JP2002515657A5 - - Google Patents

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Publication number
JP2002515657A5
JP2002515657A5 JP2000549789A JP2000549789A JP2002515657A5 JP 2002515657 A5 JP2002515657 A5 JP 2002515657A5 JP 2000549789 A JP2000549789 A JP 2000549789A JP 2000549789 A JP2000549789 A JP 2000549789A JP 2002515657 A5 JP2002515657 A5 JP 2002515657A5
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JP
Japan
Prior art keywords
conductive polymer
electrically conductive
polymer layer
pumice
printed circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000549789A
Other languages
English (en)
Japanese (ja)
Other versions
JP4044286B2 (ja
JP2002515657A (ja
Filing date
Publication date
Priority claimed from DE19822075A external-priority patent/DE19822075C2/de
Application filed filed Critical
Publication of JP2002515657A publication Critical patent/JP2002515657A/ja
Publication of JP2002515657A5 publication Critical patent/JP2002515657A5/ja
Application granted granted Critical
Publication of JP4044286B2 publication Critical patent/JP4044286B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2000549789A 1998-05-16 1999-05-14 金属を用いた基板の被覆方法 Expired - Lifetime JP4044286B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19822075.8 1998-05-16
DE19822075A DE19822075C2 (de) 1998-05-16 1998-05-16 Verfahren zur metallischen Beschichtung von Substraten
PCT/EP1999/003322 WO1999060189A2 (de) 1998-05-16 1999-05-14 Verfahren zur metallischen beschichtung von substraten

Publications (3)

Publication Number Publication Date
JP2002515657A JP2002515657A (ja) 2002-05-28
JP2002515657A5 true JP2002515657A5 (enExample) 2005-10-20
JP4044286B2 JP4044286B2 (ja) 2008-02-06

Family

ID=7868037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000549789A Expired - Lifetime JP4044286B2 (ja) 1998-05-16 1999-05-14 金属を用いた基板の被覆方法

Country Status (21)

Country Link
US (1) US6589593B1 (enExample)
EP (1) EP1088121B1 (enExample)
JP (1) JP4044286B2 (enExample)
KR (1) KR100541893B1 (enExample)
CN (1) CN1299548C (enExample)
AT (1) ATE213510T1 (enExample)
AU (1) AU4261899A (enExample)
CA (1) CA2331757A1 (enExample)
DE (2) DE19822075C2 (enExample)
HU (1) HUP0102325A3 (enExample)
IL (1) IL139422A (enExample)
IS (1) IS5704A (enExample)
NO (1) NO20005778L (enExample)
PL (1) PL345093A1 (enExample)
RO (1) RO119837B1 (enExample)
RU (1) RU2214075C2 (enExample)
SK (1) SK16922000A3 (enExample)
TR (1) TR200003369T2 (enExample)
WO (1) WO1999060189A2 (enExample)
YU (1) YU71000A (enExample)
ZA (1) ZA200006623B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10007435A1 (de) * 2000-02-18 2001-08-23 Enthone Omi Deutschland Gmbh Verfahren zum Galvanisieren eines mit einem elektrisch leitenden Polymer beschichteten Werkstücks
ATE279552T1 (de) * 2000-09-26 2004-10-15 Enthone Omi Deutschland Gmbh Verfahren zur selektiven metallisierung dielektrischer materialien
ES2387696T3 (es) 2000-10-09 2012-09-28 Hueck Folien Ges.M.B.H. Lámina metalizada y procedimiento para su fabricación, así como su uso
KR20020079075A (ko) * 2001-04-13 2002-10-19 이진규 폴리메틸실세스퀴옥산 공중합체와 이를 이용한 저유전성절연막 및 그 제조방법
DE10343873A1 (de) * 2003-09-23 2005-04-21 Starck H C Gmbh Verfahren zur Reinigung von Thiophenen
US20060009029A1 (en) * 2004-07-06 2006-01-12 Agency For Science, Technology And Research Wafer level through-hole plugging using mechanical forming technique
DE102004042111A1 (de) * 2004-08-30 2006-03-09 Ovd Kinegram Ag Mehrschichtiger Körper mit unterschiedlich mikrostrukturierten Bereichen mit elektrisch leitfähiger Beschichtung
US20070237977A1 (en) * 2006-04-07 2007-10-11 United States Of America As Represented By The Administrator Of The National Aeronautics And Spac Thin Metal Film System To Include Flexible Substrate And Method Of Making Same
EP1870491B1 (de) * 2006-06-22 2015-05-27 Enthone, Inc. Verbessertes Verfahren zur Direktmetallisierung von elektrisch nicht leitfähigen Substratoberflächen, insbesondere Polyimidoberflächen
US8198976B2 (en) * 2006-08-18 2012-06-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Flexible thin metal film thermal sensing system
US7649439B2 (en) * 2006-08-18 2010-01-19 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Flexible thin metal film thermal sensing system
KR101409710B1 (ko) * 2006-09-07 2014-06-24 엔쏜 인코포레이티드 전도성 중합체의 전착 및 비전도성 기판의 금속화
CN100553405C (zh) * 2007-07-27 2009-10-21 日月光半导体制造股份有限公司 制作电路板的方法
FR2934609B1 (fr) * 2008-07-30 2011-07-22 Jet Metal Technologies Procede non eletrolytique de metallisation en ligne de substrats par projection avec traitement de surface prealable et dispositif pour la mise en oeuvre du procede.
RU2390978C1 (ru) * 2008-09-15 2010-05-27 Игорь Валерьевич Реутов Способ формирования проводящих дорожек в пористой полимерной пленке
JP5491022B2 (ja) * 2008-12-10 2014-05-14 株式会社日立国際電気 基板処理装置、半導体装置の製造方法、基板処理装置の制御方法および基板処理装置の表示方法
US9378859B2 (en) 2010-08-20 2016-06-28 Rhodia Operations Polymer compositions, polymer films, polymer gels, polymer foams, and electronic devices containing such films, gels and foams
PL2447296T3 (pl) * 2010-10-29 2018-06-29 Macdermid Enthone Inc. Kompozycja i sposób osadzania przewodzących polimerów na podłożach dielektrycznych
CN104349585B (zh) * 2013-08-01 2018-05-15 宏启胜精密电子(秦皇岛)有限公司 电路板及其制作方法
WO2015183304A1 (en) 2014-05-30 2015-12-03 Uab Rekin International Chrome-free adhesion pre-treatment for plastics
CN105887054B (zh) * 2016-06-13 2019-01-18 华南理工大学 一种高导电生物质/纳米金属柔性复合膜及其制备方法
CN110029382B (zh) * 2019-05-22 2021-09-24 电子科技大学 一种用于直接电镀的表面处理工艺及其相关直接电镀工艺

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4216246A (en) * 1977-05-14 1980-08-05 Hitachi Chemical Company, Ltd. Method of improving adhesion between insulating substrates and metal deposits electrolessly plated thereon, and method of making additive printed circuit boards
US4847114A (en) * 1984-01-26 1989-07-11 Learonal, Inc. Preparation of printed circuit boards by selective metallization
DE3806884C1 (en) * 1988-03-03 1989-09-21 Blasberg-Oberflaechentechnik Gmbh, 5650 Solingen, De Through-plated contact printed circuit and method for fabricating it
DE3928832C2 (de) * 1989-08-31 1995-04-20 Blasberg Oberflaechentech Verfahren zur Herstellung von durchkontaktierten Leiterplatten und Leiterplatten-Halbzeug
US5183692A (en) * 1991-07-01 1993-02-02 Motorola, Inc. Polyimide coating having electroless metal plate
US5268088A (en) * 1991-12-12 1993-12-07 Eric F. Harnden Simplified method for direct electroplating of acrylic or epoxy containing dielectric substrates
DE4202337A1 (de) * 1992-01-29 1993-08-05 Bayer Ag Verfahren zur durchkontaktierung von zweilagigen leiterplatten und multilayern
US5427841A (en) * 1993-03-09 1995-06-27 U.S. Philips Corporation Laminated structure of a metal layer on a conductive polymer layer and method of manufacturing such a structure
DE4326079A1 (de) * 1993-07-30 1995-02-02 Atotech Deutschland Gmbh Verfahren zur Behandlung von Kunststoffoberflächen und Anquell-Lösung
DE19502988B4 (de) * 1995-01-31 2004-03-18 Blasberg Oberflächentechnik GmbH Verfahren zur galvanischen Beschichtung von Polymeroberflächen
KR20010031137A (ko) * 1997-10-15 2001-04-16 그래햄 이. 테일러 전자 전도성 중합체

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