JP2002543272A5 - - Google Patents

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Publication number
JP2002543272A5
JP2002543272A5 JP2000615722A JP2000615722A JP2002543272A5 JP 2002543272 A5 JP2002543272 A5 JP 2002543272A5 JP 2000615722 A JP2000615722 A JP 2000615722A JP 2000615722 A JP2000615722 A JP 2000615722A JP 2002543272 A5 JP2002543272 A5 JP 2002543272A5
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JP
Japan
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composition
amine
weight
composition according
alkanolamine
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Pending
Application number
JP2000615722A
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English (en)
Japanese (ja)
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JP2002543272A (ja
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Priority claimed from US09/304,450 external-priority patent/US6248704B1/en
Application filed filed Critical
Publication of JP2002543272A publication Critical patent/JP2002543272A/ja
Publication of JP2002543272A5 publication Critical patent/JP2002543272A5/ja
Pending legal-status Critical Current

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JP2000615722A 1999-05-03 2000-05-02 半導体デバイス用の、有機残留物およびプラズマエッチングされた残留物を洗浄するための組成物 Pending JP2002543272A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/304,450 US6248704B1 (en) 1999-05-03 1999-05-03 Compositions for cleaning organic and plasma etched residues for semiconductors devices
US09/304,450 1999-05-03
PCT/US2000/011892 WO2000066697A1 (en) 1999-05-03 2000-05-02 Compositions for cleaning organic and plasma etched residues for semiconductor devices

Publications (2)

Publication Number Publication Date
JP2002543272A JP2002543272A (ja) 2002-12-17
JP2002543272A5 true JP2002543272A5 (enExample) 2007-06-28

Family

ID=23176568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000615722A Pending JP2002543272A (ja) 1999-05-03 2000-05-02 半導体デバイス用の、有機残留物およびプラズマエッチングされた残留物を洗浄するための組成物

Country Status (10)

Country Link
US (1) US6248704B1 (enExample)
EP (1) EP1177275B1 (enExample)
JP (1) JP2002543272A (enExample)
KR (1) KR100561178B1 (enExample)
AT (1) ATE331020T1 (enExample)
AU (1) AU4980300A (enExample)
DE (1) DE60028962T2 (enExample)
HK (1) HK1041020B (enExample)
TW (1) TWI237659B (enExample)
WO (1) WO2000066697A1 (enExample)

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