JP2002202584A5 - - Google Patents

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Publication number
JP2002202584A5
JP2002202584A5 JP2000401154A JP2000401154A JP2002202584A5 JP 2002202584 A5 JP2002202584 A5 JP 2002202584A5 JP 2000401154 A JP2000401154 A JP 2000401154A JP 2000401154 A JP2000401154 A JP 2000401154A JP 2002202584 A5 JP2002202584 A5 JP 2002202584A5
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JP
Japan
Prior art keywords
photomask
pattern
light
forming
binder
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JP2000401154A
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English (en)
Japanese (ja)
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JP3914386B2 (ja
JP2002202584A (ja
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Priority claimed from JP2000401154A external-priority patent/JP3914386B2/ja
Priority to JP2000401154A priority Critical patent/JP3914386B2/ja
Priority to TW090127169A priority patent/TW516112B/zh
Priority to KR1020010076106A priority patent/KR100798969B1/ko
Priority to US10/026,973 priority patent/US6927002B2/en
Priority to CNB011440740A priority patent/CN1193405C/zh
Priority to US10/072,880 priority patent/US6703171B2/en
Publication of JP2002202584A publication Critical patent/JP2002202584A/ja
Publication of JP2002202584A5 publication Critical patent/JP2002202584A5/ja
Publication of JP3914386B2 publication Critical patent/JP3914386B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000401154A 2000-12-28 2000-12-28 フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法 Expired - Fee Related JP3914386B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2000401154A JP3914386B2 (ja) 2000-12-28 2000-12-28 フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法
TW090127169A TW516112B (en) 2000-12-28 2001-11-01 Photomask and its manufacturing method, forming method of pattern, and manufacturing method of semiconductor device
KR1020010076106A KR100798969B1 (ko) 2000-12-28 2001-12-04 포토마스크, 그 제조방법, 패턴형성방법 및 반도체장치의제조방법
US10/026,973 US6927002B2 (en) 2000-12-28 2001-12-27 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
CNB011440740A CN1193405C (zh) 2000-12-28 2001-12-28 光掩模、其制造方法、图形形成方法及半导体装置的制造方法
US10/072,880 US6703171B2 (en) 2000-12-28 2002-02-12 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000401154A JP3914386B2 (ja) 2000-12-28 2000-12-28 フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法

Publications (3)

Publication Number Publication Date
JP2002202584A JP2002202584A (ja) 2002-07-19
JP2002202584A5 true JP2002202584A5 (enExample) 2005-06-16
JP3914386B2 JP3914386B2 (ja) 2007-05-16

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JP2000401154A Expired - Fee Related JP3914386B2 (ja) 2000-12-28 2000-12-28 フォトマスク、その製造方法、パターン形成方法および半導体装置の製造方法

Country Status (5)

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US (2) US6927002B2 (enExample)
JP (1) JP3914386B2 (enExample)
KR (1) KR100798969B1 (enExample)
CN (1) CN1193405C (enExample)
TW (1) TW516112B (enExample)

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