hydrophoben organischen Polymeren
GB1420064A (en) * 1971-12-13 1976-01-07 Minnesota Mining & Mfg Coating of plastics materials
US3888672A (en) * 1972-07-31 1975-06-10 Du Pont Photopolymerizable process capable of yielding a reverse image
GB1577258A (en) * 1976-07-30 1980-10-22 Kansai Paint Co Ltd Planographic printing
JPS56125433A (en) * 1980-03-10 1981-10-01 Kansai Paint Co Ltd Modification method of surface of synthetic high-molecular substrate
JPS58196238A (ja) * 1982-05-13 1983-11-15 Toyo Ink Mfg Co Ltd 無電解メツキ方法
EP0258719A3 (de) * 1986-08-30 1989-07-05 Ciba-Geigy Ag Zweischichtensystem
JPS63312983A (ja) * 1987-06-16 1988-12-21 Hitachi Ltd 無電解銅めっき方法
JPH0826462B2 (ja) * 1987-11-30 1996-03-13 龍徳 四十宮 表面金属化重合体成形物の製造方法
US5399425A (en) * 1988-07-07 1995-03-21 E. I. Du Pont De Nemours And Company Metallized polymers
US4981715A (en) * 1989-08-10 1991-01-01 Microelectronics And Computer Technology Corporation Method of patterning electroless plated metal on a polymer substrate
US5648201A (en) * 1991-04-25 1997-07-15 The United Sates Of America As Represented By The Secretary Of The Navy Efficient chemistry for selective modification and metallization of substrates
US5357005A (en) * 1991-12-11 1994-10-18 International Business Machines Corporation Reactive surface functionalization
US5229172A (en) * 1993-01-19 1993-07-20 Medtronic, Inc. Modification of polymeric surface by graft polymerization
US6306492B1 (en) * 1996-12-26 2001-10-23 Toyo Boseki Kabushiki Kaisha Laminated polyester film
US6303278B1 (en) * 1997-01-31 2001-10-16 Cuptronic Ab Method of applying metal layers in distinct patterns
GB2325467B (en) * 1997-05-21 2000-11-01 Dainippon Ink & Chemicals Process for producing material with hydrophilic surface
TW473488B (en) * 1998-04-30 2002-01-21 Novartis Ag Composite materials, biomedical articles formed thereof and process for their manufacture
EP1135219B1 (de) * 1998-10-28 2004-01-28 Ciba SC Holding AG Verfahren zur herstellung haftfester oberflächenbeschichtungen
US6057414A (en) * 1999-02-24 2000-05-02 Micron Coating, Inc. Process of plasma treating polymer materials
US6436615B1 (en) * 1999-06-25 2002-08-20 The United States Of America As Represented By The Secretary Of The Navy Methods and materials for selective modification of photopatterned polymer films
SG87814A1 (en) * 1999-06-29 2002-04-16 Univ Singapore Method for low temperature lamination of metals to polyimides
US6607866B1 (en) * 1999-09-29 2003-08-19 Fuji Photo Film Co., Ltd. Lithographic printing plate support and lithographic printing plate precursor using the same
US6660445B2 (en) * 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
EP1211096A1 (en) * 2000-12-01 2002-06-05 Fuji Photo Film Co., Ltd. Base material for lithographic printing plate and lithographic printing plate using the same
ATE252981T1 (de) * 2000-12-13 2003-11-15 Fuji Photo Film Co Ltd Flachdruckplattenvorläufer
JP2002240450A (ja) * 2001-02-15 2002-08-28 Fuji Photo Film Co Ltd 平版印刷版原版
US20110212152A1 (en) * 2001-02-28 2011-09-01 Ditizio Valerio Modified anti-microbial surfaces, devices and methods
AU2002235694B2 (en) * 2001-02-28 2007-06-14 Covalon Technologies Inc. Method of making anti-microbial polymeric surfaces
US6811878B2 (en) * 2001-06-27 2004-11-02 Fuji Photo Film Co., Ltd. Conductive film
US7045276B2 (en) * 2001-10-11 2006-05-16 Fuji Photo Film Co., Ltd. Hydrophilic member precursor and pattern forming material that utilizes it, support for planographic printing plate, and planographic printing plate precursor
US7081291B2 (en) * 2002-01-11 2006-07-25 Domco Tarkett Inc. Selectively embossed surface coverings and processes of manufacture
US6878470B2 (en) * 2002-02-08 2005-04-12 Fuji Photo Film Co., Ltd. Visible image receiving material, conductive pattern material and organic electroluminescence element, using member having surface hydrophilicity
US6670286B1 (en) * 2002-02-13 2003-12-30 The Regents Of The University Of California Photopolymerization-based fabrication of chemical sensing films
US7056642B2 (en) * 2002-09-18 2006-06-06 Fuji Photo Film Co., Ltd. Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof
US6641899B1 (en) * 2002-11-05 2003-11-04 International Business Machines Corporation Nonlithographic method to produce masks by selective reaction, articles produced, and composition for same
JP2005037881A (ja) * 2003-04-21 2005-02-10 Fuji Photo Film Co Ltd パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版
JP4348253B2 (ja) * 2003-08-20 2009-10-21 富士フイルム株式会社 導電性パターン材料及び導電性パターンの形成方法
MY148655A (en) * 2003-11-27 2013-05-15 Fuji Photo Film Co Ltd Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same
US7291427B2 (en) * 2004-03-19 2007-11-06 Fujifilm Corporation Surface graft material, conductive pattern material, and production method thereof
EP1589376A1 (en) * 2004-03-23 2005-10-26 Fuji Photo Film Co., Ltd. Conductive pattern forming method, and conductive pattern material
JP4544913B2 (ja) * 2004-03-24 2010-09-15 富士フイルム株式会社 表面グラフト形成方法、導電性膜の形成方法、金属パターン形成方法、多層配線板の形成方法、表面グラフト材料、及び導電性材料
EP1581031B1 (en) * 2004-03-25 2010-10-06 FUJIFILM Corporation Methods of forming a pattern and a conductive pattern
US7879535B2 (en) * 2004-03-26 2011-02-01 Fujifilm Corporation Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material
BRPI0508800A (pt) * 2004-03-31 2008-02-06 Sun Chemical Corp método de fabricação de materiais para embalagem com baixo odor
JP2005347423A (ja) * 2004-06-01 2005-12-15 Fuji Photo Film Co Ltd 金属パターン形成方法、及び導電性パターン材料
JP5101026B2 (ja) * 2005-11-04 2012-12-19 富士フイルム株式会社 導電膜形成方法、導電性パターン形成方法、及び多層配線板の製造方法
JP2007131875A (ja) * 2005-11-08 2007-05-31 Fujifilm Corp 金属膜形成方法及び金属パターン形成方法
DE602007001344D1 (de) * 2006-04-10 2009-07-30 Linea Tergi Ltd Verfahren zur applizierung eines metalls auf ein substrat
JP4903479B2 (ja) * 2006-04-18 2012-03-28 富士フイルム株式会社 金属パターン形成方法、金属パターン、及びプリント配線板
ATE545665T1 (de) * 2006-10-23 2012-03-15 Fujifilm Corp Nitrilgruppen enthaltendes polymer und verfahren zu seiner synthetisierung, zusammensetzung mit nitrilgruppen enthaltendem polymer und laminat
EP2087942A1 (en) * 2006-10-23 2009-08-12 FUJIFILM Corporation Process for producing metal-film-coated substrate, metal-film-coated substrate, process for producing metallic-pattern material, and metallic-pattern material
JP5079396B2 (ja) * 2007-03-30 2012-11-21 富士フイルム株式会社 導電性物質吸着性樹脂フイルム、導電性物質吸着性樹脂フイルムの製造方法、それを用いた金属層付き樹脂フイルム、及び、金属層付き樹脂フイルムの製造方法
JP2009164575A (ja) * 2007-12-14 2009-07-23 Fujifilm Corp 表面金属膜材料の作製方法、表面金属膜材料、金属パターン材料の作製方法、金属パターン材料、及びポリマー層形成用組成物
US8293846B2 (en) * 2008-09-26 2012-10-23 Fujifilm Corporation Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material
JP5258489B2 (ja) * 2008-09-30 2013-08-07 富士フイルム株式会社 金属膜形成方法
US8967077B2 (en) * 2009-09-29 2015-03-03 Covalon Technologies, Inc. System and method for coating medical devices

Similar Documents

Publication Publication Date Title
JP2003213437A5 (https=)
Fromel et al. Surface engineering with polymer brush photolithography
RU2041261C1 (ru) Способ изготовления матрицы для детектирования мисматчей
RU2338760C2 (ru) Способ формирования реакционноспособных покрытий
EP1210396A4 (en) HYDROPHOBIC MATERIAL
TW200728071A (en) Gas barrier film, gas barrier laminated body and its fabrication method
TW200801815A (en) Method for forming pattern and composition for forming organic thin film using therefor
JP2024520575A (ja) フローセル及びそれを作製するための方法
TW200629416A (en) Semiconductor device and fabrication method thereof
JP2024522524A (ja) フローセル及びそれを作製するための方法
AU2002353851A1 (en) Improved process for modifying a polymeric surface
AU2002360288A1 (en) Process for modifying a polymeric surface
ATE302230T1 (de) Herstellung von vernetzten zweidimensionalen polymeren mit einer asymmetrie von $g(a), $g(b)- lactonen
EP1462544A3 (en) Methods for forming wiring and electrode
JP2003114525A (ja) 導電性パターン材料及び導電性パターンの形成方法
AU3800495A (en) Process for coating electrically non-conducting surfaces with connected metal structures
JP2003188498A (ja) 導電性パターン材料及び導電性パターン形成方法
ATE12705T1 (de) Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
JP2007501776A5 (https=)
JP2003527355A5 (https=)
JP2010157613A (ja) パターン形成用光硬化性組成物及びパターン形成方法
WO2003099707A3 (fr) Procede pour modifier les proprietes d'une couche mince et substrat faisant application du procede
WO2005031035A3 (en) Method for producing thin semiconductor films by deposition from solution
TWI325794B (en) Method for forming functional layers on a substrate and substrates obtained therefrom
ATE504947T1 (de) Verfahren und vorrichtung zum herstellen von elektronischen bauteilen